WO2004100255A1 - Method of making a low profile packaged semiconductor device - Google Patents
Method of making a low profile packaged semiconductor device Download PDFInfo
- Publication number
- WO2004100255A1 WO2004100255A1 PCT/US2003/013027 US0313027W WO2004100255A1 WO 2004100255 A1 WO2004100255 A1 WO 2004100255A1 US 0313027 W US0313027 W US 0313027W WO 2004100255 A1 WO2004100255 A1 WO 2004100255A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor die
- lead
- tape
- mounting
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
- H10W74/019—Manufacture or treatment using temporary auxiliary substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/40—Leadframes
- H10W70/481—Leadframes for devices being provided for in groups H10D8/00 - H10D48/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
- H10W74/014—Manufacture or treatment using batch processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/0711—Apparatus therefor
- H10W72/07178—Means for aligning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
- H10W72/07531—Techniques
- H10W72/07532—Compression bonding, e.g. thermocompression bonding
- H10W72/07533—Ultrasonic bonding, e.g. thermosonic bonding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/547—Dispositions of multiple bond wires
- H10W72/5475—Dispositions of multiple bond wires multiple bond wires connected to common bond pads at both ends of the wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/851—Dispositions of multiple connectors or interconnections
- H10W72/874—On different surfaces
- H10W72/884—Die-attach connectors and bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/921—Structures or relative sizes of bond pads
- H10W72/926—Multiple bond pads having different sizes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/931—Shapes of bond pads
- H10W72/932—Plan-view shape, i.e. in top view
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
- H10W74/142—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations exposing the passive side of the semiconductor body
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
Definitions
- the present invention relates in general to semiconductor devices and, more particularly, to semiconductor dice housed in low profile packages.
- semiconductor devices There is a continuing demand for electronic systems with a higher functionality and smaller physical size. For example, successive generations of personal computers are specified to utilize motherboards of a decreasing while incorporating more features and operating at lower voltages but a higher power consumption. The power requirements often are met by using multiple local voltage regulators located at several locations on each motherboard.
- the multiple voltage regulators typically are implemented as switching regulators that include an integrated control circuit and, to accommodate the high current levels, multiple parallel-connected discrete power switching transistors. A problem with this arrangement is that with each generation the multiple power switching transistors occupy larger portions of smaller motherboards, which reduces the area available for implementing other functions .
- FIG. 1 is an exploded isometric view of a semiconductor device during a first stage of fabrication
- FIG. 2 is a cross-sectional side view of the semiconductor device and a portion of an assembly apparatus at a second stage of fabrication;
- FIG. 3 is an isometric view of the semiconductor device after completion of a singulation process
- FIG. 4 is a bottom view of the semiconductor device
- FIG. 5 is a cross-sectional side view of a portion of an electrical system including the semiconductor device.
- FIG. 1 is an exploded isometric view of a semiconductor device 10 being assembled on a mounting tape 12 at a first fabrication stage.
- Semiconductor device 10 is formed with a leadfra e or leadframe matrix 16 and one or more semiconductor chips or dice 14.
- semiconductor dice 14 are substantially identical semiconductor substrates on which standard semiconductor wafer processes are performed to produce a plurality of power transistors.
- Mounting tape 12 comprises a standard semiconductor package assembly tape having an adhesive surface 11 for holding mounted components in position during the assembly process.
- An array of holes 18 are punched or otherwise formed in tape 12 at predefined locations determined by the package size and other factors. Holes 18 may be formed in si tu with a computer-controlled hole punch apparatus just prior to mounting package components, or may be purchased commercially in a pre-punched form from a tape manufacturer or vendor.
- Tape 12 preferably is formed with materials that can withstand the temperatures needed to complete the package assembly. For example, in one embodiment, the highest temperature occurs during the encapsulation process during which an epoxy-based or plastic mold compound is dispensed and cured at a temperature of about one hundred eighty degrees Celsius.
- tape 12 is made of a polyester-backed acrylic adhesive and formed with holes 18 of a diameter of about one thousand five hundred micrometers.
- tape 12 may comprise silicone and/or acrylic adhesive with a polyester, polyimide or polytetrafluoroethylene (PTFE) backing.
- Tape 12 may also be formed with an adhesive material applied to a metal foil such as an aluminum foil.
- Leadframe matrix 16 has an X-Y array of regions that define individual leadframes, including a leadframe 20 defined by singulation along cut lines 21-24 and severed after assembly to form a plurality of packaged integrated circuits or transistors. In the embodiment of FIG. 1, leadframe matrix 16 is patterned such that, for example, leadframe 20 is formed with leads 15 and 17 and an opening 19.
- a region 29 between adjacent leadframes functions as a tie bar to maintain the position of leads 15 and 17 in relation to opening 19 during assembly.
- leadframe matrix 16 is stamped or etched from a sheet of rolled copper having a thickness in a range between about one hundred and five hundred micrometers and a typical thickness of about two hundred micrometers .
- Leadframe matrix 16 is mounted on a region 27 of adhesive surface 11, with openings 19 aligned with regions 26 of mounting tape 12 that are generally centered around holes 18. Hence, leadframe matrix 16 is mounted directly on adhesive surface 11 so that holes 18 are exposed or visible through openings 19.
- Openings 19 have a larger area than the area of semiconductor dice 14 to allow a standard pick-and-place apparatus (not shown) to mount semiconductor dice 14 directly on adhesive surface 11 within openings 19 and over holes 18.
- the size of openings 19 is selected taking into account the die size, the requirements of the pick-and-place apparatus and any alignment tolerance necessary for a saw or other singulation tool to avoid damaging dice 14 during the subsequent singulation process.
- FIG. 2 is a cross-sectional side view of semiconductor device 10 after a second fabrication stage, and showing tape 12 mounted on a portion of an assembly apparatus that includes a vacuum system 42.
- a vacuum pump (not shown) pulls a vacuum in a direction indicated by arrows 40 through ducts of vacuum system 42 to produce a low pressure at holes 18 for securing the positions of semiconductor dice 14 and compensating for any elasticity or movement of tape 12 during subsequent wirebonding.
- a wirebonding machine attaches bonding wires 35 from a top surface 43 of lead 17 to a top surface 32 of semiconductor die 14. Similar wire bonds are attached from lead 15 to top surface 32 as shown and described below.
- molding material 49 such as a plastic material or thermoset epoxy.
- Molding material 49 is formed as a continuous body that encapsulates top surfaces 32 of semiconductor dice 14, top surfaces 43 of leads 17 and the top surfaces of leads 15 (not shown in FIG. 2) .
- Tape 12 is secured to surfaces of semiconductor device 10 so as to block molding material 49 from seeping through to reach holes 18, thereby preventing mold flash from forming on bottom surface 31 of semiconductor dice 14.
- Bottom surface 31 of semiconductor die 14 is formed during wafer processing with a solderable layer 72 for mechanically and electrically attaching to an external surface.
- Bottom surfaces 31, bottom surfaces 44 of leads 17 and bottom surfaces 54 of leads 15 are attached to tape 12 during the encapsulation or molding process and, as a consequence, are masked by tape 12 to prevent their being covered by molding material 49. Hence, bottom surfaces 31, 44 and 54 are exposed for making external electrical and mechanical connections after tape 12 is removed. If necessary, semiconductor device 10 is subjected to a cleaning process to remove any residue of tape 12 or its adhesive material to ensure that bottom surfaces 31, 44 and 54 are fully exposed and free of material that could prevent or reduce electrical contact to external surfaces .
- mold locks 71 that prevent molding material 49 from separating from leads 15 and 17 during subsequent processing or while semiconductor device 10 is being used or operated.
- mold locks 71 have a generally rectangular reentrant shape as shown.
- Leads 15 and 17, and in fact leadframe matrix 16, are made to a thickness less than the thickness of semiconductor dice 14.
- semiconductor dice 14 have a thickness of about two hundred micrometers, while leads 15 and 17 have a thickness of about one hundred twenty-five micrometers.
- This thickness difference allows bonding wires 35 to be formed with a small loop height to reduce the overall thickness or height of semiconductor device 10.
- the loop height is about four hundred eighty micrometers from the peak of bonding wires 35-36 to top surface 32 of semiconductor die 14, and the overall height of semiconductor device 10 is about eight hundred micrometers .
- semiconductor die 14 is configured as a power transistor operating at a specified source-drain current greater than one ampere and housed in a singulated package 70 that includes leads 15 and 17, bonding wires 35 and 36 and molding material 49.
- solderable layer 72 is formed on bottom surface 31 during wafer processing to function as a drain terminal.
- solderable layer 72 is formed with a titanium-nickel-silver alloy. Bottom surface 31 is exposed, i.e., not encapsulated by molding material 49, so solderable layer 72 allows bottom surface 31 to function as a package lead that can be attached by a solder reflow or other process for making external connections .
- semiconductor device 10 comprises a vertical power transistor
- multiple bonding wires 35 are attached in parallel between source bonding pad 52 and top surface 43 of lead 17 to reduce the on-resistance .
- the gate current is transient in nature and generally of a lower amplitude, so a single bonding wire 36 attached between gate bonding pad 51 and lead 15 is generally adequate to ensure a high performance .
- bottom surface 31 of semiconductor die 14, bottom surface 44 of lead 17 and a bottom surface 54 of lead 15 are all coplanar and exposed from molding material 49 to facilitate external connectivity.
- Tabs 55-56 project from leads 15 and 17, respectively, and are remnants of the tie bar of region 29, remaining on leads 15 and 17 as artifacts of the sawing or singulation process.
- semiconductor device 10 has an overall height of about eight hundred micrometers.
- FIG. 4 is a bottom view of semiconductor device 10 showing bottom surface 31 of semiconductor die 14 as being exposed for making external electrical connections along with bottom surface 54 of lead 15 and bottom surface 44 of lead 17. Bottom surfaces 31, 44 and 54 are all coplanar.
- FIG. 5 shows a cross-sectional side view of a portion of an electronic system, including semiconductor device 10 mounted on a motherboard 60.
- Motherboard 60 is formed with a trace 61 to which is attached lead 17 and a trace 62 for attaching to bottom surface 31 of semiconductor die 14.
- lead 17 and bottom surface 31 are attached to traces 61-62 by reflow soldering.
- bottom surface 31 of semiconductor die 14 results in a low thermal resistance since heat does not flow through a die attach pad and its associated metallurgical junctions as in other packaged devices. This benefit is particularly apparent in an embodiment in which a large portion of the power is generated throughout the bulk of semiconductor die 14, rather than at top surface 32.
- Thermal resistance is further reduced by the' low package profile of semiconductor device 10 because of the short distance from semiconductor die 14 to a top surface 65 of molding material 49. In some applications, it is advantageous to mount an external heat sink (not shown) to top surface 65 to further aid in dissipating power. Note also that trace 62 is formed to extend outwardly from semiconductor device 10.
- a lead has a first surface for wirebonding to a first surface of a semiconductor die and a second surface substantially coplanar with a second surface of the semiconductor die.
- a molding material encapsulates the first surface of the semiconductor die and exposes the second surface of the semiconductor die.
- the semiconductor di'e and lead are disposed on a mounting tape to maintain their position during the packaging assembly process.
- the semiconductor die is secured during package assembly by positioning over a hole in the mounting tape and applying a vacuum through the hole to obviate any movement or elasticity in the mounting tape while pressure is applied to the die by the wirebonding tool during the wirebonding process .
- the present invention provides a packaged semiconductor device with a high reliability and low cost. Because the semiconductor die is exposed to function as a lead, there is no die attach pad and therefore no solder reflow die attach process is needed. Hence, the semiconductor device can be assembled in a wider variety of manufacturing locations and at a lower cost. Moreover, fewer dissimilar component materials and therefore fewer dissimilar temperature coefficients of expansion within the semiconductor device. Consequently, internal stresses are reduced and reliability enhanced. Finally, the semiconductor device can be formed with a smaller footprint because there is no need to align and mount the semiconductor die on a die attach pad that is made larger to avoid die overhang.
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
Claims
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB038263653A CN100364074C (en) | 2003-04-29 | 2003-04-29 | Method of manufacturing low profile packaged semiconductor device |
| HK06109748.0A HK1089557B (en) | 2003-04-29 | Method of making a low profile packaged semiconductor device | |
| AU2003231137A AU2003231137A1 (en) | 2003-04-29 | 2003-04-29 | Method of making a low profile packaged semiconductor device |
| PCT/US2003/013027 WO2004100255A1 (en) | 2003-04-29 | 2003-04-29 | Method of making a low profile packaged semiconductor device |
| US10/548,563 US8574961B2 (en) | 2003-04-29 | 2003-04-29 | Method of marking a low profile packaged semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2003/013027 WO2004100255A1 (en) | 2003-04-29 | 2003-04-29 | Method of making a low profile packaged semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2004100255A1 true WO2004100255A1 (en) | 2004-11-18 |
Family
ID=33434339
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2003/013027 Ceased WO2004100255A1 (en) | 2003-04-29 | 2003-04-29 | Method of making a low profile packaged semiconductor device |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8574961B2 (en) |
| CN (1) | CN100364074C (en) |
| AU (1) | AU2003231137A1 (en) |
| WO (1) | WO2004100255A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7411305B2 (en) * | 2005-05-09 | 2008-08-12 | International Business Machines Corporation | Interconnect structure encased with high and low k interlevel dielectrics |
| US7855439B2 (en) * | 2008-08-28 | 2010-12-21 | Fairchild Semiconductor Corporation | Molded ultra thin semiconductor die packages, systems using the same, and methods of making the same |
| JP5343510B2 (en) * | 2008-10-29 | 2013-11-13 | ミツミ電機株式会社 | Semiconductor device |
| JP2012028743A (en) * | 2010-06-22 | 2012-02-09 | Panasonic Corp | Package for semiconductor device, method of manufacturing the same, and semiconductor device |
| EP3034476A1 (en) * | 2014-12-16 | 2016-06-22 | Heraeus Quarzglas GmbH & Co. KG | Method for the preparation of synthetic quartz glass with the use of a cleaning device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6001671A (en) * | 1996-04-18 | 1999-12-14 | Tessera, Inc. | Methods for manufacturing a semiconductor package having a sacrificial layer |
| US6069408A (en) * | 1997-06-10 | 2000-05-30 | Fujitsu Limited | Semiconductor device and method of manufacturing semiconductor device |
| US6258632B1 (en) * | 1996-01-15 | 2001-07-10 | Kabushiki Kaisha Toshiba | Molded packaging for semiconductor device and method of manufacturing the same |
| US20020100163A1 (en) * | 2001-02-01 | 2002-08-01 | National Semiconductor Corporation | Universal clamping mechanism |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5029418A (en) * | 1990-03-05 | 1991-07-09 | Eastman Kodak Company | Sawing method for substrate cutting operations |
| US5140404A (en) * | 1990-10-24 | 1992-08-18 | Micron Technology, Inc. | Semiconductor device manufactured by a method for attaching a semiconductor die to a leadframe using a thermoplastic covered carrier tape |
| US5319242A (en) * | 1992-03-18 | 1994-06-07 | Motorola, Inc. | Semiconductor package having an exposed die surface |
| EP1213754A3 (en) * | 1994-03-18 | 2005-05-25 | Hitachi Chemical Co., Ltd. | Fabrication process of semiconductor package and semiconductor package |
| US5589408A (en) * | 1995-07-05 | 1996-12-31 | Motorola, Inc. | Method of forming an alloyed drain field effect transistor and device formed |
| US5708419A (en) * | 1996-07-22 | 1998-01-13 | Checkpoint Systems, Inc. | Method of wire bonding an integrated circuit to an ultraflexible substrate |
| US5894108A (en) * | 1997-02-11 | 1999-04-13 | National Semiconductor Corporation | Plastic package with exposed die |
| TW449844B (en) * | 1997-05-17 | 2001-08-11 | Hyundai Electronics Ind | Ball grid array package having an integrated circuit chip |
| JP2971834B2 (en) * | 1997-06-27 | 1999-11-08 | 松下電子工業株式会社 | Method for manufacturing resin-encapsulated semiconductor device |
| US6294100B1 (en) * | 1998-06-10 | 2001-09-25 | Asat Ltd | Exposed die leadless plastic chip carrier |
| US6261864B1 (en) * | 2000-01-28 | 2001-07-17 | Advanced Semiconductor Engineering, Inc. | Low-pin-count chip package and manufacturing method thereof |
| US6909178B2 (en) * | 2000-09-06 | 2005-06-21 | Sanyo Electric Co., Ltd. | Semiconductor device and method of manufacturing the same |
| KR100490493B1 (en) * | 2000-10-23 | 2005-05-19 | 앰코 테크놀로지 코리아 주식회사 | Method for fixing semiconductor chip |
| US6337510B1 (en) * | 2000-11-17 | 2002-01-08 | Walsin Advanced Electronics Ltd | Stackable QFN semiconductor package |
| TW498443B (en) * | 2001-06-21 | 2002-08-11 | Advanced Semiconductor Eng | Singulation method for manufacturing multiple lead-free semiconductor packages |
| MY140980A (en) * | 2003-09-23 | 2010-02-12 | Unisem M Berhad | Semiconductor package |
-
2003
- 2003-04-29 CN CNB038263653A patent/CN100364074C/en not_active Expired - Fee Related
- 2003-04-29 WO PCT/US2003/013027 patent/WO2004100255A1/en not_active Ceased
- 2003-04-29 AU AU2003231137A patent/AU2003231137A1/en not_active Abandoned
- 2003-04-29 US US10/548,563 patent/US8574961B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6258632B1 (en) * | 1996-01-15 | 2001-07-10 | Kabushiki Kaisha Toshiba | Molded packaging for semiconductor device and method of manufacturing the same |
| US6001671A (en) * | 1996-04-18 | 1999-12-14 | Tessera, Inc. | Methods for manufacturing a semiconductor package having a sacrificial layer |
| US6069408A (en) * | 1997-06-10 | 2000-05-30 | Fujitsu Limited | Semiconductor device and method of manufacturing semiconductor device |
| US20020100163A1 (en) * | 2001-02-01 | 2002-08-01 | National Semiconductor Corporation | Universal clamping mechanism |
Also Published As
| Publication number | Publication date |
|---|---|
| US8574961B2 (en) | 2013-11-05 |
| US20060134836A1 (en) | 2006-06-22 |
| CN100364074C (en) | 2008-01-23 |
| HK1089557A1 (en) | 2006-12-01 |
| CN1771591A (en) | 2006-05-10 |
| AU2003231137A1 (en) | 2004-11-26 |
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