WO2004060567A1 - Centrifugal separator - Google Patents

Centrifugal separator Download PDF

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Publication number
WO2004060567A1
WO2004060567A1 PCT/JP2002/013613 JP0213613W WO2004060567A1 WO 2004060567 A1 WO2004060567 A1 WO 2004060567A1 JP 0213613 W JP0213613 W JP 0213613W WO 2004060567 A1 WO2004060567 A1 WO 2004060567A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning liquid
fly
liquid receiving
bowl
residual layer
Prior art date
Application number
PCT/JP2002/013613
Other languages
French (fr)
Japanese (ja)
Inventor
Koji Fujimoto
Atsushi Onodera
Jun Ohashi
Motoki Numata
Takayuki Isogai
Katsunori Fukuda
Original Assignee
Tomoe Engineering Co., Ltd.
Mitsubishi Chemical Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tomoe Engineering Co., Ltd., Mitsubishi Chemical Corporation filed Critical Tomoe Engineering Co., Ltd.
Priority to PCT/JP2002/013613 priority Critical patent/WO2004060567A1/en
Priority to AU2002360053A priority patent/AU2002360053A1/en
Priority to EP03768302A priority patent/EP1579918B8/en
Priority to EP09008729A priority patent/EP2108458B1/en
Priority to CN200710089696XA priority patent/CN101041145B/en
Priority to PCT/JP2003/016873 priority patent/WO2004058410A1/en
Priority to AU2003292669A priority patent/AU2003292669A1/en
Priority to US10/540,472 priority patent/US7140494B2/en
Priority to CNB2003801074619A priority patent/CN100337755C/en
Publication of WO2004060567A1 publication Critical patent/WO2004060567A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B04CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04BCENTRIFUGES
    • B04B15/00Other accessories for centrifuges
    • B04B15/12Other accessories for centrifuges for drying or washing the separated solid particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B04CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04BCENTRIFUGES
    • B04B3/00Centrifuges with rotary bowls in which solid particles or bodies become separated by centrifugal force and simultaneous sifting or filtering
    • B04B3/04Centrifuges with rotary bowls in which solid particles or bodies become separated by centrifugal force and simultaneous sifting or filtering discharging solid particles from the bowl by a conveying screw coaxial with the bowl axis and rotating relatively to the bowl

Definitions

  • a screw conveyer is provided in a bowl, these are rotatably supported, and the processed material is separated from a stock solution supplied into the bowl, and the inner periphery of one end side of the bowl is provided.
  • a centrifugal separator for washing and dewatering the processing object with a screen provided along the surface, a cleaning liquid receiving part for receiving a cleaning liquid supplied to the inside of the hub of the screw conveyer; And a washing nozzle for ejecting the washing liquid toward the screen section.
  • a centrifuge is used for purifying various crystals in the fields of the chemical industry and the food industry. Background art
  • a cleaning nozzle for ejecting the cleaning liquid toward the relevant part is provided on the hub of the screw conveyor, and the cleaning liquid is sprayed all over the crystal being transported by the screen part. Cleaning was done by doing.
  • Patent Literature 1 Japanese Patent Application Laid-Open No. 2000-3202583.
  • the crystals are transported by the conveyor. After a long operation, the remaining layer of the crystal does not move, and is pressed against the outer periphery of the flight, so that the crystal becomes hardened.
  • the present invention has been made in view of the above-mentioned problems of the prior art.
  • a process particularly a crystal or the like, in a main part of a screen part is used.
  • the gist of the present invention to achieve the above-mentioned object lies in the following inventions.
  • a screw conveyer is provided in a bowl, and these are relatively rotatably supported to separate a processed material from a stock solution supplied into the bowl, and an inner peripheral surface on one end side of the bowl.
  • a centrifugal separator for washing and dewatering the above-mentioned processed material in a screen part provided along the line, a cleaning liquid receiving part for receiving the cleaning liquid supplied into the hub of the screw conveyor, A washing nozzle for jetting a washing liquid in a washing liquid receiving section toward the screen section,
  • a plurality of residual layer cleaning liquids are arranged at predetermined intervals in the cleaning liquid receiver along the spiral direction of the fly at a position adjacent to a surface of the screw conveyor on the side opposite to the processed material transfer surface. Make a hole,
  • a narrow-width force par flight that extends in the spiral direction of the flight with a predetermined gap between the opposite surface is attached.
  • the cleaning liquid in the cleaning liquid receiving portion that protrudes from each of the remaining layer cleaning liquid discharge holes is transferred from the gap between the outer peripheral edge of the fly and the cover flight between the outer peripheral edge of the fly and the inner peripheral surface of the screen portion.
  • a centrifugal separator characterized by ejecting directly to the residual material that is generated in the gap between the two.
  • the cleaning liquid receiving portion is provided with a partition plate for partitioning the inside of the cleaning liquid receiving portion into a plurality of portions in the axial direction of the screen portion of the bowl, so that a cleaning range in the screen portion can be selected.
  • the centrifuge according to [1].
  • a screw conveyer is provided in the bowl, and these are relatively rotatably supported to separate the processed material from the undiluted solution supplied into the bowl, and to have an inner periphery on one end side of the powl.
  • a washing liquid receiving portion for receiving the washing liquid supplied to the hub of the screw conveyor, and a washing liquid in the washing liquid receiving portion to the screen portion.
  • a centrifugal separator having a wash nozzle that gushes out
  • a residual layer cleaning liquid receiving portion for receiving a cleaning liquid for cleaning a residual layer processed product generated in a gap between an outer peripheral edge of the screw conveyor and the inner peripheral surface of the screen portion is provided. It is provided separately from the inside of the washing liquid receiving section,
  • a plurality of connecting pipes are provided at a position adjacent to a surface of the freight opposite to the processed material conveying surface, at predetermined intervals along a spiral direction of the freight, at a bottom side of the residual layer cleaning liquid receiving portion. Is provided, and a plurality of residual layer cleaning liquid discharge holes are provided in the hub of the screw conveyor so that the connection pipes communicate with each other. Attach a narrow cover fly that extends in the helical direction of the fly with a predetermined gap left on the side surface.
  • the cleaning liquid in the cleaning liquid receiving portion for the residual layer which protrudes from each of the cleaning liquid discharge holes for the residual layer, is jetted directly from the gap between the outer peripheral edge of the flight and the force par flight toward the residual layer processing object.
  • a centrifuge characterized by the above.
  • a feed tube for supplying a stock solution extending in the axial direction is inserted into the inside of the hub of the screw conveyor,
  • a cleaning liquid supply path for supplying a cleaning liquid to the cleaning liquid receiving section is formed in the feed tube, and an opening for the cleaning liquid supply path is provided in the middle of the feed tube overlapping the cleaning liquid receiving section in the radial direction.
  • a residual layer cleaning liquid supply path for supplying the residual layer cleaning liquid to the residual layer cleaning liquid receiving part is formed, and in the middle of a feed tube radially overlapping the residual layer cleaning liquid receiving part.
  • Cleaning solution for the residual layer The centrifuge according to [3], wherein an opening for the supply path is provided.
  • a screw conveyor is provided in the bowl, and these are relatively rotatably supported.
  • the processed material is separated from the stock solution supplied into the bowl, and the inner peripheral surface at one end of the bowl is provided.
  • a centrifugal separator for washing and dewatering the processed material in a screen section provided along the line, wherein a cleaning liquid receiving section for receiving the cleaning liquid supplied to the inside of the haptic of the screw conveyor;
  • a centrifugal separator having a cleaning nozzle for jetting a cleaning liquid in a receiving portion toward the screen portion,
  • a cleaning liquid for a residual layer which receives a cleaning liquid for cleaning a residual layer processing product generated in a gap between an outer peripheral edge of the flight of the star conveyor and an inner peripheral surface of the screen portion inside one end of a hub of the screw conveyor.
  • a receiving chamber is provided separately from the cleaning liquid receiving section,
  • a plurality of cleaning liquid introduction pipes for remaining layers are arranged at predetermined intervals in the circumferential direction of the hub in a state in which a plurality of cleaning liquid introduction pipes for remaining layers penetrate through the fly and extend in the hub axis direction on the outer periphery of the hap of the screw conveyor.
  • One end side of the layer cleaning liquid introduction pipe is connected to the remaining layer cleaning liquid receiving chamber,
  • a narrow-width force par flight that extends in the spiral direction of the flight with a predetermined gap between the opposite surface is attached.
  • the cleaning liquid that jumps out of each of the residual layer cleaning liquid discharge holes is passed through a gap between the outer periphery of the flight and the cover flight.
  • the cover flight is provided with a gradient with respect to the surface on the opposite side of the flight from a side close to the hub to a side close to the outer peripheral edge of the fly at a predetermined interval.
  • the centrifuge described in the above [1] when the stock solution is supplied into the powl, the stock solution is separated into a processed product and a mother liquor in the bowl by centrifugal force, and the processed product is processed on the inner peripheral surface of the bowl.
  • the processed material is conveyed by a screw conveyor provided with a rotation difference from the bowl.
  • the processed material is not sufficiently conveyed by the conveyer, and is removed in the middle of t conveyance, which forms the remaining layer.
  • the liquor is attached to the surface of impurities and mother liquor itself generated during the manufacturing process, and is provided along the inner peripheral surface on one end side of the powl to wash these extraneous substances.
  • cleaning is performed by spraying the cleaning liquid toward the processed product through the cleaning nozzle in the hap of the screw conveyor.
  • the cleaning liquid here is supplied to the cleaning liquid receiving section in the hub via a cleaning liquid supply path separately provided in a feed tube for supplying the undiluted liquid into the bowl.
  • the cleaning liquid in the cleaning liquid receiving portion is jetted from the cleaning nozzle.
  • the cleaning liquid is arranged at predetermined intervals along the spiral direction of the fly at a position adjacent to the surface of the fly opposite to the processing object transport surface. Protrude into the bowl from the multiple remaining layer cleaning solution discharge holes.
  • the cleaning liquid does not scatter, and extends along the outer peripheral edge of the opposite surface of the fly in a spiral direction of the fly with a predetermined gap from the opposite surface.
  • Cover fly It is jetted directly from the narrow gap between the ground and the outer periphery of the flight toward the remaining layer processing material.
  • the cleaning nozzle in addition to the overall cleaning of the processed material by the cleaning nozzle, it is also possible to perform, in particular, the local cleaning of the remaining layer processed material, so that the remaining layer processed material is prevented from sticking and the mobility is improved, and the transport is performed.
  • the permeability of the cleaning solution to the whole processed material is also improved. Therefore, clogging of the processing object in the screen part can be prevented beforehand, and the amount of cleaning liquid for replacing impurities in the original processing object can be suppressed, and the processing in the screen part can be suppressed. It is also possible to reduce the amount of leakage of an object.
  • the cleaning liquid receiving portion when the cleaning liquid receiving portion is provided with a partition plate for partitioning the inside of the cleaning liquid receiving portion into a plurality of portions in the axial direction of the screen portion of the powl, for example, supplying the undiluted solution into the bowl
  • the cleaning liquid may be supplied to all the sections of the cleaning liquid receiving section via a cleaning liquid supply path separately provided in the feed tube, or the cleaning liquid may be supplied only to some of the sections. Is also possible.
  • the cleaning liquid is jetted only to the screen portion in the range overlapping the bowl in the radial direction in the section of the cleaning liquid receiving portion to which the cleaning liquid is supplied, so that the cleaning range in the screen portion is appropriately selected. Can be done.
  • the cleaning liquid receiving portion for receiving the cleaning liquid for cleaning the remaining layer of the processed material is formed in the cleaning liquid receiving portion independently of the inside of the cleaning liquid receiving portion.
  • the cleaning liquid supplied to the residual layer cleaning liquid receiving portion is disposed along the spiral direction of the fly at a position adjacent to the surface of the fly opposite to the processing object transport surface. It passes through the connection pipes provided at predetermined intervals and jumps out of the residual layer cleaning liquid discharge hole provided in the hub of the screw conveyor.
  • the washing liquid that has flown out into the bowl does not scatter, and along the outer peripheral edge on the surface on the opposite side of the fly, a narrow cover fly that extends in the spiral direction of the fly, and an outer peripheral edge of the fly Is ejected directly toward the residual layer processing object from a narrow gap between the above.
  • the permeability of the cleaning liquid to the processed material and the mobility of the residual layer processed material can be improved.
  • a cleaning liquid supply path for supplying the cleaning liquid to the cleaning liquid receiving section is formed in the feed tube, and an opening of the cleaning liquid supply path is provided in the middle of the feed tube radially overlapping the cleaning liquid receiving section.
  • a residual layer cleaning liquid supply path for supplying the residual layer cleaning liquid to the residual layer cleaning liquid receiving section is formed in the feed tube, and in the middle of a feed tube radially overlapping the residual layer cleaning liquid receiving section.
  • a cleaning liquid receiving chamber for a residual layer for receiving a cleaning liquid for cleaning a residual layer of the processed material is provided inside the one end side of the hap, separately from the cleaning liquid receiving section.
  • the cleaning liquid supplied to the residual layer cleaning liquid receiving chamber is introduced into a plurality of residual layer cleaning liquid introduction pipes arranged on the outer periphery of the hub.
  • each residual-layer cleaning liquid introduction pipe jumps into the bowl through a plurality of residual-layer cleaning liquid discharge holes provided at predetermined intervals in the middle of each residual-layer cleaning liquid introduction pipe. .
  • the cleaning solution that has popped out here Along with the outer peripheral edge on the opposite side of the fly, a narrow gap between the cover fly in the spiral direction of the fly and the outer peripheral edge of the fly is directed toward the residual layer processing object. It is gushing directly. This makes it possible to increase the permeability of the cleaning liquid to the processed material and the mobility of the residual layer processed material, as in the above [1] and [3].
  • the cover fly is moved from the side close to the hub to the side close to the outer peripheral edge of the fly with respect to the opposite surface of the fly.
  • the cleaning liquid is ejected from the hub side in a wide range, the received cleaning liquid can be applied to the remaining layer processing material from a narrower area by attaching the supporting liquid through a support plate arranged at predetermined intervals with a gradient that gradually narrows the gap. It can be spouted directly.
  • FIG. 1 is a longitudinal sectional view showing a main part of a centrifuge according to a first embodiment of the present invention.
  • FIG. 2 is a longitudinal sectional view showing the whole of the centrifuge according to the first embodiment of the present invention.
  • FIG. 3 is a sectional view taken along line III-II of FIG.
  • FIG. 4 is a longitudinal sectional view showing a main part of a centrifuge according to a second embodiment of the present invention.
  • FIG. 5 is a longitudinal sectional view showing a main part of a centrifuge according to a third embodiment of the present invention.
  • FIG. 6 is a sectional view taken along line VI-VI of FIG.
  • FIG. 7 is a longitudinal sectional view showing a main part of a centrifuge according to a fourth embodiment of the present invention.
  • FIG. 8 is a sectional view taken along the line VI II-VIII of FIG. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIG. 1 to 3 show a first embodiment of the present invention.
  • the centrifugal separator 10 is called a screen bowl type centrifugal separator.
  • the centrifugal separator 10 includes a screw con- troller 40 in a substantially cylindrical bowl 20. Rotatably supported on the powl
  • the processing solution to be processed and the mother liquor are configured to be separately separated from the stock solution supplied into the storage solution.
  • the treated material corresponds to various crystals in the fields of the chemical industry and the food industry.
  • terephthalic acid as a raw material for pet bottles and polyester fibers
  • paraxylene as a raw material for terephthalic acid
  • CD — R terephthalic acid
  • Bisphenol which is a raw material for OM
  • glutamin soda which is a raw material for chemical seasonings
  • Various solvents correspond to the mother liquor.
  • Each seed crystal has an unpolymerized substance / a solvent constituting the slurry adhered to the crystal surface during the manufacturing process, and these adhered substances can be washed and replaced with a washing liquid (a specific other solvent or the like).
  • a washing liquid a specific other solvent or the like
  • the bow 20 and the screw conveyor 40 inside the bow 20 are rotatably supported inside the casing 11 via shafts 12a and 12b.
  • the bowl 20 and the screw conveyor 40 are rotationally driven at a slight differential speed by a differential device 14 provided continuously with the bearing 13 on one side.
  • a differential device 14 itself is publicly known, and a detailed description thereof will be omitted.
  • the interior of the casing 11 is defined so as to correspond to a discharge port 24, a screen portion 30, a dam portion 26, and the like provided in a bowl 20 described below.
  • a crystal discharge port 15 communicating with the discharge port 24 and a cleaning liquid discharge communicating with the screen section 30 are provided at a lower portion of the casing 11.
  • An opening 16 and a mother liquor outlet 11 communicating with the dam portion 26 are provided, respectively.
  • One end of the bowl 20 (the right side in Fig. 2) is the direction of crystal discharge.
  • the large-diameter parallel cylindrical section 21 and the other ends in the order from the other end of the bowl 20 (the left side in Fig. 2). It is divided into a tapered portion 22 whose inner diameter gradually decreases toward one end, and a small-diameter parallel cylindrical portion 23.
  • a crystal outlet 24 is opened, and at the distal end of the large-diameter parallel cylindrical portion 21, the liquid depth in the radial direction of the bowl 20 is regulated.
  • a dam 26 is provided which can discharge the mother liquor from which the crystals have been separated out of the bowl 20.
  • the small-diameter parallel cylindrical portion 23 has a large number of filtrate discharge holes 25 formed on the wall surface, and the inner peripheral side is covered with a cylindrical filter medium 31 in the entire circumferential direction, and the screen portion is formed. It is 30.
  • the size of the filtrate discharge hole 25 does not need to take into account the crystal particle diameter, but the filter medium 31 is made of a material having a large number of micropores or slits whose diameter is smaller than the crystal particle diameter. .
  • edge wire screen, a porous ceramic molded body, or the like may be used.
  • the inner peripheral surface of the parallel cylindrical portion 23 is shaved by the thickness of the filter medium 31.
  • the screw conveyor 40 is composed of a hub 41 serving as a rotating shaft thereof, and a fly 42 provided in a screw-shape on the outer periphery of the hub 41. It is formed so as to be conveyed to one end (right side in Fig. 2).
  • the screw conveyor 40 and the bowl 20 have different speeds between the outer peripheral edge of the fly 42 and the inner peripheral surface of the parallel tube portion 23 (the surface of the filter medium 31 of the screen portion 30). It is set so that there is a gap in the radial direction due to the structure that rotates with.
  • the hub 41 has a cleaning liquid receiving section 43 for receiving the cleaning liquid supplied therein, and the cleaning liquid in the cleaning liquid receiving section 43 is filled with the cleaning liquid in the bowl 20. And a cleaning nozzle 45 ejecting toward the cleaning section 30.
  • the cleaning liquid receiving portion 43 is a portion surrounded by a partition extending to a predetermined width in the axial direction over the entire inner circumferential surface of the hub 41.
  • a cleaning liquid discharge hole 44 is provided at predetermined intervals on a peripheral wall of the hap 41, which is a bottom side of the cleaning liquid receiving portion 43, and a cleaning communicating with the cleaning liquid discharge hole 44 is provided on an outer peripheral surface side of the hub 41.
  • Nozzles 45 are provided.
  • the cleaning nozzle 45 is arranged at a position slightly opposite to the center of the pitch of the fly 42 as shown in FIG. 1 (left side in FIG. 1) and facing the screen portion 30 in the radial direction. I have.
  • a predetermined interval is provided along the spiral direction of the fly 42 at a position adjacent to the surface 42b opposite to the processed material transfer surface 42a of the fly 42.
  • a plurality of residual layer cleaning liquid discharge holes 48 are provided.
  • the remaining-layer cleaning liquid discharge hole 48 is used to directly jet the cleaning liquid in the cleaning liquid receiving section 43 toward the remaining layer crystal on the screen section 30 separately from the cleaning nozzle 45. Things.
  • a predetermined gap is provided with respect to the surface 42b on the opposite side.
  • a narrow cover flight 50 extending in the helical direction 2 is attached.
  • the cleaning liquid that jumps out from the residual layer cleaning liquid discharge hole 48 is jetted directly to the residual layer crystal from a gap between the outer periphery of the light 42 and the cover fly 50. I have.
  • the cover flight 50 has a gradient with respect to the surface 42 b on the opposite side of the flight 42 that gradually narrows the gap from the side close to the hap 41 to the side close to the outer periphery of the fly 42. It is arranged in a state of being attached, and is attached via a support plate 51 arranged at predetermined intervals along the spiral direction of the fly 42.
  • a feed tube 60 for supplying a stock solution extending in the axial direction is inserted inside the hap 41.
  • the starting end of the feed tube 60 extends outside from the hub 41 and the bowl 20 to become a stock solution supply port 61, and the end of the feed tube 60 is arranged substantially in the center of the hub 41 and has a stock solution outlet 6.
  • the cleaning liquid supply pipe 71 for supplying the cleaning liquid to the cleaning liquid receiving section 43 is inserted into the feed tube 60.
  • the starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60. Also, in the middle of the feed tube 60 radially overlapping the cleaning liquid receiving portion 43 in the hub 41, an opening 71b of the cleaning liquid supply pipe 71 is opened substantially at right angles to the axial direction. are doing.
  • the undiluted solution is supplied into the bowl 20 via a feed tube 6, 0 using a drive source such as a pump.
  • the undiluted solution sent from the undiluted solution supply port 61 of the feed tube 60 exits from the undiluted solution outlet 62 located near the center of the hub 41 of the screw conveyer 40, and is damped in the powls 2,0. It is stuck to a predetermined depth set in 26.
  • the undiluted solution is subjected to the action of centrifugal force in the poule 20 and the crystals are settled and separated from the mother liquor.
  • the crystal that settles to the inner peripheral surface of the bowl 20 due to the action of the centrifugal force is turned into the tapered portion of the powl 20 by the fly 42 of the screw conveyor 40 rotating at a slightly different speed from the bowl 20. 22 and is drained when it moves on the outer circumferential surface of the tapered section 22 to the inner diameter side from the liquid depth set in advance in the dam section 26, and is further transferred to the screen section 30 Is done.
  • Crystals that have been drained during transportation have impurities and mother liquor themselves generated during the manufacturing process adhered to the surface, and crystals that have reached the screen section 30 have cleaning nozzles 4 located in the hub 41. Washed by the washing liquid spouted from 5,
  • the washing liquid is generally pure water, acetic acid, pure phenol, sulfuric acid, hydrochloric acid, or the like.
  • the washing liquid receiving section 4 3 in the hub 41 is provided via the washing liquid supply pipe 71 inserted separately into the feed tube 60. Supplied to The cleaning liquid received in the cleaning liquid receiving portion 43 passes through the cleaning liquid discharge hole 44 on the peripheral wall of the hub 41 and is discharged from the cleaning nozzle 45.
  • the crystal undergoes the washing and draining action in the screen section 30 and is further conveyed to the discharge port 24 side.
  • the outer periphery of the screen conveyor 40 and the screen section 3 0 A residual layer of crystals is formed in the gap between the inner peripheral surface. Apart from the cleaning by the cleaning nozzle 45, such residual layer crystals are directly and locally cleaned by a cleaning liquid sprayed from the outer periphery of the fly 42.
  • the cleaning liquid in the cleaning liquid receiving portion 43 flows along the spiral direction of the fly 42 at a position adjacent to the surface 42 b of the fly 42 opposite to the processing surface 42 a. From the plurality of remaining layer cleaning liquid discharge holes 48 arranged at predetermined intervals.
  • the cleaning liquid that has come out here does not scatter, and is scattered between the force par flute 50 attached along the outer peripheral edge of the surface 42 b on the opposite side of the fly 42 and the outer peripheral edge of the fly 42. Are ejected directly from the narrow gap toward the residual layer crystal.
  • the force par flight 50 is located close to the outer periphery of the fly 42 from the side close to the hub 41 with respect to the opposite surface 42 b of the fly 42. Attached via the support plates 51 arranged at predetermined intervals with a gradient that gradually narrows the gap toward the side, so that the cleaning liquid ejecting from the cleaning liquid discharge holes 48 for each remaining layer can be received and received over a wide area.
  • the cleaning liquid can be jetted locally and directly to the remaining layer crystals from a narrow range.
  • the cleaning liquid ejected from the outer periphery of the cleaning nozzle 45 and the fly 42 passes through the filter medium 31 after washing the crystals and remaining layer crystals, and is discharged from the filtrate discharge hole 25 to the outside of the bowl 20. Is done. Further, the crystals washed and drained in the screen section 30 are discharged to the outside of the bowl 20 from the discharge port 24 and finally collected from the crystal discharge port 15 in the casing 11. .
  • FIG. 4 shows a second embodiment of the present invention.
  • the cleaning liquid receiving portion 43 includes a partition plate 43 that divides the inside of the cleaning liquid receiving portion 43 in the axial direction of the screen portion 30 of the bowl 20 into a plurality. Is provided so that the cleaning range in the screen section 30 can be selected.
  • the same parts as those in the first embodiment are denoted by the same reference numerals, and redundant description will be omitted.
  • the cleaning liquid is supplied to one of the cleaning liquid receiving portions 43, which is partitioned by the partition plate 43a (the left portion in FIG. 4).
  • the starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60.
  • One of the inside of the washing liquid receiving portion 43 in the hub 41 is partitioned by the partition plate 43a (in FIG. 4, In the middle of the feed tube 60 radially overlapping the left side portion), an opening 71 b of the cleaning liquid supply tube 71 is opened substantially perpendicular to the axial direction.
  • the starting end of the cleaning liquid supply pipe 73 forms a cleaning liquid supply port 73 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60.
  • the cleaning liquid is supplied in the middle of the feed tube 60 radially overlapping the other part (the right part in FIG. 4) of the cleaning liquid receiving portion 43 in the hub 41, which is partitioned by the partition plate 43a.
  • the opening 73 b of the tube 73 is opened substantially at right angles to the axial direction.
  • the inside of the cleaning liquid receiving portion 43 is divided into two in the axial direction by one partition plate 43a, but it is a matter of course that the present invention is not limited to this mode.
  • two partition plates 43a are provided to divide the inside of the cleaning liquid receiving portion 43 into three in the axial direction, or two partition plates 43a are provided and the inside of the cleaning liquid receiving portion 43 It may be divided into four in the direction.
  • the cleaning liquid receiving section 4 3 is provided via the cleaning liquid supply path 71 and the cleaning liquid supply path 73 provided separately in the feed tube 60 for supplying the undiluted liquid into the powl 20.
  • the cleaning liquid may be supplied to all of the compartments, or the cleaning liquid may be supplied only to some of the compartments.
  • FIG. 5 and FIG. 6 show a third embodiment of the present invention.
  • the cleaning liquid receiving portion 43 receives the cleaning liquid for cleaning the residual layer crystals in the cleaning liquid receiving portion 43. 6 is provided separately from the inside of the cleaning liquid receiving section 43.
  • the residual layer cleaning liquid receiving portion 46 is provided with a partition extending at a predetermined width in the axial direction over the entire circumferential direction at both ends of the cylindrical member, and a connection pipe is provided at a predetermined interval on the bottom side. 47 is protruded, and the residual layer cleaning liquid receiving portion 46 is fixedly mounted in the cleaning liquid receiving portion 43 so as to be separated from the inner peripheral surface of the hub 41 by the respective connection pipes 47. .
  • each connection pipe 47 extends along the spiral direction of the fly 42 at a position adjacent to the surface 42 b of the fly 42 opposite to the processing surface 42 a.
  • the hub 41 is provided with a cleaning liquid discharge hole 48 for a residual layer on the peripheral wall of the hub 41, to which the connection pipes 47 communicate.
  • the cleaning liquid in the cleaning liquid receiving portion 46 for the residual layer which flows out from the cleaning liquid discharge hole 48 for the residual layer.
  • the cleaning liquid is jetted directly from the gap between the cover fly 50 and the outer periphery 42 to the residual crystal. It has become to be.
  • a cleaning liquid supply pipe 71 serving as a cleaning liquid supply path for supplying a cleaning liquid to the cleaning liquid receiving section 43, and a cleaning liquid is supplied to the residual layer cleaning liquid receiving section 46.
  • the cleaning liquid supply pipes 72 for the residual layer forming the supply path of the cleaning liquid for the residual layer are separately introduced.
  • the starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60.
  • an opening 71b of the cleaning liquid supply pipe 71 is opened substantially at right angles to the axial direction. I have.
  • the starting end of the residual-layer cleaning liquid supply pipe 72 forms a residual-layer cleaning liquid supply port 72 a that opens substantially perpendicularly to the axial direction on the start end side of the feed tube 60.
  • the supply pipe 72 for the cleaning liquid for the residual layer is opened in the middle of the feed tube 60 radially overlapping the cleaning liquid receiving portion 46 for the residual layer in the hub 41.
  • the outlet 72b is opened substantially perpendicular to the axial direction.
  • the cleaning liquid supplied to the residual layer cleaning liquid receiving portion 46 is applied to the surface 42b of the fly 42 opposite to the processing object transport surface 42a. At the adjacent position, through the connecting pipes 47 provided at predetermined intervals along the spiral direction of the fly 42, the residual layer cleaning liquid provided in the hub 41 of the screw compressor 40. Jump out of the discharge hole 4 8.
  • the cleaning liquid that has flown into the bowl 20 is not scattered, and is not scattered between the cover fly 50 attached along the outer peripheral edge of the surface 42 b on the opposite side of the fly 42 and the outer peripheral edge of the fly 42. From the narrow gap between them, it is possible to jet directly toward the remaining layer crystal.
  • the cleaning liquid is supplied separately to the cleaning liquid receiving section 43 and the residual layer cleaning liquid receiving section 46 in a state where they are separated from each other, the amount of the cleaning liquid ejected from the cleaning nozzle 45 and the cover Since the amount of the cleaning liquid ejected from the narrow gap between the freight 50 and the fringe 42 can be controlled separately from the outside, the replacement rate of crystal cleaning and the amount of leaks are reduced. Therefore, it is possible to easily adjust both of the optimal amounts of the cleaning liquid for achieving the above-mentioned conditions.
  • FIG. 7 and FIG. 8 show a fourth embodiment of the present invention.
  • the residual layer cleaning liquid receiving chamber 54 for receiving the cleaning liquid for cleaning the residual layer crystals is provided inside one end of the hap 41 of the screw conveyor 40. It is provided separately from the cleaning liquid receiving section 43. In the present embodiment, the remaining layer cleaning liquid receiving chamber 54 is provided at the foremost portion of the hub 41.
  • a plurality of cleaning liquid introduction pipes 53 for the remaining layer penetrate the aforementioned fly 42 and extend in the axial direction of the hub 41, and extend in the circumferential direction of the hub 41. They are mounted so as to be arranged at predetermined intervals. Said At the bottom of the residual layer cleaning liquid receiving chamber 54, a residual layer cleaning liquid communication hole 54a is drilled, and one end of each residual layer cleaning liquid introduction pipe 53 communicates with the residual layer cleaning liquid. It is connected to the remaining layer cleaning liquid receiving chamber 54 through the hole 54a.
  • the other end of the cleaning liquid introduction pipe 53 for each residual layer is closed, but in the middle of each of the cleaning liquid introduction pipes 53 for the residual layer, the surface 4 2 b on the opposite side of the fly 42 is placed.
  • a plurality of residual layer cleaning liquid discharge holes 53 a are provided at predetermined intervals along the spiral direction of the fly 42.
  • the cleaning liquid in the cleaning liquid receiving chamber 54 for the residual layer which protrudes from each of the cleaning liquid discharge holes 53 for the residual layer is supplied to the crystal of the residual layer through the gap between the force par flute 50 and the outer periphery of the fly 42. So that it can be spouted directly.
  • an opening 72b of the residual layer cleaning liquid supply pipe 72 is substantially in the axial direction. It opens at right angles.
  • the cleaning liquid supplied to the residual layer cleaning liquid receiving chamber 54 is supplied to the plurality of residual layer cleaning liquid introduction pipes 53 arranged on the outer periphery of the hub 41. Respectively.
  • the cleaning liquid introduced into each of the remaining layer cleaning liquid introduction pipes 53 is provided with a plurality of remaining layer cleaning liquid discharge holes 53 provided at predetermined intervals in the middle of each of the remaining layer cleaning liquid introduction pipes 53. Go through a and jump into bowl 20. '
  • the cleaning liquid that has flown out into the bowl 20 ⁇ does not splatter, and is not scattered between the cover fly 50 attached along the outer peripheral edge of the surface 42b opposite to the fly 42 and the outer peripheral edge of the fly 42. From the narrow gap between them, it is possible to jet directly toward the remaining layer crystal. As a result, it is possible to separately wash the processed material with the cleaning nozzle 45 and the remaining layer crystal with each of the remaining layer cleaning solution introduction pipes 53, and to change the type and amount of each cleaning solution. It can be different.
  • cleaning liquid can be directly sprayed from the outer periphery of the fry of a screen conveyor to the remaining layer processed material adhering to the outer peripheral surface of a screen part. Therefore, the mobility of this residual layer is improved, and the permeability of the entire cleaning liquid is increased.Therefore, only the residual layer treated material is locally washed to increase the liquid content of the treated product, thereby preventing the residual layer from solidifying. Becomes possible.
  • the amount of the processing object is proportional to the amount of the cleaning liquid passing through the processing object layer, and the amount is proportional to the opening of the screen part. Leakage of the processed material occurs, but by spraying the cleaning liquid directly from the outer peripheral edge of the frit onto the remaining processed material as described above, the remaining processed material is prevented from sticking to the processed material being transported. Since the permeability of the cleaning liquid is improved, the amount of the cleaning liquid for replacing impurities in the original processed material can be suppressed, and the total leak amount of the processed material in the screen area can be reduced. It becomes.

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  • Centrifugal Separators (AREA)

Abstract

A screen-bowl type centrifugal separator capable of eliminating productivity lowering caused by clogging by a material to be processed such as crystals in a screen portion as an essential portion of the separator as well as reducing the leak of the material to be processed in the screen portion. Inside a hub (41) of a screw conveyer (40), a cleaning liquid receiver (43) is provided for receiving the cleaning liquid for a cleaning nozzle (45). Inside the cleaning liquid receiver (43), there are provided a plurality of remaining layer cleaning liquid discharge holes (48). The cleaning liquid injected from each of the remaining layer cleaning liquid discharge holes (48) into the bowl (20) is directly injected toward the remaining layered material to be processed through a thin clearance between a narrow-stripe-shaped cover flight (50) extending in the helical direction along the surface (42b) opposite to the material-to-be-processed convey surface (42a) of the flight (42) and the outer periphery of the flight (42).

Description

明細 : 遠心分離機 技術分野 Description : Centrifuge technical field
本発明は、 ボウル内にスクリューコンペャを備え、 これらを相対的に 回転可能に支持してなり、 前記ボウル内に供給した原液から処理物を分 離すると共に、 該ボウルの一端側の内周面に沿って設けたスクリーン部 で、 前記処理物の洗浄および脱液を行う遠心分離機において、 前記スク リューコンペャのハブに、 その内部に供給した洗浄液を受け入れる洗浄 液受け部と、 該洗浄液受け部内の洗浄液を前記スクリーン部に向かって 噴出する洗浄ノズルとを有する遠心分離機に関する。 このような遠心分 離機は、 化学工業や食品工業の分野における各種結晶の精製に用いられ るものである。 背景技術  According to the present invention, a screw conveyer is provided in a bowl, these are rotatably supported, and the processed material is separated from a stock solution supplied into the bowl, and the inner periphery of one end side of the bowl is provided. In a centrifugal separator for washing and dewatering the processing object with a screen provided along the surface, a cleaning liquid receiving part for receiving a cleaning liquid supplied to the inside of the hub of the screw conveyer; And a washing nozzle for ejecting the washing liquid toward the screen section. Such a centrifuge is used for purifying various crystals in the fields of the chemical industry and the food industry. Background art
従来、 スク リーンボウル型の遠心分離機では、 ボウル内に結晶性の固 形物と溶媒からなる原液が供給されると、 遠心力によりボウル内で原液 が処理物である結晶と溶媒とに分けられ、 結晶はボウルの内周面に沈降 して、 ボウルと微少の回転差を与えられているスクリューコンペャによ り搬送され、 ボウルの一端側にあるテーパー部にて脱液作用を受ける。 脱液された結晶は、 一般的にその製造過程で生じた不純物や溶媒その ものを結晶表面に付着させており、 これら余分な付着物を洗浄するため に、 テーパー部に続くボウル内周側にスク リーン部を設けると共に、 当 該部位に向かって洗浄液を噴出する洗浄ノズルをスクリユーコンべャの ハブに設けて、 スクリーン部で搬送途中の結晶に洗浄液をくまなく嘖射 することで洗浄を行っていた。 例えば、 特許文献 1 (特開 2 0 0 0— 3 2 5 8 3 3号公報) 参照。 Conventionally, in a screen bowl type centrifuge, when an undiluted solution consisting of a crystalline solid and a solvent is supplied into the bowl, the undiluted solution is separated into crystals and a solvent in the bowl by centrifugal force. The crystals settle on the inner peripheral surface of the bowl, are conveyed by a screw conveyer with a slight difference in rotation from the bowl, and are subjected to a liquid removing action at a tapered portion at one end of the bowl. In general, the dehydrated crystals adhere to the crystal surface impurities and solvents generated during the manufacturing process.In order to clean these extra deposits, the crystals are placed on the inner peripheral side of the bowl following the taper. In addition to providing a screen part, a cleaning nozzle for ejecting the cleaning liquid toward the relevant part is provided on the hub of the screw conveyor, and the cleaning liquid is sprayed all over the crystal being transported by the screen part. Cleaning was done by doing. For example, see Patent Literature 1 (Japanese Patent Application Laid-Open No. 2000-3202583).
しかしながら、 前述したようなスクリーンボウル型の遠心分離機では. スク リ ユーコンべャのフライ ト外周縁とスクリーン部内周面との間に形 成される半径方向の隙間において、 結晶はコンペャでは搬送されず、 長 時間の運転によって結晶の残層は移動がなく、 フライ ト外周縁に押し付 けられることにより、 固く しまつた状態となる。  However, in the screen bowl type centrifuge described above. In the radial gap formed between the outer peripheral edge of the screw and the inner peripheral surface of the screen part, the crystals are transported by the conveyor. After a long operation, the remaining layer of the crystal does not move, and is pressed against the outer periphery of the flight, so that the crystal becomes hardened.
このように残層をなす結晶は、 洗浄液の透過性を阻害するばかりでな く、 新しい残層結晶に入れ替わるための移動性も阻害する状態となって しまうという問題がある。 かかる状態は、 一般的にスク リーンの目詰ま り と呼ばれている。 スク リーンの目詰まりを解消するためには、 原液の 供給を一時停止させ、 代わりに一定時間の間、 洗浄液を供給する必要が ある。 そのため、 原液供給の停止時間は生産に寄与できないことになり 生産性を低下させる要因となっていた。 '  Thus, there is a problem that the crystals forming the residual layer not only impair the permeability of the cleaning solution, but also impair the mobility for replacing the crystal with a new residual layer. Such a condition is generally called screen clogging. In order to eliminate the clogging of the screen, it is necessary to suspend the supply of the stock solution and to supply the cleaning solution for a certain period of time instead. For this reason, the suspension time of the supply of undiluted solution could not contribute to production, which was a factor that reduced productivity. '
さらにまた、 スクリーン部での目漏れについても、 フライ トで搬送さ れている結晶全体にくまなく洗浄液を噴出した場合には、 結晶層を通過 する液量に比例した量の結晶と、 スク リーンの目開きに比例した量の結 晶が目漏れを生じてしまう という問題があった。  Furthermore, regarding the leakage at the screen part, when the cleaning liquid is jetted all over the crystal transported by the freight, the amount of the crystal in proportion to the amount of liquid passing through the crystal layer and the screen are increased. However, there is a problem that crystals in an amount proportional to the size of the openings cause eye leakage.
本発明は、 以上のような従来技術が有する問題点に着目してなされた もので、 スク リーンボウル型の遠心分離機において、 その要部であるス クリーン部での特に結晶等の処理物による目詰まりの発生に伴う生産性 の低下を解消させるだけでなく、 スク リーン部における処理物の目漏れ 量を減少させることができる遠心分離機を提供することを目的としてい る。 ' 発明の開示 前述した目的を達成するための本発明の要旨とするところは、 次の各 項の発明に存する。 SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art. In a screen bowl type centrifugal separator, a process, particularly a crystal or the like, in a main part of a screen part is used. It is an object of the present invention to provide a centrifugal separator that can not only reduce the decrease in productivity due to the occurrence of clogging but also reduce the amount of leakage of processed material in a screen portion. '' Disclosure of the Invention The gist of the present invention to achieve the above-mentioned object lies in the following inventions.
[ 1 ] ボウル内にスクリューコンペャを備え、 これらを相対的に回転可 能に支持してなり、 前記ボウル内に供給した原液から処理物を分離する と共に、 該ボウルの一端側の内周面に沿って設けたスク リーン部で、 前 記処理物の洗浄および脱液を行う遠心分離機において、 前記スク リュー コンべャのハブに、 その内部に供給した洗浄液を受け入れる洗浄液受け 部と、 該洗浄液受け部内の洗浄液を前記スク リーン部に向かって噴出す る洗浄ノズルとを有する遠心分離機であって、  [1] A screw conveyer is provided in a bowl, and these are relatively rotatably supported to separate a processed material from a stock solution supplied into the bowl, and an inner peripheral surface on one end side of the bowl. In a centrifugal separator for washing and dewatering the above-mentioned processed material in a screen part provided along the line, a cleaning liquid receiving part for receiving the cleaning liquid supplied into the hub of the screw conveyor, A washing nozzle for jetting a washing liquid in a washing liquid receiving section toward the screen section,
前記洗浄液受け部内に、 前記スク リューコンペャのフライ トの処理物 搬送面と反対側の面に隣接する位置にて、 前記フライ トのらせん方向に 沿って所定間隔おきに並ぶ複数の残層用洗浄液排出孔を設け、  A plurality of residual layer cleaning liquids are arranged at predetermined intervals in the cleaning liquid receiver along the spiral direction of the fly at a position adjacent to a surface of the screw conveyor on the side opposite to the processed material transfer surface. Make a hole,
前記フライ トの反対側の面における外周縁に沿って、 該反対側の面に 対して所定の隙間を空けた状態でフライ トのらせん方向に延びる細幅状 の力パーフライ トを取り付け、  Along with the outer peripheral edge of the opposite surface of the flight, a narrow-width force par flight that extends in the spiral direction of the flight with a predetermined gap between the opposite surface is attached.
前記各残層用洗浄液排出孔から飛び出す前記洗浄液受け部内の洗浄液 を、 前記フライ ト外周縁と前記カバーフライ トとの間の隙間より、 前記 フライ ト外周縁.と前記スクリーン部内周面との間の隙間に生じる残層処 理物に向けて直接噴出させることを特徴とする遠心分離機。  The cleaning liquid in the cleaning liquid receiving portion that protrudes from each of the remaining layer cleaning liquid discharge holes is transferred from the gap between the outer peripheral edge of the fly and the cover flight between the outer peripheral edge of the fly and the inner peripheral surface of the screen portion. A centrifugal separator characterized by ejecting directly to the residual material that is generated in the gap between the two.
[ 2 ] 前記洗浄液受け部に、 前記ボウルのスク リーン部における軸方向 に洗浄液受け部内を複数に区画する仕切り板を設けて、 前記スク リーン 部における洗浄範囲を選択可能に構成したことを特徴とする [ 1 ] 記載 の遠心分離機。  [2] The cleaning liquid receiving portion is provided with a partition plate for partitioning the inside of the cleaning liquid receiving portion into a plurality of portions in the axial direction of the screen portion of the bowl, so that a cleaning range in the screen portion can be selected. The centrifuge according to [1].
[ 3 ] ボウル内にスクリューコンペャを備え、 これらを相対的に回転可 能に支持してなり、' 前記ボウル内に供給した原液から処理物を分離する と共に、 該ポウルの一端側の内周面に沿って設けたスク リーン部で、 前 記処理物の洗浄およぴ脱液を行う遠心分離機において、 前記スクリュー コンべャのハブに、 その内部に供給した洗浄液を受け入れる洗浄液受け 部と、 該洗浄液受け部内の洗浄液を前記スクリーン部に向かって噴出す る洗浄ノズルとを有する遠心分離機であって、 [3] A screw conveyer is provided in the bowl, and these are relatively rotatably supported to separate the processed material from the undiluted solution supplied into the bowl, and to have an inner periphery on one end side of the powl. In the screen section along the surface, In the centrifugal separator for washing and dewatering the processed material, a washing liquid receiving portion for receiving the washing liquid supplied to the hub of the screw conveyor, and a washing liquid in the washing liquid receiving portion to the screen portion. A centrifugal separator having a wash nozzle that gushes out,
前記洗浄液受け部内に、 前記スク リ ューコンペャのフライ ト外周縁と 前記スクリーン部内周面との間の隙間に生じる残層処理物を洗浄する洗 • 浄液を受け入れる残層用洗浄液受け部を、 前記洗浄液受け部内とは独立 に区画して設け、  In the cleaning liquid receiving portion, a residual layer cleaning liquid receiving portion for receiving a cleaning liquid for cleaning a residual layer processed product generated in a gap between an outer peripheral edge of the screw conveyor and the inner peripheral surface of the screen portion is provided. It is provided separately from the inside of the washing liquid receiving section,
前記フライ トの処理物搬送面と反対側の面に隣接する位置にて、 前記 フライ トのらせん方向に沿って所定間隔おき'に、 前記残層用洗浄液受け 部の底側に複数の接続管.を設けると共に、 前記スクリユーコンべャのハ ブに前記各接続管がそれぞれ連通する複数の残層用洗浄液排出孔を設け. 前記フライ トの反対側の面における外周縁に沿って、 該反対側の面に 対して所定の隙間を空けた状態でフライ トのらせん方向に延びる細幅状 のカバーフライ トを取り付け、  A plurality of connecting pipes are provided at a position adjacent to a surface of the freight opposite to the processed material conveying surface, at predetermined intervals along a spiral direction of the freight, at a bottom side of the residual layer cleaning liquid receiving portion. Is provided, and a plurality of residual layer cleaning liquid discharge holes are provided in the hub of the screw conveyor so that the connection pipes communicate with each other. Attach a narrow cover fly that extends in the helical direction of the fly with a predetermined gap left on the side surface.
前記各残層用洗浄液排出孔から飛び出す前記残層用洗浄液受け部内の 洗浄液を、 前記フライ ト外周縁と前記力パーフライ トとの間の隙間より . 前記残層処理物に向けて直接噴出させることを特徴とする遠心分離機。  The cleaning liquid in the cleaning liquid receiving portion for the residual layer, which protrudes from each of the cleaning liquid discharge holes for the residual layer, is jetted directly from the gap between the outer peripheral edge of the flight and the force par flight toward the residual layer processing object. A centrifuge characterized by the above.
[ 4 ] 前記スク リ ューコンペャのハブ内部に、 その軸方向に延びる原液 供給用のフィードチューブを挿入し、  [4] A feed tube for supplying a stock solution extending in the axial direction is inserted into the inside of the hub of the screw conveyor,
前記フィードチューブ内に、 前記洗浄液受け部に洗浄液を供給する洗 浄液供給経路を形成すると共に、 前記洗浄液受け部に対して半径方向に 重なるフィードチューブの途中に前記洗浄液供給経路の開放口を設け、 前記フィードチューブ内に、 前記残層用洗浄液受け部に洗浄液を供給 する残層用洗浄液供給経路を形成すると共に、 前記残層用洗浄液受け部 に対して半径方向に重なるフィ一ドチューブの途中に前記残層用洗浄液 供給経路の開放口を設けたことを特徴とする [ 3 ] 記載の遠心分離機。 A cleaning liquid supply path for supplying a cleaning liquid to the cleaning liquid receiving section is formed in the feed tube, and an opening for the cleaning liquid supply path is provided in the middle of the feed tube overlapping the cleaning liquid receiving section in the radial direction. In the feed tube, a residual layer cleaning liquid supply path for supplying the residual layer cleaning liquid to the residual layer cleaning liquid receiving part is formed, and in the middle of a feed tube radially overlapping the residual layer cleaning liquid receiving part. Cleaning solution for the residual layer The centrifuge according to [3], wherein an opening for the supply path is provided.
[ 5 ] ボウル内にスク リ ューコンベアを備え、 これらを相対的に回転可 能に支持してなり、 前記ボウル内に供給した原液から処理物を分離する と共に、 該ボウルの一端側の内周面に沿って設けたスク リーン部で、 前 記処理物の洗浄およぴ脱液を行う遠心分離機において、 前記スクリュー コンベアのハプに、 その内部に供給した洗浄液を受け入れる洗浄液受け 部と、 該洗浄液受け部内の洗浄液を前記スク リーン部に向かって噴出す る洗浄ノズルとを有する遠心分離機であって、  [5] A screw conveyor is provided in the bowl, and these are relatively rotatably supported. The processed material is separated from the stock solution supplied into the bowl, and the inner peripheral surface at one end of the bowl is provided. A centrifugal separator for washing and dewatering the processed material in a screen section provided along the line, wherein a cleaning liquid receiving section for receiving the cleaning liquid supplied to the inside of the haptic of the screw conveyor; A centrifugal separator having a cleaning nozzle for jetting a cleaning liquid in a receiving portion toward the screen portion,
前記スクリユーコンベアのハブの一端側内部に、 該スタリユーコンべ ャのフライ ト外周縁と前記スク リーン部内周面との間の隙間に生じる残 層処理物を洗浄する洗浄液を受け入れる残層用洗浄液受け室を、 前記洗 浄液受け部とは別に区画して設け、 .  A cleaning liquid for a residual layer which receives a cleaning liquid for cleaning a residual layer processing product generated in a gap between an outer peripheral edge of the flight of the star conveyor and an inner peripheral surface of the screen portion inside one end of a hub of the screw conveyor. A receiving chamber is provided separately from the cleaning liquid receiving section,
前記スクリューコンベアのハプの外周に、 複数の残層用洗浄液導入管 を、 それぞれ前記フライ トを貫通させてハブ軸方向に延ばした状態で、 ハブ円周方向に所定間隔おきに配列させ、 各残層用洗浄液導入管の一端 側を、 前記残層用洗浄液受け室内に連通接続し、  A plurality of cleaning liquid introduction pipes for remaining layers are arranged at predetermined intervals in the circumferential direction of the hub in a state in which a plurality of cleaning liquid introduction pipes for remaining layers penetrate through the fly and extend in the hub axis direction on the outer periphery of the hap of the screw conveyor. One end side of the layer cleaning liquid introduction pipe is connected to the remaining layer cleaning liquid receiving chamber,
前記各残層用洗浄液導入管の途中に、 前記スク リ ユーコンべャのフラ ィ トの処理物搬送面と反対側の面に隣接する位置にて、 前記フライ トの らせん方向に沿って所定間隔おきに並ぶ複数の残雇用洗浄液排出孔を設 け、  A predetermined interval along the spiral direction of the fly at a position adjacent to the surface of the float of the screw conveyor opposite to the surface on the opposite side of the processed material transfer surface, in the middle of each of the residual layer cleaning liquid introduction pipes. A number of remaining employment cleaning solution discharge holes
前記フライ トの反対側の面における外周縁に沿って、 該反対側の面に 対して所定の隙間を空けた状態でフライ トのらせん方向に延びる細幅状 の力パーフライ トを取り付け、  Along with the outer peripheral edge of the opposite surface of the flight, a narrow-width force par flight that extends in the spiral direction of the flight with a predetermined gap between the opposite surface is attached.
前記残層用洗浄液受け室から前記各残層用洗浄液導入管内に導入され. その前記各残層用洗浄液排出孔から飛び出す洗浄液を、 前記フライ ト外 周縁と前記カバーフライ トとの間の隙間より、 前記残層処理物に向けて 直接噴出させることを特徴とする遠心分離機。 The cleaning liquid that is introduced from the residual layer cleaning liquid receiving chamber into each of the residual layer cleaning liquid introduction pipes. The cleaning liquid that jumps out of each of the residual layer cleaning liquid discharge holes is passed through a gap between the outer periphery of the flight and the cover flight. Towards the residual layer processed material A centrifugal separator characterized by direct ejection.
[ 6 ] 前記カバーフライ トは、 前記フライ トにおける反対側の面に対し て、 前記ハブに近接する側からフライ ト外周縁に近接する側にかけて隙 間が次第に狭まる勾配をつけて、 所定間隔おきに並ぶ支持板を介して取 り付けたことを特徴とする [ 1 ] , [ 2 ] , [ 3 ] , [ 4 ] または [ 5 ] 記載の遠心分離機。  [6] The cover flight is provided with a gradient with respect to the surface on the opposite side of the flight from a side close to the hub to a side close to the outer peripheral edge of the fly at a predetermined interval. The centrifuge according to [1], [2], [3], [4] or [5], wherein the centrifuge is mounted via a support plate arranged in a row.
次に本発明の作用を説明する。  Next, the operation of the present invention will be described.
前記 [ 1 ] に記載-の遠心分離機によれば、 ポウル内に原液が供給され ると、 遠心力によりボウル内で原液が処理物と母液とに分けられ、 処理 物はボウルの内周面に沈降し、 かかる処理物は、 ボウルと回転差を与え られているスクリューコンペャにより搬送される。 ただし、 スクリュー コンべャのフライ ト外周縁とスクリーン部内周面との間に形成される半 径方向の隙間では、 処理物はコンペャで十分には搬送されず残層をなす t 搬送途中で脱液された処理物は、 一般にその製造過程で生じた不純物 や母液そのものを表面に付着させており、 これら余分な付着物を洗浄す るために、 ポウルの一端側の内周面に沿って設けたスクリーン部におい て、 スクリューコンべャのハプにある洗浄ノズルょり処理物に向かって 洗浄液を噴出して洗浄を行う。 ここでの洗浄液は、 例えば、 ボウル内に 原液を供給するフィードチューブ中に別途設けた洗浄液供給経路を介し て、 前記ハブ内にある洗浄液受け部に供給される。 According to the centrifuge described in the above [1], when the stock solution is supplied into the powl, the stock solution is separated into a processed product and a mother liquor in the bowl by centrifugal force, and the processed product is processed on the inner peripheral surface of the bowl. The processed material is conveyed by a screw conveyor provided with a rotation difference from the bowl. However, in the radial gap formed between the outer peripheral edge of the screw conveyor and the inner peripheral surface of the screen, the processed material is not sufficiently conveyed by the conveyer, and is removed in the middle of t conveyance, which forms the remaining layer. Generally, the liquor is attached to the surface of impurities and mother liquor itself generated during the manufacturing process, and is provided along the inner peripheral surface on one end side of the powl to wash these extraneous substances. In the screen section, cleaning is performed by spraying the cleaning liquid toward the processed product through the cleaning nozzle in the hap of the screw conveyor. The cleaning liquid here is supplied to the cleaning liquid receiving section in the hub via a cleaning liquid supply path separately provided in a feed tube for supplying the undiluted liquid into the bowl.
前記洗浄液受け部内の洗浄液は、 前記洗浄ノズルより噴出されるほか. 前記フライ トの処理物搬送面と反対側の面に隣接する位置にて、 フライ トのらせん方向に沿って所定間隔おきに並ぶ複数の残層用洗浄液排出孔 からボウル内に飛び出す。 ここで洗浄液は飛び散ることなく、 フライ ト の反対側の面における外周縁に沿って、 該反対側の面に対して所定の隙 間を空けた状態でフライ トのらせん方向に延びる細幅状のカバーフライ トと、 フライ ト外周縁との間の細い隙間より、 残層処理物に向けて直接 噴出される。 The cleaning liquid in the cleaning liquid receiving portion is jetted from the cleaning nozzle. The cleaning liquid is arranged at predetermined intervals along the spiral direction of the fly at a position adjacent to the surface of the fly opposite to the processing object transport surface. Protrude into the bowl from the multiple remaining layer cleaning solution discharge holes. Here, the cleaning liquid does not scatter, and extends along the outer peripheral edge of the opposite surface of the fly in a spiral direction of the fly with a predetermined gap from the opposite surface. Cover fly It is jetted directly from the narrow gap between the ground and the outer periphery of the flight toward the remaining layer processing material.
それにより、 洗浄ノズルによる処理物の全体的な洗浄とは別に、 特に 残層処理物に対する局所的な洗浄も併せて行うことができるので、 残層 処理物の固着がなくなり移動性も高まり、 搬送中の処理物全体に対する 洗浄液の透過性も向上する。 従って、 スク リーン部における処理物の目 詰まりを未然に防ぐことができると共に、 本来の処理物中の不純物の置 換用としての洗浄液量を抑制することが可能になり、 スクリーン部にお ける処理物の目漏れ量も減少させることが可能となる。  As a result, in addition to the overall cleaning of the processed material by the cleaning nozzle, it is also possible to perform, in particular, the local cleaning of the remaining layer processed material, so that the remaining layer processed material is prevented from sticking and the mobility is improved, and the transport is performed. The permeability of the cleaning solution to the whole processed material is also improved. Therefore, clogging of the processing object in the screen part can be prevented beforehand, and the amount of cleaning liquid for replacing impurities in the original processing object can be suppressed, and the processing in the screen part can be suppressed. It is also possible to reduce the amount of leakage of an object.
前記 [ 2 ] に記載のように、 前記洗浄液受け部に、 前記ポウルのスク リーン部における軸方向に洗浄液受け部内を複数に区画する仕切り板を 設けた場合、 例えば、 ボウル内に原液を供給するフィードチューブ中に 別途設けた洗浄液供給経路を介して、 前記洗浄液受け部の総ての区画内 に洗浄液を供給しても良く、 あるいは一部の区画内のみに限定して洗浄 液を供給することも可能である。  As described in the above [2], when the cleaning liquid receiving portion is provided with a partition plate for partitioning the inside of the cleaning liquid receiving portion into a plurality of portions in the axial direction of the screen portion of the powl, for example, supplying the undiluted solution into the bowl The cleaning liquid may be supplied to all the sections of the cleaning liquid receiving section via a cleaning liquid supply path separately provided in the feed tube, or the cleaning liquid may be supplied only to some of the sections. Is also possible.
かかる場合に、 洗浄液が供給された洗浄液受け部の区画内に、 'ボウル 半径方向に重なる範囲のスクリーン部に対してのみ洗浄液が噴出される, それにより、 スクリーン部における洗浄範囲を適宜選択することができ る。  In such a case, the cleaning liquid is jetted only to the screen portion in the range overlapping the bowl in the radial direction in the section of the cleaning liquid receiving portion to which the cleaning liquid is supplied, so that the cleaning range in the screen portion is appropriately selected. Can be done.
前記 [ 3 ] に記載の遠心分離機によれば、 前記洗浄液受け部内には、 処理物の残層を洗浄する洗浄液を受け入れる残層用洗浄液受け部が、 洗 浄液受け部内とは独立に区画して設けられており、 この残層用洗浄液受 け部に供給された洗浄液は、 前記フライ トの処理物搬送面と反対側の面 に隣接する位置にて、 フライ トのらせん方向に沿って所定間隔おきに設 けられている接続管を通り、 前記スク リ ューコンペャのハブに設けられ ている残層用洗浄液排出孔から飛び出す。 ここでボウル内に飛び出した洗浄液は飛び散ることなく、 前記フライ トの反対側の面における外周縁に沿って、 フライ トのらせん方向に延ぴ る細幅状のカバーフライ トと、 フライ ト外周縁との間の細い隙間より、 前記残層処理物に向けて直接噴出される。 それにより、 前記 [ 1 ] の場 合と同様に、 処理物に対する洗浄液の透過性およぴ残層処理物の移動性 を高めることができる。 According to the centrifuge according to the above [3], the cleaning liquid receiving portion for receiving the cleaning liquid for cleaning the remaining layer of the processed material is formed in the cleaning liquid receiving portion independently of the inside of the cleaning liquid receiving portion. The cleaning liquid supplied to the residual layer cleaning liquid receiving portion is disposed along the spiral direction of the fly at a position adjacent to the surface of the fly opposite to the processing object transport surface. It passes through the connection pipes provided at predetermined intervals and jumps out of the residual layer cleaning liquid discharge hole provided in the hub of the screw conveyor. Here, the washing liquid that has flown out into the bowl does not scatter, and along the outer peripheral edge on the surface on the opposite side of the fly, a narrow cover fly that extends in the spiral direction of the fly, and an outer peripheral edge of the fly Is ejected directly toward the residual layer processing object from a narrow gap between the above. As a result, as in the case of the above [1], the permeability of the cleaning liquid to the processed material and the mobility of the residual layer processed material can be improved.
また、 本遠心分離機において、 前記スクリューコンペャのハブ内にあ る洗浄液受け部と残層用洗浄液受け部とに洗浄液を供給するには、 前記 [ 4 ] に記載したように、 ハブ内に揷入する原液供給用のフィードチュ ーブの一部を有効に利用することができる。  Further, in the present centrifuge, in order to supply the cleaning liquid to the cleaning liquid receiving portion and the residual layer cleaning liquid receiving portion in the hub of the screw conveyer, as described in the above [4], A part of the feed tube for supplying the undiluted solution can be effectively used.
すなわち、 フィードチューブ内に、 前記洗浄液受け部に洗浄液を供給 する洗浄液供給経路を形成し、 前記洗浄液受け部に対して半径方向に重 なるフィードチューブの途中に洗浄液供給経路の開放口を設ける。  That is, a cleaning liquid supply path for supplying the cleaning liquid to the cleaning liquid receiving section is formed in the feed tube, and an opening of the cleaning liquid supply path is provided in the middle of the feed tube radially overlapping the cleaning liquid receiving section.
同様にフィードチューブ内に、 前記残層用洗浄液受け部に洗浄液を供 給する残層用洗浄液供給経路を形成し、 前記残層用洗浄液受け部に対し て半径方向に重なるフィ一ドチューブの途中に残層用洗浄液供給経路の 開放口を設ければ、 洗浄液受け部および残層用洗浄液受け部に対して、 別々に洗浄液を効率よく供給することが可能となる。  Similarly, a residual layer cleaning liquid supply path for supplying the residual layer cleaning liquid to the residual layer cleaning liquid receiving section is formed in the feed tube, and in the middle of a feed tube radially overlapping the residual layer cleaning liquid receiving section. By providing an opening for the residual layer cleaning liquid supply path, it is possible to efficiently supply the cleaning liquid separately to the cleaning liquid receiving section and the residual layer cleaning liquid receiving section.
前記 [ 5 ] に記載の遠心分離機によれば、 前記ハプの一端側内部に、 前記洗浄液受け部とは別に、 処理物の残層を洗浄する洗浄液を受け入れ る残層用洗浄液受け室が設けられており、 この残層用洗浄液受け室に供 給された洗浄液は、 ハブの外周に配列されている複数の残層用洗浄液導 入管にそれぞれ導入される。  According to the centrifuge according to the above [5], a cleaning liquid receiving chamber for a residual layer for receiving a cleaning liquid for cleaning a residual layer of the processed material is provided inside the one end side of the hap, separately from the cleaning liquid receiving section. The cleaning liquid supplied to the residual layer cleaning liquid receiving chamber is introduced into a plurality of residual layer cleaning liquid introduction pipes arranged on the outer periphery of the hub.
そして、 各残層用洗浄液導入管内に導入された洗浄液は、 各残層用洗 浄液導入管の途中に所定間隔おきに設けられている複数の残層用洗浄液 排出孔を通り ボウル内に飛び出す。 ここで飛び出した洗浄液は、 前記 フライ トの反対側の面における外周縁に沿って、 フライ トのらせん方向 に举ぴる細幅状のカバーフライ トと、 フライ ト外周縁との間の細い隙間 より、 前記残層処理物に向けて直接噴出される。 それにより、 前記 [ 1 ] , [ 3 ] の場合と同様に、 処理物に対する洗浄液の透過性およぴ残層 処理物の移動性を高めることができる。 Then, the cleaning liquid introduced into each residual-layer cleaning liquid introduction pipe jumps into the bowl through a plurality of residual-layer cleaning liquid discharge holes provided at predetermined intervals in the middle of each residual-layer cleaning liquid introduction pipe. . The cleaning solution that has popped out here Along with the outer peripheral edge on the opposite side of the fly, a narrow gap between the cover fly in the spiral direction of the fly and the outer peripheral edge of the fly is directed toward the residual layer processing object. It is gushing directly. This makes it possible to increase the permeability of the cleaning liquid to the processed material and the mobility of the residual layer processed material, as in the above [1] and [3].
さらにまた、 前記 [ 6 ] に記載のように、 前記カバーフライ トを、 前 記フライ トにおける反対側の面に対して、 '前記ハブに近接する側からフ ライ ト外周縁に近接する側にかけて隙間が次第に狭まる勾配をつけて、 所定間隔おきに並ぶ支持板を介して取り付ければ、 前記ハブ側から飛ぴ 出す洗浄液を広い範囲で受け入れつつ、 受け入れた洗浄液を狭い範囲よ り残層処理物に対して直接噴出させることができる。 図面の簡単な説明  Furthermore, as described in the above [6], the cover fly is moved from the side close to the hub to the side close to the outer peripheral edge of the fly with respect to the opposite surface of the fly. If the cleaning liquid is ejected from the hub side in a wide range, the received cleaning liquid can be applied to the remaining layer processing material from a narrower area by attaching the supporting liquid through a support plate arranged at predetermined intervals with a gradient that gradually narrows the gap. It can be spouted directly. BRIEF DESCRIPTION OF THE FIGURES
図 1は、 本発明の第 1実施の形態に係る遠心分離機の要部を示す縦断 面図である。  FIG. 1 is a longitudinal sectional view showing a main part of a centrifuge according to a first embodiment of the present invention.
図 2は、 本発明の第 1実施の形態に係る遠心分離機の全体を示す縦断 面図である。  FIG. 2 is a longitudinal sectional view showing the whole of the centrifuge according to the first embodiment of the present invention.
図 3は、 図 1の III一 I II線断面図である。  FIG. 3 is a sectional view taken along line III-II of FIG.
図 4は、 本発明の第 2実施の形態に係る遠心分離機の要部を示す縦断 面図である。  FIG. 4 is a longitudinal sectional view showing a main part of a centrifuge according to a second embodiment of the present invention.
図 5は、 本発明の第 3実施の形態に係る遠心分離機の要部を示す縦断 面図である。  FIG. 5 is a longitudinal sectional view showing a main part of a centrifuge according to a third embodiment of the present invention.
図 6は、 図 5の VI— VI線断面図である。  FIG. 6 is a sectional view taken along line VI-VI of FIG.
図 7は、 本発明の第 4実施の形態に係る遠心分離機の要部を示す縦断 面図である。  FIG. 7 is a longitudinal sectional view showing a main part of a centrifuge according to a fourth embodiment of the present invention.
図 8は、 図 7の VI II— VIII線断面図である。 発明を実施するための最良の形態 FIG. 8 is a sectional view taken along the line VI II-VIII of FIG. BEST MODE FOR CARRYING OUT THE INVENTION
以下、 図面に基づき本発明を代表する各種の実施の形態を説明する。 図 1〜図 3は本発明の第 1実施の形態を示している。  Hereinafter, various embodiments representing the present invention will be described with reference to the drawings. 1 to 3 show a first embodiment of the present invention.
本実施の形態に係る遠心分離機 1 0は、 スク リーンボウル型遠心分離 機と称されるものであり、 略円筒型のボウル 2 0内にスク リ ューコンペ ャ 4 0を備え、 これらを相対的に回転可能に支持してなり、 前記ポウル The centrifugal separator 10 according to the present embodiment is called a screen bowl type centrifugal separator. The centrifugal separator 10 includes a screw con- troller 40 in a substantially cylindrical bowl 20. Rotatably supported on the powl
2 0内に供給される原液から処理対象である処理物と母液を別々に分離 することができるように構成されている。 The processing solution to be processed and the mother liquor are configured to be separately separated from the stock solution supplied into the storage solution.
ここで処理物とは、 化学工業や食品工業の分野における各種結晶等が 該当し、 具体的には例えば、 ペッ トボトルやポリエステル繊維の原料と なるテレフダル酸、 テレフタル酸の原料となるパラキシレン、 C D— R Here, the treated material corresponds to various crystals in the fields of the chemical industry and the food industry. Specifically, for example, terephthalic acid as a raw material for pet bottles and polyester fibers, paraxylene as a raw material for terephthalic acid, CD — R
O Mの原料となるビスフエノール、 その他、 化学調味料の原料となるグ ルタ ミ ンソーダ等が該当する。 また母液には各種.の溶媒が該当する。 各 種結晶は、 その製造過程において未重合物質ゃスラリーを構成する溶媒 を結晶表面に付着しており、 これらの付着物は洗浄液 (特定の別な溶媒 等) により洗浄置換することができる。 以下、 処理物として結晶に適用 した場合を例に説明する。 Bisphenol, which is a raw material for OM, and glutamin soda, which is a raw material for chemical seasonings, are applicable. Various solvents correspond to the mother liquor. Each seed crystal has an unpolymerized substance / a solvent constituting the slurry adhered to the crystal surface during the manufacturing process, and these adhered substances can be washed and replaced with a washing liquid (a specific other solvent or the like). Hereinafter, an example in which the present invention is applied to a crystal as a processed material will be described.
図 2に示すように、 ボウノレ 2 0とその内部のスクリューコンべャ 4 0 は、 ケーシング 1 1 の内部にシャフト 1 2 a , 1 2 bを介して回転可能 に軸支されている。 ボウル 2 0およびスク リューコンペャ 4 0は、 片側 の軸受け 1 3に連設された差動装置 1 4によって微少差速で回転駆動さ れる。 かかる差動装置 1 4自体は公知であり詳細な説明は省略する。 ケーシング 1 1 の内部は、 次述するボウル 2 0に設けられている排出 口 2 4、 スク リーン部 3 0、 ダム部 2 6等にそれぞれ対応するように区 画されている。 そして、 ケーシング 1 1 の下部には、 前記排出口 2 4に 連通する結晶排出口 1 5、 前記スクリーン部 3 0に連通する洗浄液排出 口 1 6、 前記ダム部 2 6に連通する母液排出口 1 1がそれぞれ設けられ ている。 As shown in FIG. 2, the bow 20 and the screw conveyor 40 inside the bow 20 are rotatably supported inside the casing 11 via shafts 12a and 12b. The bowl 20 and the screw conveyor 40 are rotationally driven at a slight differential speed by a differential device 14 provided continuously with the bearing 13 on one side. Such a differential device 14 itself is publicly known, and a detailed description thereof will be omitted. The interior of the casing 11 is defined so as to correspond to a discharge port 24, a screen portion 30, a dam portion 26, and the like provided in a bowl 20 described below. A crystal discharge port 15 communicating with the discharge port 24 and a cleaning liquid discharge communicating with the screen section 30 are provided at a lower portion of the casing 11. An opening 16 and a mother liquor outlet 11 communicating with the dam portion 26 are provided, respectively.
ボウル 2 0の一端側 (図 2中で右側) が結晶の排出方向となっており . ボウル 2 0の他端側 (図 2中で左側) から順に、 大径の平行筒部 2 1 と. 一端側に向かって内径が漸次縮小するテーパー部 2 2と、 小径の平行筒 部 2 3とに区分けされている。 小径の平行筒部 2 3の先端側には、 結晶 の排出口 2 4が開設され、 大径の平行筒部 2 1の先端側には、 ボウル 2 0の半径方向の液深を規制すると共に、 結晶を分離した母液をボウル 2 0外へ排出可能なダム部 2 6が設けられている。  One end of the bowl 20 (the right side in Fig. 2) is the direction of crystal discharge. The large-diameter parallel cylindrical section 21 and the other ends in the order from the other end of the bowl 20 (the left side in Fig. 2). It is divided into a tapered portion 22 whose inner diameter gradually decreases toward one end, and a small-diameter parallel cylindrical portion 23. At the distal end of the small-diameter parallel cylindrical portion 23, a crystal outlet 24 is opened, and at the distal end of the large-diameter parallel cylindrical portion 21, the liquid depth in the radial direction of the bowl 20 is regulated. A dam 26 is provided which can discharge the mother liquor from which the crystals have been separated out of the bowl 20.
図 1に示すように、 小径の平行筒部 2 3は、 その壁面に多数の濾液排 出孔 2 5が形成され、 内周側が円筒状の濾材 3 1で全周方向に覆われて スクリーン部 3 0をなしている。 濾液排出孔 2 5の大きさは、 結晶の粒 子径をさほど考慮する必要はないが、 濾材 3 1は、 結晶の粒子径より小 径サイズの多数の微小孔ないしスリッ トを有する素材から成る。 具体的 には例えば、 ゥヱッジワイヤースク リーンや多孔質セラミック成形体等 を用いるとよい。 なお、 平行筒部 2 3の内周面は濾材 3 1の厚さ分だけ 表面が削られている。  As shown in FIG. 1, the small-diameter parallel cylindrical portion 23 has a large number of filtrate discharge holes 25 formed on the wall surface, and the inner peripheral side is covered with a cylindrical filter medium 31 in the entire circumferential direction, and the screen portion is formed. It is 30. The size of the filtrate discharge hole 25 does not need to take into account the crystal particle diameter, but the filter medium 31 is made of a material having a large number of micropores or slits whose diameter is smaller than the crystal particle diameter. . Specifically, for example, edge wire screen, a porous ceramic molded body, or the like may be used. The inner peripheral surface of the parallel cylindrical portion 23 is shaved by the thickness of the filter medium 31.
スクリユー コンべャ 4 0は、 その回転軸となるハブ 4 1 と、 該ハブ 4 1の外周にスクリユー状に設けられるフライ ト 4 2とからなり、 フライ ト 4 2は、 結晶をポウル 2 0の一端側 (図 2中で右側) へ搬送するよう に形成されている。 なお、 フライ ト 4 2の外周縁と平行筒部 2 3の内周 面 (スク リーン部 3 0の濾材 3 1表面) との間には、 スクリューコンペ ャ 4 0とボウル 2 0とが異なる速度で回転する構造上、 半径方向に隙間 が生じるように設定されている。  The screw conveyor 40 is composed of a hub 41 serving as a rotating shaft thereof, and a fly 42 provided in a screw-shape on the outer periphery of the hub 41. It is formed so as to be conveyed to one end (right side in Fig. 2). The screw conveyor 40 and the bowl 20 have different speeds between the outer peripheral edge of the fly 42 and the inner peripheral surface of the parallel tube portion 23 (the surface of the filter medium 31 of the screen portion 30). It is set so that there is a gap in the radial direction due to the structure that rotates with.
ハブ 4 1には、 その内部に供給された洗浄液を受け入れる洗浄液受け 部 4 3 、 該洗浄液受け部 4 3内の洗浄液を前記ボウル 2 0のスクリー ン部 3 0に向かって噴出する洗浄ノズル 4 5とが設けられている。 洗浄 液受け部 4 3は、 ハブ 4 1の内周面の全周方向に亘り軸心方向に所定幅 に延出する仕切りで囲まれた部位からなる。 The hub 41 has a cleaning liquid receiving section 43 for receiving the cleaning liquid supplied therein, and the cleaning liquid in the cleaning liquid receiving section 43 is filled with the cleaning liquid in the bowl 20. And a cleaning nozzle 45 ejecting toward the cleaning section 30. The cleaning liquid receiving portion 43 is a portion surrounded by a partition extending to a predetermined width in the axial direction over the entire inner circumferential surface of the hub 41.
洗浄液受け部 4 3の底側となるハプ 4 1の周壁には、 所定間隔おきに 洗浄液排出孔 4 4が設けられ、 ハブ 4 1の外周面側に、 前記洗浄液排出 孔 4 4に連通する洗浄ノズル 4 5が突設されている。 ここで洗浄ノズル 4 5は、 図 1に示すようにフライ ト 4 2のピッチ中央よりやや他端側 ( 図 1中で左側) で、 スク リーン部 3 0を半径方向に臨む位置に配されて いる。  A cleaning liquid discharge hole 44 is provided at predetermined intervals on a peripheral wall of the hap 41, which is a bottom side of the cleaning liquid receiving portion 43, and a cleaning communicating with the cleaning liquid discharge hole 44 is provided on an outer peripheral surface side of the hub 41. Nozzles 45 are provided. Here, the cleaning nozzle 45 is arranged at a position slightly opposite to the center of the pitch of the fly 42 as shown in FIG. 1 (left side in FIG. 1) and facing the screen portion 30 in the radial direction. I have.
さらに洗浄液受け部 4 3内には、 フライ ト 4 2の処理物搬送面 4 2 a と反対側の面 4 2 bに隣接する位置にて、 フライ ト 4 2のらせん方向に 沿って所定間隔おきに並ぶ複数の残層用洗浄液排出.孔 4 8が設けられて いる。 かかる残層用洗浄液排出孔 4 8は、 前記洗浄液受け部 4 3内の洗 浄液を、 前記洗浄ノズル 4 5とは別に、 スクリーン部 3 0上の残層結晶 に向けて直接噴出するためのものである。  Further, in the cleaning liquid receiving portion 43, a predetermined interval is provided along the spiral direction of the fly 42 at a position adjacent to the surface 42b opposite to the processed material transfer surface 42a of the fly 42. A plurality of residual layer cleaning liquid discharge holes 48 are provided. The remaining-layer cleaning liquid discharge hole 48 is used to directly jet the cleaning liquid in the cleaning liquid receiving section 43 toward the remaining layer crystal on the screen section 30 separately from the cleaning nozzle 45. Things.
フライ ト 4 2の処理物搬送面 4 2 a と反対側の面 4 2 bにおける外周 縁に沿って、 該反対側の面 4 2 bに対して所定の隙間を空けた状態でフ ライ ト 4 2のらせん方向に延びる細幅状のカバーフライ ト 5 0が取り付 けられている。 前記残層用洗浄液排出孔 4 8から飛び出す洗浄液は、 フ ライ ト 4 2外周縁とカバーフライ ト 5 0との間の隙間より、 前記残層結 晶に対して直接噴出されるようになっている。  Along the outer peripheral edge of the surface 42b opposite to the processed material transport surface 42a of the fly 42, a predetermined gap is provided with respect to the surface 42b on the opposite side. A narrow cover flight 50 extending in the helical direction 2 is attached. The cleaning liquid that jumps out from the residual layer cleaning liquid discharge hole 48 is jetted directly to the residual layer crystal from a gap between the outer periphery of the light 42 and the cover fly 50. I have.
カバーフライ ト 5 0は、 フライ ト 4 2における反対側の面 4 2 bに対 して、 前記ハプ 4 1に近接する側からフライ ト 4 2外周縁に近接する側 にかけて隙間が次第に狭まる勾配がつけられた状態に配され、 フライ ト 4 2のらせん方向に沿って所定間隔おきに並ぶ支持板 5 1を介して取り 付けられている。 ハプ 4 1の内部には、 その軸方向に延びる原液供給用のフィ一ドチュ ーブ 6 0が揷入されている。 フィードチューブ 6 0の始端は、 ハブ 4 1 やボウル 2 0より外部に延出し原液供給口 6 1 となり、 フィードチュー ブ 6 0の終端は、 ハブ 4 1内部の略中央に配されて原液出口 6 2となる, さらにフィードチューブ 6 0内には、 前記洗浄液受け部 4 3に洗浄液を 供給する洗浄液供給管 7 1が挿入されている。 The cover flight 50 has a gradient with respect to the surface 42 b on the opposite side of the flight 42 that gradually narrows the gap from the side close to the hap 41 to the side close to the outer periphery of the fly 42. It is arranged in a state of being attached, and is attached via a support plate 51 arranged at predetermined intervals along the spiral direction of the fly 42. Inside the hap 41, a feed tube 60 for supplying a stock solution extending in the axial direction is inserted. The starting end of the feed tube 60 extends outside from the hub 41 and the bowl 20 to become a stock solution supply port 61, and the end of the feed tube 60 is arranged substantially in the center of the hub 41 and has a stock solution outlet 6. The cleaning liquid supply pipe 71 for supplying the cleaning liquid to the cleaning liquid receiving section 43 is inserted into the feed tube 60.
洗浄液供給管 7 1の始端は、 フィードチューブ 6 0の始端側にて軸方 向と略直角に開口する洗浄液供給口 7 1 aをなしている。 また、 ハブ 4 1内において洗浄液受け部 4 3に対して半径方向に重なるフィードチュ ープ 6 0の途中には、 洗浄液供給管 7 1の開放口 7 1 bが軸方向と略直 角に開口している。  The starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60. Also, in the middle of the feed tube 60 radially overlapping the cleaning liquid receiving portion 43 in the hub 41, an opening 71b of the cleaning liquid supply pipe 71 is opened substantially at right angles to the axial direction. are doing.
次に、 第 1実施の形態に係る遠心分離機 1 0の作用を説明する。  Next, the operation of the centrifuge 10 according to the first embodiment will be described.
図 1 , 図 2において、 原液はフィードチューブ 6, 0を介して、 ポンプ 等の駆動源を用いてボウル 2 0内へ供給される。 フィードチューブ 6 0 の原液供給口 6 1から送られた原液は、 スクリューコンペャ 4 0のハブ 4 1内の略中央付近に位置する原液出口 6 2から出て、 ポウル 2 , 0内の ダム部 2 6で予め設定した所定の深さまで張り込まれる。 原液はポウル 2 0内で遠心力の作用を受けて、 母液から結晶が沈降分離される。  In FIGS. 1 and 2, the undiluted solution is supplied into the bowl 20 via a feed tube 6, 0 using a drive source such as a pump. The undiluted solution sent from the undiluted solution supply port 61 of the feed tube 60 exits from the undiluted solution outlet 62 located near the center of the hub 41 of the screw conveyer 40, and is damped in the powls 2,0. It is stuck to a predetermined depth set in 26. The undiluted solution is subjected to the action of centrifugal force in the poule 20 and the crystals are settled and separated from the mother liquor.
遠心力の作用によりボウル 2 0の内周面側へ沈降した結晶は、 ボウル 2 0と微少差速で回転するスクリユーコンべャ 4 0のフライ ト 4 2によ つて、 ポウル 2 0のテーパー部 2 2へ搬送され、 予めダム部 2 6で設定 されている液深よりも内径側へテーパー部 2 2の內周面上を移動する際 に脱液されて、 さらにスク リーン部 3 0へ搬送される。  The crystal that settles to the inner peripheral surface of the bowl 20 due to the action of the centrifugal force is turned into the tapered portion of the powl 20 by the fly 42 of the screw conveyor 40 rotating at a slightly different speed from the bowl 20. 22 and is drained when it moves on the outer circumferential surface of the tapered section 22 to the inner diameter side from the liquid depth set in advance in the dam section 26, and is further transferred to the screen section 30 Is done.
搬送途中で脱液された結晶は、 その製造過程で生じた不純物や母液そ のものを表面に付着させており、 スク リーン部 3 0に至った結晶は、 ハ ブ 4 1にある洗浄ノズル 4 5から噴出される洗浄液によって洗浄される, 洗浄液は、 一般に純水、 酢酸、 純フエノール、 硫酸、 塩酸等が用いられ. フィードチューブ 6 0に別途挿入してある洗浄液供給管 7 1を介して、 ハブ 4 1内にある洗浄液受け部 4 3に供給される。 洗浄液受け部 4 3に 受け入れられた洗浄液は、 ハブ 4 1周壁の洗浄液排出孔 4 4を通り洗浄 ノズル 4 5力ゝら嘖出される。 Crystals that have been drained during transportation have impurities and mother liquor themselves generated during the manufacturing process adhered to the surface, and crystals that have reached the screen section 30 have cleaning nozzles 4 located in the hub 41. Washed by the washing liquid spouted from 5, The washing liquid is generally pure water, acetic acid, pure phenol, sulfuric acid, hydrochloric acid, or the like. The washing liquid receiving section 4 3 in the hub 41 is provided via the washing liquid supply pipe 71 inserted separately into the feed tube 60. Supplied to The cleaning liquid received in the cleaning liquid receiving portion 43 passes through the cleaning liquid discharge hole 44 on the peripheral wall of the hub 41 and is discharged from the cleaning nozzle 45.
このようにスク リーン部 3 0で結晶は洗浄および脱液作用を受け、 さ らに排出口 2 4側へ搬送されるが、 スクリユーコンべャ 4 0のフライ ト 4 2外周縁とスクリーン部 3 0内周面との間の隙間には結晶の残層が形 成される。 かかる残層結晶は、 前記洗浄ノズル 4 5による洗浄とは別に. フライ ト 4 2外周縁から噴射される洗浄液により直接的かつ局所的に洗 浄される。  As described above, the crystal undergoes the washing and draining action in the screen section 30 and is further conveyed to the discharge port 24 side. However, the outer periphery of the screen conveyor 40 and the screen section 3 0 A residual layer of crystals is formed in the gap between the inner peripheral surface. Apart from the cleaning by the cleaning nozzle 45, such residual layer crystals are directly and locally cleaned by a cleaning liquid sprayed from the outer periphery of the fly 42.
すなわち、 洗浄液受け部 4 3内の洗浄液は、 フライ ト 4 2の処理物搬 送面 4 2 a と反対側の面 4 2 bに隣接する位置にて、 フライ ト 4 2のら せん方向に沿って所定間隔おきに並ぶ複数の残層用洗浄液排出孔 4 8か らもポウル 2 0内に飛び出す。 ここで飛び出した洗浄液は飛び散ること なく、 前記フライ ト 4 2の反対側の面 4 2 bにおける外周縁に沿って取 り付けられた力パーフライ ト 5 0と、 フライ ト 4 2外周縁との間の細い 隙間より、 前記残層結晶に向けて直接噴出される。  In other words, the cleaning liquid in the cleaning liquid receiving portion 43 flows along the spiral direction of the fly 42 at a position adjacent to the surface 42 b of the fly 42 opposite to the processing surface 42 a. From the plurality of remaining layer cleaning liquid discharge holes 48 arranged at predetermined intervals. The cleaning liquid that has come out here does not scatter, and is scattered between the force par flute 50 attached along the outer peripheral edge of the surface 42 b on the opposite side of the fly 42 and the outer peripheral edge of the fly 42. Are ejected directly from the narrow gap toward the residual layer crystal.
特に力パーフライ ト 5 0は、 図 1に示すように、 前記フライ ト 4 2に おける反対側の面 4 2 bに対して、 ハブ 4 1に近接する側からフライ ト 4 2外周縁に近接する側にかけて隙間が次第に狭まる勾配をつけて、 所 定間隔おきに並ぶ支持板 5 1を介して取り付けたことにより、 各残層用 洗浄液排出孔 4 8から飛び出す洗浄液を広い範囲で受け入れつつ、 受け 入れた洗浄液を狭い範囲より残層結晶に対して局所的に直接噴出させる ことができる。  In particular, as shown in FIG. 1, the force par flight 50 is located close to the outer periphery of the fly 42 from the side close to the hub 41 with respect to the opposite surface 42 b of the fly 42. Attached via the support plates 51 arranged at predetermined intervals with a gradient that gradually narrows the gap toward the side, so that the cleaning liquid ejecting from the cleaning liquid discharge holes 48 for each remaining layer can be received and received over a wide area. The cleaning liquid can be jetted locally and directly to the remaining layer crystals from a narrow range.
以上のように、 洗浄ノズル 4 5による結晶全体の洗浄とは別に、 特に 残層処理物に対する局所的な洗浄も併せて行うことができるので、 残層 結晶の固着がなくなり移動性も高まり、 搬送中の結晶全体に対する洗浄 液の透過性も向上する。 そのため、 スクリーン部 3 0における結晶の目 詰まりを未然に防ぐことができると共に、 本来の結晶中の不純物の置換 用としての洗浄液量を抑制することが可能になり、 スク リーン部 3 0に おける結晶の目漏れ量を減少させることが可能となる。 As described above, apart from cleaning the entire crystal by the cleaning nozzle 45, Since local cleaning of the residual layer processing material can be performed at the same time, the residual layer crystals are not fixed and the mobility is improved, and the permeability of the cleaning liquid to the entire crystal being transported is improved. As a result, clogging of the crystal in the screen portion 30 can be prevented beforehand, and the amount of the cleaning liquid for replacing impurities in the original crystal can be suppressed, and the crystal in the screen portion 30 can be prevented. Can be reduced.
スクリーン部 3 0において、 洗浄ノズル 4 5およびフライ ト 4 2外周 縁より噴出された洗浄液は、 結晶や残層結晶の洗浄後に濾材 3 1を通り 濾液排出孔 2 5からボウル 2 0の外部へ排出される。 また、 スク リーン 部 3 0で洗浄され脱液された結晶は、 排出口 2 4からボウル 2 0の外部 に排出され、 最後はケーシング 1 1にある結晶排出口 1 5から回収され ることになる。  In the screen section 30, the cleaning liquid ejected from the outer periphery of the cleaning nozzle 45 and the fly 42 passes through the filter medium 31 after washing the crystals and remaining layer crystals, and is discharged from the filtrate discharge hole 25 to the outside of the bowl 20. Is done. Further, the crystals washed and drained in the screen section 30 are discharged to the outside of the bowl 20 from the discharge port 24 and finally collected from the crystal discharge port 15 in the casing 11. .
図 4は本発明の第 2実施の形態を示している。  FIG. 4 shows a second embodiment of the present invention.
本実施の形態に係る遠心分離機 1 O Aでは、 前記洗浄液受け部 4 3に 前記ボウル 2 0のスク リーン部 3 0における軸方向に洗浄液受け部 4 3 内を複数に区画する仕切り板 4 3 aを設けて、 前記スク リーン部 3 0に おける洗浄範囲を選択可能に構成している。 なお、 第 1実施の形態と同 種の部位には同一符号を付して重複した説明を省略する。  In the centrifugal separator 1 OA according to the present embodiment, the cleaning liquid receiving portion 43 includes a partition plate 43 that divides the inside of the cleaning liquid receiving portion 43 in the axial direction of the screen portion 30 of the bowl 20 into a plurality. Is provided so that the cleaning range in the screen section 30 can be selected. The same parts as those in the first embodiment are denoted by the same reference numerals, and redundant description will be omitted.
ハブ 4 1の内部に揷入されているフィードチューブ 6 0内には、 前記 洗浄液受け部 4 3内のうち仕切り板 4 3 aで区画された一方 (図 4中で 左側部分) に洗浄液を供給する洗浄液供給管 7 1 と、 仕切り板 4 3 aで 区画された他方 (図 4中で右側部分) に洗浄液を供給する洗浄液供給管 In the feed tube 60 inserted into the hub 41, the cleaning liquid is supplied to one of the cleaning liquid receiving portions 43, which is partitioned by the partition plate 43a (the left portion in FIG. 4). Cleaning liquid supply pipe 7 1 and cleaning liquid supply pipe that supplies cleaning liquid to the other (the right side in Fig. 4) partitioned by the partition plate 43a.
7 3 とが、 それぞれ別々に揷入されている。 7 and 3 are separately introduced.
洗浄液供給管 7 1の始端は、 フィードチューブ 6 0の始端側にて軸方 向と略直角に開口する洗浄液供給口 7 1 aをなしている。 ハブ 4 1内の 洗浄液受け部 4 3内のうち仕切り板 4 3 aで区画された一方 (図 4中で 左側部分) に対して半径方向に重なるフィードチューブ 6 0の途中には. 洗浄液供給管 7 1の開放口 7 1 bが軸方向と略直角に開口している。 The starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60. One of the inside of the washing liquid receiving portion 43 in the hub 41 is partitioned by the partition plate 43a (in FIG. 4, In the middle of the feed tube 60 radially overlapping the left side portion), an opening 71 b of the cleaning liquid supply tube 71 is opened substantially perpendicular to the axial direction.
また、 洗浄液供給管 7 3の始端は、 フィードチューブ 6 0の始端側に て軸方向と略直角に開口する洗浄液供給口 7 3 aをなしている。 ハブ 4 1内の洗浄液受け部 4 3内のうち仕切り板 4 3 aで区画された他方 (図 4中で右側部分) に対して半径方向に重なるフィードチューブ 6 0の途 中には、 洗浄液供給管 7 3の開放口 7 3 bが軸方向と略直角に開口して いる。  Further, the starting end of the cleaning liquid supply pipe 73 forms a cleaning liquid supply port 73 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60. In the middle of the feed tube 60 radially overlapping the other part (the right part in FIG. 4) of the cleaning liquid receiving portion 43 in the hub 41, which is partitioned by the partition plate 43a, the cleaning liquid is supplied. The opening 73 b of the tube 73 is opened substantially at right angles to the axial direction.
本実施の形態では、 1つの仕切り板 4 3 aにより、 洗浄液受け部 4 3 内を軸方向に 2分割するように構成されているが、 もちろん、 この態様 に限定されるものではなく、 '他に例えば、 2つの仕切り板 4 3 aを設け て洗浄液受け部 4 3内を軸方向に 3つに区画したり、 あるいは、 2つの 仕切り板 4 3 aを設けて洗浄液受け部 4 3内を軸方向に 4つに区面して もよい。  In the present embodiment, the inside of the cleaning liquid receiving portion 43 is divided into two in the axial direction by one partition plate 43a, but it is a matter of course that the present invention is not limited to this mode. For example, two partition plates 43a are provided to divide the inside of the cleaning liquid receiving portion 43 into three in the axial direction, or two partition plates 43a are provided and the inside of the cleaning liquid receiving portion 43 It may be divided into four in the direction.
このような第 2実施の形態によれば、 ポウル 2 0内に原液を供給する フィードチューブ 6 0中に別途設けた洗浄液供給経路 7 1や洗浄液供給 経路 7 3を介して、 洗浄液受け部 4 3の総ての区画内に洗浄液を供給し ても良く、 あるいは一部の区画内のみに限定して洗浄液を供給すること も可能である。  According to such a second embodiment, the cleaning liquid receiving section 4 3 is provided via the cleaning liquid supply path 71 and the cleaning liquid supply path 73 provided separately in the feed tube 60 for supplying the undiluted liquid into the powl 20. The cleaning liquid may be supplied to all of the compartments, or the cleaning liquid may be supplied only to some of the compartments.
かかる場合に、 洗浄液が供給された洗浄液受け部 4 3の区画内に、 ボ ウル 2 0半径方向に重なる範囲のスクリーン部 3 0に対してのみ洗浄液 が噴出される。 それにより、 処理物である結晶や洗浄液の種類等に応じ て、 スク リーン部 3 0における洗浄範囲を適宜選択することができる。 図 5および図 6は本発明の第 3実施の形態を示している。  In such a case, the cleaning liquid is jetted only to the screen part 30 in a range overlapping in the radial direction of the bowl 20 into the section of the cleaning liquid receiving part 43 to which the cleaning liquid is supplied. Thus, the cleaning range in the screen section 30 can be appropriately selected according to the type of the processing object, such as the crystal and the cleaning liquid. FIG. 5 and FIG. 6 show a third embodiment of the present invention.
本実施の形態に係る遠心分離機 1 O Bでは、 前記洗浄液受け部 4 3内 に、 前記残層結晶を洗浄する洗浄液を受け入れる残層用洗浄液受け部 4 6が、 洗浄液受け部 4 3内とは独立に区画して設けられている。 In the centrifuge 1 OB according to the present embodiment, the cleaning liquid receiving portion 43 receives the cleaning liquid for cleaning the residual layer crystals in the cleaning liquid receiving portion 43. 6 is provided separately from the inside of the cleaning liquid receiving section 43.
残層用洗浄液受け部 4 6は、 円筒部材の両端に全周方向に亘り軸心方 向に所定幅に延出する仕切りを設けてなり、 その底側には、 所定間隔お きに接続管 4 7が突設され、 各接続管 4 7によって残層用洗浄液受け部 4 6は、 前記洗浄液受け部 4 3内にてハブ 4 1の内周面より離隔した状 態に固設されている。  The residual layer cleaning liquid receiving portion 46 is provided with a partition extending at a predetermined width in the axial direction over the entire circumferential direction at both ends of the cylindrical member, and a connection pipe is provided at a predetermined interval on the bottom side. 47 is protruded, and the residual layer cleaning liquid receiving portion 46 is fixedly mounted in the cleaning liquid receiving portion 43 so as to be separated from the inner peripheral surface of the hub 41 by the respective connection pipes 47. .
図 5に示すように各接続管 4 7は、 前記フライ ト 4 2の処理物搬送面 4 2 a と反対側の面 4 2 bに隣接する位置にて、 フライ ト 4 2のらせん 方向に沿って所定間隔おきに配されており、 前記ハブ 4 1の周壁には、 各接続管 4 7が連通する残層用洗浄液排出孔 4 8が設けられている。 残 層用洗浄液排出孔 4 8から飛び出す残層用洗浄液受け部 4 6の洗浄液は. カバーフライ ト 5 0とフライ ト 4 2外周縁との間の隙間より、 前記残層 結晶に対して直接噴出されるようになつている。  As shown in FIG. 5, each connection pipe 47 extends along the spiral direction of the fly 42 at a position adjacent to the surface 42 b of the fly 42 opposite to the processing surface 42 a. The hub 41 is provided with a cleaning liquid discharge hole 48 for a residual layer on the peripheral wall of the hub 41, to which the connection pipes 47 communicate. The cleaning liquid in the cleaning liquid receiving portion 46 for the residual layer which flows out from the cleaning liquid discharge hole 48 for the residual layer. The cleaning liquid is jetted directly from the gap between the cover fly 50 and the outer periphery 42 to the residual crystal. It has become to be.
また、 前記フィードチューブ 6 0内には、 前記洗浄液受け部 4 3に洗 浄液を供給する洗浄液供給経路をなす洗浄液供給管 7 1 と、 前記残層用 洗浄液受け部 4 6に洗浄液を供給する残層用洗挣液供給経路をなす残層 用洗浄液供給管 7 2とが、 それぞれ別々に揷入されている。  In the feed tube 60, a cleaning liquid supply pipe 71 serving as a cleaning liquid supply path for supplying a cleaning liquid to the cleaning liquid receiving section 43, and a cleaning liquid is supplied to the residual layer cleaning liquid receiving section 46. The cleaning liquid supply pipes 72 for the residual layer forming the supply path of the cleaning liquid for the residual layer are separately introduced.
洗浄液供給管 7 1の始端は、 フィードチューブ 6 0の始端側にて軸方 向と略直角に開口する洗浄液供給口 7 1 aをなしている。 ハブ 4 1内に おいて洗浄液受け部 4 3に対して半径方向に重なるフィードチューブ 6 0の途中には、 洗浄液供給管 7 1の開放口 7 1 bが軸方向と略直角に開 口している。  The starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60. In the middle of the feed tube 60 radially overlapping the cleaning liquid receiving portion 43 in the hub 41, an opening 71b of the cleaning liquid supply pipe 71 is opened substantially at right angles to the axial direction. I have.
一方、 残層用洗浄液供給管 7 2の始端は、 フィードチューブ 6 0の始 端側にて軸方向と略直角に開口する残層用洗浄液供給口 7 2 aをなして いる。 ハブ 4 1内において残層用洗浄液受け部 4 6に対して半径方向に 重なるフィードチューブ 6 0の途中には、 残層用洗浄液供給管 7 2の開 放口 7 2 bが軸方向と略直角に開口している。 On the other hand, the starting end of the residual-layer cleaning liquid supply pipe 72 forms a residual-layer cleaning liquid supply port 72 a that opens substantially perpendicularly to the axial direction on the start end side of the feed tube 60. In the middle of the feed tube 60 radially overlapping the cleaning liquid receiving portion 46 for the residual layer in the hub 41, the supply pipe 72 for the cleaning liquid for the residual layer is opened. The outlet 72b is opened substantially perpendicular to the axial direction.
以上のような第 3実施の形態によれば、 残層用洗浄液受け部 4 6に供 給された洗浄液は、 フライ ト 4 2の処理物搬送面 4 2 a と反対側の面 4 2 bに隣接する位置にて、 フライ ト 4 2のらせん方向に沿って所定間隔 おきに設けられている接続管 4 7を通り、 スク リ ューコンペャ 4 0のハ ブ 4 1に設けられている残層用洗浄液排出孔 4 8から飛び出す。  According to the third embodiment as described above, the cleaning liquid supplied to the residual layer cleaning liquid receiving portion 46 is applied to the surface 42b of the fly 42 opposite to the processing object transport surface 42a. At the adjacent position, through the connecting pipes 47 provided at predetermined intervals along the spiral direction of the fly 42, the residual layer cleaning liquid provided in the hub 41 of the screw compressor 40. Jump out of the discharge hole 4 8.
ボウル 2 0内に飛び出した洗浄液は飛び散ることなく、 前記フライ ト 4 2の反対側の面 4 2 bにおける外周縁に沿って取り付けられたカバー フライ ト 5 0 と、 フライ ト 4 2外周縁との間の細い隙間より、 前記残層 結晶に向けて直接噴出させることができる。  The cleaning liquid that has flown into the bowl 20 is not scattered, and is not scattered between the cover fly 50 attached along the outer peripheral edge of the surface 42 b on the opposite side of the fly 42 and the outer peripheral edge of the fly 42. From the narrow gap between them, it is possible to jet directly toward the remaining layer crystal.
ここで、 洗浄液受け部 4 3と残層用洗浄液受け部 4 6 とには、 互いに 仕切られた状態で別々に洗浄液が供給されるので、 洗浄ノズル 4 5から 噴出させる洗浄液の液量と、 カバーフライ ト 5 0とフライ ト 4 2外周縁 との間の細い隙間から噴出させる洗浄液の液量とを、 外部より別々にコ ントロールすることができるため、 結晶洗浄の置換率および目漏れ量の 低減を図るための両方の最適な洗浄液液量の調整を容易に行うことがで きる。  Here, since the cleaning liquid is supplied separately to the cleaning liquid receiving section 43 and the residual layer cleaning liquid receiving section 46 in a state where they are separated from each other, the amount of the cleaning liquid ejected from the cleaning nozzle 45 and the cover Since the amount of the cleaning liquid ejected from the narrow gap between the freight 50 and the fringe 42 can be controlled separately from the outside, the replacement rate of crystal cleaning and the amount of leaks are reduced. Therefore, it is possible to easily adjust both of the optimal amounts of the cleaning liquid for achieving the above-mentioned conditions.
図 7および図 8は本発明の第 4実施の形態を示している。  FIG. 7 and FIG. 8 show a fourth embodiment of the present invention.
本実施の形態に係る遠心分離機 1 0 Cでは、 前記スク リ ューコンペャ 4 0のハプ 4 1 の一端側内部に、 前記残層結晶を洗浄する洗浄液を受け 入れる残層用洗浄液受け室 5 4が、 前記洗浄液受け部 4 3とは別に区画 して設けられている。 本実施の形態では、 残層用洗浄液受け室 5 4はハ ブ 4 1の最先端部分に設けられている。  In the centrifugal separator 10C according to the present embodiment, the residual layer cleaning liquid receiving chamber 54 for receiving the cleaning liquid for cleaning the residual layer crystals is provided inside one end of the hap 41 of the screw conveyor 40. It is provided separately from the cleaning liquid receiving section 43. In the present embodiment, the remaining layer cleaning liquid receiving chamber 54 is provided at the foremost portion of the hub 41.
ハブ 4 1の外周には、 複数の残層用洗浄液導入管 5 3が、 それぞれ前 記フライ ト 4 2を貫通してハブ 4 1の軸方向に延びる状態で、 ハブ 4 1 の円周方向に所定間隔おきに配列するように取り付けられている。 前記 残層用洗浄液受け室 5 4の底部には残層用洗浄液連通孔 5 4 aが穿設さ れており、 各残層用洗浄液導入管 5 3の一端側は、 それぞれ残層用洗浄 液連通孔 5 4 a ,を介して残層用洗浄液受け室 5 4内に連通接続されてい る。 On the outer periphery of the hub 41, a plurality of cleaning liquid introduction pipes 53 for the remaining layer penetrate the aforementioned fly 42 and extend in the axial direction of the hub 41, and extend in the circumferential direction of the hub 41. They are mounted so as to be arranged at predetermined intervals. Said At the bottom of the residual layer cleaning liquid receiving chamber 54, a residual layer cleaning liquid communication hole 54a is drilled, and one end of each residual layer cleaning liquid introduction pipe 53 communicates with the residual layer cleaning liquid. It is connected to the remaining layer cleaning liquid receiving chamber 54 through the hole 54a.
各残層用洗浄液導入管 5 3の他端側は閉じられているが、 各残層用洗 浄液導入管 5 3の途中には、 前記フライ ト 4 2の反対側の面 4 2 bに隣 接する位置にて、 フライ ト 4 2のらせん方向に沿って所定間隔おきに並 ぶ複数の残層用洗浄液排出孔 5 3 aが設けられている。  The other end of the cleaning liquid introduction pipe 53 for each residual layer is closed, but in the middle of each of the cleaning liquid introduction pipes 53 for the residual layer, the surface 4 2 b on the opposite side of the fly 42 is placed. At adjacent positions, a plurality of residual layer cleaning liquid discharge holes 53 a are provided at predetermined intervals along the spiral direction of the fly 42.
各残層用洗浄液排出孔 5 3 aから飛び出す残層用洗浄液受け室 5 4の 洗浄液は、 前記力パーフライ ト 5 0とフライ ト 4 2外周縁との間の隙間 より、 前記残層結晶に対して直接噴出されるようになっている。 なお、 ハプ 4 1内において残層用洗浄液受け室 5 4に対して半径方向に重なる フィードチューブ 6 0の途中には、 残層用洗浄液供給管 7 2の開放口 7 2 bが軸方向と略直角に開口している。  The cleaning liquid in the cleaning liquid receiving chamber 54 for the residual layer which protrudes from each of the cleaning liquid discharge holes 53 for the residual layer, is supplied to the crystal of the residual layer through the gap between the force par flute 50 and the outer periphery of the fly 42. So that it can be spouted directly. In the feed tube 60 radially overlapping the residual layer cleaning liquid receiving chamber 54 in the hap 41, an opening 72b of the residual layer cleaning liquid supply pipe 72 is substantially in the axial direction. It opens at right angles.
以上のような第 4実施の形態によれば、 残層用洗浄液受け室 5 4に供 給された洗浄液は、 ハブ 4 1の外周に配列されている複数の残層用洗浄 液導入管 5 3にそれぞれ導入される。 そして、 各残層用洗浄液導入管 5 3内に導入された洗浄液は、 各残層用洗浄液導入管 5 3の途中に所定間 隔おきに設けられている複数の残層用洗浄液排出孔 5 3 aを通り、 ボウ ル 2 0内に飛び出す。 '  According to the fourth embodiment as described above, the cleaning liquid supplied to the residual layer cleaning liquid receiving chamber 54 is supplied to the plurality of residual layer cleaning liquid introduction pipes 53 arranged on the outer periphery of the hub 41. Respectively. The cleaning liquid introduced into each of the remaining layer cleaning liquid introduction pipes 53 is provided with a plurality of remaining layer cleaning liquid discharge holes 53 provided at predetermined intervals in the middle of each of the remaining layer cleaning liquid introduction pipes 53. Go through a and jump into bowl 20. '
ボウル 2 0內に飛び出した洗浄液は飛び散ることなく、 前記フライ ト 4 2の反対側の面 4 2 bにおける外周縁に沿って取り付けられたカバー フライ ト 5 0と、 フライ ト 4 2外周縁との間の細い隙間より、 前記残層 結晶に向けて直接噴出させることができる。 それにより、 前記洗浄ノズ ル 4 5による処理物の洗浄と、 各残層用洗浄液導入管 5 3による残層結 晶の洗浄を別々に行うことができ、 それぞれの洗浄液の種類や液量を互 いに異ならせることもできる。 The cleaning liquid that has flown out into the bowl 20 內 does not splatter, and is not scattered between the cover fly 50 attached along the outer peripheral edge of the surface 42b opposite to the fly 42 and the outer peripheral edge of the fly 42. From the narrow gap between them, it is possible to jet directly toward the remaining layer crystal. As a result, it is possible to separately wash the processed material with the cleaning nozzle 45 and the remaining layer crystal with each of the remaining layer cleaning solution introduction pipes 53, and to change the type and amount of each cleaning solution. It can be different.
以上、 本発明の実施の形態を図面によって説明してきたが、 これらの 具体的な構成によれば、 結晶に対する洗浄液の透過性および残層結晶の 移動性を高めることが可能となる。 ただし、 本発明はこれらの実施の形 態に限定されるものではなく、 本発明の要旨を,逸脱しない範囲における 変更や追加があっても本発明に含まれることは言うまでもない。 産業上の利用可能性  As described above, the embodiments of the present invention have been described with reference to the drawings. According to these specific configurations, it is possible to enhance the permeability of the cleaning liquid to the crystals and the mobility of the remaining layer crystals. However, the present invention is not limited to these embodiments, and it goes without saying that changes and additions within the spirit and scope of the present invention are included in the present invention. Industrial applicability
本発明に係る遠心分離機によれば、 スク リ ユー コンべャのフライ ト外 周縁より、 スク リーン部の內周面に付着している残層処理物に直接洗浄 液を噴射させることができるため、 この残層の移動性を改善し、 洗浄液 全体の透過性が増すため、 局所的に残層処理物のみを洗浄し、 処理物の 含液率を高くすることにより、 残層の固化防止が可能となる。  ADVANTAGE OF THE INVENTION According to the centrifugal separator which concerns on this invention, a washing | cleaning liquid can be directly sprayed from the outer periphery of the fry of a screen conveyor to the remaining layer processed material adhering to the outer peripheral surface of a screen part. Therefore, the mobility of this residual layer is improved, and the permeability of the entire cleaning liquid is increased.Therefore, only the residual layer treated material is locally washed to increase the liquid content of the treated product, thereby preventing the residual layer from solidifying. Becomes possible.
また、 スク リーン部の目漏れについても処理物全体に洗浄液をかけた 場合、 処理物層を通過する洗浄液の液量に比例した量の処理物と、 スク リーン部の目開きに比例した量の処理物の目漏れを生じるが、 前述の如 く洗浄液をフライ ト外周縁より直接的に残層処理物に噴射することによ り、 残層処理物の固着がなくなり、 搬送中の処理物に対する洗浄液の透 過率が向上するため、 本来の処理物中の不純物の置換用としての洗浄液 量を抑制することが可能になり、 スク リーン部における処理物の総合目 漏れ量を減少させることが可能となる。  Also, regarding the leakage of the screen part, when the cleaning liquid is applied to the entire processing object, when the cleaning liquid is applied to the entire processing object layer, the amount of the processing object is proportional to the amount of the cleaning liquid passing through the processing object layer, and the amount is proportional to the opening of the screen part. Leakage of the processed material occurs, but by spraying the cleaning liquid directly from the outer peripheral edge of the frit onto the remaining processed material as described above, the remaining processed material is prevented from sticking to the processed material being transported. Since the permeability of the cleaning liquid is improved, the amount of the cleaning liquid for replacing impurities in the original processed material can be suppressed, and the total leak amount of the processed material in the screen area can be reduced. It becomes.

Claims

請求の範囲 The scope of the claims
1. ボウル ( 2 0 ) 内にスクリューコンペャ (4 0 ) を備え、 これらを 相対的に回転可能に支持してなり、 前記ボウル ( 2 0 ) 内に供給した原 液から処理物を分離すると共に、 該ポウル (2 0 ) の一端側の内周面に 沿って設けたスク リーン部 ( 3 0 ) で、 前記処理物の洗浄および脱液を 行う遠心分離機 ( 1 0 , 1 0 A) において、 前記スク リユーコンべャ (4 0) のハプ (4 1 ) に、 その内部に供給した洗浄液を受け入れる洗 浄液受け部 (4 3 ) と、 該洗浄液受け部 (4 3 ) 内の洗浄液を前記スク リーン部 (3 0 ) に向かって噴出する洗浄ノズル ( 4 5 ) とを有する遠 心分離機 ( 1 0 , 1 0 A) であって、 1. A screw conveyor (40) is provided in a bowl (20), and these are relatively rotatably supported to separate a processed material from a stock solution supplied into the bowl (20). At the same time, a centrifuge (10, 10A) for washing and dewatering the processed material at a screen part (30) provided along the inner peripheral surface on one end side of the powl (20). In the above, a cleaning liquid receiving section (43) for receiving the cleaning liquid supplied to the haptic (41) of the screw conveyor (40) and a cleaning liquid in the cleaning liquid receiving section (43). A centrifugal separator (10, 10A) having a washing nozzle (45) ejecting toward the screen part (30),
前記洗浄液受け部 (4 3 ) 内に、 前記スク リ ューコンペャ (4 0 ) の フライ ト (4 2 ) の処理物搬送面 (4 2 a ) と反対側の面 (4 2 b ) に 隣接する位置にて、 前記フライ ト (4 2) のらせん方向に沿って所定間 隔おきに並ぶ複数の残層用洗浄液排出孔 (4 8 ) を設け、  A position adjacent to the surface (42b) of the screw conveyor (40) opposite to the surface (42a) for transporting the processed material in the fly (42) in the cleaning liquid receiver (43). A plurality of residual layer cleaning liquid discharge holes (48) are provided at predetermined intervals along the spiral direction of the fly (42).
前記フライ ト (4 2) の反対側の面 (4 2 b ) における外周縁に沿つ て、 該反対側の面 (4 2 b ) に対して所定の隙間を空けた状態でフライ ト (4 2) のらせん方向に延びる細幅状のカバーフライ ト ( 5 0 ) を取 り付け、  Along the outer peripheral edge of the opposite side (42b) of the above-mentioned fly (42), a predetermined clearance is provided to the opposite side (42b) of the fly (42). 2) Attach a narrow cover fly (50) extending in the spiral direction of
前記各残層用洗浄液排出孔 ( 4 8 ) から飛び出す前記洗浄液受け部 (4 3 ) 内の洗浄液を、 前記フライ ト (4 2) 外周縁と前記力パーフラ イ ト ( 5 0 ) との間の隙間より、 前記フライ ト (4 2 ) 外周縁と前記ス クリーン部 ( 3 0 ) 内周面との間の隙間に生じる残層処理物に向けて直 接噴出させることを特徴とする遠心分離機 ( 1 0, 1 0 A) 。  The cleaning liquid in the cleaning liquid receiving portion (43) that protrudes from the cleaning liquid discharge holes (48) for the remaining layers is supplied to the space between the outer periphery of the fly (42) and the force perflight (50). A centrifugal separator characterized in that a centrifugal separator is ejected directly from a gap toward a residual layer processing object generated in a gap between an outer peripheral edge of the fly (42) and an inner peripheral surface of the screen portion (30). (10, 10A).
2. 前記洗浄液受け部 C4 3 ) に、 前記ボウル ( 2 0) のスク リーン部 2. The screen part of the bowl (20) is placed in the cleaning liquid receiving part C43).
( 3 0) における軸方向に洗浄液受け部 (4 3 ) 内を複数に区画する仕 切り板 (4 3 a ) を設けて、 前記スク リーン部 (3 0) における洗浄範 囲を選択可能に構成したことを特徴とする請求の範囲第 1項記載の遠心 分離機 ( 1 0 A) 。 In the (30), the washing liquid receiving part (43) is divided into multiple parts in the axial direction. The centrifugal separator (10A) according to claim 1, wherein a cutting plate (43a) is provided so that a washing range in the screen part (30) can be selected. .
3. ボウル (2 0) 内にスクリューコンペャ (4 0 ) を備え、 これらを 相対的に回転可能に支持してなり、 前記ボウル (2 0) 内に供給した原 液から処理物を分離すると共に、 該ポウル ( 2 0 ) の一端側の内周面に 沿って設けたスク リーン部 ( 3 0) で、 前記処理物の洗浄および脱液を 行う遠心分離機 ( 1 0 B) において、 前記スクリユーコンべャ (4 0 ) のハプ (4 1 ) に、 その内部に供給した洗浄液を受け入れる洗浄液受け 部 (4 3 ) と、 該洗浄液受け部 (4 3) 内の洗浄液を前記スク リーン部 ( 3 0) に向かって噴出する洗浄ノズル (4 5 ) とを有する遠心分離機 ( 1 0 B ) であって、  3. Equipped with a screw conveyer (40) in the bowl (20), which is relatively rotatably supported, and separates the processed material from the stock solution supplied into the bowl (20). And a centrifugal separator (10B) for washing and dewatering the processed material at a screen portion (30) provided along the inner peripheral surface on one end side of the powl (20). A cleaning liquid receiving section (43) for receiving the cleaning liquid supplied therein and a cleaning liquid in the cleaning liquid receiving section (43) are supplied to the haptic (41) of the screw conveyor (40) by the cleaning section (43). A centrifuge (10B) having a washing nozzle (45) ejecting toward 30),
前記洗浄液受け部 (4 3 ) 内に、 前記スク リ ューコンペャ (4 0 ) の フライ ト (4 2) 外周縁と前記スクリーン部 ( 3 0 ) 内周面との間の隙 間に生じる残層処理物を洗浄する洗浄液を受け入れる残層用洗浄液受け 部 (4 6 ) を、 前記洗浄液受け部 (4 3 ) 内とは独立に区画して設け、 前記フライ ト (4 2) の処理物搬送面 (4 2 a ) と反対側の面 (4 2 b ) に隣接する位置にて、 前記フライ ト (4 2) のらせん方向に沿って 所定間隔おきに、 前記残層用洗浄液受け部 (4 6 ) の底側に複数の接続 管 (4 7 ) を設けると共に、 前記スクリューコンペャ (4 0) のハブ ( 4 1 ) に前記各接続管 (4 7 ) がそれぞれ連通する複数の残層用洗浄液 排出孔 (4 8 ) を設け、  Remaining layer treatment generated in the cleaning liquid receiving portion (43) between the outer periphery of the flight (42) of the screw conveyor (40) and the inner peripheral surface of the screen portion (30). A residual layer cleaning liquid receiving section (46) for receiving a cleaning liquid for cleaning an object is provided separately from the inside of the cleaning liquid receiving section (43), and a processing object transporting surface of the fly (42) is provided. At the position adjacent to the surface (42b) opposite to 42a), at predetermined intervals along the spiral direction of the fly (42), the residual layer cleaning liquid receiving portion (46) A plurality of connecting pipes (47) are provided on the bottom side of the pipe, and a plurality of residual layer cleaning liquids, each of which is connected to the hub (41) of the screw conveyer (40), respectively. With holes (4 8)
前記フライ ト (4 2 ) の反対側の面 (4 2 b ) における外周縁に沿つ て、 該反対側の面 (4 2 b ) に対して所定の隙間を空けた状態でフライ ト (4 2) のらせん方向に延びる細幅状のカバーフライ ト ( 5 0) を取 り付け、 前記各残層用洗浄液排出孔 (4 8 ) から飛び出す前記残層用洗浄液受 け部 (4 6 ) 内の洗浄液を、 前記フライ ト (4 2) 外周縁と前記カバー フライ ト ( 5 0) との間の隙間より、 前記残層処理物に向けて直接噴出 させることを特徴とする遠心分離機 ( 1 0 B) 。 Along the outer peripheral edge of the opposite surface (42b) of the fly (42), a predetermined clearance is provided with respect to the opposite surface (42b). 2) Attach the narrow cover fly (50) extending in the spiral direction of The cleaning liquid in the remaining layer cleaning liquid receiving portion (46) that protrudes from each of the remaining layer cleaning liquid discharge holes (48) is transferred to the outer periphery of the fly (42) and the cover flight (50). A centrifugal separator (10B) characterized in that a jet is directly ejected from the gap between the residual layer processed material and the target material.
4. 前記スク リューコンペャ (4 0 ) のハブ (4 1 ) 内部に、 その軸方 向に延びる原液供給用のフィードチューブ (6 0 ) を揷入し、 4. Insert a feed tube (60) for supplying undiluted solution, which extends in the axial direction, into the hub (41) of the screw conveyor (40).
前記フィードチューブ ( 6 0 ) 内に、 前記洗浄液受け部 (4 3 ) に洗 浄液を供給する洗浄液供給経路 ( 7 1 ) を形成すると共に、 前記洗浄液 受け部 (4 3) に対して半径方向に重なるフィードチューブ (6 0 ) の 途中に前記洗浄液供給経路 ( 7 1 ) の開放口を設け、  In the feed tube (60), a cleaning liquid supply path (71) for supplying a cleaning liquid to the cleaning liquid receiving section (43) is formed, and a radial direction is formed with respect to the cleaning liquid receiving section (43). An opening for the cleaning liquid supply path (71) is provided in the middle of the feed tube (60) overlapping the
前記フィードチューブ ( 6 0 ) 内に、 前記残層用洗浄液受け部 ( 4 6 ) に洗浄液を供給する残層用洗浄液供給経路 ( 7 2) を形成すると共 に、 前記残層用洗浄液受け部 (4 6 ) に対して半径方向に重なるフィー ドチューブ (6 0) の途中に前記残層用洗浄液供給経路 ( 7 2) の開放 口を設けたことを特徴とする請求の範囲第 3項記載の遠心分離機 ( 1 0 B) 。  In the feed tube (60), a remaining layer cleaning liquid supply path (72) for supplying a cleaning liquid to the remaining layer cleaning liquid receiving section (46) is formed, and the remaining layer cleaning liquid receiving section (72) is formed. 4. The centrifuge according to claim 3, wherein an opening for the residual layer cleaning liquid supply path (72) is provided in the middle of a feed tube (60) radially overlapping with 46). Separator (10B).
5. ボウル ( 2 0) 内にスク リ ューコンペャ (4 0 ) を備え、 これらを 相対的に回転可能に支持してなり、 前記ボウル (2 0) 内に供給した原 液から処理物を分離すると共に、 該ボウル (2 0 ) の一端側の内周面に 沿って設けたスク リーン部 ( 3 0) で、 前記処理物の洗浄および脱液を 行う遠心分離機 ( 1 0 C) において、 前記スクリユーコンべャ (4 0 ) のハブ (4 1 ) に、 その内部に供給した洗浄液を受け入れる洗浄液受け 部 (4 3) と、 該洗浄液受け部 (4 3) 内の洗浄液を前記スクリーン部 ( 3 0) に向かって噴出する洗浄ノズル (4 5 ) とを有する遠心分離機 ( 1 0 C) であって、  5. A screw conveyor (40) is provided in the bowl (20), and these are relatively rotatably supported. The processed material is separated from the stock solution supplied into the bowl (20). And a centrifugal separator (10C) for washing and dewatering the processed material at a screen section (30) provided along the inner peripheral surface on one end side of the bowl (20). A cleaning liquid receiving section (43) for receiving the cleaning liquid supplied to the inside of the hub (41) of the screw conveyor (40), and a cleaning liquid in the cleaning liquid receiving section (43) are supplied to the screen section (3). A centrifugal separator (10 C) having a washing nozzle (45) ejecting toward
前記スクリ ューコンペャ (4 0) のハブ (4 1 ) の一端側内部に、 該 スク リユーコンべャ (4 0 ) のフライ ト (4 2 ) 外周縁と前記スク リ一 ン部 し3 0 ) 内周面との間の隙間に生じる残層処理物を洗浄する洗浄液 を受け入れる残層用洗浄液受け室 ( 5 4 ) を、 前記洗浄液受け部 (4 3 ) とは別に区画して設け、 The screw conveyor (40) has the hub (41) inside one end of the hub. The remaining layer for receiving the cleaning liquid for cleaning the remaining layer processing material generated in the gap between the outer periphery of the screw conveyor (40) and the inner peripheral surface of the screen portion (32). A cleaning liquid receiving chamber (54) for use separately provided from the cleaning liquid receiving section (43);
前記スクリユーコンべャ (4 0 ) のハブ (4 1 ) の外周に、 複数の残 層用洗浄液導入管 (5 3 ) を、 それぞれ前記フライ ト (4 2 ) を貫通さ せてハプ (4 1.) 軸方向に延ばした状態で、 ハブ (4 1 ) 円周方向に所 定間隔おきに配列させ、 各残層用洗浄液導入管 ( 5 3 ) の一端側を、 前 記残層用洗浄液受け室 ( 5 4 ) 内に連通接続し、  A plurality of cleaning liquid introduction pipes (53) for the residual layer are passed around the hub (41) of the screw conveyor (40) through the fly (42), respectively. .) While extending in the axial direction, hubs (41) are arranged at regular intervals in the circumferential direction, and one end of each residual layer cleaning liquid introduction pipe (53) is placed in the aforementioned residual layer cleaning liquid receiver. Connect to the room (54)
前記各残層用洗浄液導入管 ( 5 3 ) の途中に、 前記スク リ ューコンペ ャ (4 0 ) のフライ ト (4 2 ) の処理物搬送面 (4 2 a ) と反対側の面 ( 4 2 b ) に隣接する位置にて、 前記フライ ト (4 2 ) のらせん方向に 沿って所定間隔おきに並ぶ複数の残層用洗浄液排出孔 ( 5 3 a ) を設け 前記フライ ト (4 2 ) の反対側の面 (4 2 b ) における外周縁に沿つ て、 該反対側の面 (4 2 b ) に対して所定の隙間を空けた状態でフライ ト (4 2 ) のらせん方向に延びる細幅状のカバーフライ ト ( 5 0 ) を取 り付け、  In the middle of each of the residual layer cleaning liquid introduction pipes (53), a surface (42) of the screw conveyor (40) on the side opposite to the processed material transfer surface (42a) of the fly (42) is placed. b) a plurality of residual layer cleaning liquid discharge holes (53a) arranged at predetermined intervals along the spiral direction of the fly (42) at a position adjacent to the fly (42); Along the outer peripheral edge of the opposite surface (42b), a narrow space extending in the spiral direction of the fly (42) with a predetermined gap left from the opposite surface (42b). Attach the wide cover fly (50),
前記残層用洗浄液受け室 (5 4 ) から前記各残層用洗浄液導入管 ( 5 3 ) 内に導入され、 その前記各残層用洗浄液排出孔 (5 3 a ) から飛び 出す洗浄液を、 前記フライ ト (4 2 ) 外周縁と前記力パーフライ ト ( 5 0 ) との間の隙間より、 前記残層処理物に向けて直接噴出させることを 特徴とする遠心分離機 ( 1 0 C) 。  The cleaning liquid introduced from the residual-layer cleaning liquid receiving chamber (54) into each of the residual-layer cleaning liquid introduction pipes (53) and ejected from the respective residual-layer cleaning liquid discharge holes (53a) is A centrifugal separator (10C), characterized in that the centrifugal separator (10C) is ejected directly from the clearance between an outer peripheral edge and the force par frit (50) toward the residual layer processed material.
6. 前記カバーフライ ト ( 5 0 ) は、 前記フライ ト (4 2 ) における反 対側の面 (4 2 b ) に対して、 前記ハブ (4 1 ) に近接する側からフラ イ ト (4 2 ) 外周縁に近接する側にかけて隙間が次第に狭まる勾配をつ けて、 所定間隔おきに並ぶ支持板 ( 5 1 ) を介して取り付けたことを特 徴とする請求の範囲第 1項, 第 2項, 第 3項, 第 4項または第 5項記載 の遠心分離機 ( 1 0, 1 0 A, 1 0 B , 1 0 C) 。 6. The cover fly (50) is arranged on the opposite side (42b) of the fly (42) from the side close to the hub (41). 2) It is characterized in that it is attached via support plates (51) arranged at predetermined intervals with a gradient that gradually narrows the gap toward the side close to the outer peripheral edge. A centrifuge (10, 10A, 10B, 10C) according to claim 1, 2, 3, 4 or 5.
PCT/JP2002/013613 2002-12-26 2002-12-26 Centrifugal separator WO2004060567A1 (en)

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PCT/JP2002/013613 WO2004060567A1 (en) 2002-12-26 2002-12-26 Centrifugal separator
AU2002360053A AU2002360053A1 (en) 2002-12-26 2002-12-26 Centrifugal separator
EP03768302A EP1579918B8 (en) 2002-12-26 2003-12-26 Centrifugal machine
EP09008729A EP2108458B1 (en) 2002-12-26 2003-12-26 Centrifugal separator
CN200710089696XA CN101041145B (en) 2002-12-26 2003-12-26 Centrifugal separator
PCT/JP2003/016873 WO2004058410A1 (en) 2002-12-26 2003-12-26 Centrifugal machine
AU2003292669A AU2003292669A1 (en) 2002-12-26 2003-12-26 Centrifugal machine
US10/540,472 US7140494B2 (en) 2002-12-26 2003-12-26 Centrifugal machine
CNB2003801074619A CN100337755C (en) 2002-12-26 2003-12-26 Centrifuge

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JPH1028899A (en) * 1996-07-16 1998-02-03 Tsukishima Kikai Co Ltd Screen bowl decanter centrifugal separator
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CN112387428A (en) * 2020-12-04 2021-02-23 成都高分离心机有限公司 Spiral pusher of centrifugal machine and horizontal spiral centrifugal machine
CN112387428B (en) * 2020-12-04 2021-11-16 成都高分离心机有限公司 Spiral pusher of centrifugal machine and horizontal spiral centrifugal machine

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