WO2004041760A3 - Fluorinated polymers - Google Patents
Fluorinated polymers Download PDFInfo
- Publication number
- WO2004041760A3 WO2004041760A3 PCT/US2003/035223 US0335223W WO2004041760A3 WO 2004041760 A3 WO2004041760 A3 WO 2004041760A3 US 0335223 W US0335223 W US 0335223W WO 2004041760 A3 WO2004041760 A3 WO 2004041760A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- fluorinated polymers
- compounds
- present
- fluorine
- hydroxyl
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C33/00—Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
- C07C33/40—Halogenated unsaturated alcohols
- C07C33/44—Halogenated unsaturated alcohols containing rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C35/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring
- C07C35/48—Halogenated derivatives
- C07C35/52—Alcohols with a condensed ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F32/08—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having two condensed rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2602/00—Systems containing two condensed rings
- C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
- C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Structural Engineering (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003291279A AU2003291279A1 (en) | 2002-11-05 | 2003-11-03 | Fluorinated polymers |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43288602P | 2002-11-05 | 2002-11-05 | |
US60/432,886 | 2002-11-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004041760A2 WO2004041760A2 (en) | 2004-05-21 |
WO2004041760A3 true WO2004041760A3 (en) | 2004-06-24 |
Family
ID=32313166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/035223 WO2004041760A2 (en) | 2002-11-05 | 2003-11-03 | Fluorinated polymers |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2003291279A1 (en) |
WO (1) | WO2004041760A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5719514B2 (en) * | 2009-02-08 | 2015-05-20 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | Coating compositions suitable for use with overcoated photoresist |
US8883407B2 (en) | 2009-06-12 | 2014-11-11 | Rohm And Haas Electronic Materials Llc | Coating compositions suitable for use with an overcoated photoresist |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4104392A1 (en) * | 1991-02-14 | 1992-08-20 | Hoechst Ag | Light wave guide and new polymers - are based on poly:norbornene or poly:norbornadiene prods. partic. contg. fluoro or fluoro-alkyl substits. |
WO2000067072A1 (en) * | 1999-05-04 | 2000-11-09 | E.I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
US6468712B1 (en) * | 2000-02-25 | 2002-10-22 | Massachusetts Institute Of Technology | Resist materials for 157-nm lithography |
WO2003073169A2 (en) * | 2002-02-21 | 2003-09-04 | Honeywell International Inc. | Fluorinated molecules and methods of making and using same |
-
2003
- 2003-11-03 WO PCT/US2003/035223 patent/WO2004041760A2/en not_active Application Discontinuation
- 2003-11-03 AU AU2003291279A patent/AU2003291279A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4104392A1 (en) * | 1991-02-14 | 1992-08-20 | Hoechst Ag | Light wave guide and new polymers - are based on poly:norbornene or poly:norbornadiene prods. partic. contg. fluoro or fluoro-alkyl substits. |
WO2000067072A1 (en) * | 1999-05-04 | 2000-11-09 | E.I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
US6468712B1 (en) * | 2000-02-25 | 2002-10-22 | Massachusetts Institute Of Technology | Resist materials for 157-nm lithography |
WO2003073169A2 (en) * | 2002-02-21 | 2003-09-04 | Honeywell International Inc. | Fluorinated molecules and methods of making and using same |
Non-Patent Citations (13)
Title |
---|
BRAENDLIN, H. P. ET AL., J. AMER. CHEM. SOC., vol. 84, 1962, pages 2112 - 2115 * |
DATABASE CROSSFIRE BEILSTEIN [online] Beilstein Institut zur Förderung der Chemischen Wissenschaften, Frankfurt am Main, DE; XP002276799, Database accession no. 2056783 * |
DATABASE CROSSFIRE BEILSTEIN [online] Beilstein Institut zur Förderung der Chemischen Wissenschaften, Frankfurt am Main, DE; XP002276800, Database accession no. 1875563 (BRN) * |
DATABASE CROSSFIRE BEILSTEIN [online] Beilstein Institut zur Förderung der Chemischen Wissenschaften, Frankfurt am Main, DE; XP002276801, Database accession no. 3241179 (BRN) * |
DATABASE CROSSFIRE BEILSTEIN [online] Beilstein Institut zur Förderung der Chemischen Wissenschaften, Frankfurt am Main, DE; XP002276802, Database accession no. 1926324 (BRN) * |
HUNG, RAYMOND J. ET AL.: "Resist Materials for 157 nm Microlithography: An Update", ADVANCES IN RESIST TECHNOLOGY AND PROCESSING - PROCEEDINGS OF SPIE- THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 2001, pages 385 - 395, XP009012603 * |
JORNAL OF ORGANIC CHEMISTRY, vol. 44, 1979, pages 3485 - 3491 * |
KEROV, I. I. ET AL., PET. CHEM. USSR (ENGL. TRANSL.), vol. 38, no. 3, 1998, pages 156 - 163 * |
MCBEE EARL T. ET AL.: "Stereochemistry of the Diels-Alder Reaction. V. Fluorinated Trans-Olefinic Acids and Derivatives with Cyclopentadiene", JOURNAL OF ORGANIC CHEMISTRY, vol. 38, no. 4, 1973, pages 632 - 636, XP002245294 * |
MCBEE ET AL., J. AMER. CHEM. SOC., vol. 77, 1955, pages 917 * |
PIRKLE, WILLIAM H. ET AL.: "Use of Liquid-Crystal-Induced Circular Dichroism for Determination of Absolute Configuration of Alcohols and Oxaziridines", JOURNAL OF ORGANIC CHEMISTRY, vol. 45, 1980, pages 1379 - 1382, XP002957666 * |
SHONO, TATSUYA ET AL.: "A Novel Trifluoromethylation of Aldehydes and Ketones Promoted by an Electrogenerated Base", JOURNAL OF ORGANIC CHEMISTRY, vol. 56, 1991, pages 2 - 4, XP002276797 * |
VOHRA, VAISHALI RAGHU ET AL: "Highly transparent resist platforms for 157-nm microlithography: an updat", PROCEEDINGS OF SPIE-THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING (2002), 4690(PT. 1, ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX), 84-93, XP001180659 * |
Also Published As
Publication number | Publication date |
---|---|
AU2003291279A1 (en) | 2004-06-07 |
WO2004041760A2 (en) | 2004-05-21 |
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