WO2004040378A3 - Illumination device for a microlithographic projection-exposure system - Google Patents

Illumination device for a microlithographic projection-exposure system Download PDF

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Publication number
WO2004040378A3
WO2004040378A3 PCT/EP2003/011000 EP0311000W WO2004040378A3 WO 2004040378 A3 WO2004040378 A3 WO 2004040378A3 EP 0311000 W EP0311000 W EP 0311000W WO 2004040378 A3 WO2004040378 A3 WO 2004040378A3
Authority
WO
WIPO (PCT)
Prior art keywords
unit
exposure system
illumination device
microlithographic projection
cuboid
Prior art date
Application number
PCT/EP2003/011000
Other languages
German (de)
French (fr)
Other versions
WO2004040378A2 (en
Inventor
Markus Deguenther
Stig Bieling
Johannes Wangler
Original Assignee
Zeiss Carl Smt Ag
Markus Deguenther
Stig Bieling
Johannes Wangler
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Markus Deguenther, Stig Bieling, Johannes Wangler filed Critical Zeiss Carl Smt Ag
Priority to AU2003276050A priority Critical patent/AU2003276050A1/en
Publication of WO2004040378A2 publication Critical patent/WO2004040378A2/en
Publication of WO2004040378A3 publication Critical patent/WO2004040378A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Abstract

The invention relates to an illumination device for a microlithographic projection-exposure system, which preferably operates with a mercury high-pressure lamp as the primary light source. One embodiment of said device comprises an integrator unit for mixing the light of the primary light source, said unit having at least one cuboid integrator rod with a rectangular entrance surface (43) and lateral faces (45, 47) that are aligned at right angles to one another. A cuboid premixing unit (50) with a rectangular cross-section is situated in the optical path, upstream of the entry surface (43), said unit having several reflection surfaces (156, 157, 158, 159) running obliquely in relation to the lateral faces of the integrator rod. The oblique reflection surfaces cause azimuthal mixing of the light and can be used to provide a pupil of illumination light that is largely devoid of ellipticity.
PCT/EP2003/011000 2002-10-29 2003-10-04 Illumination device for a microlithographic projection-exposure system WO2004040378A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003276050A AU2003276050A1 (en) 2002-10-29 2003-10-04 Illumination device for a microlithographic projection-exposure system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2002151087 DE10251087A1 (en) 2002-10-29 2002-10-29 Illumination device for a microlithography projection exposure system
DE10251087.3 2002-10-29

Publications (2)

Publication Number Publication Date
WO2004040378A2 WO2004040378A2 (en) 2004-05-13
WO2004040378A3 true WO2004040378A3 (en) 2004-12-23

Family

ID=32115133

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/011000 WO2004040378A2 (en) 2002-10-29 2003-10-04 Illumination device for a microlithographic projection-exposure system

Country Status (3)

Country Link
AU (1) AU2003276050A1 (en)
DE (1) DE10251087A1 (en)
WO (1) WO2004040378A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011086915A1 (en) 2011-01-26 2012-07-26 Carl Zeiss Smt Gmbh Illumination system for microlithographic projection exposure system, has LED for generating illumination radiation in UV range at specific wavelength

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1041606A1 (en) * 1997-11-10 2000-10-04 Nikon Corporation Exposure apparatus
US6324330B1 (en) * 2000-07-10 2001-11-27 Ultratech Stepper, Inc. Folded light tunnel apparatus and method
US20010046038A1 (en) * 1998-04-08 2001-11-29 Johannes Catharinus H. Mulkens Lithography apparatus
US20010048562A1 (en) * 1999-12-28 2001-12-06 Bartlett Terry A. Optical architectures for combining multiple lamps in light valve projectors
EP1217450A2 (en) * 2000-12-20 2002-06-26 Carl Zeiss Semiconductor Manufacturing Technologies Ag Light integrator for an irradiation device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4342424A1 (en) * 1993-12-13 1995-06-14 Zeiss Carl Fa Illuminator for projection micro-lithography illumination installation
JP3275575B2 (en) * 1993-10-27 2002-04-15 キヤノン株式会社 Projection exposure apparatus and device manufacturing method using the projection exposure apparatus
WO1997031298A1 (en) * 1996-02-23 1997-08-28 Asm Lithography B.V. Illumination unit for an optical apparatus
JP3005203B2 (en) * 1997-03-24 2000-01-31 キヤノン株式会社 Illumination apparatus, exposure apparatus, and device manufacturing method
WO2000070660A1 (en) * 1999-05-18 2000-11-23 Nikon Corporation Exposure method, illuminating device, and exposure system
JP4659223B2 (en) * 2001-01-15 2011-03-30 キヤノン株式会社 Illumination apparatus, projection exposure apparatus used therefor, and device manufacturing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1041606A1 (en) * 1997-11-10 2000-10-04 Nikon Corporation Exposure apparatus
US20010046038A1 (en) * 1998-04-08 2001-11-29 Johannes Catharinus H. Mulkens Lithography apparatus
US20010048562A1 (en) * 1999-12-28 2001-12-06 Bartlett Terry A. Optical architectures for combining multiple lamps in light valve projectors
US6324330B1 (en) * 2000-07-10 2001-11-27 Ultratech Stepper, Inc. Folded light tunnel apparatus and method
EP1217450A2 (en) * 2000-12-20 2002-06-26 Carl Zeiss Semiconductor Manufacturing Technologies Ag Light integrator for an irradiation device

Also Published As

Publication number Publication date
WO2004040378A2 (en) 2004-05-13
AU2003276050A1 (en) 2004-05-25
DE10251087A1 (en) 2004-05-19

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