WO2004031432A3 - Method and device for low-pressure carburising - Google Patents
Method and device for low-pressure carburising Download PDFInfo
- Publication number
- WO2004031432A3 WO2004031432A3 PCT/EP2003/010014 EP0310014W WO2004031432A3 WO 2004031432 A3 WO2004031432 A3 WO 2004031432A3 EP 0310014 W EP0310014 W EP 0310014W WO 2004031432 A3 WO2004031432 A3 WO 2004031432A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- hydrocarbon
- processing chamber
- process gas
- low
- mass flow
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/20—Carburising
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE50302246T DE50302246D1 (en) | 2002-09-13 | 2003-09-09 | METHOD AND DEVICE FOR UNDERPRESSURE COOLING |
EP03747994A EP1537252B1 (en) | 2002-09-13 | 2003-09-09 | Method and device for low-pressure carburising |
AU2003267331A AU2003267331A1 (en) | 2002-09-13 | 2003-09-09 | Method and device for low-pressure carburising |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10242616A DE10242616A1 (en) | 2002-09-13 | 2002-09-13 | Carburizing process comprises feeding a hydrocarbon-containing treatment gas into a treatment chamber containing a reference sample having a defined carburizing surface and removing a waste gas stream from the chamber using a vacuum pump |
DE10242616.3 | 2002-09-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004031432A2 WO2004031432A2 (en) | 2004-04-15 |
WO2004031432A3 true WO2004031432A3 (en) | 2004-12-29 |
Family
ID=31895964
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/010014 WO2004031432A2 (en) | 2002-09-13 | 2003-09-09 | Method and device for low-pressure carburising |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1537252B1 (en) |
AT (1) | ATE316161T1 (en) |
AU (1) | AU2003267331A1 (en) |
DE (2) | DE10242616A1 (en) |
WO (1) | WO2004031432A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9212416B2 (en) | 2009-08-07 | 2015-12-15 | Swagelok Company | Low temperature carburization under soft vacuum |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL210958B1 (en) * | 2007-04-02 | 2012-03-30 | Seco Warwick Społka Akcyjna | The manner and control-metering system for active control of the surface of charge in the process of carbonizing under negative pressure |
WO2013109415A1 (en) | 2012-01-20 | 2013-07-25 | Swagelok Company | Concurrent flow of activating gas in low temperature carburization |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5064620A (en) * | 1989-06-01 | 1991-11-12 | Pierre Beuret | Probe for measuring carbon flux |
-
2002
- 2002-09-13 DE DE10242616A patent/DE10242616A1/en not_active Withdrawn
-
2003
- 2003-09-09 WO PCT/EP2003/010014 patent/WO2004031432A2/en not_active Application Discontinuation
- 2003-09-09 AT AT03747994T patent/ATE316161T1/en not_active IP Right Cessation
- 2003-09-09 DE DE50302246T patent/DE50302246D1/en not_active Expired - Fee Related
- 2003-09-09 AU AU2003267331A patent/AU2003267331A1/en not_active Abandoned
- 2003-09-09 EP EP03747994A patent/EP1537252B1/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5064620A (en) * | 1989-06-01 | 1991-11-12 | Pierre Beuret | Probe for measuring carbon flux |
Non-Patent Citations (5)
Title |
---|
BAMMIDIPATI SREEKANTH ET AL: "Chemical vapor deposition of carbon on graphite by methane pyrolysis", AICHE J; AICHE JOURNAL NOV 1996 AICHE, NEW YORK, NY, US, vol. 42, no. 11, November 1996 (1996-11-01), pages 3123 - 3132, XP000937830 * |
HOFFMANN R ET AL: "PROBLEME DER KINETIK UND DER KEIMBILDUNG BEIM GASNITRIEREN", HÄRTEREI - TECHNISCHE MITTEILUNGEN, vol. 38, no. 3, May 1983 (1983-05-01), CARL HANSER VERLAG, MÜNCHEN, DE, pages 103 - 109, XP009037775 * |
KLÜMPER-WESTKAMP H ET AL: "BESTIMMUNG DES KOHLENSTOFFGEHALTES IN AUFKOHLUNGSFOLIEN", HÄRTEREI - TECHNISCHE MITTEILUNGEN, vol. 57, no. 5, 1 September 2002 (2002-09-01), CARL HANSER VERLAG, MÜNCHEN, DE, pages 364 - 372, XP001140765, ISSN: 0341-101X * |
MATAMALA G ET AL: "Carburization and decarburization kinetics of iron in CH4 - H2 mixtures between 1000 - 1100 °C", MATERIALS CHEMISTRY AND PHYSICS SWITZERLAND, vol. 12, no. 4, April 1985 (1985-04-01), pages 313 - 319, XP002299774, ISSN: 0254-0584 * |
ROEMPLER D ET AL: "KOHLENSTOFF- UND HÄRTEVERLAUF IN DER EINSATZHÄRTUNGSSCHICHT - ZUSATZMODUL FÜR DIFFUSIONSRECHNER", HÄRTEREI - TECHNISCHE MITTEILUNGEN, vol. 44, no. 6, 1 November 1989 (1989-11-01), CARL HANSER VERLAG, MÜNCHEN, DE, pages 360 - 365, XP000163077, ISSN: 0341-101X * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9212416B2 (en) | 2009-08-07 | 2015-12-15 | Swagelok Company | Low temperature carburization under soft vacuum |
Also Published As
Publication number | Publication date |
---|---|
AU2003267331A1 (en) | 2004-04-23 |
WO2004031432A2 (en) | 2004-04-15 |
DE50302246D1 (en) | 2006-04-06 |
ATE316161T1 (en) | 2006-02-15 |
EP1537252B1 (en) | 2006-01-18 |
AU2003267331A8 (en) | 2004-04-23 |
DE10242616A1 (en) | 2004-03-25 |
EP1537252A2 (en) | 2005-06-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1014427A3 (en) | Processing apparatus having integrated pumping system | |
WO2006060275A3 (en) | Fore-line preconditioning for vacuum pumps | |
EP1081380A4 (en) | Device and method for evacuation | |
WO2003035927A3 (en) | Gas delivery apparatus for atomic layer deposition | |
WO2003021649A1 (en) | Apparatus and method for producing semiconductor device, and method for cleaning semiconductor producing apparatus | |
WO2007025039A3 (en) | Pulsed etching cooling | |
WO2007053607A3 (en) | Pumping system for atomic layer deposition | |
WO2001078101A3 (en) | Method and apparatus for plasma processing | |
EP1335414A3 (en) | Semiconductor processing apparatus | |
EP1243667A3 (en) | Gas recirculation flow control method and apparatus for use in vacuum system for semiconductor manufacture | |
EP1172458A3 (en) | Components peripheral to the pedestal in the gas flow path within a chemical vapor deposition chamber | |
WO2002012585A3 (en) | Processing apparatus and cleaning method | |
WO2001082355A3 (en) | Method and apparatus for plasma cleaning of workpieces | |
WO2003075323A3 (en) | Device and method for anisotropically plasma etching a substrate | |
TW200614369A (en) | Methods and apparatus for the optimization of etch resistance in a plasma processing system | |
EP1350997A3 (en) | Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber | |
EP1444905A3 (en) | Pressure conditioning method and apparatus | |
WO2003033761A3 (en) | Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor | |
WO2003052399A3 (en) | Method of chemical of ionization at reduced pressures | |
WO2004036627A3 (en) | Plasma system and method for anistropically etching structures into a substrate | |
EP1156135A3 (en) | Vacuum processing apparatus | |
DE60126773D1 (en) | METHOD AND DEVICE FOR PRESENTING FILM MATERIAL FROM EXPANDED GRAPHITE UNDER REDUCED PRESSURE | |
WO2008080249A3 (en) | Apparatus for gas handling in vacuum processes | |
MXPA05011288A (en) | Vapor collection method and apparatus. | |
WO2004031432A3 (en) | Method and device for low-pressure carburising |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2003747994 Country of ref document: EP |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWP | Wipo information: published in national office |
Ref document number: 2003747994 Country of ref document: EP |
|
WWG | Wipo information: grant in national office |
Ref document number: 2003747994 Country of ref document: EP |
|
NENP | Non-entry into the national phase |
Ref country code: JP |
|
WWW | Wipo information: withdrawn in national office |
Country of ref document: JP |