WO2004018719A1 - Negative volume expansion lead-free electrical connection - Google Patents

Negative volume expansion lead-free electrical connection Download PDF

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Publication number
WO2004018719A1
WO2004018719A1 PCT/EP2003/007980 EP0307980W WO2004018719A1 WO 2004018719 A1 WO2004018719 A1 WO 2004018719A1 EP 0307980 W EP0307980 W EP 0307980W WO 2004018719 A1 WO2004018719 A1 WO 2004018719A1
Authority
WO
WIPO (PCT)
Prior art keywords
solder
electronic package
substrate
electrical connection
solder member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2003/007980
Other languages
French (fr)
Inventor
David V. Caletka
Krishna Darbha
Donald W. Henderson
Lawrence P. Lehman
George H. Thiel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IBM Deutschland GmbH
International Business Machines Corp
Original Assignee
IBM Deutschland GmbH
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IBM Deutschland GmbH, International Business Machines Corp filed Critical IBM Deutschland GmbH
Priority to AU2003251438A priority Critical patent/AU2003251438A1/en
Publication of WO2004018719A1 publication Critical patent/WO2004018719A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • C22C13/02Alloys based on tin with antimony or bismuth as the next major constituent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
    • B23K35/264Bi as the principal constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C12/00Alloys based on antimony or bismuth
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3431Leadless components
    • H05K3/3436Leadless components having an array of bottom contacts, e.g. pad grid array or ball grid array components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/01Manufacture or treatment
    • H10W74/012Manufacture or treatment of encapsulations on active surfaces of flip-chip devices, e.g. forming underfills
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/15Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10613Details of electrical connections of non-printed components, e.g. special leads
    • H05K2201/10954Other details of electrical connections
    • H05K2201/10977Encapsulated connections
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/284Applying non-metallic protective coatings for encapsulating mounted components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/346Solder materials or compositions specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07231Techniques
    • H10W72/07236Soldering or alloying
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07251Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251Materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251Materials
    • H10W72/252Materials comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/853On the same surface
    • H10W72/856Bump connectors and die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/923Bond pads having multiple stacked layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/9415Dispositions of bond pads relative to the surface, e.g. recessed, protruding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • H10W72/952Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to an electrical connection between conductors, more particularly to the electrical connection which is comprised of a material which has a negative volume expansion, upon melting and which is lead- free .
  • solders have been conventionally used for achieving electrical and mechanical joints between electronic devices and electronic parts. Solders containing tin and lead as major components have been generally used for this purpose. In addition, solders not containing lead, so called “lead-free solders", which typically contain tin as a major component and other metals such as silver and copper are being used in consideration of environmental concerns. In recent years, soldered electronic assemblies with electrical joints having satisfactory soldering characteristics have been produced using such lead-free solders. For example, U.S. Patent Number 5,730,932, issued on March 24, 1998 -and assigned to the IBM Corporation describes a lead-free solder alloy and microelectronics circuits soldered by the alloy. Another example, U.S.
  • Patent Number 6,204,490 issued on March 20, 2001 and assigned to Hitachi, Ltd. describes a method of manufacturing an electronic circuit card on which components are mounted using a lead-free solder.
  • Flip chip mounting is an increasingly popular technique for electrically connecting an electronic device, such as an semiconductor chip, to a substrate, such as a circuit board or a chip carrier.
  • the active circuitry face of the chip is mounted face down or "flipped" onto the substrate.
  • Conductive contact pads on the flip chip are aligned with corresponding conductive contact pads on the substrate, with the flip chip and substrate contact pads electrically connected by way of an electrically conductive material.
  • the flip chip mounting technique eliminates the use of bond wires between a semiconductor chip and substrate, resulting in improved electrical performance.
  • a wide range of electrically conducting materials have been used for making the electrical connection between conductive contact pads of the flip chip and substrate, the most common of which being solder in the form of bumps .
  • Other materials that have been used to make this connection are gold bumps, gold stud bumps, and electrically conducting polymer compositions .
  • an underfill material is usually dispensed between the flip chip and the substrate.
  • the underfill is typically provided as a liquid adhesive resin and can be dried, cured and/or polymerized.
  • the underfill material provides enhanced mechanical adhesion and mechanical stability between the " substrate and the flip chip and inhibits environmental attack of the flip chip and substrate surfaces .
  • C4 connections controlled-collapse chip connections
  • C4 interconnections can be arranged in an area array rather than a peripheral array on the face of the flip chip.
  • C4 connections are very small solder bumps formed on the flip chip conductive pads during the processing steps required to manufacture the flip chip module assembly.
  • the solder bumps are aligned with conductive contact pads on the substrate surface substantially arranged in a pattern identical to that of the solder bumps .
  • the solder bumps melt and wet the conductive pads. The surface tension of the liquid solder helps -align the flip chip properly on the substrate.
  • the flip chip is electrically, mechanically, and thermally connected to the substrate.
  • an underfill material can be dispensed to encapsulate the electrical connections and substantially fill the space between the flip chip and the substrate.
  • the underfill material is then cured to form a flip chip module.
  • the module can be heated to temperatures that may cause the electrical connections to undergo reflow (to melt) .
  • Each reflow operation places stresses on the module, that can have a tendency to cause delamination in the module.
  • delamination refers to delamination at or near the underfill to flip chip interface and/or delamination at or near the underfill to substrate interface.
  • the largest source of stress in the module is the melting of the solder electrical connection and specifically the solder volume increase associated with this melting process. Melting of most commonly used solders results in a volume increase of about 2 to about 4 percent.
  • the volume increase of the solder electrical connection of C4 modules encapsulated by underfill occurs at the solder melting point and, subjects the layered flip chip-underfill-substrate module to large stresses. The molten solder is placed under a large hydrostatic stress by the constraining underfill. Immediately beneath the C4 connections, the stresses are compressive at the flip chip and substrate C4 connection pad interfaces .
  • the underfill interfaces at the flip chip and substrate are subjected to large delaminating tensile stresses "because the molten solder is undergoing an expansion, tending to push the flip chip upwards away from the underfill, while the underfill is expanding at a lesser rate. If the adhesion in these regions is insufficient to withstand the resulting large tensile stresses, delamination results.
  • the present invention is directed at overcoming the problem associated with the stresses that occur from the solder volume increase associated with the melting process as set forth above. It is desirable to have an electronic package that substantially eliminates this stress. Electronic packages of this type will have lower defect levels and increased operational field life.
  • Still yet another object of this invention is to provide an electronic package that will be manufactured with relatively lower costs than many current products .
  • Still yet another object of this invention is to provide an electronic package having at least one solder member electrically coupling a device to a substrate and a dielectric material forming a physical connection between the device and substrate, the volume of the solder member contracting during melting thereof, thereby improving operational field life by preventing failure of the physical connection and/or the electrical connection between the substrate and the device.
  • an electrical connection comprising a first conductor, a second conductor, and a volume of solder used to form the electrical connection between the first conductor and the second conductor wherein the volume of solder is contractible during melting thereof .
  • an electronic package comprising a substrate, a device mounted on the substrate, at least one solder member electrically coupling the device to the substrate, and a dielectric material positioned substantially around the solder member and forming a physical connection between the substrate and the device, the volume of the solder member contracting during melting of the solder.
  • an electronic package comprising a substrate, a device mounted on the substrate, at least one solder member electrically coupling the device to the substrate, and a dielectric material positioned substantially around the solder member and forming a physical connection between the substrate and the device, the volume of the solder member contracting during melting thereof to prevent failure of the physical connection or the electrical coupling between the substrate and the device .
  • FIG. 1 is an enlarged sectional view in elevation of one embodiment of the electronic package of the present invention illustrating a semiconductor device electrically coupled to a substrate by a plurality of solder members .
  • FIG. 2 is a view of the electronic package of FIG. 1 after heating the electronic package to a temperature above the melting point of the solder members .
  • FIG. 1 shows a much enlarged sectional view in elevation of the electronic package 10 of the present invention.
  • Electronic package 10 includes a substrate 2 having a first conductor 4 positioned thereon, a device 6 mounted on the substrate, a second conductor 8 positioned on a surface of the device, and a volume of solder comprising a solder member 12 which forms an electrical connection between the first conductor and the second conductor.
  • Solder member 12 can be one of a plurality of solder members. For example, the number of solder members can range from a few hundred to over one " thousand.
  • a substantially cured dielectric material 14 is positioned substantially around solder member 12 and between first and second conductors, 4 and 8, respectively. Dielectric material 14 forms a physical connection between substrate 2 and device 6.
  • the dielectric material 14 can be an organic encapsulating material, such as an epoxy or a cyanate ester and can include an inorganic filler material.
  • examples of filler material that can be used in this invention are silica and alumina.
  • Some commercially available organic encapsulating materials that can be used in this invention are available from Loctite Corporation, Wappingers Falls, NY under the product names FP 4511 and FP 4549.
  • Other examples of organic encapsulating materials that can be used in this invention are the products JM8806 and U8437-2, available from Ablestik Electronic Materials and Adhesives, Collinso Dominguez, CA and Namics Corporation, Niigata City , Japan, respectively.
  • Substrate 2 can be a printed wiring board, or a chip carrier (typically much smaller than a normal sized board) comprising a material selected from the group consisting of ceramics, epoxy resins, filled epoxy resins, liquid crystal polymers, thermoplastics, filled thermoplastics, polyimides, and polyesters.
  • First conductor 4 can be a metal, for example, gold, copper, or aluminum or a conductive polymer composition, or combinations thereof.
  • a layer of conventional solder paste (not shown) can be positioned on first conductor 4.
  • Device 6 may comprise a semiconductor chip, an optoelectronics assembly, a chip carrier, or a like structure. If the device is a chip, preferably the chip is positioned face down or in the flipped (flip chip) position as shown.
  • the chip's second conductor 8 can be a metal such as aluminum or copper or alloys thereof and may have surface " finishes, such as nickel, nickel-aluminum, and/or palladium.
  • Solder member 12 comprises a metal alloy including a metal selected from the group consisting of bismuth, antimony, and gallium. Metals antimony, gallium, and bismuth are contractible during melting; that is, these undergo volume contraction or negative volume expansion on melting and tend to induce volume contraction on melting in alloys of which these may form a component of.
  • One metal which may be used as the other part of said alloy is tin.
  • tin- bismuth solder alloys having a bismuth composition of from about 40% by weight to about 98% by weight of the alloy the alloy undergoes volume contraction upon melting. This property of these metals and alloys is important when these metals/alloys are utilized as soldering alloys for solder member 12. Further advantages of electronic package 10 will be explained in greater detail below.
  • FIG. 2 illustrates electronic package 10 of FIG. 1 upon melting of solder member 12.
  • Solder member 12 contracts about 3% or less during melting and creates a void 16 between substantially cured dielectric material 14 and the solder member.
  • Dielectric material 14 completely surrounds solder member 12 during contraction. Portions of the dielectric material may engage the solder member during such contraction.
  • solder members having a composition as described above completely eliminates the major source of delaminating stress caused by solder volume increase during melting (solder assembly reflow or rework reflow processes) preventing failure of the physical connection between semiconductor chip 6 and substrate 2. Defect levels of the electronic package are therefore greatly reduced.
  • the support between substantially cured dielectric material 14 and solder member 12 reduces the stress in the solder member preventing stress related failure to the electrical coupling between substrate 2 and semiconductor chip 6. Fatigue life of solder member 12 is increased. Furthermore, the absence of any delaminations between dielectric material 14 and the surface of substrate 2 or the dielectric material and the surface of flip chip 6 will insure that there are no cracks initiated which could propagate along these surfaces and eventually fracture solder member 12 during operational thermal cycling. Reliability of the electronic package throughout operational field life is therefore greatly improved.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Wire Bonding (AREA)

Abstract

An electronic package is provided including a substrate, a device mounted on the substrate, and a solder member electrically coupling the device to the substrate. The package includes a dielectric material positioned substantially around the solder member which forms a physical connection between the substrate and the device. The volume of the solder member contracts during melting thereof to prevent failure of the physical connection and/or the electrical coupling between the substrate and the device.

Description

D E S C R I P T I O N
NEGATIVE VOLUME EXPANSION LEAD-FREE ELECTRICAL CONNECTION
FIELD OF THE INVENTION
The present invention relates to an electrical connection between conductors, more particularly to the electrical connection which is comprised of a material which has a negative volume expansion, upon melting and which is lead- free .
BACKGROUND OF THE INVENTION
Solders have been conventionally used for achieving electrical and mechanical joints between electronic devices and electronic parts. Solders containing tin and lead as major components have been generally used for this purpose. In addition, solders not containing lead, so called "lead-free solders", which typically contain tin as a major component and other metals such as silver and copper are being used in consideration of environmental concerns. In recent years, soldered electronic assemblies with electrical joints having satisfactory soldering characteristics have been produced using such lead-free solders. For example, U.S. Patent Number 5,730,932, issued on March 24, 1998 -and assigned to the IBM Corporation describes a lead-free solder alloy and microelectronics circuits soldered by the alloy. Another example, U.S. Patent Number 6,204,490 issued on March 20, 2001 and assigned to Hitachi, Ltd., describes a method of manufacturing an electronic circuit card on which components are mounted using a lead-free solder. Flip chip mounting is an increasingly popular technique for electrically connecting an electronic device, such as an semiconductor chip, to a substrate, such as a circuit board or a chip carrier. In a flip chip configuration, the active circuitry face of the chip is mounted face down or "flipped" onto the substrate. Conductive contact pads on the flip chip are aligned with corresponding conductive contact pads on the substrate, with the flip chip and substrate contact pads electrically connected by way of an electrically conductive material. The flip chip mounting technique eliminates the use of bond wires between a semiconductor chip and substrate, resulting in improved electrical performance.
A wide range of electrically conducting materials have been used for making the electrical connection between conductive contact pads of the flip chip and substrate, the most common of which being solder in the form of bumps . Other materials that have been used to make this connection are gold bumps, gold stud bumps, and electrically conducting polymer compositions .
Once a flip chip is bonded to a substrate, an underfill material is usually dispensed between the flip chip and the substrate. The underfill is typically provided as a liquid adhesive resin and can be dried, cured and/or polymerized. The underfill material provides enhanced mechanical adhesion and mechanical stability between the"substrate and the flip chip and inhibits environmental attack of the flip chip and substrate surfaces .
One type of flip chip bonding utilizes what is known as C4 connections (controlled-collapse chip connections) to electrically connect the substrate and the flip chip. C4 interconnections can be arranged in an area array rather than a peripheral array on the face of the flip chip. C4 connections are very small solder bumps formed on the flip chip conductive pads during the processing steps required to manufacture the flip chip module assembly. When the flip chip is placed on the substrate, the solder bumps are aligned with conductive contact pads on the substrate surface substantially arranged in a pattern identical to that of the solder bumps . During a reflow process, the solder bumps melt and wet the conductive pads. The surface tension of the liquid solder helps -align the flip chip properly on the substrate. Once the solder is cooled and solidifies, the flip chip is electrically, mechanically, and thermally connected to the substrate. At this point, an underfill material can be dispensed to encapsulate the electrical connections and substantially fill the space between the flip chip and the substrate. The underfill material is then cured to form a flip chip module. During subsequent assembly of the underfilled module to a circuit board or other carrier and during rework, the module can be heated to temperatures that may cause the electrical connections to undergo reflow (to melt) . Each reflow operation places stresses on the module, that can have a tendency to cause delamination in the module. Specifically, such delamination refers to delamination at or near the underfill to flip chip interface and/or delamination at or near the underfill to substrate interface. There are three sources of stress manifested during reflow processing which may lead to delamination in the module. These sources of stress are:
1. Coefficient of thermal expansion differences between the materials comprising the layered structure of the module including the flip chip, underfill, solder, and substrate. 2. Steam pressurization of any poorly bonded/adhered underfill interfaces (i.e., partially delaminated interfaces) in this layered region due to vaporization of latent moisture in the module.
3. The melting of the encapsulated solder electrical connection, and the solder volume increase associated with the melting process.
In modules having uniformly good adhesion of the underfill with the flip chip and substrate interfaces, the largest source of stress in the module is the melting of the solder electrical connection and specifically the solder volume increase associated with this melting process. Melting of most commonly used solders results in a volume increase of about 2 to about 4 percent. The volume increase of the solder electrical connection of C4 modules encapsulated by underfill occurs at the solder melting point and, subjects the layered flip chip-underfill-substrate module to large stresses. The molten solder is placed under a large hydrostatic stress by the constraining underfill. Immediately beneath the C4 connections, the stresses are compressive at the flip chip and substrate C4 connection pad interfaces . In the regions immediately adjacent to the C4 connections, the underfill interfaces at the flip chip and substrate are subjected to large delaminating tensile stresses "because the molten solder is undergoing an expansion, tending to push the flip chip upwards away from the underfill, while the underfill is expanding at a lesser rate. If the adhesion in these regions is insufficient to withstand the resulting large tensile stresses, delamination results. The present invention is directed at overcoming the problem associated with the stresses that occur from the solder volume increase associated with the melting process as set forth above. It is desirable to have an electronic package that substantially eliminates this stress. Electronic packages of this type will have lower defect levels and increased operational field life.
OBJECTS AND SUMMARY OF THE INVENTION
Accordingly it is the object of this invention to enhance the art of packaging technology.
It is another object of this invention to provide an electrical connection comprising a volume of solder between two conductors that is contractible during melting of the solder.
It is yet another object of this invention to provide an electronic package that provides an improved electrical coupling between a device and a substrate.
Still yet another object of this invention is to provide an electronic package that will be manufactured with relatively lower costs than many current products .
Still yet another object of this invention is to provide an electronic package having at least one solder member electrically coupling a device to a substrate and a dielectric material forming a physical connection between the device and substrate, the volume of the solder member contracting during melting thereof, thereby improving operational field life by preventing failure of the physical connection and/or the electrical connection between the substrate and the device.
According to one aspect of the invention, there is provided an electrical connection comprising a first conductor, a second conductor, and a volume of solder used to form the electrical connection between the first conductor and the second conductor wherein the volume of solder is contractible during melting thereof .
According to another aspect of the invention, there is provided an electronic package comprising a substrate, a device mounted on the substrate, at least one solder member electrically coupling the device to the substrate, and a dielectric material positioned substantially around the solder member and forming a physical connection between the substrate and the device, the volume of the solder member contracting during melting of the solder.
According to yet another aspect of the invention, there is provided an electronic package comprising a substrate, a device mounted on the substrate, at least one solder member electrically coupling the device to the substrate, and a dielectric material positioned substantially around the solder member and forming a physical connection between the substrate and the device, the volume of the solder member contracting during melting thereof to prevent failure of the physical connection or the electrical coupling between the substrate and the device .
The above objects, advantages, and features of the present invention will become more readily apparent from the following detailed description of the presently preferred embodiments as illustrated in the accompanying drawings .
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is an enlarged sectional view in elevation of one embodiment of the electronic package of the present invention illustrating a semiconductor device electrically coupled to a substrate by a plurality of solder members .
FIG. 2 is a view of the electronic package of FIG. 1 after heating the electronic package to a temperature above the melting point of the solder members .
BEST MODE FOR CARRYING OUT THE INVENTION
Referring to the drawings, FIG. 1 shows a much enlarged sectional view in elevation of the electronic package 10 of the present invention. Electronic package 10 includes a substrate 2 having a first conductor 4 positioned thereon, a device 6 mounted on the substrate, a second conductor 8 positioned on a surface of the device, and a volume of solder comprising a solder member 12 which forms an electrical connection between the first conductor and the second conductor. Solder member 12 can be one of a plurality of solder members. For example, the number of solder members can range from a few hundred to over one" thousand. A substantially cured dielectric material 14 is positioned substantially around solder member 12 and between first and second conductors, 4 and 8, respectively. Dielectric material 14 forms a physical connection between substrate 2 and device 6. The dielectric material 14 can be an organic encapsulating material, such as an epoxy or a cyanate ester and can include an inorganic filler material. Examples of filler material that can be used in this invention are silica and alumina. Some commercially available organic encapsulating materials that can be used in this invention are available from Loctite Corporation, Wappingers Falls, NY under the product names FP 4511 and FP 4549. Other examples of organic encapsulating materials that can be used in this invention are the products JM8806 and U8437-2, available from Ablestik Electronic Materials and Adhesives, Rancho Dominguez, CA and Namics Corporation, Niigata City , Japan, respectively.
Substrate 2 can be a printed wiring board, or a chip carrier (typically much smaller than a normal sized board) comprising a material selected from the group consisting of ceramics, epoxy resins, filled epoxy resins, liquid crystal polymers, thermoplastics, filled thermoplastics, polyimides, and polyesters. First conductor 4 can be a metal, for example, gold, copper, or aluminum or a conductive polymer composition, or combinations thereof. A layer of conventional solder paste (not shown) can be positioned on first conductor 4.
Device 6 may comprise a semiconductor chip, an optoelectronics assembly, a chip carrier, or a like structure. If the device is a chip, preferably the chip is positioned face down or in the flipped (flip chip) position as shown. The chip's second conductor 8 can be a metal such as aluminum or copper or alloys thereof and may have surface "finishes, such as nickel, nickel-aluminum, and/or palladium.
Solder member 12 comprises a metal alloy including a metal selected from the group consisting of bismuth, antimony, and gallium. Metals antimony, gallium, and bismuth are contractible during melting; that is, these undergo volume contraction or negative volume expansion on melting and tend to induce volume contraction on melting in alloys of which these may form a component of. One metal which may be used as the other part of said alloy is tin. For example, in tin- bismuth solder alloys having a bismuth composition of from about 40% by weight to about 98% by weight of the alloy, the alloy undergoes volume contraction upon melting. This property of these metals and alloys is important when these metals/alloys are utilized as soldering alloys for solder member 12. Further advantages of electronic package 10 will be explained in greater detail below.
FIG. 2 illustrates electronic package 10 of FIG. 1 upon melting of solder member 12. Solder member 12 contracts about 3% or less during melting and creates a void 16 between substantially cured dielectric material 14 and the solder member. Dielectric material 14 completely surrounds solder member 12 during contraction. Portions of the dielectric material may engage the solder member during such contraction. As previously described, upon melting most solders, those not having volume contraction properties, undergo a significant volume increase. Use of solder members having a composition as described above, completely eliminates the major source of delaminating stress caused by solder volume increase during melting (solder assembly reflow or rework reflow processes) preventing failure of the physical connection between semiconductor chip 6 and substrate 2. Defect levels of the electronic package are therefore greatly reduced. Failure of the physical connection between substrate 2 and device 6 can also lead to subsequent failure of the electrical coupling 12 either during reflow/rework processing or upon subsequent operational thermal cycling. Since the physical connection between substrate 2 and semiconductor chip 6 remains intact when using the contractible solder of this invention, the tendency for a crack between dielectric 14 and either the substrate or the semiconductor chip is substantially eliminated. After reflow processing is complete and electronic package 10 is cooled to a temperature below the melting point of solder member 12, the solder member returns to its original shape and form as shown in FIG. 1. The intact and adhered substantially cured dielectric material 14 can now provide full mechanical support to solder member 12 during operational thermal cycling. The support between substantially cured dielectric material 14 and solder member 12 reduces the stress in the solder member preventing stress related failure to the electrical coupling between substrate 2 and semiconductor chip 6. Fatigue life of solder member 12 is increased. Furthermore, the absence of any delaminations between dielectric material 14 and the surface of substrate 2 or the dielectric material and the surface of flip chip 6 will insure that there are no cracks initiated which could propagate along these surfaces and eventually fracture solder member 12 during operational thermal cycling. Reliability of the electronic package throughout operational field life is therefore greatly improved.

Claims

C L I M S
1. An electrical connection comprising:
a first conductor (4) ;
a second conductor (8) ; and
a volume of solder (12) used to form said electrical connection between said first conductor (4)
and said second conductor (8) , characterized in that said volume of solder is contractible during melting thereof.
2. The electrical connection of claim 1 wherein said solder is comprised of a metal selected from the group consisting of tin, bismuth, antimony, gallium, and alloys thereof .
3. The electrical connection of claim 2 wherein said bismuth metal comprises from about 40 weight percent to about 98 weight percent of said solder.
4. The electrical connection of claim 3 wherein said solder has a volume contraction of less than about 3%.
5. The electrical connection of claim 1 further including an organic encapsulating material positioned between said first and second conductors.
6. The electrical connection of claim 5 wherein said organic encapsulating material includes a filler.
7. The electrical connection of claim 5 wherein said organic encapsulating material engages said solder during contraction.
8. The electrical connection of claim 5 wherein said organic encapsulating material completely surrounds said solder during contraction.
9. An electronic package comprising:
a substrate (2);
a device (6) mounted on said substrate (2);
at least one solder member (12) of a solder electrically coupling said device (6) to said substrate (2) ; and
a dielectric material (14) positioned substantially around said at least one solder member (12) and forming a physical connection between said substrate (2) and said device (6) , characterized in that the volume of said at least one solder member (12) is contracting during melting of said solder.
10. The electronic package of claim 9 wherein said substrate is comprised of a material selected from the group consisting of ceramics, epoxy resins, filled epoxy resins, liquid crystal polymers, thermoplastics, filled thermoplastics, polyimides, and polyesters.
11. The electronic package of claim 9 wherein said device comprises a semiconductor chip, an optoelectronics assembly, or a chip carrier.
12. The electronic package of claim 9 wherein said at least one solder member is comprised of a metal selected from the group consisting of tin, bismuth, antimony, gallium, and alloys thereof.
13. The electronic package of claim 12 wherein said bismuth metal comprises from about 40 weight percent to about 98 weight percent of said solder member.
14. The electronic package of claim 13 wherein said solder member has a volume contraction of less than about 3%.
15. The electronic package of claim 9 wherein said dielectric material comprises an organic encapsulating material.
16. The electronic package of claim 15 wherein said organic encapsulating material includes a filler.
17. The electronic package of claim 15 wherein said organic encapsulating material engages said at least one solder member during contraction.
18. The electronic package of claim 15 wherein said organic encapsulating material completely surrounds said at least one solder member during contraction.
19. The electronic package of claim 9 wherein the volume of said at least one solder member contracts during melting thereof to prevent failure of said physical connection and/or said electrical coupling between said substrate and said device.
20. The electronic package of claim 19 wherein said at least one solder member is comprised of a metal selected from the group consisting of tin, bismuth, antimony, gallium, and alloys thereof.
21. The electronic package of claim 20 wherein said bismuth metal comprises from about 40 weight percent to about 98 weight percent of said solder member.
22. The electronic package of claim 21 wherein said solder member has a volume contraction of less than about 3%.
23. The electronic package of claim 19 wherein said dielectric material comprises an organic encapsulating material .
24. The electronic package of claim 19 wherein said organic encapsulating material includes a filler.
25. The electronic package of claim 23 wherein said organic encapsulating material engages said at least one solder member during contraction.
26. The electronic package of claim 23 wherein said organic encapsulating material completely surrounds said at least one solder member during contraction.
PCT/EP2003/007980 2002-08-09 2003-07-22 Negative volume expansion lead-free electrical connection Ceased WO2004018719A1 (en)

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US10/215,451 US6649833B1 (en) 2002-08-09 2002-08-09 Negative volume expansion lead-free electrical connection

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AU2003251438A1 (en) 2004-03-11

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