WO2004016820A3 - Thin film deposition apparatus - Google Patents

Thin film deposition apparatus Download PDF

Info

Publication number
WO2004016820A3
WO2004016820A3 PCT/GB2003/003526 GB0303526W WO2004016820A3 WO 2004016820 A3 WO2004016820 A3 WO 2004016820A3 GB 0303526 W GB0303526 W GB 0303526W WO 2004016820 A3 WO2004016820 A3 WO 2004016820A3
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
film deposition
deposition apparatus
radiation
support
Prior art date
Application number
PCT/GB2003/003526
Other languages
French (fr)
Other versions
WO2004016820A2 (en
Inventor
Christopher George
Michael Watson
Robert Knight
Brian Halsall
Timothy Jolly
Original Assignee
Oxford Instr Plasma Technology
Christopher George
Michael Watson
Robert Knight
Brian Halsall
Timothy Jolly
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oxford Instr Plasma Technology, Christopher George, Michael Watson, Robert Knight, Brian Halsall, Timothy Jolly filed Critical Oxford Instr Plasma Technology
Priority to AU2003251052A priority Critical patent/AU2003251052A1/en
Priority to DE60309900T priority patent/DE60309900T2/en
Priority to EP03787880A priority patent/EP1540032B1/en
Publication of WO2004016820A2 publication Critical patent/WO2004016820A2/en
Publication of WO2004016820A3 publication Critical patent/WO2004016820A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

Thin film deposition apparatus comprises a processing chamber (1) within which is mounted a movable substrate support (5). Monitoring apparatus has an aligned radiation emitter and radiation receiver (13, 15, 14, 16) mounted on the substrate support (5) and located in use on opposite sides of a substrate on the support, and a processing system (36) for monitoring radiation received by the radiation receiver.
PCT/GB2003/003526 2002-08-14 2003-08-13 Thin film deposition apparatus WO2004016820A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU2003251052A AU2003251052A1 (en) 2002-08-14 2003-08-13 Thin film deposition apparatus
DE60309900T DE60309900T2 (en) 2002-08-14 2003-08-13 DEVICE FOR DISPOSING THIN FILMS
EP03787880A EP1540032B1 (en) 2002-08-14 2003-08-13 Thin film deposition apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0218998.3A GB0218998D0 (en) 2002-08-14 2002-08-14 Thin film deposition apparatus
GB0218998.3 2002-08-14

Publications (2)

Publication Number Publication Date
WO2004016820A2 WO2004016820A2 (en) 2004-02-26
WO2004016820A3 true WO2004016820A3 (en) 2004-04-01

Family

ID=9942372

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2003/003526 WO2004016820A2 (en) 2002-08-14 2003-08-13 Thin film deposition apparatus

Country Status (6)

Country Link
EP (1) EP1540032B1 (en)
AT (1) ATE346178T1 (en)
AU (1) AU2003251052A1 (en)
DE (1) DE60309900T2 (en)
GB (1) GB0218998D0 (en)
WO (1) WO2004016820A2 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3400687A (en) * 1966-02-25 1968-09-10 Sylvania Electric Prod Film thickness monitoring apparatus
GB1179413A (en) * 1966-02-17 1970-01-28 Barr & Stroud Ltd Apparatus for Use in Vacuum Deposition of Thin Films
US3636917A (en) * 1970-06-29 1972-01-25 Optical Coating Laboratory Inc Optical-monitoring apparatus utilizing fiber optics
US4793908A (en) * 1986-12-29 1988-12-27 Rockwell International Corporation Multiple ion source method and apparatus for fabricating multilayer optical films
US5745240A (en) * 1994-05-11 1998-04-28 Essilor International Compagnie Generale D'optique Method and device for in situ stress measurement within a thin film upon its deposition on a substrate
EP1278042A1 (en) * 2001-07-18 2003-01-22 Alps Electric Co., Ltd. Method for forming optical thin films on substrate at high accuracy and apparatus therefor

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1179413A (en) * 1966-02-17 1970-01-28 Barr & Stroud Ltd Apparatus for Use in Vacuum Deposition of Thin Films
US3400687A (en) * 1966-02-25 1968-09-10 Sylvania Electric Prod Film thickness monitoring apparatus
US3636917A (en) * 1970-06-29 1972-01-25 Optical Coating Laboratory Inc Optical-monitoring apparatus utilizing fiber optics
US4793908A (en) * 1986-12-29 1988-12-27 Rockwell International Corporation Multiple ion source method and apparatus for fabricating multilayer optical films
US5745240A (en) * 1994-05-11 1998-04-28 Essilor International Compagnie Generale D'optique Method and device for in situ stress measurement within a thin film upon its deposition on a substrate
EP1278042A1 (en) * 2001-07-18 2003-01-22 Alps Electric Co., Ltd. Method for forming optical thin films on substrate at high accuracy and apparatus therefor

Also Published As

Publication number Publication date
DE60309900D1 (en) 2007-01-04
DE60309900T2 (en) 2007-10-25
WO2004016820A2 (en) 2004-02-26
ATE346178T1 (en) 2006-12-15
AU2003251052A8 (en) 2004-03-03
EP1540032B1 (en) 2006-11-22
GB0218998D0 (en) 2002-09-25
AU2003251052A1 (en) 2004-03-03
EP1540032A2 (en) 2005-06-15

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