WO2003097285A3 - Nanolithography molecular beam machine - Google Patents

Nanolithography molecular beam machine Download PDF

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Publication number
WO2003097285A3
WO2003097285A3 PCT/US2003/015496 US0315496W WO03097285A3 WO 2003097285 A3 WO2003097285 A3 WO 2003097285A3 US 0315496 W US0315496 W US 0315496W WO 03097285 A3 WO03097285 A3 WO 03097285A3
Authority
WO
WIPO (PCT)
Prior art keywords
travel
nanolithography
molecular beam
neutral molecules
beam machine
Prior art date
Application number
PCT/US2003/015496
Other languages
French (fr)
Other versions
WO2003097285A2 (en
Inventor
Robert J Gordon
Langchi Zhu
Andreas Schroeder
Tamar Seideman
Original Assignee
Univ Illinois
Ca Nat Research Council
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Illinois, Ca Nat Research Council filed Critical Univ Illinois
Priority to AU2003243248A priority Critical patent/AU2003243248A1/en
Publication of WO2003097285A2 publication Critical patent/WO2003097285A2/en
Publication of WO2003097285A3 publication Critical patent/WO2003097285A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2065—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam using corpuscular radiation other than electron beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31752—Lithography using particular beams or near-field effects, e.g. STM-like techniques

Abstract

A method of directly writing on a surface of a substrate with neutral molecules uses a collimated beam of neutral molecules having a first direction of travel, a laser light energy field having a second direction of travel; and intersects the laser light energy field with the collimated beam of neutral molecules at a grazing angle of incidence between the first direction of travel and the second direction of travel to control the formation of features comprising the neutral molecules on the surface of the substrate.
PCT/US2003/015496 2002-05-15 2003-05-14 Nanolithography molecular beam machine WO2003097285A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003243248A AU2003243248A1 (en) 2002-05-15 2003-05-14 Nanolithography molecular beam machine

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US38075402P 2002-05-15 2002-05-15
US60/380,754 2002-05-15
US43813303P 2003-01-06 2003-01-06
US60/438,133 2003-01-06

Publications (2)

Publication Number Publication Date
WO2003097285A2 WO2003097285A2 (en) 2003-11-27
WO2003097285A3 true WO2003097285A3 (en) 2004-06-24

Family

ID=29553510

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/015496 WO2003097285A2 (en) 2002-05-15 2003-05-14 Nanolithography molecular beam machine

Country Status (2)

Country Link
AU (1) AU2003243248A1 (en)
WO (1) WO2003097285A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MX2009008090A (en) 2007-02-01 2009-08-12 Dsm Ip Assets Bv METHOD FOR PRODUCING CAKE WITH PHOSPHOLIPASE A.

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5360764A (en) * 1993-02-16 1994-11-01 The United States Of America, As Represented By The Secretary Of Commerce Method of fabricating laser controlled nanolithography
US6183817B1 (en) * 1997-05-29 2001-02-06 Michael S. Gersonde Method and apparatus for direct write fabrication of nanostructures
US6548124B1 (en) * 2000-03-20 2003-04-15 Paul Brumer Nanometric scale coherently controlled molecular deposition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5360764A (en) * 1993-02-16 1994-11-01 The United States Of America, As Represented By The Secretary Of Commerce Method of fabricating laser controlled nanolithography
US6183817B1 (en) * 1997-05-29 2001-02-06 Michael S. Gersonde Method and apparatus for direct write fabrication of nanostructures
US6548124B1 (en) * 2000-03-20 2003-04-15 Paul Brumer Nanometric scale coherently controlled molecular deposition

Also Published As

Publication number Publication date
WO2003097285A2 (en) 2003-11-27
AU2003243248A1 (en) 2003-12-02
AU2003243248A8 (en) 2003-12-02

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