WO2003027769A3 - Method for producing a two-dimensional photomask - Google Patents

Method for producing a two-dimensional photomask Download PDF

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Publication number
WO2003027769A3
WO2003027769A3 PCT/EP2002/010610 EP0210610W WO03027769A3 WO 2003027769 A3 WO2003027769 A3 WO 2003027769A3 EP 0210610 W EP0210610 W EP 0210610W WO 03027769 A3 WO03027769 A3 WO 03027769A3
Authority
WO
WIPO (PCT)
Prior art keywords
photomask
image
mask elements
target
distribution
Prior art date
Application number
PCT/EP2002/010610
Other languages
German (de)
French (fr)
Other versions
WO2003027769A2 (en
Inventor
Joern Hopf
Original Assignee
Joern Hopf
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Joern Hopf filed Critical Joern Hopf
Priority to AU2002342731A priority Critical patent/AU2002342731A1/en
Publication of WO2003027769A2 publication Critical patent/WO2003027769A2/en
Publication of WO2003027769A3 publication Critical patent/WO2003027769A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

The invention relates to a method for producing a two-dimensional photomask. Said photomask comprises a plurality of transparent zones with one or more mask elements each that are disposed in such a manner that, when a target is exposed through the photomask, an exposure image is produced on the target, said image being adapted to a defined halftone image. The number, geometry and/or positions of the mask elements are determined by means of an evolutionary selection procedure that comprises a multitude of mutation steps. Starting from an initial distribution of mask elements a distribution of mask elements is successively produced, until a termination criterion is fulfilled, by using an operator that is selected from a group of statistical operators. For every actual distribution, the respective exposure image is determined that would result from the exposure of the target through a photomask with the actual distribution. The termination criterion is fulfilled when an approximative quality that is characteristic for the adaptation of the exposure image to the halftone image, reaches a threshold value or does not improve over a number of mutation steps.
PCT/EP2002/010610 2001-09-21 2002-09-20 Method for producing a two-dimensional photomask WO2003027769A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002342731A AU2002342731A1 (en) 2001-09-21 2002-09-20 Method for producing a two-dimensional photomask

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10146619A DE10146619C2 (en) 2001-09-21 2001-09-21 Process for the generation of a two-dimensional photomask
DE10146619.6 2001-09-21

Publications (2)

Publication Number Publication Date
WO2003027769A2 WO2003027769A2 (en) 2003-04-03
WO2003027769A3 true WO2003027769A3 (en) 2003-11-27

Family

ID=7699833

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/010610 WO2003027769A2 (en) 2001-09-21 2002-09-20 Method for producing a two-dimensional photomask

Country Status (3)

Country Link
AU (1) AU2002342731A1 (en)
DE (1) DE10146619C2 (en)
WO (1) WO2003027769A2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2277998A (en) * 1993-05-13 1994-11-16 Marconi Gec Ltd Mask and apparatus for producing microlenses

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6071652A (en) * 1997-03-21 2000-06-06 Digital Optics Corporation Fabricating optical elements using a photoresist formed from contact printing of a gray level mask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2277998A (en) * 1993-05-13 1994-11-16 Marconi Gec Ltd Mask and apparatus for producing microlenses

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
YAO J ET AL: "Coding Gray-tone Mask for Refractive Microlens Fabrication", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 53, no. 1-4, June 2000 (2000-06-01), pages 531 - 534, XP004237828, ISSN: 0167-9317 *

Also Published As

Publication number Publication date
WO2003027769A2 (en) 2003-04-03
DE10146619C2 (en) 2003-11-20
DE10146619A1 (en) 2003-04-17
AU2002342731A1 (en) 2003-04-07

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