WO2003021577A2 - Narrow write head pole tip fabricated by sidewall processing - Google Patents
Narrow write head pole tip fabricated by sidewall processing Download PDFInfo
- Publication number
- WO2003021577A2 WO2003021577A2 PCT/EP2002/008826 EP0208826W WO03021577A2 WO 2003021577 A2 WO2003021577 A2 WO 2003021577A2 EP 0208826 W EP0208826 W EP 0208826W WO 03021577 A2 WO03021577 A2 WO 03021577A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pole tip
- seed layer
- approximately
- fabricated
- thickness
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/147—Structure or manufacture of heads, e.g. inductive with cores being composed of metal sheets, i.e. laminated cores with cores composed of isolated magnetic layers, e.g. sheets
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/012—Recording on, or reproducing or erasing from, magnetic disks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49044—Plural magnetic deposition layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/4906—Providing winding
Definitions
- the present invention relates generally to the fabrication of magnetic heads, and more particularly to the fabrication of a narrow second pole section (P2) for such magnetic heads .
- Hard disk drives include one or more magnetic disks upon which data is written by magnetic heads.
- the ongoing efforts to increase the amount of data stored on the disk necessarily focuses on increasing the areal data storage density of the disk; that is, the number of data bits that are stored within a given area of disk surface.
- one way to increase the areal data storage density of a hard disk 12 is to increase the number of tracks per inch (TPI) that are written onto the disk surface.
- TPI tracks per inch
- the standard P2 pole tip fabrication process involves the use of photolithographic techniques to create a narrow P2 pole tip trench, followed by the plating up of the P2 pole tip from the bottom of the trench to its top. In this photolithographic fabrication process, the width of the P2 pole tip corresponds to the width of the P2 pole tip trench.
- the magnetic head of the hard disk drive of the present invention includes a P2 pole tip that is fabricated utilizing photolithographic and electroplating techniques in which the P2 pole tip material is electroplated upon a sidewall of the P2 pole tip photolithographic trench.
- a block of material is deposited upon a write gap layer, such that a generally straight, vertical sidewall of the block of material is disposed at the P2 pole tip location.
- an electroplating seed layer is deposited upon the sidewall.
- a P2 pole tip trench is fabricated such that the sidewall (with its deposited seed layer) is exposed within the P2 pole tip trench. Thereafter, the P2 pole tip is formed by electroplating pole tip material upon the seed layer.
- the P2 pole tip is fabricated by electroplating material outward from the sidewall within the trench, rather than from the bottom of the trench as is known in the prior art.
- the width of the P2 pole tip is determined by the quantity of pole tip material that is deposited upon the sidewall, rather than by the width of the P2 pole tip trench.
- an induction coil is fabricated utilizing standard photolithographic techniques and a third pole section (P3) is fabricated over the induction coil in magnetic interconnection with the P2 pole tip.
- the P2 pole tip of the present invention therefore includes a side portion that is composed of the seed layer that was deposited upon the sidewall of the block of material, and a second portion that is composed of the pole tip material that was electroplated onto the seed layer.
- the width of the P2 pole tip is therefore determined by electroplating parameters, rather than by the width of the photolithographic P2 pole tip trench in which the P2 pole tip is fabricated.
- the hard disk drive of the present invention includes magnetic hard disks having an increase areal data storage density.
- the hard disk drive of the present invention includes a magnetic head of the present invention that includes a narrow P2 pole tip for writing narrow data tracks to a magnetic hard disk. It is an advantage of the method for fabricating a magnetic head of the present invention that a high aspect ratio P2 pole tip is more easily fabricated.
- Fig. 1 is a top plan view depicting a hard disk drive of the present invention including a magnetic head of the present invention there within;
- Fig. 2 is a top plan view of a portion of a wafer substrate depicting a first step in the fabrication of the magnetic head of the present invention
- Fig. 3 is a side cross-sectional view of the device depicted in Fig. 2, taken along lines 3-3 of Fig. 2 ;
- Fig. 4 is a top plan view of a further step in fabricating the magnetic head of the present invention.
- Fig. 5 is a side cross-sectional view of the fabrication step depicted in Fig. 4, generally taken along lines 5-5 of Fig. 4;
- Fig. 6 is a top plan view depicting a further fabrication step of the magnetic head of the present invention.
- Fig. 7 is a side elevational view of the fabrication step depicted in Fig. 6 taken along lines 7-7 of Fig. 6;
- Fig. 8 is a top plan view of a further fabrication step of the magnetic head of the present invention
- Fig. 9 is a side cross-sectional view of the fabrication step depicted in Fig. 8 taken along lines 9-9 of Fig. 8;
- Fig. 10 is a top plan view of a further fabrication step of the magnetic head of the present invention.
- Fig. 11 is a side cross-sectional view of the fabrication step depicted in Fig. 10 taken along lines 11-11 of Fig. 10;
- Fig. 12 is a top plan view of another fabrication step of the magnetic head of the present invention.
- Fig. 13 is a side cross-sectional view of the fabrication step depicted in Fig. 12, taken along lines 13-13 of Fig. 12;
- Fig. 14 is a side cross-sectional view depicting a further fabrication step of the magnetic head of the present invention taken along lines 13-13 of Fig. 12;
- Fig. 15 is a side cross-sectional view depicting still a further fabrication step of the magnetic head of the present invention taken along lines 13-13 of Fig. 12;
- Fig. 16 is a side cross-sectional view depicting yet another fabrication step of the magnetic head of the present invention taken along lines 13-13 of Fig. 12.
- Fig. 1 is a top plan view that depicts significant components of a hard disk drive which includes the magnetic head of the present invention.
- the hard disk drive 10 includes a magnetic media hard disk 12 that is rotatably mounted upon a motorized spindle 14.
- An actuator arm 16 is pivotally mounted within the hard disk drive 10 with a magnetic head 20 of the present invention disposed upon a distal end 22 of the actuator arm 16.
- a typical hard disk drive 10 may include a plurality of disks that are rotatably mounted upon the spindle 14 and a plurality of actuator arms 16 having a magnetic head 20 mounted upon the distal end 22 of the actuator arms.
- the hard disk 12 rotates upon the spindle 14 and the magnetic head 20 acts as an air bearing slider that is adapted for flying above the surface of the rotating disk.
- the slider includes a substrate base upon which the various structures that form the magnetic head are fabricated. Such heads are fabricated in large quantities upon a wafer substrate and subsequently sliced into discrete magnetic heads 20.
- typical magnetic head fabrication steps generally include the deposition and patterning of various thin film layers to fabricate a read head, followed by the further deposition and patterning of various thin film layers upon the read head to fabricate a write head.
- the present invention relates to the fabrication of a write head, and therefore a magnetic head of the present invention may include most, if not all, of the various read head configurations as are generally known to those skilled in the art.
- a detailed description of the fabrication process of the present invention can commence at a point in the magnetic head fabrication process that a read head element has been fabricated upon a wafer substrate, followed by the fabrication of a Pi magnetic pole and a write gap layer.
- Such structures are well known to those skilled in the art, and a detailed description thereof is not required to present a detailed description of the present invention.
- Figs. 2 and 3 depict first steps in the fabrication of a P2 pole tip of the magnetic head 20 of the present invention, wherein Fig. 2 is a top plan view and Fig. 3 is a side cross- sectional view taken along lines 3-3 of Fig. 2.
- the fabrication process of a magnetic head upon a wafer substrate surface has been conducted to the point of the fabrication of a first pole (Pi) 30 upon an insulation layer (not shown) followed by the deposition of a write gap layer 34 upon the PI pole 30.
- the fabrication of magnetic heads to this point is well known to those skilled in the art.
- a block of nonconductive material 40 is fabricated upon the write gap layer.
- the block of material 40 can be fabricated in a variety of ways, such as by depositing a photoresist and photolithographically patterning and removing portions of the photoresist such that the block of material remains.
- the significant features of the block of material are that its height h should correspond to the height of the desired P2 pole tip, that its thickness t corresponds to the desired thickness of the P2 pole tip, that the block 40 be positioned such that its sidewall 44 be accurately located above the Pi pole at the desired location of the P2 pole tip, and that the sidewall 44 be smooth and vertical.
- a seed layer 50 for the electroplating of the P2 pole tip is deposited across the surface of the wafer, significantly including a seed layer portion 54 that is deposited to cover the sidewall 44.
- the seed layer 50 is preferably composed of the same material as the pole tip, such as NiFe, and is deposited using a typical sputter deposition technique.
- FIG. 4 is a top plan view and Fig. 5 is a side cross-sectional view taken along lines 5-5 of Fig. 4.
- a photoresist layer 60 is deposited on top of the seed layer 50 and across the surface of the wafer.
- a P2 pole tip trench 64 is photolithographically formed in the photoresist layer 60.
- the P2 pole tip trench is located to expose the seed layer 54 deposited upon the sidewall 44.
- the width r of the P2 pole tip trench 64 is chosen to be sufficiently wide to allow unimpeded electroplating of the P2 pole tip within the trench 64 as is next described with the aid of Figs. 6 and 7, wherein Fig. 6 is a top plan view of the electroplating step and Fig. 7 is a side cross-sectional view taken along lines 7- 7 of Fig. 6.
- the P2 pole tip material 70 is next electroplated onto the exposed seed layer 50 utilizing standard electroplating techniques as are known to those skilled in the art. It is significant that the P2 pole tip material 70 is electroplated outward from the seed layer portion 54 deposited upon the sidewall 44. That is, the critical width dimension of the P2 pole tip is now determined by the electroplating parameters related to the thickness of the electroplated layer as is further described hereinbelow. Thus the width of the P2 pole tip is not determined by the width of the P2 pole tip trench, as is done in the prior art. As a result, the prior art problems associated with limits upon the aspect ratio of the P2 pole tip trench in the photolithographic process are no longer significant.
- Fig. 8 is a top plan view depicting the device following photoresist removal
- Fig. 9 is a side cross-sectional view taken along lines 9-9 of Fig. 8 that likewise depicts the device following the removal of the photoresist.
- the seed layer 50 is removed preferably utilizing an ion beam milling step, typically utilizing argon, as is known to those skilled in the art.
- Fig. 10 is a top plan view of the device following the removal of the seed layer and Fig. 11 is a side cross-sectional view taken along lines 11-11 of Fig.
- the ion milling step is conducted for a sufficient time period to remove the upper, overlaid portion 74 of the electroplated pole tip material and the lower overlaid portion 78 of the P2 pole tip material, such that the remaining portion of the P2 pole tip 80 includes portions of the seed layer 54 deposited upon the sidewall 44 and the P2 pole tip material 88 that has been electroplated onto the seed layer 54.
- the resist block 40 is removed in a further wet chemical process, such that only the P2 pole tip structure 80 remains on the write gap surface 34.
- the width W of the P2 pole tip 80 is comprised of the thickness of the seed layer 54 deposited upon the sidewall 44 plus the thickness of the pole tip material 88 electroplated onto the sidewall seed layer 54. Furthermore, as indicated above, the width W of the P2 pole tip has been determined in the electroplating process by selection of appropriate electroplating process parameters rather than by the width of the P2 pole tip plating trench 64.
- a PI notching process can now be advantageously conducted.
- a patterned ion etching mask is fabricated upon the wafer substrate such that the P2 pole tip 80 and portions of the write gap layer adjacent thereto are exposed to an ion milling beam.
- the ion milling is conducted to remove portions of the write gap layer 34 adjacent to the P2 pole tip 80 and to mill a notch 92 into the Pi pole 30.
- PI pole notching advantageously reduces side writing effects of a magnetic head. Where PI pole notching is not desired, the block of material 40 can be allowed to remain on the write gap layer 34 to support the P2 pole tip 80, and the fabrication of the induction coil (as is next described) can be commenced.
- Figs. 12 through 16 further fabrication steps, as are known to those skilled in the art, are next conducted to complete the fabrication of the magnetic head.
- Figs. 12 and 13 wherein Fig. 12 is a top plan view of the head, and Fig. 13 is a side cross- sectional view taken along lines 13 - 13 of Fig. 12, an induction coil is fabricated upon the wafer surface by photolithographic techniques to create an induction coil trench 100 within an insulation layer 104, followed by electroplating techniques to electroplate the induction coil 108, typically composed of copper, into the induction coil trench 100. Therefore, as depicted in Fig. 12, the induction coil trench is located immediately above the previously fabricated P2 pole tip 80.
- the induction coil can be fabricated utilizing a suitable dielectric material layer and a reactive ion etching process to create the induction coil trench, followed by the electroplating of the induction coil there within.
- a chemical mechanical polishing (CMP) step is conducted to remove any excess induction coil material and to achieve a planar surface 112 upon the wafer.
- CMP chemical mechanical polishing
- a patterned insulation layer 116 is deposited on top of the induction coil.
- the insulation layer 116 is not deposited upon the top surface of the P2 pole tip 80.
- a further magnetic pole piece 120 (sometimes referred to as a P2 pole yoke or a P3 pole) is fabricated upon the surface of the insulation layer and in magnetic connection with the P2 pole tip 80.
- the P3 pole 120 is preferably fabricated utilizing photolithographic techniques and electroplating techniques as are well known to those skilled in the art.
- the P3 pole is preferably fabricated upon the P2 pole tip, such that a gap 124 is provided between the end surface 128 of the P3 pole and the end surface 132 of the P2 pole tip 80.
- the air bearing surface (ABS) 148 is then fabricated, such that the gap 124 remains. Thereafter, further magnetic head fabrication steps are conducted, as are well known to those skilled in the art, and encapsulation layer 140 is ultimately fabricated upon the device. Further fabrication steps as are well known to those skilled in the art are then undertaken to complete the fabrication of the magnetic head 20 of the present invention.
- the width W of the P2 pole tip 80 is determined in the electroplating process steps by the deposition of P2 pole tip material 88 upon the sidewall seed layer 54.
- a P2 pole tip 80 is fabricated wherein the width W is determined by the thickness of the sidewall seed layer 54 plus the thickness of the electroplated material 88 layer thereon.
- a P2 pole tip 80 of the present invention may be fabricated wherein the sidewall seed layer thickness is approximately 50 A to 500 A and the electroplated material thickness is approximately 100 A to 5000 A, such that the P2 pole tip width W is approximately 150 A to 5500 A.
- the seed layer thickness is approximately 250 A and the electroplated material thickness is approximately 1500 A, such that the width W of the P2 pole tip is approximately 1750 A.
- the thickness dimension t of the P2 pole tip 80 is controlled by the thickness t of the deposited sidewall, less material removed from the top of the P2 pole tip during PI pole notching, if conducted.
- the width W of the P2 pole tip 80 of the present invention is now within the control of the magnetic head electroplating step, and not controlled by the photolithographic aspect ratio problems encountered in the prior art.
- the prior art P2 pole tip fabrication problems associated with the aspect ratio of the photolithographically created P2 pole tip trench are overcome.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02797571A EP1438714B1 (en) | 2001-08-31 | 2002-08-07 | Narrow write head pole tip fabricated by sidewall processing |
DE60216954T DE60216954T2 (en) | 2001-08-31 | 2002-08-07 | POLE TIP MADE BY SIDE WALL PROCESSING FOR A NARROW WRITING HEAD |
JP2003525840A JP2005502151A (en) | 2001-08-31 | 2002-08-07 | Narrow write head pole tip formed by sidewall processing |
AU2002333361A AU2002333361A1 (en) | 2001-08-31 | 2002-08-07 | Narrow write head pole tip fabricated by sidewall processing |
KR10-2003-7017209A KR100537576B1 (en) | 2001-08-31 | 2002-08-07 | Narrow write head pole tip fabricated by sidewall processing |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/944,648 | 2001-08-31 | ||
US09/944,648 US7199972B2 (en) | 2001-08-31 | 2001-08-31 | Narrow write head pole tip fabricated by sidewall processing |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003021577A2 true WO2003021577A2 (en) | 2003-03-13 |
WO2003021577A3 WO2003021577A3 (en) | 2003-09-25 |
Family
ID=25481804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/008826 WO2003021577A2 (en) | 2001-08-31 | 2002-08-07 | Narrow write head pole tip fabricated by sidewall processing |
Country Status (8)
Country | Link |
---|---|
US (2) | US7199972B2 (en) |
EP (1) | EP1438714B1 (en) |
JP (1) | JP2005502151A (en) |
KR (1) | KR100537576B1 (en) |
CN (1) | CN1272769C (en) |
AU (1) | AU2002333361A1 (en) |
DE (1) | DE60216954T2 (en) |
WO (1) | WO2003021577A2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003045539A (en) * | 2001-05-22 | 2003-02-14 | Enplas Corp | Contact pin and socket for electrical component |
US7587810B2 (en) * | 2004-04-30 | 2009-09-15 | Hitachi Global Storage Technologies Netherlands B.V. | High milling resistance write pole fabrication method for perpendicular recording |
US7254884B2 (en) * | 2004-09-20 | 2007-08-14 | Hitachi Global Storage Technologies Netherlands B.V. | Method for fabricating a pole tip in a magnetic transducer using feed-forward and feedback |
US7363698B2 (en) * | 2004-09-30 | 2008-04-29 | Hitachi Gobal Storage Technologies Inc. | Process for creating a write head by forming a bump after the top pole is formed |
US7395595B2 (en) * | 2005-04-19 | 2008-07-08 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing P3 layer of a perpendicular magnetic write head |
US7536774B2 (en) * | 2006-04-07 | 2009-05-26 | Hitachi Global Storage Technologies B.V. | Method and apparatus for integrating a stair notch and a gap bump at a pole tip in a write head |
US7791834B2 (en) * | 2006-08-14 | 2010-09-07 | International Business Machines Corporation | Magnetic head having a ratio of back gap width to front gap width in about a defined range |
US7910011B2 (en) * | 2008-05-28 | 2011-03-22 | Headway Technologies, Inc. | Method of manufacturing magnetic head for perpendicular magnetic recording |
US10973908B1 (en) | 2020-05-14 | 2021-04-13 | David Gordon Bermudes | Expression of SARS-CoV-2 spike protein receptor binding domain in attenuated salmonella as a vaccine |
Citations (4)
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US5652687A (en) * | 1994-04-19 | 1997-07-29 | International Business Machines Corporation | Planarized thin film magnetic write head with submicron trackwidth |
JP2000207709A (en) * | 1999-01-13 | 2000-07-28 | Read Rite Smi Kk | Manufacture of thin film magnetic head |
JP2001023117A (en) * | 1999-07-07 | 2001-01-26 | Nec Corp | Magnetoresistance effect composite head, magnetic memory device employing the same, and manufacture of magnetoresistance effect composite head |
JP2002175606A (en) * | 2000-12-06 | 2002-06-21 | Hitachi Ltd | Thin film magnetic head and manufacturing method thereof, and magnetic disk unit |
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JPS5778613A (en) | 1980-10-30 | 1982-05-17 | Canon Inc | Thin film magnetic head and its manufacture |
JP2656064B2 (en) | 1988-04-18 | 1997-09-24 | ティーディーケイ株式会社 | Method for manufacturing thin-film magnetic head |
JPH03228210A (en) | 1990-02-01 | 1991-10-09 | Fujitsu Ltd | Production of perpendicular magnetic thin-film head |
US5285340A (en) | 1992-02-28 | 1994-02-08 | International Business Machines Corporation | Thin film magnetic head with conformable pole tips |
US5282308A (en) | 1992-12-29 | 1994-02-01 | International Business Machines Corporation | Thin film planarization process for fabricating magnetic heads employing a stitched pole structure |
JPH08329418A (en) * | 1995-06-02 | 1996-12-13 | Read Rite S M I Kk | Production of thin film magnetic head |
JPH09293209A (en) * | 1996-04-26 | 1997-11-11 | Fujitsu Ltd | Thin film magnetic head and magnetic recorder and production of thin film magnetic head |
US5805391A (en) | 1996-10-28 | 1998-09-08 | International Business Machines Corporation | Write head with recessed stitched yoke on a planar portion of an insulation layer defining zero throat height |
US5875542A (en) * | 1997-04-18 | 1999-03-02 | Read-Rite Corporation | Method of making thin film merged magnetoresistive heads |
JPH117608A (en) * | 1997-04-25 | 1999-01-12 | Fujitsu Ltd | Magnetic head and its manufacture |
US6069775A (en) * | 1997-12-22 | 2000-05-30 | International Business Machines Corporation | Inverted merged MR head with precise track width |
US6043960A (en) | 1997-12-22 | 2000-03-28 | International Business Machines Corporation | Inverted merged MR head with track width defining first pole tip component constructed on a side wall |
JP3782228B2 (en) * | 1998-02-27 | 2006-06-07 | Tdk株式会社 | Composite thin film magnetic head and method for manufacturing the same |
JP3526787B2 (en) * | 1999-06-25 | 2004-05-17 | Tdk株式会社 | Thin film magnetic head and method of manufacturing the same |
JP2001034911A (en) * | 1999-07-16 | 2001-02-09 | Tdk Corp | Thin film magnetic head and fabrication method thereof |
JP3747135B2 (en) * | 1999-08-06 | 2006-02-22 | アルプス電気株式会社 | Thin film magnetic head and manufacturing method thereof |
JP3473684B2 (en) * | 1999-11-08 | 2003-12-08 | 日本電気株式会社 | Magnetic head, method of manufacturing the same, and magnetic recording / reproducing apparatus using the same |
JP2001195708A (en) * | 2000-01-07 | 2001-07-19 | Tdk Corp | Thin-film magnetic head and method for manufacturing the same |
-
2001
- 2001-08-31 US US09/944,648 patent/US7199972B2/en not_active Expired - Fee Related
-
2002
- 2002-08-07 EP EP02797571A patent/EP1438714B1/en not_active Expired - Lifetime
- 2002-08-07 JP JP2003525840A patent/JP2005502151A/en active Pending
- 2002-08-07 KR KR10-2003-7017209A patent/KR100537576B1/en not_active IP Right Cessation
- 2002-08-07 DE DE60216954T patent/DE60216954T2/en not_active Expired - Fee Related
- 2002-08-07 CN CNB028169956A patent/CN1272769C/en not_active Expired - Fee Related
- 2002-08-07 WO PCT/EP2002/008826 patent/WO2003021577A2/en active IP Right Grant
- 2002-08-07 AU AU2002333361A patent/AU2002333361A1/en not_active Abandoned
-
2003
- 2003-06-30 US US10/610,970 patent/US7127800B2/en not_active Expired - Fee Related
Patent Citations (4)
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US5652687A (en) * | 1994-04-19 | 1997-07-29 | International Business Machines Corporation | Planarized thin film magnetic write head with submicron trackwidth |
JP2000207709A (en) * | 1999-01-13 | 2000-07-28 | Read Rite Smi Kk | Manufacture of thin film magnetic head |
JP2001023117A (en) * | 1999-07-07 | 2001-01-26 | Nec Corp | Magnetoresistance effect composite head, magnetic memory device employing the same, and manufacture of magnetoresistance effect composite head |
JP2002175606A (en) * | 2000-12-06 | 2002-06-21 | Hitachi Ltd | Thin film magnetic head and manufacturing method thereof, and magnetic disk unit |
Non-Patent Citations (2)
Title |
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PATENT ABSTRACTS OF JAPAN vol. 2000, no. 10, 17 November 2000 (2000-11-17) -& JP 2000 207709 A (READ RITE SMI KK), 28 July 2000 (2000-07-28) * |
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 16, 8 May 2001 (2001-05-08) & JP 2001 023117 A (NEC CORP), 26 January 2001 (2001-01-26) * |
Also Published As
Publication number | Publication date |
---|---|
US7127800B2 (en) | 2006-10-31 |
US7199972B2 (en) | 2007-04-03 |
US20040001282A1 (en) | 2004-01-01 |
KR20040028801A (en) | 2004-04-03 |
WO2003021577A3 (en) | 2003-09-25 |
CN1630897A (en) | 2005-06-22 |
AU2002333361A1 (en) | 2003-03-18 |
EP1438714B1 (en) | 2006-12-20 |
DE60216954T2 (en) | 2007-10-18 |
JP2005502151A (en) | 2005-01-20 |
KR100537576B1 (en) | 2005-12-20 |
DE60216954D1 (en) | 2007-02-01 |
CN1272769C (en) | 2006-08-30 |
EP1438714A2 (en) | 2004-07-21 |
US20030043504A1 (en) | 2003-03-06 |
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