WO2003008098A1 - Apparatus for, and method of, treating substrates for catalytic converters - Google Patents

Apparatus for, and method of, treating substrates for catalytic converters Download PDF

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Publication number
WO2003008098A1
WO2003008098A1 PCT/ZA2002/000117 ZA0200117W WO03008098A1 WO 2003008098 A1 WO2003008098 A1 WO 2003008098A1 ZA 0200117 W ZA0200117 W ZA 0200117W WO 03008098 A1 WO03008098 A1 WO 03008098A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
chamber
substrates
partition
air
Prior art date
Application number
PCT/ZA2002/000117
Other languages
French (fr)
Inventor
Ralph Jazzar Raad
Original Assignee
Ralph Jazzar Raad
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ralph Jazzar Raad filed Critical Ralph Jazzar Raad
Publication of WO2003008098A1 publication Critical patent/WO2003008098A1/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/08—Heat treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/50—Catalysts, in general, characterised by their form or physical properties characterised by their shape or configuration
    • B01J35/56—Foraminous structures having flow-through passages or channels, e.g. grids or three-dimensional monoliths
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0215—Coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0236—Drying, e.g. preparing a suspension, adding a soluble salt and drying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/22—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes

Definitions

  • THIS INVENTION relates to apparatus for, and a method of, treating
  • Substrate is a term used for the ceramic multi-passaged structure which
  • the passages in the substrate are coated with
  • the noble metal is applied to the passages as a suspension. Normally
  • the suspension is initially forced in from one end of the substrate.
  • the substrate is then
  • the substrate then has suspension forced in from the other end.
  • the treatment steps are achieved by exposing one end of the substrate to a source of
  • substrate as used herein covers bodies of the form described
  • the present invention seeks to provide an improved apparatus for and
  • the method can further include the step of heating the air before it is
  • apparatus for treating a substrate which comprises means defining a lower plenum
  • partition forming the top wall of said chamber, an opening in said top wall, and a
  • Said partition can be a tray with one or more openings in it, the tray being
  • substrates are placed on said part and through a zone constituted by said two
  • form said part is a horizontal table which is rotatable about a central vertical axis
  • Each tray can comprise a resilient element which bounds said opening
  • Figure 1 is a front elevation of apparatus for treating substrates
  • Figure 2 is a side elevation of the apparatus of Figure 1;
  • Figure 3 is a top plan view
  • Figure 4 is a section through the apparatus, the section being on the line A-A of
  • Figure 5 is a section on the line B-B of Figure 1 ;
  • Figure 6 is a section on the line C-C of Figure 1 ;
  • Figures 7 and 8 are sections illustrating the mounting of the outer periphery of a
  • Figure 9 is a top plan view of the rotatable table
  • Figure 10 is a section on the line D-D of Figure 9;
  • Figure 11 is a section on the line E-E of Figure 10, the section being below the
  • Figure 12 is a top plan view of an upper disc of the table
  • Figure 13 is a section through the upper disc
  • Figure 14 is a top plan view of a lower disc of the table
  • Figure 15 is a section through the lower disc
  • Figure 16 is a plan view of a screen
  • Figure 17 is a section illustrating the mounting of the centre of the rotatable table
  • Figure 18 is a front view of part of the superstructure taken in the direction of
  • Figure 19 is a section on the line G-G in Figure 5;
  • Figure 20 is a section on the line H-H in Figure 18.
  • Figure 21 is a section on the line l-l in Figure 12 and additionally shows part of a
  • the substrate treatment apparatus illustrated is designated 10 in Figures
  • the base structure 12 includes an outer wall 20 which has therein three
  • doors 28, 30 and 32 are normally closed-off by doors 28, 30 and 32.
  • the doors are mounted by hinges
  • the structure 12 also includes a bottom
  • a plinth 38 consisting of four channels arranged at right angles to
  • the space 42 separates a space 42 from a generally arcuate further space 44.
  • the space 42 is open
  • a panel 46 closes off the radially
  • a cylindrical sleeve 54 extends upwardly from the ring 50 and includes an overhang 56
  • a duct 60 ( Figure 6) leads from one end of the space 44 to the suction
  • a further duct 62 leads from the mid-section of the space
  • a damper 64 ( Figures 6 and 11 ) extending between the walls 20 and 40
  • the damper 64 is moved by a control designated 70 in
  • the table 14 comprises a
  • the rollers 52 and 58 run on the rim 76.
  • a bush 84 ( Figures 14, 15 and 17) is welded into a central opening of the
  • the upper disc 88 ( Figures 12 and 13) is of substantially the same
  • ring 98 is welded to the upper surface of the rim 90 close to its inner periphery.
  • the screen 102 has a central opening 104. The discs and screen are secured together
  • the ring 86 is in contact with a circular seal 110 (Figure 17) which is mounted on the top surface of a plate 113 which is in turn supported by gussets 115
  • Substrate trays 112 (parts of which are shown in Figures 7, 8, 9 and 17)
  • tray has a base element 116 with three openings 118 in it.
  • the trays 112 are described
  • the superstructure 16 comprises a vertically elongate casing 120
  • the section 122 is illustrated in detail in Figures 18 to 20.
  • the section 122 is supported
  • a part circular outer wall 132 which forms the external boundary of a
  • the entrance and exit have strip curtains 140 in them to limit air flow.
  • the section 124 serves merely as a spacer and has no other function.
  • the upper section 126 has an air inlet at 140 and a bank of heaters at 142 in the
  • a spacer 143 is stitch welded to the upper spoke 94.
  • the tray 112 comprises the base element 116 which is of silicone rubber.
  • the element 116 has a chamfered edge 146 which bounds one of the three openings
  • the outer edge shown at 148 has the shape of the apertures 82, 92 in the discs
  • a clamping strip 156 are secured together by bolts 158.
  • the heads of the bolts 158 are secured together by bolts 158.
  • the seal 152 extends both inwardly and outwardly from the spacers 150,
  • the substrates S are placed on the trays of the table at zone 14.1 ( Figure
  • the duct 60 by flowing downwardly through the multitude of passages in the substrate.
  • the substrates emerge from the space 134 through the right hand curtain
  • Substrates are manually removed from the table. Substrates are manufactured in a variety of shapes and it will be
  • the trays are configured so that the substrates fit in an airtight manner

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

Apparatus for treating a substrate is described, a substrate being the component of a catalytic converter which is coated with the catalytic material: The apparatus comprises a rotary table which divides the apparatus into an upper chamber and a lower chamber. Air is withdrawn from the lower chamber thereby reducing the pressure there to sub-atmospheric. This causes air to flow through the table to the lower chamber from the upper chamber. The table has openings in it and trays are provided which search sealingly in the openings. The trays support the substrate and themselves have openings the shapes of which match the shapes of the substrates. There are seals between the trays and substrates so that all the air flowing from the upper chamber to the lower chamber passes through the substrates.

Description

APPARATUS FOR, AND METHOD OF , TREATING SUBSTRATES FOR CATALYTIC CONVERTERS
FIELD OF THE INVENTION
THIS INVENTION relates to apparatus for, and a method of, treating
substrates.
BACKGROUND TO THE INVENTION
"Substrate" is a term used for the ceramic multi-passaged structure which
is a component of a catalytic converter. The passages in the substrate are coated with
a noble metal such as platinum. It is this metal which reacts with the exhaust gasses
emerging from an internal combustion engine to convert the noxious components into
products which are somewhat more environmentally friendly.
The noble metal is applied to the passages as a suspension. Normally
the suspension is initially forced in from one end of the substrate. The substrate is then
stabilized by blowing air through it and it is simultaneously subjected to some drying
action. The substrate then has suspension forced in from the other end. The substrate
is again stabilized followed by a drying step followed by calcining at high temperature.
The treatment steps are achieved by exposing one end of the substrate to a source of
heated air under pressure, the temperature of the air being chosen in dependence on
whether it is stabilizing, drying or calcining that is to be achieved. The term "substrate" as used herein covers bodies of the form described
above and also any other body having a multitude of passages through it through which
a gas must flow as part of the manufacturing process. The term "air" as used herein
additionally covers other gases which might be used in the manufacturing process.
The present invention seeks to provide an improved apparatus for and
method of treating a substrate.
BRIEF DESCRIPTION OF THE INVENTION
According to one aspect of the present invention there is provided a
method of treating a substrate which comprises subjecting one end of the substrate to a
sub-atmospheric pressure so that air is sucked through the substrate.
The method can further include the step of heating the air before it is
drawn through the substrate.
According to a further aspect of the present invention there is provided a
method of treating a substrate which comprises creating a lower than atmospheric
pressure in a lower plenum chamber, separating the lower plenum chamber from an
upper plenum chamber which is at higher pressure than the lower plenum chamber by
means of a horizontal partition with a hole in it, and standing a substrate on the partition
so that it covers said hole whereby air flow from the upper chamber to the lower chamber is through the substrate.
According to another aspect of the present invention there is provided
apparatus for treating a substrate which comprises means defining a lower plenum
chamber, means for withdrawing air from said lower plenum chamber, a horizontal
partition forming the top wall of said chamber, an opening in said top wall, and a
chamber above said partition for containing a substrate standing on said partition.
Said partition can be a tray with one or more openings in it, the tray being
carried by part of the apparatus which, in use, is displaced from a zone at which
substrates are placed on said part and through a zone constituted by said two
chambers to a zone at which substrates are removed from said part. In the preferred
form said part is a horizontal table which is rotatable about a central vertical axis
thereof.
Each tray can comprise a resilient element which bounds said opening
and which has a chamfered edge on which the substrate rests, there being a sealing
element above said resilient element for bearing on the side walling of the substrate
whereby there are two sealing zones in series between said chambers.
BRIEF DESCRIPTION OF THE DRAWINGS
For a better understanding of the present invention, and to show how the same may be carried into effect, reference will now be made, by way of example, to the
accompanying drawings in which:-
Figure 1 is a front elevation of apparatus for treating substrates;
Figure 2 is a side elevation of the apparatus of Figure 1;
Figure 3 is a top plan view;
Figure 4 is a section through the apparatus, the section being on the line A-A of
Figure 1 ;
Figure 5 is a section on the line B-B of Figure 1 ;
Figure 6 is a section on the line C-C of Figure 1 ;
Figures 7 and 8 are sections illustrating the mounting of the outer periphery of a
rotatable table;
Figure 9 is a top plan view of the rotatable table;
Figure 10 is a section on the line D-D of Figure 9;
Figure 11 is a section on the line E-E of Figure 10, the section being below the
level of the table;
Figure 12 is a top plan view of an upper disc of the table;
Figure 13 is a section through the upper disc;
Figure 14 is a top plan view of a lower disc of the table;
Figure 15 is a section through the lower disc;
Figure 16 is a plan view of a screen;
Figure 17 is a section illustrating the mounting of the centre of the rotatable table;
. Figure 18 is a front view of part of the superstructure taken in the direction of
arrow A in Figure 5;
Figure 19 is a section on the line G-G in Figure 5;
Figure 20 is a section on the line H-H in Figure 18; and
Figure 21 is a section on the line l-l in Figure 12 and additionally shows part of a
tray.
DETAILED DESCRIPTION OF THE DRAWINGS
The substrate treatment apparatus illustrated is designated 10 in Figures
1 to 6 and comprises a base structure 12, a rotatable table 14 mounted on the base
structure 12 and a superstructure 16 which is above the table 14. Coaxial with and
under the table 14 there is a motor and gearbox 18 which is attached to the table and
rotates it about a vertical axis.
The base structure 12 includes an outer wall 20 which has therein three
access openings 22, 24 and 26 for maintenance purposes. The openings 22, 24 and
26 are normally closed-off by doors 28, 30 and 32. The doors are mounted by hinges
onto the wall 20 and held closed by latches 34. The structure 12 also includes a bottom
wall 36 supported by a plinth 38 consisting of four channels arranged at right angles to
one another. An internal wall 40 (see particularly Figure 6) of the base structure
separates a space 42 from a generally arcuate further space 44. The space 42 is open
on one side and houses the motor and gearbox 18. A panel 46 closes off the radially
outer end of the space 42.
Gusset plates 48 (see also Figures 7 and 8) are mounted on the outer
face of the wall 20 and support a ring 50 on which a number of rollers 52 are mounted.
A cylindrical sleeve 54 extends upwardly from the ring 50 and includes an overhang 56
from the underside of which a further set of rollers 58 is suspended. The table 14 is
gripped between the rollers 52 and 58.
A duct 60 (Figure 6) leads from one end of the space 44 to the suction
side of a blower (not shown). A further duct 62 leads from the mid-section of the space
44 to the suction side of the same blower or a further blower (not shown).
A damper 64 (Figures 6 and 11 ) extending between the walls 20 and 40
enables air flow between a mid-section 66 of the space 44 and an end section 68 of the
space 44 to be controlled. The damper 64 is moved by a control designated 70 in
Figures 2 and 6.
Turning now to Figures 7, 8, 9 and 12 to 15, the table 14 comprises a
lower disc 74 which has an outer rim 76, an inner hub 78 and radial spokes 80 joining the rim 76 and hub 78. This configuration results in there being eight apertures 82 in
the disc 74. The rollers 52 and 58 run on the rim 76.
A bush 84 (Figures 14, 15 and 17) is welded into a central opening of the
disc 74. The shaft of the motor and gearbox fits in the bush 84. A depending ring 86 is
welded to the underside of the disc 74 radially outwardly of the bush 84.
The upper disc 88 (Figures 12 and 13) is of substantially the same
configuration as the disc 74 but smaller in diameter. Its rim, hub, spokes and apertures
are designated 90, 92, 94 and 96 respectively in Figure 12. An upstanding retaining
ring 98 is welded to the upper surface of the rim 90 close to its inner periphery. A
further retaining ring 100 is welded to the upper surface of the hub 92 close to the outer
periphery of the hub 92.
Between the upper and lower discs there is a screen 102 (see Figure 16).
The screen 102 has a central opening 104. The discs and screen are secured together
around their inner and outer peripheries. More specifically bolts 106 (Figure 17)
arranged in an inner circular array secure the discs 74 and 88 together with the screen
102 between them. Further bolts 108 (Figures 7 and 8) arranged in an outer circular
array also clamp the discs and screen together.
The ring 86 is in contact with a circular seal 110 (Figure 17) which is mounted on the top surface of a plate 113 which is in turn supported by gussets 115
mounted on the wall 40. This seals off the motor and gear box from the zones in which
treatment takes place.
Substrate trays 112 (parts of which are shown in Figures 7, 8, 9 and 17)
each having the same shape as the apertures 82, 96 stand on the screen 102. Each
tray has a base element 116 with three openings 118 in it. The trays 112 are described
in more detail hereinafter with reference to Figure 21.
The superstructure 16 comprises a vertically elongate casing 120
comprising a lowermost section 122, a centre section 124 and an upper section 126.
The section 122 is illustrated in detail in Figures 18 to 20. The section 122 is supported
by the sleeve 54 and overhang 56 (see Figure 4)
At the centre of the section 122 there is a downwardly open housing 124
which is open at one side (see Figure 20). A seal 130 (see Figure 17) around the open
lower end of the housing 124 co-operates with the upper disc 88. The section 122
further includes a part circular outer wall 132 which forms the external boundary of a
part circular space 134 through which the substrates move on the table 14. The
entrance to and exit from the space 134 are shown at 136 and 138 (Figures 1 and 21).
The entrance and exit have strip curtains 140 in them to limit air flow. The section 124 serves merely as a spacer and has no other function.
The upper section 126 has an air inlet at 140 and a bank of heaters at 142 in the
passage leading from the inlet 140 to the section 124.
It will be understood that the part of the table 14 between the curtains 140
is accessible (see Figure 3) whereas the remainder of the table is within the space 134.
Referring now to Figure 21 , the spokes 80 and 94 of the upper and lower
discs 74, 88 are shown. A spacer 143 is stitch welded to the upper spoke 94.
The tray 112 comprises the base element 116 which is of silicone rubber.
The element 116 has a chamfered edge 146 which bounds one of the three openings
118. The outer edge shown at 148 has the shape of the apertures 82, 92 in the discs
74, 88. A cast spacer 150 of Nylon, a silicon rubber seal 152, a further spacer 154 and
a clamping strip 156 are secured together by bolts 158. The heads of the bolts 158
bear on the strip 156 and the ends of the shanks of the bolts 158 screw into tapped
holes in a further clamping strip 160 which is in a recess in the underside of the element
116.
The seal 152 extends both inwardly and outwardly from the spacers 150,
154. The outwardly protruding part bears on the spacer 143. The inwardly protruding
part bears on the cylindrical wall W of the substrate S. It will be noted that the lower periphery of the substrate seats on the edge 146 of the opening 118.
The substrates S are placed on the trays of the table at zone 14.1 (Figure
3) in register with the openings 118 in the trays. The table carries the substrates into
the space 134 where they are immediately subjected to the negative pressure below
the table which results from air being withdrawn through the duct 60. Air can only reach
the duct 60 by flowing downwardly through the multitude of passages in the substrate.
This is because the trays fit snugly in the spaces provided therefor on the table and
prevent any air flow which bypasses the substrates. The flow of air results in any
surplus of catalytic material deposited in the passages of the substrates being sucked
out.
As the substrates move around the space 134, they are heated by air
which is flowing in a closed system from the space 134, through the duct 62, through
the blower and back to the inlet 140.
The substrates emerge from the space 134 through the right hand curtain
140 (Figure 20) to the zone designated 14.2. Whilst in this zone the substrates cool by
air flow downwardly through the substrate into the section 68 and past the damper 64,
into section 66 and hence to the duct 62. When the substrates reach zone 14.3 they
are manually removed from the table. Substrates are manufactured in a variety of shapes and it will be
understood that the trays are configured so that the substrates fit in an airtight manner
in the trays. In Figures 3 and 5 the substrates are shown as being substantially oval in
cross section. In Figure 9 the openings 118 in the trays 112 are shown as being
circular so that they are usable with substrates which are cylindrical in form.

Claims

CLAIMS:
1. A method of treating a substrate which comprises subjecting one end of
the substrate to a sub-atmospheric pressure so that air is sucked through the substrate.
2. A method as claimed in claim 1 , and which further includes the step of
heating the air before it is drawn through the substrate.
3. A method of treating a substrate which comprises creating a lower than
atmospheric pressure in a lower plenum chamber, separating the lower plenum
chamber from an upper plenum chamber which is at higher pressure than the lower
plenum chamber by means of a horizontal partition with a hole in it, and standing a
substrate on the partition so that it covers said hole whereby air flow from the upper
chamber to the lower chamber is through the substrate.
4. Apparatus for treating a substrate which comprises means defining a
lower plenum chamber, means for withdrawing air from said lower plenum chamber, a
horizontal partition forming the top wall of said chamber, an opening in said top wall,
and a chamber above said partition for containing a substrate standing on said partition.
5. Apparatus as claimed in claim 4, wherein said partition is a tray with one
or more openings in it, the tray being carried by part of the apparatus which, in use, is displaced from a zone at which substrates are placed on said part and through a zone
constituted by said two chambers to a zone at which substrates are removed from said
part.
6. Apparatus as claimed in claim 5, wherein said part is a horizontal table
which is rotatable about a central vertical axis thereof.
7. Apparatus as claimed in claim 5 or 6, wherein each tray comprises a
resilient element which bounds said opening and which has a chamfered edge on
which the substrate rests, there being a sealing element above said resilient element
for bearing on the side walling of the substrate whereby there are two sealing zones in
series between said chambers.
PCT/ZA2002/000117 2001-07-20 2002-07-22 Apparatus for, and method of, treating substrates for catalytic converters WO2003008098A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ZA200105448 2001-07-20
ZA2001/5448 2001-07-20

Publications (1)

Publication Number Publication Date
WO2003008098A1 true WO2003008098A1 (en) 2003-01-30

Family

ID=25589222

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/ZA2002/000117 WO2003008098A1 (en) 2001-07-20 2002-07-22 Apparatus for, and method of, treating substrates for catalytic converters

Country Status (1)

Country Link
WO (1) WO2003008098A1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1338529A (en) * 1917-10-29 1920-04-27 Richter Johannes Cigarette
US2867544A (en) * 1956-02-23 1959-01-06 Owens Illinois Glass Co Method and apparatus for coating the interior surfaces of small diameter glass tubing
US3948213A (en) * 1974-10-21 1976-04-06 Universal Oil Products Company Coating-impregnating chamber for catalyst support members
US4208454A (en) * 1978-01-19 1980-06-17 General Motors Corporation Method for coating catalyst supports
WO1999055458A1 (en) * 1998-04-28 1999-11-04 Engelhard Corporation Method for drying a coated substrate
EP0980710A1 (en) * 1998-08-20 2000-02-23 Degussa-Hüls Aktiengesellschaft Method for coating the channels of a monolithic catalyst body with a coating dispersion

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1338529A (en) * 1917-10-29 1920-04-27 Richter Johannes Cigarette
US2867544A (en) * 1956-02-23 1959-01-06 Owens Illinois Glass Co Method and apparatus for coating the interior surfaces of small diameter glass tubing
US3948213A (en) * 1974-10-21 1976-04-06 Universal Oil Products Company Coating-impregnating chamber for catalyst support members
US4208454A (en) * 1978-01-19 1980-06-17 General Motors Corporation Method for coating catalyst supports
WO1999055458A1 (en) * 1998-04-28 1999-11-04 Engelhard Corporation Method for drying a coated substrate
EP0980710A1 (en) * 1998-08-20 2000-02-23 Degussa-Hüls Aktiengesellschaft Method for coating the channels of a monolithic catalyst body with a coating dispersion

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