WO2002082130A3 - Optical grating structures and method for their manufacture - Google Patents

Optical grating structures and method for their manufacture Download PDF

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Publication number
WO2002082130A3
WO2002082130A3 PCT/GB2002/001625 GB0201625W WO02082130A3 WO 2002082130 A3 WO2002082130 A3 WO 2002082130A3 GB 0201625 W GB0201625 W GB 0201625W WO 02082130 A3 WO02082130 A3 WO 02082130A3
Authority
WO
WIPO (PCT)
Prior art keywords
intermediate layer
refractive index
corrugation
optical grating
manufacture
Prior art date
Application number
PCT/GB2002/001625
Other languages
French (fr)
Other versions
WO2002082130A2 (en
Inventor
Nikolai Mikhailovitch Lyndin
Original Assignee
Thermo Fast Uk Ltd
Nikolai Mikhailovitch Lyndin
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermo Fast Uk Ltd, Nikolai Mikhailovitch Lyndin filed Critical Thermo Fast Uk Ltd
Priority to AU2002251250A priority Critical patent/AU2002251250A1/en
Publication of WO2002082130A2 publication Critical patent/WO2002082130A2/en
Publication of WO2002082130A3 publication Critical patent/WO2002082130A3/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

A method is disclosed for the fabrication of an optical grating structure. An intermediate layer (3) of a relatively low refractive index material is deposited on a planar substrate (1) of relatively low refractive index or upon a base layer (2) of relatively high-refractive index material applied to the substrate (1). The intermediate layer (3) is of a material capable of being formed precisely into a pattern corresponding to a desired grating pattern. Material is selectively removed from the intermediate layer (3) so as to create a corrugation in the intermediate layer (3) corresponding to the desired grating pattern. A surface layer (5) of relatively high refractive index material of uniform thickness is deposited on the intermediate layer (3), whereby the surface layer (5) is formed with a corrugation corresponding to the corrugation formed in the intermediate layer (3).
PCT/GB2002/001625 2001-04-05 2002-04-05 Optical grating structures and method for their manufacture WO2002082130A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002251250A AU2002251250A1 (en) 2001-04-05 2002-04-05 Optical grating structures and method for their manufacture

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0108557.0 2001-04-05
GB0108557A GB0108557D0 (en) 2001-04-05 2001-04-05 Optical grating structures and method for their manufacture

Publications (2)

Publication Number Publication Date
WO2002082130A2 WO2002082130A2 (en) 2002-10-17
WO2002082130A3 true WO2002082130A3 (en) 2003-03-13

Family

ID=9912300

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2002/001625 WO2002082130A2 (en) 2001-04-05 2002-04-05 Optical grating structures and method for their manufacture

Country Status (3)

Country Link
AU (1) AU2002251250A1 (en)
GB (1) GB0108557D0 (en)
WO (1) WO2002082130A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1645893A1 (en) * 2004-10-08 2006-04-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Diffraction grating for electromagnetic radiation and manufacturing method
US7218802B1 (en) 2005-11-30 2007-05-15 Corning Incorporated Low drift planar waveguide grating sensor and method for manufacturing same
DE102012103443B4 (en) * 2012-04-19 2015-03-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Reflection diffraction grating and process for its production

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5323266A (en) * 1993-02-26 1994-06-21 United States Of America As Represented By The Secretary Of The Air Force Electroformed buried gratings for high-power shared aperture systems
WO1997029362A1 (en) * 1996-02-08 1997-08-14 Thermo Fast Uk Limited Analytical methods and apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5323266A (en) * 1993-02-26 1994-06-21 United States Of America As Represented By The Secretary Of The Air Force Electroformed buried gratings for high-power shared aperture systems
WO1997029362A1 (en) * 1996-02-08 1997-08-14 Thermo Fast Uk Limited Analytical methods and apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
LAAKKONEN P ET AL: "Coated phase masks for proximity printing of Bragg gratings", OPTICS COMMUNICATIONS, NORTH-HOLLAND PUBLISHING CO. AMSTERDAM, NL, vol. 192, no. 3-6, 1 June 2001 (2001-06-01), pages 153 - 159, XP004243233, ISSN: 0030-4018 *

Also Published As

Publication number Publication date
GB0108557D0 (en) 2001-05-23
WO2002082130A2 (en) 2002-10-17
AU2002251250A1 (en) 2002-10-21

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