WO2002063654A3 - System and method for amplifying an angle of divergence of a scanned ion beam - Google Patents

System and method for amplifying an angle of divergence of a scanned ion beam Download PDF

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Publication number
WO2002063654A3
WO2002063654A3 PCT/US2002/003449 US0203449W WO02063654A3 WO 2002063654 A3 WO2002063654 A3 WO 2002063654A3 US 0203449 W US0203449 W US 0203449W WO 02063654 A3 WO02063654 A3 WO 02063654A3
Authority
WO
WIPO (PCT)
Prior art keywords
ion beam
divergence
amplifying
angle
scanned ion
Prior art date
Application number
PCT/US2002/003449
Other languages
French (fr)
Other versions
WO2002063654A2 (en
Inventor
Harald Enge
Donald W Berrian
Original Assignee
Proteros Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Proteros Llc filed Critical Proteros Llc
Priority to AU2002247083A priority Critical patent/AU2002247083A1/en
Publication of WO2002063654A2 publication Critical patent/WO2002063654A2/en
Publication of WO2002063654A3 publication Critical patent/WO2002063654A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

A system for amplifying a scan of an ion beam is provided. Examples of the system include a magnetic scanner and a beam amplifier in combination. The magnetic scanner is configured to scan the ion beam in a single plane. The beam amplifier is configured to receive the ion beam from the magnetic scanner, amplify a divergence of the ion beam, and focus the ion beam in the single plane.
PCT/US2002/003449 2001-02-06 2002-02-06 System and method for amplifying an angle of divergence of a scanned ion beam WO2002063654A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002247083A AU2002247083A1 (en) 2001-02-06 2002-02-06 System and method for amplifying an angle of divergence of a scanned ion beam

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26667201P 2001-02-06 2001-02-06
US60/266,672 2001-02-06

Publications (2)

Publication Number Publication Date
WO2002063654A2 WO2002063654A2 (en) 2002-08-15
WO2002063654A3 true WO2002063654A3 (en) 2003-03-13

Family

ID=23015530

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/003449 WO2002063654A2 (en) 2001-02-06 2002-02-06 System and method for amplifying an angle of divergence of a scanned ion beam

Country Status (2)

Country Link
AU (1) AU2002247083A1 (en)
WO (1) WO2002063654A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7525103B2 (en) 2006-01-20 2009-04-28 Varian Semiconductor Equipment Associates, Inc. Technique for improving uniformity of a ribbon beam
US9793087B2 (en) 2015-09-10 2017-10-17 Varian Semiconductor Equipment Associates, Inc. Techniques and apparatus for manipulating an ion beam

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4757208A (en) * 1986-03-07 1988-07-12 Hughes Aircraft Company Masked ion beam lithography system and method
US5438203A (en) * 1994-06-10 1995-08-01 Nissin Electric Company System and method for unipolar magnetic scanning of heavy ion beams
US5481116A (en) * 1994-06-10 1996-01-02 Ibis Technology Corporation Magnetic system and method for uniformly scanning heavy ion beams

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4757208A (en) * 1986-03-07 1988-07-12 Hughes Aircraft Company Masked ion beam lithography system and method
US5438203A (en) * 1994-06-10 1995-08-01 Nissin Electric Company System and method for unipolar magnetic scanning of heavy ion beams
US5481116A (en) * 1994-06-10 1996-01-02 Ibis Technology Corporation Magnetic system and method for uniformly scanning heavy ion beams

Also Published As

Publication number Publication date
AU2002247083A1 (en) 2002-08-19
WO2002063654A2 (en) 2002-08-15

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