WO2002044297A1 - Fluorocarbon decomposer and decomposition methods - Google Patents

Fluorocarbon decomposer and decomposition methods Download PDF

Info

Publication number
WO2002044297A1
WO2002044297A1 PCT/JP2001/010391 JP0110391W WO0244297A1 WO 2002044297 A1 WO2002044297 A1 WO 2002044297A1 JP 0110391 W JP0110391 W JP 0110391W WO 0244297 A1 WO0244297 A1 WO 0244297A1
Authority
WO
WIPO (PCT)
Prior art keywords
decomposer
fluorocarbon
oxide
earth metal
alkaline earth
Prior art date
Application number
PCT/JP2001/010391
Other languages
French (fr)
Japanese (ja)
Inventor
Kenji Otsuka
Youji Nawa
Tomohisa Ikeda
Koshi Ochi
Original Assignee
Japan Pionics Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Pionics Co., Ltd. filed Critical Japan Pionics Co., Ltd.
Priority to AU2002218487A priority Critical patent/AU2002218487A1/en
Publication of WO2002044297A1 publication Critical patent/WO2002044297A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8659—Removing halogens or halogen compounds
    • B01D53/8662—Organic halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Abstract

A decomposer which comprises as active ingredients aluminum oxide and either an oxide of an alkaline earth metal or an alkaline earth metal compound which thermally decomposes into an oxide of the alkaline earth metal; a method of fluorocarbon decomposition which comprises bringing, with heating, the fluorocarbon into contact with a decomposer comprising aluminum oxide and an oxide of an alkaline earth metal as active ingredients; and a method of fluorocarbon decomposition which comprises bringing, with heating, the fluorocarbon into contact alternately with a decomposer comprising aluminum oxide as an active ingredient and a decomposer comprising an oxide of an alkaline earth metal as an active ingredient. Thus, fluorocarbons contained in a waste gas discharged from semiconductor production steps, etc., such as CF4, can be decomposed while preventing the decomposer(s) from being deactivated in a short time and without discharging a corrosive gas such as hydrogen fluoride. At a relatively low temperature of 1,000°C or below, 99.9% or more of the fluorocarbons can be decomposed.
PCT/JP2001/010391 2000-12-01 2001-11-28 Fluorocarbon decomposer and decomposition methods WO2002044297A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002218487A AU2002218487A1 (en) 2000-12-01 2001-11-28 Fluorocarbon decomposer and decomposition methods

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000366606 2000-12-01
JP2000-366606 2000-12-01
JP2001151875A JP2002224565A (en) 2000-12-01 2001-05-22 Agent and method for decomposing fluorocarbon
JP2001-151875 2001-05-22

Publications (1)

Publication Number Publication Date
WO2002044297A1 true WO2002044297A1 (en) 2002-06-06

Family

ID=26605046

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/010391 WO2002044297A1 (en) 2000-12-01 2001-11-28 Fluorocarbon decomposer and decomposition methods

Country Status (4)

Country Link
JP (1) JP2002224565A (en)
AU (1) AU2002218487A1 (en)
TW (1) TWI243199B (en)
WO (1) WO2002044297A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7138551B2 (en) 2004-11-05 2006-11-21 E. I. Du Pont De Nemours And Company Purification of fluorinated alcohols

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5048208B2 (en) 2004-03-19 2012-10-17 株式会社荏原製作所 Method and apparatus for treating gas containing fluorine-containing compound
JP4511227B2 (en) * 2004-03-29 2010-07-28 京セラ株式会社 Method for producing hydroxide particles
JP2006169062A (en) * 2004-12-17 2006-06-29 Ube Material Industries Ltd Porous particulate containing calcium oxide
WO2006106878A1 (en) * 2005-03-30 2006-10-12 Ube Material Industries, Ltd. Granular material comprising porous particles containing calcium and/or magnesium
JP4902969B2 (en) * 2005-06-08 2012-03-21 研一 秋鹿 Method for decomposing chlorofluorocarbon and decomposing agent therefor
WO2007142192A1 (en) 2006-06-02 2007-12-13 National University Corporation Tohoku University Porous calcium oxide particulate and porous calcium hydroxide particulate
JP5066021B2 (en) * 2007-07-10 2012-11-07 株式会社荏原製作所 PFC processing apparatus and PFC-containing gas processing method
JP5020136B2 (en) * 2007-07-10 2012-09-05 株式会社荏原製作所 Fluorine fixing agent, PFC decomposition treatment agent, and preparation method thereof
JP5031783B2 (en) * 2008-02-26 2012-09-26 京セラ株式会社 Decomposition treatment agent
JP5642337B2 (en) * 2008-02-27 2014-12-17 中部電力株式会社 Halogen-containing compound decomposer
JP4887327B2 (en) * 2008-05-07 2012-02-29 日本パイオニクス株式会社 Fluorine compound decomposition treatment system
JP5366479B2 (en) * 2008-08-26 2013-12-11 中部電力株式会社 Fluorine selective separating agent for dry treatment and dry treatment method of fluorine-containing compound
JP5284773B2 (en) * 2008-12-26 2013-09-11 株式会社荏原製作所 Exhaust gas treatment method for increasing treatment temperature, operation method of exhaust gas treatment device, and exhaust gas treatment device
JP5016616B2 (en) * 2009-01-08 2012-09-05 株式会社荏原製作所 Method for treating exhaust gas containing fluorine compound and reaction tank for treatment
JP5498752B2 (en) * 2009-10-07 2014-05-21 大陽日酸株式会社 Exhaust gas treatment method and exhaust gas treatment apparatus
JP5423594B2 (en) * 2010-06-23 2014-02-19 セントラル硝子株式会社 Method for removing fluorine-containing compound gas
JP2012055836A (en) * 2010-09-09 2012-03-22 Chubu Electric Power Co Inc Method of treating gas
JP6732694B2 (en) * 2017-06-16 2020-07-29 クラリアント触媒株式会社 Decomposition removal agent for fluorine-containing gas, method for producing the same, method for removing fluorine-containing gas using the same, and method for recovering fluorine resources
JP7164992B2 (en) * 2018-08-21 2022-11-02 株式会社荏原製作所 Rare gas recovery device
KR102081820B1 (en) * 2019-09-17 2020-02-26 박태영 Method for Disposing HFCs by Decomposition
KR102081819B1 (en) * 2019-09-17 2020-02-26 박태영 Method for Disposing HFCs by Decomposition
KR102235569B1 (en) * 2020-02-19 2021-04-01 한국남동발전 주식회사 Method for Decomposing HFCs with Adsorbents in Catalyst Layer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0546464A1 (en) * 1991-12-11 1993-06-16 Japan Pionics Co., Ltd. Process for cleaning harmful gas
EP0948995A1 (en) * 1998-03-31 1999-10-13 Institut Francais Du Petrole Process for removing halogenated compounds from a gas or a liquid with at least one metallic element-containing composition
EP0948990A1 (en) * 1998-03-27 1999-10-13 Abb Research Ltd. Process for disposing of a fluorinated gas, which is enclosed in a container, and apparatus for carrying out the process

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0546464A1 (en) * 1991-12-11 1993-06-16 Japan Pionics Co., Ltd. Process for cleaning harmful gas
EP0948990A1 (en) * 1998-03-27 1999-10-13 Abb Research Ltd. Process for disposing of a fluorinated gas, which is enclosed in a container, and apparatus for carrying out the process
EP0948995A1 (en) * 1998-03-31 1999-10-13 Institut Francais Du Petrole Process for removing halogenated compounds from a gas or a liquid with at least one metallic element-containing composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7138551B2 (en) 2004-11-05 2006-11-21 E. I. Du Pont De Nemours And Company Purification of fluorinated alcohols

Also Published As

Publication number Publication date
JP2002224565A (en) 2002-08-13
TWI243199B (en) 2005-11-11
AU2002218487A1 (en) 2002-06-11

Similar Documents

Publication Publication Date Title
WO2002044297A1 (en) Fluorocarbon decomposer and decomposition methods
MY130650A (en) Compositions for removing etching residue and use thereof
EP1136588A3 (en) MOCVD method of tantalum oxide film
EP1498940A3 (en) Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas
WO2003084865A3 (en) Field emission devices using modified carbon nanotubes
SG120055A1 (en) Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process
WO2002065513A3 (en) Photoresist strip with 02 and nh3 for organosilicate glass applications
TW200501254A (en) Method for removing silicon oxide film and processing apparatus
WO2002055987A3 (en) Gas sensor
WO2004024320A8 (en) Catalyst and method for decomposition of perfluoro-compound in waste gas
EP1388902A3 (en) Fabricating method of Gunn diode
ES2189177T3 (en) MANUFACTURING PROCEDURE FOR SIMPLE OR MIXED METAL OXIDES, OR SILICON OXIDE.
EP0873778A3 (en) Cleaning process for harmful gas
WO2003030238A1 (en) Processing method
TW329540B (en) The method for etching metal layer
EP0802339A3 (en) Bearing retainer and method of fabricating the same
EP1139399A3 (en) Film-forming surface reforming method and semiconductor device manufacturing method
EP0887845A3 (en) Processing method and apparatus for removing oxide film
EP1297884A3 (en) Treating agent and method for decomposition of fluorocarbons
EP1308994A3 (en) Method for VIA etching in organo-silica-glass
WO2001099181A3 (en) Clean method for recessed conductive barriers
EP1164632A3 (en) Method of forming a fluoro-organosilicate layer on a substrate
WO2001011673A3 (en) Method for etching oxide films containing bismuth
WO2001078654A3 (en) Halogentated 2-amino-3, 4 heptenoic acid derivatives useful as nitric oxide synthase inhibitors
WO2002096126A3 (en) Method and apparatus for message escalation by digital assistants

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PH PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase