WO2002043076A2 - Fission-voltaic reactor - Google Patents
Fission-voltaic reactor Download PDFInfo
- Publication number
- WO2002043076A2 WO2002043076A2 PCT/US2001/044666 US0144666W WO0243076A2 WO 2002043076 A2 WO2002043076 A2 WO 2002043076A2 US 0144666 W US0144666 W US 0144666W WO 0243076 A2 WO0243076 A2 WO 0243076A2
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- WO
- WIPO (PCT)
- Prior art keywords
- reactor
- core
- fission
- semiconductor device
- semiconductor
- Prior art date
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- 239000004065 semiconductor Substances 0.000 claims abstract description 96
- 239000000463 material Substances 0.000 claims abstract description 85
- 230000004992 fission Effects 0.000 claims abstract description 56
- 239000003758 nuclear fuel Substances 0.000 claims abstract description 22
- 230000001939 inductive effect Effects 0.000 claims abstract description 14
- 238000003780 insertion Methods 0.000 claims abstract description 3
- 230000037431 insertion Effects 0.000 claims abstract description 3
- 239000012634 fragment Substances 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 22
- 230000004888 barrier function Effects 0.000 claims description 19
- 239000002245 particle Substances 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 15
- 239000011888 foil Substances 0.000 claims description 12
- 230000005611 electricity Effects 0.000 claims description 8
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 7
- 229910052770 Uranium Inorganic materials 0.000 claims description 6
- JFALSRSLKYAFGM-OIOBTWANSA-N uranium-235 Chemical compound [235U] JFALSRSLKYAFGM-OIOBTWANSA-N 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 4
- OYEHPCDNVJXUIW-FTXFMUIASA-N 239Pu Chemical compound [239Pu] OYEHPCDNVJXUIW-FTXFMUIASA-N 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 230000005251 gamma ray Effects 0.000 claims description 2
- -1 polypropylene Polymers 0.000 claims description 2
- 239000004743 Polypropylene Substances 0.000 claims 1
- 239000003575 carbonaceous material Substances 0.000 claims 1
- 229910002804 graphite Inorganic materials 0.000 claims 1
- 239000010439 graphite Substances 0.000 claims 1
- 239000011824 nuclear material Substances 0.000 claims 1
- 229920001155 polypropylene Polymers 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 27
- 239000000446 fuel Substances 0.000 description 19
- 230000005855 radiation Effects 0.000 description 12
- 238000005516 engineering process Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000004364 calculation method Methods 0.000 description 7
- 238000013461 design Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052580 B4C Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
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- 238000001228 spectrum Methods 0.000 description 2
- 229910052778 Plutonium Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000005258 radioactive decay Effects 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21D—NUCLEAR POWER PLANT
- G21D7/00—Arrangements for direct production of electric energy from fusion or fission reactions
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21H—OBTAINING ENERGY FROM RADIOACTIVE SOURCES; APPLICATIONS OF RADIATION FROM RADIOACTIVE SOURCES, NOT OTHERWISE PROVIDED FOR; UTILISING COSMIC RADIATION
- G21H1/00—Arrangements for obtaining electrical energy from radioactive sources, e.g. from radioactive isotopes, nuclear or atomic batteries
- G21H1/06—Cells wherein radiation is applied to the junction of different semiconductor materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/30—Nuclear fission reactors
Definitions
- This invention relates to the practical and efficient production of electrical energy directly from the nuclear fission reaction.
- this invention relates to the direct production of electrical energy by what I have termed the fission-voltaic process. More particularly, this invention relates to the direct production of electrical energy in a nuclear reactor utilizing fission-voltaic technology.
- the reactor incorporates a semiconductor device having a high electrical collection efficiency and which is able to perform in both high temperatures and high radiation environments. Examples include amorphous semiconductor material incorporated in p-n junction diodes and Schottky barrier diodes.
- the nuclear fission conversion method described herein is safer, more secure, and more compact than conventional nuclear-electric conversion technology provides.
- the invention is useful in both space electric power generation and terrestrial replacement of conventional nuclear-electric power reactors.
- the fission-voltaic process utilized in this invention is based on the application of a well understood principle used to detect high energy charged-particles in nuclear research.
- Charge collection in single-crystal silicon diode devices has been used in experiments to measure the fission reaction rate in both nuclear reactors and fission experiments. See Charged Particle Detection, Silicon Charged Particle Detectors, www.canaberra.com / literature / basic-principles / charged.htm, 06/14/00.
- the fissionable material having semiconductor characteristics can be either: (1) a single chemical substance that has semiconductor characteristics and includes a fissionable constituent; or (2) a material which is not a single substance but two distinct chemical substances that comprise, respectively, a fissionable material and a semiconductor material.
- Uranium 235 phthalocyanine is illustrative of a material that is a single chemical compound having both semiconductor characteristics and also a fissionable constituent.
- Garrett states that the semiconductor material must retain at least some semiconductor characteristics in the presence of the fissionable material.
- a specific example of the laminated structure is a high resistivity oxide of uranium 235 and silicon.
- Garrett also discloses a fuel element composed of a semiconductor material having finely divided particles of fissionable material dispersed therein.
- the fissionable material is located so that fission fragments from nuclear fission collide with the semiconductor material. These collisions, in turn, produce electron-hole pairs in the semiconductor material. More specifically, Garrett states that electrons resulting from the collision of fission fragments with the semiconductor material are separated from holes resulting from such fission fragment collisions, and these electrons and holes are moved, respectively, in generally opposite directions within the semiconductor material.
- Groups of electrons and groups of holes resulting from the fission fragment collisions are conducted to respective output terminals in operative electrical connection with the semiconductor material.
- the output terminals are connected with each other through a circuit that includes an external load. This produces an electromotive force across the output terminals and a resulting electrical current through the load.
- the depleting, separating, moving apart and conducting of electrons and holes are effected through at least one charge-affecting field of force within the semiconductor material.
- the rate of production of electrons and holes from the collision of fission fragments with the semiconductor material is maintained at a sufficiently high level to deliver to the external load a net positive yield of electrical power over the total input of any electrical power used to produce the charge-affecting field or fields of force by means of which Garrett's method is carried out.
- the depletion, separating, moving apart and conducting steps of the method of this invention are all accompanied by a single charge-affectmg field of force (i.e., the field provided by p-n junction 212).
- the nuclear reactor of the present invention includes a core having nuclear fuel material, moderator material and semiconductor device material.
- the core by itself has a subcritical mass.
- the reactor also includes a fission inducing source which is movable from a first position outside the core to a second position inside the core, whereby the core becomes critical.
- the reactor includes a neutron reflector which su ⁇ ounds the core and includes an opening to permit the insertion and removal of the fission inducing source.
- the core consists of alternate layers of the semiconductor device, the nuclear fuel material, and the semiconductor device, whereby the nuclear fuel material is sandwiched between layers of the semiconductor device.
- the nuclear fuel material is in the form of a thin foil or deposit which has a thickness in the range of 1.5 mg/cm 2 to 10mg/cm 2 , which thickness depends on the particular type of fuel used (e.g., uranium 235, plutonium 239, reactor grade uranium, and oxides of uranium).
- the reactor has a cross-sectional configuration selected from the group including concentric cylinders and spirals. With such a design: the core consists of alternate layers of moderator, semiconductor device, nuclear fuel material, semiconductor device and moderator; and the electrodes are sandwiched between the nuclear fuel material and the semiconductor devices.
- the semiconductor device includes a semiconductor material that has a high electrical collection efficiency and is able to survive both the high temperatures and high particle fluences generated by the nuclear fuel material.
- the semiconductor material is amorphous.
- the semiconductor device is selected from the group including p-n junction diodes and Schottky barrier diodes. Where a Schottky barrier diode is used, the fuel foil or deposit can be bonded directly to the semiconductor material.
- the fission- inducing source is selected from the group including neutron generators, gamma ray sources, high energy charged particles and electron beam sources.
- the reactor includes a shield su ⁇ ounding the neutron reflector.
- the method of the present invention for generating electricity via the fission- voltaic process includes the steps of providing a core having a subcritical mass; providing a fission inducing source; inserting the fission inducing source into the core whereby the core becomes critical; and generating electricity by bombarding the semiconductor device with fission fragments while minimizing the generation of heat.
- Figure 1 is a diagram comparing the fission-voltaic process of the present invention with the well known and defined photo-voltaic and beta-voltaic processes;
- Figure 2 is the energy band diagram of a p-n junction fission- voltaic cell of the present invention under fragment i ⁇ adiation;
- Figure 3 is a schematic diagram of a Schottky-barrier fission-voltaic cell of the present invention.
- Figure 4 is a schematic of an equivalent circuit the fission-voltaic cell (e.g., p-n junction, Schottky-barrier) of the present invention
- Figure 5 is a perspective view, partially broken out, of the fission-voltaic reactor of the present invention. Description of the Preferred Embodiment
- the fission-voltaic electrical-energy process of the present invention can best be defined in terms analogous to the well-known and documented solar photovoltaic process and the less well known beta-voltaic process. A graphic comparison of these two technologies and the technology of the present invention is illustrated in
- the intrinsic efficiency and energy density of the fission-voltaic device of the present invention is much larger.
- Energy density is governed by the available source energy that can be made incident on the surface of the collecting material and the intrinsic efficiency of the energy conversion device.
- solar photo-voltaics that limitation is the maximum solar radiation at the earth's surface of 0.1 watt/cm 2 .
- beta-voltaic conversion where a radioactive nuclide is the energy source, the available power of the beta particle fluence at the surface of the conversion material is limited by radioactive decay rates of specific radioisotopes. For 147 Pm, a beta emitting source previously used in beta-voltaic devices, the upper power limit is approximately,
- the criticality calculations described below produce an incident fission power of 0.085 watts/cm 2 from the fuel foil or deposit on the surface of the semiconductor materials; an incident energy fluence approximately equal that of solar energy fluence.
- the incident power of solar energy on photo-voltaics and that produced in the reactor described below are similar, because of the energy losses from the respective sources and the intrinsic efficiencies of the respective devices, the overall efficiency of the fission- voltaic device of the present invention is much greater than that of photo-voltaic devices.
- the overall efficiency of the device of the present invention can be greater than 50%, while that of photo-voltaic devices is on the order of 15%.
- Beta-voltaic devices are even less efficient, having an overall efficiency on the order of 4-5%.
- the energy available for solar photo-voltaics is that part of the solar spectrum where solar energy photons have energy greater than the band-gap energy of the semiconductor used. For silicon that fraction is approximately 75%. Thus, 25% of the solar radiation at normal incidence on a photo- voltaic device surface is of an energy level below that necessary to excite an electron in the semiconductor to the conduction band.
- the energy exchange in the conversion device itself further reduces energy efficiency.
- the incremental kinetic energy exchange process between incident photons and electrons resident in the deposition region of the semiconductor must produce electrons with energy greater than the band-gap energy of the semiconductor.
- the energy transfer must occur in a thin depletion layer at or near the surface of the semiconductor device to produce an electrical current.
- the thickness of this layer depends on specific device design parameters and material properties. For most common p-n semiconductor diodes (e.g., silicon), this thickness is, approximately, 10 micrometers at zero bias voltage.
- the theoretical maximum efficiency achievable for photo-voltaic conversion is nearly a factor of three less than that for fission- voltaic conversion.
- energy fluxes incident on the fission-voltaic device can be better controlled (i.e., increased or decreased) to suit a particular mode of operation. Together, these qualities make fission-voltaic technology superior to photo- voltaic and beta-voltaic technologies.
- the fission voltaics used to directly generate electrical energy in the materials of the present invention yields far greater efficiencies than can be achieved in electric power conversion with conventional nuclear reactors.
- This more efficient reactor will operate with less heat generation (because the use of thin fuel foils or deposits permit the fission fragments to escape the fuel) and require less cooling, thus creating a less stressful environment on parts and materials in the reactor system, all of which makes the reactor of the present invention inherently more safe and reliable.
- the fuel foil or deposit can be up to lOmg/cm 2 thick.
- the layered geometry of fuel and semiconductor material provides for a more complete "burn up" of the fuel than is presently achieved in conventional nuclear reactors, thus extending the lifetime of the reactor.
- the efficient design can be made to achieve greater electric power from smaller volumes than conventional reactors providing for a : smaller packaging of the system for portable power supplies.
- the proper choice of semiconductor material, conversion device design, and it's geometric configuration in relation to the nuclear fuel is critical to achieving the optimum performance (e.g., efficiency, longevity) of the present invention.
- the fuel must be adjacent to the thin depletion layer of the conversion device (i.e., within the typical range of the fragments (typically, 5-25 micrometers)).
- the semiconductor device material must: operate in high temperatures; perform electronically in an intense thermal neutron environment; and be capable of surviving in the harsh radiation environment of the fission process.
- Amorphous semiconductor materials are prefe ⁇ ed over single crystal materials.
- Both are shallow depletion region devices that are suitable for the energy deposition profile of the fission-fragments utilized in the present invention.
- the p-n diode utilizes a variety of doping compounds diffused into the selected semiconductor materials to create opposite carrier types (i.e., p-type carriers in an n-type material or visa- versa) at the junction.
- the Schotty-barrier diode utilizes a metal-semiconductor interface to create the voltage potential across the junction.
- Figure 2 shows an energy band diagram for an ideal semiconducting p-n junction of the present invention. The energy level of the conduction band and valence band are designated E c and E v , respectively.
- the high-energy fission- fragments penetrate the layer and pass into the p material, creating a large number of electron-hole pairs.
- ⁇ E the energy partition, of the incident fission- fragments, the thickness of the n-layer, and the lifetime of minority carriers in both the p and n regions (as well as other pertinent semiconductor parameters such as energy gap Eg, mobility, diffusion coefficient, etc.)
- the flow of created ion pairs of charge q is collected across the junction and produces an open circuit voltage N oc .
- the larger the energy gap the higher the incident fragment fluence, the larger the resultant electrical power produced.
- a metal When a metal is brought into contact with a semiconductor, it forms two types of junctions according to the relative energy level of the metal and the semiconductor.
- n-type semiconductors if the electron affinity of the semiconductor is greater than the work functions of the metal, the electrons flow to the semiconductor and make it more strongly n-type. This is called an ohmic contact.
- the voltage and cu ⁇ ent characteristics of ohmic contacts exhibit linear relationships. If the work function of the metal is greater than the electron affinity of the n-type semiconductor, then a Schottky barrier diode is formed. The height of this barrier depends on the difference in the energy levels of the semiconductor and the metal.
- FIG. 3 is a schematic representation of the basic configuration of a Schottky cell fission-voltaic energy conversion system, wherein II is the load current.
- the advantages of Schottky barrier diodes over p-n junction devices are: low-temperature fabrication because no high-temperature diffusion is required; adaptability to polycrystalline materials; high radiation resistance due to a high electric field near the fuel-semiconductor surface; and high cu ⁇ ent output because the close proximity of the depletion region to the surface of the semiconductor can reduce the effects of low carrier life-times and recombination.
- An important parameter for the proper selection of the metal-semiconductor interface used in Schottky-barrier diodes is the barrier height for each individual combination of material. Theoretically, this height approaches 2/3 of the band-gap of the semiconductor.
- the Schottky barrier diode used with the fission- voltaic power conversion process can best be described by considering the case of an ideal Schottky barrier diode with a constant-cu ⁇ ent source resulting from the excitation of excess carriers by fission-fragment irradiation. Referring to the idealized equivalent circuit of Figure 4, which neglects series and shunt resistive losses, the fission-fragment ionization thus causes an electric cu ⁇ ent, I, to flow in the load. The magnitude of this cu ⁇ ent is the difference between the generated short-circuit cu ⁇ ent and the cu ⁇ ent flowing in the diode.
- 0 B barrier height of the Schottky diode.
- the short-circuit cu ⁇ ent, open-circuit voltage, and maximum power output can be calculated from Eq.(l) as follows.
- the power output, P is the product of the voltage and the cu ⁇ ent at a particular operating point.
- Nmp The voltage co ⁇ esponding to maximum power output, Nmp can be calculated in the usual way by maximizing the power.
- FIG. 5 is a perspective view, with a section broken out and a basic reactor unit enlarged for clarity, of the fission-voltaic reactor of the present invention.
- Reactor 11 includes a fuel-moderator-semiconductor device core 13, a removable neutron source 15, and a beryllium reflector 17.
- the neutron source 15 is a line source of thermal neutrons in this example.
- This fission-inducing source could be any number of energetic particles or radiation.
- the reflector 17 is 20 cm thick in both the radial and axial directions in this example.
- the core 13, which in this example is lm long, lm in diameter and has a volume of 0.785 m3, includes 10kg of fuel (i.e., uranium 235 distributed throughout in the form of 1.5 mg/cm2 foil), 260 kg of hydrogenous moderator (e.g., polyethylene) and 1300 kg of semiconductor boron carbide (B4C). With neutron source 15 removed, the mass of core 13 is sub-critical.
- alternate fuels include reactor grade uranium (e.g., 7% uranium 235 and
- each basic reactor element 21 includes a first p-n semiconductor device layer 23, an electrode 25, a thin layer of uranium fuel foil 27, a second electrode 29, and a second p-n semiconductor device layer 31.
- the reactor element 21 is sandwiched between first 33 and second 35 moderator layers.
- the electrical contacts shown schematically could be, as those skilled in the art would appreciate, combined with the cooling channels.
- the fuel foil or deposit can be brought into contact with the semiconductor material to also function as the metal component of the diode.
- the metal fuel foil or deposit can, additionally, serve as the electrodes.
- core 13 is composed of a series of concentric cylindrical elements increasing in diameter. Alternately, core 13 can have a spiral configuration. One third of the core volume is occupied by the moderator which has a density of 1.Og/cc. The rest of the core is occupied by the boron carbide semiconductor with a theoretical density of 2.5 g/cc.
- the fission density in this 1 MWt reactor will vary from 6.87x1010 fissions/cm3/sec at the center to 3.76x1010 fissions/cm3/sec at the radial boundary, with a volume averaged fission density of 4.76xl010fissions/cm3/sec. These values can be scaled to obtain fission densities at other reactor powers.
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Measurement Of Radiation (AREA)
- Monitoring And Testing Of Nuclear Reactors (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01997817A EP1350255A4 (en) | 2000-11-20 | 2001-11-19 | Fission-voltaic reactor |
AU2002217933A AU2002217933A1 (en) | 2000-11-20 | 2001-11-19 | Fission-voltaic reactor |
CA002431372A CA2431372A1 (en) | 2000-11-20 | 2001-11-19 | Fission-voltaic reactor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71638800A | 2000-11-20 | 2000-11-20 | |
US09/716,388 | 2000-11-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002043076A2 true WO2002043076A2 (en) | 2002-05-30 |
WO2002043076A3 WO2002043076A3 (en) | 2003-02-13 |
Family
ID=24877807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/044666 WO2002043076A2 (en) | 2000-11-20 | 2001-11-19 | Fission-voltaic reactor |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1350255A4 (en) |
AU (1) | AU2002217933A1 (en) |
CA (1) | CA2431372A1 (en) |
WO (1) | WO2002043076A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106531228A (en) * | 2015-09-14 | 2017-03-22 | 韩国原子力研究院 | Hybrid nuclear reactor with separable core |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3197375A (en) * | 1958-10-28 | 1965-07-27 | Dow Chemical Co | Nuclear power reactor |
US3291694A (en) * | 1957-04-24 | 1966-12-13 | Dow Chemical Co | Neutron amplifier |
DE3047098A1 (en) * | 1980-12-13 | 1982-07-22 | Hochtemperatur-Reaktorbau GmbH, 5000 Köln | Remote handling device for neutron start-up source - in high temp. reactor has winch housed in shielded zone of stand-pipe |
US4415526A (en) * | 1977-05-31 | 1983-11-15 | Metco Properties | Metal phthalocyanine on a substrate |
US5606213A (en) * | 1993-04-21 | 1997-02-25 | Ontario Hydro | Nuclear batteries |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1457434A (en) * | 1965-07-30 | 1966-01-24 | Commissariat Energie Atomique | Irradiation device |
DE2742739A1 (en) * | 1977-09-22 | 1979-04-05 | Selim Dipl Ing Mourad | Partly irradiated fuel used for electricity generation - in semiconductor sandwich mounted adjacent to block of spent fuel |
-
2001
- 2001-11-19 AU AU2002217933A patent/AU2002217933A1/en not_active Abandoned
- 2001-11-19 WO PCT/US2001/044666 patent/WO2002043076A2/en not_active Application Discontinuation
- 2001-11-19 EP EP01997817A patent/EP1350255A4/en not_active Withdrawn
- 2001-11-19 CA CA002431372A patent/CA2431372A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3291694A (en) * | 1957-04-24 | 1966-12-13 | Dow Chemical Co | Neutron amplifier |
US3197375A (en) * | 1958-10-28 | 1965-07-27 | Dow Chemical Co | Nuclear power reactor |
US4415526A (en) * | 1977-05-31 | 1983-11-15 | Metco Properties | Metal phthalocyanine on a substrate |
DE3047098A1 (en) * | 1980-12-13 | 1982-07-22 | Hochtemperatur-Reaktorbau GmbH, 5000 Köln | Remote handling device for neutron start-up source - in high temp. reactor has winch housed in shielded zone of stand-pipe |
US5606213A (en) * | 1993-04-21 | 1997-02-25 | Ontario Hydro | Nuclear batteries |
Non-Patent Citations (2)
Title |
---|
SCHULTZ M.A.: 'Control of nuclear reactors and power plants', 1961, MCGRAWHILL, NEW YORK XP002955795 2nd edition * page 15 - page 17 * * |
See also references of EP1350255A2 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106531228A (en) * | 2015-09-14 | 2017-03-22 | 韩国原子力研究院 | Hybrid nuclear reactor with separable core |
Also Published As
Publication number | Publication date |
---|---|
AU2002217933A1 (en) | 2002-06-03 |
CA2431372A1 (en) | 2002-05-30 |
EP1350255A4 (en) | 2004-04-14 |
EP1350255A2 (en) | 2003-10-08 |
WO2002043076A3 (en) | 2003-02-13 |
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