WO2002025327A3 - Manufacturing a fiber bragg grating and a mask used in the fabrication of a fiber bragg grating - Google Patents

Manufacturing a fiber bragg grating and a mask used in the fabrication of a fiber bragg grating

Info

Publication number
WO2002025327A3
WO2002025327A3 PCT/US2001/029178 US0129178W WO2002025327A3 WO 2002025327 A3 WO2002025327 A3 WO 2002025327A3 US 0129178 W US0129178 W US 0129178W WO 2002025327 A3 WO2002025327 A3 WO 2002025327A3
Authority
WO
Grant status
Application
Patent type
Prior art keywords
errors
stitching
fabrication
fiber
bragg
Prior art date
Application number
PCT/US2001/029178
Other languages
French (fr)
Other versions
WO2002025327A2 (en )
Inventor
Jason Zweiback
Joshua E Rothenberg
Jan Popelek
Roger F Caldwell
Original Assignee
Phaeton Comm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/02Optical fibre with cladding with or without a coating
    • G02B6/02057Optical fibre with cladding with or without a coating comprising gratings
    • G02B6/02076Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02133Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
    • G02B6/02138Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask

Abstract

The invention reduces the effects of stitching errors from re-scaling or re-positioning in the fabrication of fiber Bragg gratings or the mask used in such fabrication. A first embodiment of the invention preferably uses characteristics of stitching errors to compensate for the stitching errors themselves. By increasing the number of stitching errors, errors caused by the stitching errors can be reduced. A second embodiment uses continuous writing of the desired pattern, wherein the desired pattern is snapped to a grid that can be written by the fabrication equipment. Using continuous writing eliminates stitching errors in the resulting gratings.
PCT/US2001/029178 2000-09-20 2001-09-19 Manufacturing a fiber bragg grating and a mask used in the fabrication of a fiber bragg grating WO2002025327A3 (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
US23431800 true 2000-09-20 2000-09-20
US60/234,318 2000-09-20
US23587300 true 2000-09-27 2000-09-27
US60/235,873 2000-09-27
US24159400 true 2000-10-18 2000-10-18
US60/241,594 2000-10-18
US24342300 true 2000-10-25 2000-10-25
US60/243,423 2000-10-25
US09757386 US6707967B2 (en) 2000-09-20 2001-01-08 Efficient sampled bragg gratings for WDM applications
US09/757,386 2001-01-08
US09957443 US6833954B2 (en) 2000-09-20 2001-09-18 Lithographic method for manufacturing a mask used in the fabrication of a fiber Bragg grating
US09/957,443 2001-09-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA 2422460 CA2422460A1 (en) 2000-09-20 2001-09-19 Manufacturing a fiber bragg grating and a mask used in the fabrication of a fiber bragg grating

Publications (2)

Publication Number Publication Date
WO2002025327A2 true WO2002025327A2 (en) 2002-03-28
WO2002025327A3 true true WO2002025327A3 (en) 2004-03-25

Family

ID=27559248

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/029178 WO2002025327A3 (en) 2000-09-20 2001-09-19 Manufacturing a fiber bragg grating and a mask used in the fabrication of a fiber bragg grating

Country Status (2)

Country Link
CA (1) CA2422460A1 (en)
WO (1) WO2002025327A3 (en)

Non-Patent Citations (8)

* Cited by examiner, † Cited by third party
Title
ALBERT J ET AL: "MINIMIZATION OF PHASE ERROR IN LONG FIBER BRAGG GRATING PHASE MASKSMADE USING ELECTRON BEAM LITHOGRAPHY", IEEE PHOTONICS TECHNOLOGY LETTERS, IEEE INC. NEW YORK, US, vol. 8, no. 10, 1 October 1996 (1996-10-01), pages 1334 - 1336, XP000628950, ISSN: 1041-1135 *
CHAKARIAN V ET AL: "System architecture choices for an advanced mask writer (100-130 nm)", PROCEEDINGS OF THE SPIE, vol. 3873, 15 September 1999 (1999-09-15) - 17 September 1999 (1999-09-17), pages 1 - 15, XP002245923 *
ERIKSSON U ET AL: "DESIGN OF FIBER GRATINGS FOR TOTAL DISPERSION COMPENSATION", OPTICS LETTERS, OPTICAL SOCIETY OF AMERICA, WASHINGTON, US, vol. 19, no. 14, 15 July 1994 (1994-07-15), pages 1028 - 1030, XP000455026, ISSN: 0146-9592 *
HILL K O; MELTZ G: "Fiber Bragg Grating Technology Fundamentals and Overview", JOURNAL OF LIGHTWAVE TECHNOLOGY, vol. 15, no. 8, August 1997 (1997-08-01), pages 1263 - 1276, XP002248916 *
MORGANTE C G; HAMAKER H: "The ALTA 3700: Extending the Application Space of the ALTA 3500 Laser Recticle Writer", PROCEEDINGS OF THE SPIE, vol. 4066, 12 April 2000 (2000-04-12) - 13 April 2000 (2000-04-13), pages 1 - 11, XP002245924 *
PFEIFFER H C ET AL: "EL-4, A NEW GENERATION ELECTRON-BEAM LITHOGRAPHY SYSTEM", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 11, no. 6, 1 November 1993 (1993-11-01), pages 2332 - 2341, XP000423368, ISSN: 0734-211X *
RISHTON S A ET AL: "Raster shaped beam pattern generation", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 17, no. 6, November 1999 (1999-11-01), pages 2927 - 2931, XP002137368, ISSN: 0734-211X *
TIBERIO R C; CARR D W; ROOKS M J; MIHAILOV S J; BILODEAU F; ALBERT J; STRYCKMAN D; JOHNSON D C; HILL K O; MCCLELLAND A W; HUGHES B: "Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66nm) for fiber Bragg grating dispersion compensator", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, vol. 16, no. 6, November 1998 (1998-11-01), pages 3237 - 3240, XP002245922 *

Also Published As

Publication number Publication date Type
CA2422460A1 (en) 2002-03-28 application
WO2002025327A2 (en) 2002-03-28 application

Similar Documents

Publication Publication Date Title
US6456495B1 (en) Logic controller having DIN rail backplane and locking means for interconnected device module
US20010016099A1 (en) Apparatus and method for fabricating multi-period optical fiber grating
US6398121B1 (en) Toy train tracks
WO2003037864A1 (en) Indole compound and medicinal use thereof
US3806124A (en) Three-dimensional table game device with resiliently deformable spacer members
JPH01272917A (en) Reflection type xy encoder
USD391402S (en) Camouflage pattern applied to sheet material
GB2364933B (en) Method of horizontally growing carbon nanotubes
USD455838S1 (en) Fiberglass swimming pool
USD490161S1 (en) Fiberglass swimming pool
WO1993024977A1 (en) Filter with preselected attenuation/wavelength characteristic
CA2518620A1 (en) 2,4,6-phenyl substituted cyclic ketoenols
JP2005156855A (en) Multi-channel mach-zehnder interferometer type optical circuit
USD461873S1 (en) Actuator
JPH03154803A (en) Positioning method
JPH07297044A (en) Core for coil device
Schiebold An operator theoretic approach to the Toda lattice equation
JPS63271265A (en) Production of transmissivity modulation type photomask and production of diffraction gtating using the photomask
JPS63153818A (en) Mark for alignment
JPH02116848A (en) Photomask
JPH07317082A (en) Anchor frame
DE19943387A1 (en) A process for producing an optical grating in an optical conductor arrangement and with such a grating, and such a conductor
USD477242S1 (en) Tide watch dial
Sinha Values and work behaviour.
Piskunov et al. An NMR approach to the superconducting regime of the spin ladder compound Sr Ca Cu O

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PH PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2422460

Country of ref document: CA

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase in:

Ref country code: JP