WO2002016051A3 - Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays - Google Patents

Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays Download PDF

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Publication number
WO2002016051A3
WO2002016051A3 PCT/US2001/026546 US0126546W WO0216051A3 WO 2002016051 A3 WO2002016051 A3 WO 2002016051A3 US 0126546 W US0126546 W US 0126546W WO 0216051 A3 WO0216051 A3 WO 0216051A3
Authority
WO
WIPO (PCT)
Prior art keywords
present
methods
surface cleaning
contaminants
reactive
Prior art date
Application number
PCT/US2001/026546
Other languages
French (fr)
Other versions
WO2002016051A2 (en
Inventor
David P Jackson
Original Assignee
Deflex Llc
David P Jackson
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deflex Llc, David P Jackson filed Critical Deflex Llc
Priority to US10/362,598 priority Critical patent/US20040011378A1/en
Priority to AU2001288402A priority patent/AU2001288402A1/en
Publication of WO2002016051A2 publication Critical patent/WO2002016051A2/en
Publication of WO2002016051A3 publication Critical patent/WO2002016051A3/en
Priority to US11/465,762 priority patent/US7901540B2/en
Priority to US13/016,836 priority patent/US8021489B2/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C5/00—Devices or accessories for generating abrasive blasts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/003—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods using material which dissolves or changes phase after the treatment, e.g. ice, CO2

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Cleaning In General (AREA)

Abstract

The present invention relates generally to providing processes, methods and apparatus to produce and apply a variety of surface cleaning and modification spray treatments. More specifically, the present invention provides the simultaneous steps of 1) selectively removing one or more unwanted surface contaminants, including extremely hard coatings, 2) exposing a native clean surface layer and 3) modifying said exposed and cleaned native substrate surface layer to energetic radicals and radiation to improve adhesion, wettability or coatability. Reactive species in combination with non-reactive, but chemically or physically active, species provide a rich reaction control and surface treatment environment by which contaminants and surface interlayers are oxidatively, physically and/or chemically removed or modified to prepare an underlying substrate surface for subsequent bonding, deposition, coating and curing operations. Substrates treated in accordance with the present invention have cleaner and higher surface free energy surfaces.
PCT/US2001/026546 2000-08-23 2001-08-23 Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays WO2002016051A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US10/362,598 US20040011378A1 (en) 2001-08-23 2001-08-23 Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays
AU2001288402A AU2001288402A1 (en) 2000-08-23 2001-08-23 Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays
US11/465,762 US7901540B2 (en) 2000-08-23 2006-08-18 Dense fluid delivery apparatus
US13/016,836 US8021489B2 (en) 2000-08-23 2011-01-28 Substrate treatment process

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22688200P 2000-08-23 2000-08-23
US60/226,882 2000-08-23

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US10362598 A-371-Of-International 2001-08-23
US11/465,762 Division US7901540B2 (en) 2000-08-23 2006-08-18 Dense fluid delivery apparatus

Publications (2)

Publication Number Publication Date
WO2002016051A2 WO2002016051A2 (en) 2002-02-28
WO2002016051A3 true WO2002016051A3 (en) 2002-06-06

Family

ID=22850811

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/026546 WO2002016051A2 (en) 2000-08-23 2001-08-23 Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays

Country Status (2)

Country Link
AU (1) AU2001288402A1 (en)
WO (1) WO2002016051A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
BRPI0520574A2 (en) 2005-09-30 2009-05-19 Airbus Espana Sl surface treatment method of composite material structures with atmospheric plasma beams
US20080216870A1 (en) * 2007-01-19 2008-09-11 Air Liquid Industrial U.S. Lp Dry Ice Blasting With Ozone-Containing Carrier Gas
WO2009064490A2 (en) * 2007-11-14 2009-05-22 The State Of Oregon Acting By & Through The State Board Of Higher Education On Behalf Of Oregon State University Microchannel structures having bonded layers including height control features
US8277741B2 (en) 2008-10-28 2012-10-02 Mccabe Colin Adam Anti-germicidal and/or antimicrobial apparatus for reducing and/or eliminating germs and/or bacteria from the soles of footwear and method for use
EP3536434A1 (en) * 2018-03-06 2019-09-11 Newfrey LLC Protective gas mouthpiece and joining device for joining a stud to a workpiece comprising the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0391035A2 (en) * 1989-04-03 1990-10-10 Hughes Aircraft Company Dense fluid photochemical process for substrate treatment
US5054421A (en) * 1986-07-14 1991-10-08 Mitsubishi Denki K.K. Substrate cleaning device
US5326406A (en) * 1991-07-31 1994-07-05 Kawasaki Steel Corporation Method of cleaning semiconductor substrate and apparatus for carrying out the same
US5725154A (en) * 1995-08-18 1998-03-10 Jackson; David P. Dense fluid spray cleaning method and apparatus
US5782253A (en) * 1991-12-24 1998-07-21 Mcdonnell Douglas Corporation System for removing a coating from a substrate
US5967156A (en) * 1994-11-07 1999-10-19 Krytek Corporation Processing a surface

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5054421A (en) * 1986-07-14 1991-10-08 Mitsubishi Denki K.K. Substrate cleaning device
EP0391035A2 (en) * 1989-04-03 1990-10-10 Hughes Aircraft Company Dense fluid photochemical process for substrate treatment
US5326406A (en) * 1991-07-31 1994-07-05 Kawasaki Steel Corporation Method of cleaning semiconductor substrate and apparatus for carrying out the same
US5782253A (en) * 1991-12-24 1998-07-21 Mcdonnell Douglas Corporation System for removing a coating from a substrate
US5967156A (en) * 1994-11-07 1999-10-19 Krytek Corporation Processing a surface
US5725154A (en) * 1995-08-18 1998-03-10 Jackson; David P. Dense fluid spray cleaning method and apparatus

Also Published As

Publication number Publication date
WO2002016051A2 (en) 2002-02-28
AU2001288402A1 (en) 2002-03-04

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