WO2002014915A3 - Silicon-on-insulator optical waveguide fabrication by local oxidation of silicon - Google Patents

Silicon-on-insulator optical waveguide fabrication by local oxidation of silicon Download PDF

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Publication number
WO2002014915A3
WO2002014915A3 PCT/CA2001/001159 CA0101159W WO0214915A3 WO 2002014915 A3 WO2002014915 A3 WO 2002014915A3 CA 0101159 W CA0101159 W CA 0101159W WO 0214915 A3 WO0214915 A3 WO 0214915A3
Authority
WO
WIPO (PCT)
Prior art keywords
silicon
layer
optical waveguide
local oxidation
waveguide fabrication
Prior art date
Application number
PCT/CA2001/001159
Other languages
French (fr)
Other versions
WO2002014915A2 (en
Inventor
Paul E Jessop
Mathew R T Pearson
Original Assignee
Univ Mcmaster
Paul E Jessop
Mathew R T Pearson
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Mcmaster, Paul E Jessop, Mathew R T Pearson filed Critical Univ Mcmaster
Priority to AU2001281623A priority Critical patent/AU2001281623A1/en
Publication of WO2002014915A2 publication Critical patent/WO2002014915A2/en
Publication of WO2002014915A3 publication Critical patent/WO2002014915A3/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12035—Materials
    • G02B2006/12061—Silicon
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12097—Ridge, rib or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by the arrayed waveguides, e.g. comprising a filled groove in the array section
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12016—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by the input or output waveguides, e.g. tapered waveguide ends, coupled together pairs of output waveguides

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

A method of fabricating an optical waveguide (40) using a silicon-on-insulator wafer (40) having a first layer of silicon dioxide (46) positioned between a silicon substrate (44) and a second layer of silicon (42). The method includes the steps of depositing a masking layer on at least a portion of the second layer of silicon, oxidizing unmasked portions of the second layer, and removing the oxidized unmasked portions of the second layer to define a channel waveguide in which optical radiation can propagate.
PCT/CA2001/001159 2000-08-17 2001-08-16 Silicon-on-insulator optical waveguide fabrication by local oxidation of silicon WO2002014915A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2001281623A AU2001281623A1 (en) 2000-08-17 2001-08-16 Silicon-on-insulator optical waveguide fabrication by local oxidation of silicon

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22574000P 2000-08-17 2000-08-17
US60/225,740 2000-08-17

Publications (2)

Publication Number Publication Date
WO2002014915A2 WO2002014915A2 (en) 2002-02-21
WO2002014915A3 true WO2002014915A3 (en) 2003-05-01

Family

ID=22846032

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CA2001/001159 WO2002014915A2 (en) 2000-08-17 2001-08-16 Silicon-on-insulator optical waveguide fabrication by local oxidation of silicon

Country Status (2)

Country Link
AU (1) AU2001281623A1 (en)
WO (1) WO2002014915A2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1402564B1 (en) * 2001-05-17 2017-07-12 Cisco Technology, Inc. Integrated optical/electronic circuits and associated methods of simultaneous generation thereof
FR2840415A1 (en) * 2002-06-04 2003-12-05 Centre Nat Rech Scient Low loss optical micro-waveguide production involves dry and wet etching procedures to define the side surfaces of the guide and reveal crystalline planes for the side surfaces
US7309628B2 (en) 2004-11-15 2007-12-18 Omar Zia Method of forming a semiconductor device
US7169654B2 (en) 2004-11-15 2007-01-30 Freescale Semiconductor, Inc. Method of forming a semiconductor device
US7067342B2 (en) 2004-11-15 2006-06-27 Freescale Semiconductor, Inc. Method of integrating optical devices and electronic devices on an integrated circuit
US7109051B2 (en) 2004-11-15 2006-09-19 Freescale Semiconductor, Inc. Method of integrating optical devices and electronic devices on an integrated circuit
US7098090B2 (en) 2004-11-15 2006-08-29 Freescale Semiconductor, Inc. Method of forming a semiconductor device
US9039907B2 (en) * 2011-07-20 2015-05-26 Imec Methods for improving integrated photonic device uniformity
US10718901B2 (en) * 2013-06-26 2020-07-21 Micron Technology, Inc. Photonic device having a photonic crystal lower cladding layer provided on a semiconductor substrate
KR20160147018A (en) * 2014-04-30 2016-12-21 후아웨이 테크놀러지 컴퍼니 리미티드 Inverse taper waveguides for low-loss mode converters
US10838146B2 (en) * 2016-06-03 2020-11-17 Rockley Photonics Limited Single mode waveguide with an adiabatic bend
GB2572641B (en) 2018-04-06 2021-06-02 Rockley Photonics Ltd Optoelectronic device and array thereof
WO2022184869A1 (en) 2021-03-05 2022-09-09 Rockley Photonics Limited Higher order mode filter

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0150929A2 (en) * 1984-01-16 1985-08-07 Texas Instruments Incorporated Substrate with optical communications systems between chips mounted thereon
DE4113355A1 (en) * 1991-04-24 1992-10-29 Siemens Ag Optical waveguide in silicon@ layer between boundary regions - which may be constituted by differential doping of semiconductor, or imposition of dielectric material alongside it
US5212111A (en) * 1992-04-22 1993-05-18 Micron Technology, Inc. Local-oxidation of silicon (LOCOS) process using ceramic barrier layer
US5327448A (en) * 1992-03-30 1994-07-05 The Board Of Trustees Of The University Of Illinois Semiconductor devices and techniques for controlled optical confinement
US5360982A (en) * 1991-10-08 1994-11-01 U.S. Philips Corporation Optoelectronic semiconductor having a groove-shaped waveguide
EP0793121A2 (en) * 1996-02-29 1997-09-03 Nortel Networks Corporation Semiconductor optical waveguide

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0150929A2 (en) * 1984-01-16 1985-08-07 Texas Instruments Incorporated Substrate with optical communications systems between chips mounted thereon
DE4113355A1 (en) * 1991-04-24 1992-10-29 Siemens Ag Optical waveguide in silicon@ layer between boundary regions - which may be constituted by differential doping of semiconductor, or imposition of dielectric material alongside it
US5360982A (en) * 1991-10-08 1994-11-01 U.S. Philips Corporation Optoelectronic semiconductor having a groove-shaped waveguide
US5327448A (en) * 1992-03-30 1994-07-05 The Board Of Trustees Of The University Of Illinois Semiconductor devices and techniques for controlled optical confinement
US5212111A (en) * 1992-04-22 1993-05-18 Micron Technology, Inc. Local-oxidation of silicon (LOCOS) process using ceramic barrier layer
EP0793121A2 (en) * 1996-02-29 1997-09-03 Nortel Networks Corporation Semiconductor optical waveguide

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
CUTOLO A ET AL: "SILICON ELECTRO-OPTIC MODULAR BASED ON A THREE TERMINAL DEVICE INTEGRATED IN A LOW-LOSS SINGLE MODE SOI WAVEGUIDE", JOURNAL OF LIGHTWAVE TECHNOLOGY, IEEE. NEW YORK, US, vol. 15, no. 3, 1 March 1997 (1997-03-01), pages 505 - 518, XP000686685, ISSN: 0733-8724 *
PEARSON M R T ET AL: "ARRAYED WAVEGUIDE RATING DEMULTIPLEXERS IN SILICON-ON-INSULATOR", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 3953, 28 January 2000 (2000-01-28), pages 11 - 18, XP001040941 *
RICKMAN A G ET AL: "SILICON-ON-INSULATOR OPTICAL RIB WAVEGUIDES: LOSS, MODE CHARACTERISTICS, BENDS AND Y-JUNCTIONS", IEE PROCEEDINGS: OPTOELECTRONICS, INSTITUTION OF ELECTRICAL ENGINEERS, STEVENAGE, GB, vol. 141, no. 6, 1 December 1994 (1994-12-01), pages 391 - 393, XP000494732, ISSN: 1350-2433 *

Also Published As

Publication number Publication date
WO2002014915A2 (en) 2002-02-21
AU2001281623A1 (en) 2002-02-25

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