WO2001098825A1 - Apparatus and method for producing pulsed mid infra-red radiation - Google Patents

Apparatus and method for producing pulsed mid infra-red radiation Download PDF

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Publication number
WO2001098825A1
WO2001098825A1 PCT/GB2001/002095 GB0102095W WO0198825A1 WO 2001098825 A1 WO2001098825 A1 WO 2001098825A1 GB 0102095 W GB0102095 W GB 0102095W WO 0198825 A1 WO0198825 A1 WO 0198825A1
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WIPO (PCT)
Prior art keywords
radiation
red
laser
infra
producing
Prior art date
Application number
PCT/GB2001/002095
Other languages
French (fr)
Inventor
Ian Weaver
Original Assignee
Central Research Laboratories Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Central Research Laboratories Limited filed Critical Central Research Laboratories Limited
Priority to AU2001256489A priority Critical patent/AU2001256489A1/en
Publication of WO2001098825A1 publication Critical patent/WO2001098825A1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2/00—Demodulating light; Transferring the modulation of modulated light; Frequency-changing of light
    • G02F2/02—Frequency-changing of light, e.g. by quantum counters

Definitions

  • the present invention relates to an apparatus and method for producing pulsed mid infra-red radiation. It relates particularly, but not exclusively, to an apparatus and method for producing pulsed mid infra-red radiation suitable for use in spectroscopy.
  • Infra-red radiation is the part of the electromagnetic spectrum that lies between visible light and micro-wave radiation.
  • the absorption of infra-red radiation by a material gives extremely useful information about the molecular structure of that material. If infra-red radiation is directed through a material, some wavelengths will be absorbed by the material, and some will be transmitted by the material. Analysis of the resulting absorption spectrum can thus reveal details about the molecular groups present, and can therefore be used to identify the material.
  • This technique is known as infra-red spectroscopy. Mid infra-red radiation in the range 5 to 10 micrometers is preferred for spectroscopy, as at these wavelengths the spectra are clearly defined and are therefore more easily interpreted than spectra obtained using radiation of a shorter wavelength.
  • instruments that are used to perform infra-red spectroscopy employ a detector to detect the transmitted infra-red radiation.
  • detectors include solid state photon counting detectors such as InGaAs, InAsSb and cadmium mercury teluride (CMT) detectors, and temperature detectors such as pyroelectric devices.
  • CMT cadmium mercury teluride
  • the photon counting detectors suffer from temperature sensitivity and must therefore be cooled in order to reduce the effects of background radiation. Cooling is usually achieved by the use of, for example, liquid nitrogen or Peltier coolers.
  • the spectroscope be uncooled, due to the inconvenience (and expense) of having to provide a liquid nitrogen supply.
  • LEDs light emitting diodes
  • Lasers inherently generate only a narrow range of wavelengths and are unsuitable for a spectroscope where a broader range of wavelengths is required.
  • LEDs have been developed that emit over the 3 to 4.5 micrometer range, with work progressing to push this further into the red end of the spectrum. However, this is still not in the preferred 5 to 10 micrometer range. Therefore, at present, it is not possible to use LEDs to directly produce mid infra-red radiation for spectroscopy.
  • Hot thermal radiation sources such as filaments have formed the mainstay of sources over the 5 to 10 micrometer range.
  • pyroelectric detectors are usually used. These detectors work on the principle of measuring the rate of change of temperature, rather than absolute temperature and, as a result, they do not have to be cooled.
  • filaments and other sources which have a high thermal mass require some form of modulation when used in conjunction with pyroelectric detectors, due to the manner in which pyroelectric detectors work. Such modulation is known as chopping, and allows a pyroelectric detector to measure differentially between dark and light states. Sources with a high thermal mass are difficult to self-modulate and are not ideal for use with pyroelectric detectors.
  • CMOS complementary metal-oxide-semiconductor
  • CMOS complementary metal-oxide-semiconductor
  • chopper add cost and complexity to a spectroscope, and mechanical devices can have fairly short lifetimes as a result of wear and tear.
  • Low thermal mass sources such as thin film filaments
  • They are also not ideally suited for use with pyroelectric detectors in mid infra-red spectroscopy.
  • Thermal radiation emitters are also not ideally suited for mid infra-red spectroscopy because emission over the 5 to 10 micrometer range is relatively weak due to this radiation lying within the tail of the spectral black-body emission curve, with the majority of the available emission occurring in the near infra-red part of the spectrum.
  • Spectroscopes which use thermal radiation emitters generally have to use relatively unresponsive detectors coupled to infra-red sources which have relatively weak emission over the required wavelength range, resulting in signal strength problems.
  • a source suitable for a mid infra-red spectroscope which utilises a pyroelectric detector is a broadband emitter with the required wavelength range of approximately 5 to 10 micrometers.
  • the source should also be a high intensity source to account for the lack of response of pyroelectric detectors.
  • Figure 1 shows a schematic view of a first apparatus for producing pulsed mid infra-red radiation, according to the invention.
  • Figure 2 shows a schematic view of a second apparatus for producing pulsed mid infrared radiation, accordin • ⁇ g to the invention.
  • the apparatus (10a) includes a laser (12), and a supporting substrate (14) which is coated with a phosphor (16).
  • the supporting substrate (14) can include glass, ceramic, plastic, metal, or other suitable material.
  • the substrate (14) is generally planar, although it may be any suitable shape.
  • the substrate (14) is positioned so that at least some of the light emanating from the laser (12) will reach the phosphor coating (16).
  • FIG. 2 A second apparatus for producing a pulsed mid infra-red source is shown in Figure 2.
  • the apparatus (10b) is identical to the first apparatus (10a), except that the supporting substrate (14) is coated with a reflective layer (18). This reflective layer (18) is in turn coated with a phosphor (16).
  • a phosphor (16) with a grain size of approximately 10 micrometers, and which phosphoresces in the mid infra-red range, is suitable for use in the first and second apparatus (10a,b). It will, however, be appreciated that phosphors with other grain sizes may be used, and a single phosphor or a mixture of two or more suitable phosphors can be used.
  • a glue is spin coated to, for example, a few tens of micrometers onto the substrate (14) or the reflective layer (18), and the phosphor (16) deposited thereon. The thickness of the phosphor coating (16) will depend on the grain size of the phosphor used, although a phosphor coating (16) of approximately 3 to 5 grains thick will be suitable in most circumstances.
  • a suitable laser (12) for use with the first and second apparatus (10a,b) is a solid state electrically pumped diode laser, or a neodymium-doped yttrium aluminium garnet
  • Nd:YAG Pulsed Nd:YAG lasers are commercially available and are used in many different fields due to their relatively low cost, large average and peak powers, and high pulse repetition frequencies. Other standard commercially available lasers which are capable of being modulated can be used. Diode lasers are very suitable as they not only have long lifetimes, but are also very efficient and can be easily pulsed to yield very stable square wave output characteristics. Either a single diode laser could be used, or an array of diode lasers, depending on the application and/or the size of the diode laser.
  • the first and second apparatus (10a,b) can be built to the required size.
  • the apparatus (10a,b) could include a sub-centimeter diode laser (12), a phosphor supporting substrate (14) of area 1 square centimeter, placed a couple of centimeters from the laser.
  • the phosphor (16) is pumped radiatively by the laser (12) and phosphoresces to emit infra-red radiation between, for example, 5 to 10 micrometers, depending on the phosphor used.
  • the laser (12) is pulsed so that the infra-red radiation generated by the phosphor coating (16) also pulses, the characteristics of the pulses governed by the pulse characteristics of the laser.
  • the use of reflective layer (18) allows more efficient use of the radiation incident on the phosphor coating (16), and ensures that radiation produced by the phosphor is directed towards its intended target, rather than through the substrate (14).
  • a waveguide such as a fibre optic cable or a hollow waveguide, may be used to direct the radiation from the laser to the phosphor coated substrate(14).
  • Other types of lasers (12) such as carbon dioxide lasers may be used with the apparatus (10a,b), and spatial filters may be used to yield a more uniform laser beam.

Abstract

The apparatus (10) comprises a laser (12) for producing a first pulsed beam of radiation in a band other than the mid infra-red, and a substrate (14) coated with a phosphor which, when excited by the laser (12), produces a pulsed beam of mid infra-red radiation (16). The pulsed beam of mid infra-red radiation produced by the apparatus (10) is of a high intensity, and is especially suitable for use in spectroscopes which utilise pyroelectric detectors.

Description

APPARATUS AND METHOD FOR PRODUCING PULSED MID INFRA-RED RADIATION
Technical Field
The present invention relates to an apparatus and method for producing pulsed mid infra-red radiation. It relates particularly, but not exclusively, to an apparatus and method for producing pulsed mid infra-red radiation suitable for use in spectroscopy.
Background Art
Infra-red radiation is the part of the electromagnetic spectrum that lies between visible light and micro-wave radiation. The absorption of infra-red radiation by a material gives extremely useful information about the molecular structure of that material. If infra-red radiation is directed through a material, some wavelengths will be absorbed by the material, and some will be transmitted by the material. Analysis of the resulting absorption spectrum can thus reveal details about the molecular groups present, and can therefore be used to identify the material. This technique is known as infra-red spectroscopy. Mid infra-red radiation in the range 5 to 10 micrometers is preferred for spectroscopy, as at these wavelengths the spectra are clearly defined and are therefore more easily interpreted than spectra obtained using radiation of a shorter wavelength.
In general, instruments that are used to perform infra-red spectroscopy employ a detector to detect the transmitted infra-red radiation. Examples of these detectors are solid state photon counting detectors such as InGaAs, InAsSb and cadmium mercury teluride (CMT) detectors, and temperature detectors such as pyroelectric devices. However, the photon counting detectors suffer from temperature sensitivity and must therefore be cooled in order to reduce the effects of background radiation. Cooling is usually achieved by the use of, for example, liquid nitrogen or Peltier coolers. For in situ industrial applications, there is generally a requirement that the spectroscope be uncooled, due to the inconvenience (and expense) of having to provide a liquid nitrogen supply. There has been extensive work to develop pulsed solid state sources for use in mid infra-red spectroscopy. Such work has concentrated on the development of both lasers and light emitting diodes (LEDs). Lasers inherently generate only a narrow range of wavelengths and are unsuitable for a spectroscope where a broader range of wavelengths is required. LEDs have been developed that emit over the 3 to 4.5 micrometer range, with work progressing to push this further into the red end of the spectrum. However, this is still not in the preferred 5 to 10 micrometer range. Therefore, at present, it is not possible to use LEDs to directly produce mid infra-red radiation for spectroscopy.
Hot thermal radiation sources such as filaments have formed the mainstay of sources over the 5 to 10 micrometer range. In order to detect infra-red radiation emitted from these sources, pyroelectric detectors are usually used. These detectors work on the principle of measuring the rate of change of temperature, rather than absolute temperature and, as a result, they do not have to be cooled. However, filaments and other sources which have a high thermal mass require some form of modulation when used in conjunction with pyroelectric detectors, due to the manner in which pyroelectric detectors work. Such modulation is known as chopping, and allows a pyroelectric detector to measure differentially between dark and light states. Sources with a high thermal mass are difficult to self-modulate and are not ideal for use with pyroelectric detectors. They can, however, be modulated using a separate modulator or chopper such as, for example, a rotating wheel with alternating solid and cut-away portions which intermittently permit the passage of radiation. These types of chopper add cost and complexity to a spectroscope, and mechanical devices can have fairly short lifetimes as a result of wear and tear.
Low thermal mass sources, such as thin film filaments, have been developed and are capable of being self-modulated, but the depth of modulation and the maximum attainable temperature falls rapidly with modulation frequency. They are also not ideally suited for use with pyroelectric detectors in mid infra-red spectroscopy. Thermal radiation emitters are also not ideally suited for mid infra-red spectroscopy because emission over the 5 to 10 micrometer range is relatively weak due to this radiation lying within the tail of the spectral black-body emission curve, with the majority of the available emission occurring in the near infra-red part of the spectrum. Spectroscopes which use thermal radiation emitters generally have to use relatively unresponsive detectors coupled to infra-red sources which have relatively weak emission over the required wavelength range, resulting in signal strength problems.
In summary, it can be seen that a source suitable for a mid infra-red spectroscope which utilises a pyroelectric detector is a broadband emitter with the required wavelength range of approximately 5 to 10 micrometers. The source should also be a high intensity source to account for the lack of response of pyroelectric detectors.
An aim of the present invention is to provide a method and apparatus for producing a source of pulsed mid infra-red radiation. Another aim of the present invention is to provide a method and apparatus for producing a source of high intensity pulsed mid infra-red radiation for use in spectroscopy.
Disclosure of Invention
According to a first aspect of the invention there is provided an apparatus for producing pulsed mid infra-red radiation, as claimed in claims 1 to 12.
According to a second aspect of the invention there is provided a method of producing pulsed mid infra-red radiation, as claimed in claim 13.
According to another aspect of the invention there is provided a radiation producing means for use in the method, as claimed in claims 14 to 16.
According to another aspect of the invention there is provided a system for analysing a material, the system including the apparatus claimed in any of claims 1 to 12. Brief Description of Drawings
A number of embodiments of the invention will now be described, by way of example only, with reference to the accompanying Figures, in which: -
Figure 1 shows a schematic view of a first apparatus for producing pulsed mid infra-red radiation, according to the invention; and
Figure 2 shows a schematic view of a second apparatus for producing pulsed mid infrared radiation, accordin •Όg to the invention.
Detailed Description of Preferred Embodiments
Referring to Figure 1, there is shown a first apparatus (10a) for producing a pulsed mid infra-red source. The apparatus (10a) includes a laser (12), and a supporting substrate (14) which is coated with a phosphor (16). The supporting substrate (14) can include glass, ceramic, plastic, metal, or other suitable material. The substrate (14) is generally planar, although it may be any suitable shape. The substrate (14) is positioned so that at least some of the light emanating from the laser (12) will reach the phosphor coating (16).
A second apparatus for producing a pulsed mid infra-red source is shown in Figure 2. The apparatus (10b) is identical to the first apparatus (10a), except that the supporting substrate (14) is coated with a reflective layer (18). This reflective layer (18) is in turn coated with a phosphor (16).
A phosphor (16) with a grain size of approximately 10 micrometers, and which phosphoresces in the mid infra-red range, is suitable for use in the first and second apparatus (10a,b). It will, however, be appreciated that phosphors with other grain sizes may be used, and a single phosphor or a mixture of two or more suitable phosphors can be used. A glue is spin coated to, for example, a few tens of micrometers onto the substrate (14) or the reflective layer (18), and the phosphor (16) deposited thereon. The thickness of the phosphor coating (16) will depend on the grain size of the phosphor used, although a phosphor coating (16) of approximately 3 to 5 grains thick will be suitable in most circumstances. A suitable laser (12) for use with the first and second apparatus (10a,b) is a solid state electrically pumped diode laser, or a neodymium-doped yttrium aluminium garnet
(Nd:YAG) laser. Pulsed Nd:YAG lasers are commercially available and are used in many different fields due to their relatively low cost, large average and peak powers, and high pulse repetition frequencies. Other standard commercially available lasers which are capable of being modulated can be used. Diode lasers are very suitable as they not only have long lifetimes, but are also very efficient and can be easily pulsed to yield very stable square wave output characteristics. Either a single diode laser could be used, or an array of diode lasers, depending on the application and/or the size of the diode laser.
The first and second apparatus (10a,b) can be built to the required size. For example, the apparatus (10a,b) could include a sub-centimeter diode laser (12), a phosphor supporting substrate (14) of area 1 square centimeter, placed a couple of centimeters from the laser.
During operation of the first and second apparatus (10a,b), the phosphor (16) is pumped radiatively by the laser (12) and phosphoresces to emit infra-red radiation between, for example, 5 to 10 micrometers, depending on the phosphor used. The laser (12) is pulsed so that the infra-red radiation generated by the phosphor coating (16) also pulses, the characteristics of the pulses governed by the pulse characteristics of the laser. In the second apparatus (10b), the use of reflective layer (18) allows more efficient use of the radiation incident on the phosphor coating (16), and ensures that radiation produced by the phosphor is directed towards its intended target, rather than through the substrate (14).
Variation may be made to the aforementioned embodiments without departing from the scope of the invention. For example, a waveguide such as a fibre optic cable or a hollow waveguide, may be used to direct the radiation from the laser to the phosphor coated substrate(14). Other types of lasers (12) such as carbon dioxide lasers may be used with the apparatus (10a,b), and spatial filters may be used to yield a more uniform laser beam.

Claims

Claims
1. An apparatus (10) for producing pulsed mid infra-red radiation comprising: first radiation producing means for producing a first pulsed beam of radiation (12) in a band other than the mid infra-red, and second radiation producing means which, when excited by the first pulsed beam of radiation (12), produces a second pulsed beam of mid infra-red radiation (16).
2. An apparatus (10) according to claim 1 wherein the first radiation producing means
(12) is at least one laser.
3. An apparatus (10) according to claim 1 wherein the second radiation producing means (16) includes a phosphor.
4. An apparatus (10) according to claim 1 wherein the second radiation producing means (16) is supported by a substrate (14).
5. An apparatus (10) according to claim 2 wherein the laser (12) is a solid state laser.
6. An apparatus (10) according to claim 2 wherein the laser (12) is a diode laser.
7. An apparatus (10) according to claim 5 wherein the laser (12) is an Nd:YAG laser.
8. An apparatus (10) according to claim 1 further including directing means for directing radiation from the first radiation producing means (12) to the second radiation producing means (16).
9. An apparatus (10) according to claim 8 wherein the directing means is at least one optical fibre.
10. An apparatus (10) according to claim 8 wherein the directing means is a hollow waveguide.
11. An apparatus (10) according to any of claims 4 to 10 wherein the substrate (14) is substantially planar.
12. An apparatus (10) according to claim 11 wherein a layer of reflective material (18) is disposed between the substrate (14) and the second radiation producing means (16).
13. A method of producing pulsed mid infra-red radiation, the method comprising the steps of: producing a first pulsed beam of radiation in a band other than the mid infra-red, and directing the first pulsed beam of radiation onto a material which, when excited by the first beam of radiation, produces a second beam of pulsed mid infra-red radiation.
14. A radiation producing means (12) for use in the method of claim 13 comprising a phosphor layer supported by a substrate (14).
15. A radiation producing means (12) according to claim 14 wherein the substrate (14) is substantially planar.
16. A radiation producing means (12) according to claim 15 further including a layer of reflective material (18) disposed between the substrate (14) and the phosphor layer.
17. A system for analysing a material, the system including the apparatus claimed in any of claims 1 to 10.
18. An apparatus substantially as described herein with reference to Figures 1 and 2 of the drawings.
PCT/GB2001/002095 2000-06-20 2001-05-14 Apparatus and method for producing pulsed mid infra-red radiation WO2001098825A1 (en)

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AU2001256489A AU2001256489A1 (en) 2000-06-20 2001-05-14 Apparatus and method for producing pulsed mid infra-red radiation

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GB0015108.4 2000-06-20
GB0015108A GB0015108D0 (en) 2000-06-20 2000-06-20 Apparatus and method for producing pulsed mid infra-red radiation

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3109818A (en) * 1959-08-11 1963-11-05 Philips Corp Infrared phosphors using vanadium as an activator
DE3606764A1 (en) * 1986-03-01 1987-09-03 Messerschmitt Boelkow Blohm METHOD AND DEVICE FOR MICROLOETING
US4755673A (en) * 1984-10-24 1988-07-05 Hughes Aircraft Company Selective thermal radiators
EP0415241A2 (en) * 1989-08-28 1991-03-06 Hughes Aircraft Company Durable infrared target having fast response time
WO1998003512A1 (en) * 1996-07-22 1998-01-29 Novartis Ag Process for the preparation of platinum or palladium benzoporphyrins and platinum or palladium cyclohexenoporphyrins, intermediates, and an oxygen sensor comprising platinum or palladium cyclohexenoporphyrin

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3109818A (en) * 1959-08-11 1963-11-05 Philips Corp Infrared phosphors using vanadium as an activator
US4755673A (en) * 1984-10-24 1988-07-05 Hughes Aircraft Company Selective thermal radiators
DE3606764A1 (en) * 1986-03-01 1987-09-03 Messerschmitt Boelkow Blohm METHOD AND DEVICE FOR MICROLOETING
EP0415241A2 (en) * 1989-08-28 1991-03-06 Hughes Aircraft Company Durable infrared target having fast response time
WO1998003512A1 (en) * 1996-07-22 1998-01-29 Novartis Ag Process for the preparation of platinum or palladium benzoporphyrins and platinum or palladium cyclohexenoporphyrins, intermediates, and an oxygen sensor comprising platinum or palladium cyclohexenoporphyrin

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GB0015108D0 (en) 2000-08-09
AU2001256489A1 (en) 2002-01-02

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