WO2001072377A3 - Treatment of hazardous gases in effluent - Google Patents
Treatment of hazardous gases in effluent Download PDFInfo
- Publication number
- WO2001072377A3 WO2001072377A3 PCT/US2001/008178 US0108178W WO0172377A3 WO 2001072377 A3 WO2001072377 A3 WO 2001072377A3 US 0108178 W US0108178 W US 0108178W WO 0172377 A3 WO0172377 A3 WO 0172377A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- effluent
- gas
- treatment
- hazardous gases
- process chamber
- Prior art date
Links
- 239000007789 gas Substances 0.000 title abstract 8
- 231100001261 hazardous Toxicity 0.000 title abstract 3
- 238000000034 method Methods 0.000 abstract 3
- 239000000654 additive Substances 0.000 abstract 2
- 230000000996 additive effect Effects 0.000 abstract 2
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
- B01D53/70—Organic halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Biomedical Technology (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treating Waste Gases (AREA)
Abstract
An apparatus and method for reducing hazardous gases exhausted from a process chamber includes an effluent gas treatment system with a gas energizing reactor and an additive gas source. Additive gas comprising reactive gas is introduced into the effluent from the process chamber in a volumetric flow rate in relation to the hazardous gas content in the effluent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001570334A JP2003534112A (en) | 2000-03-24 | 2001-03-13 | Hazardous gas treatment in emissions |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/535,461 | 2000-03-24 | ||
US09/535,461 US6673323B1 (en) | 2000-03-24 | 2000-03-24 | Treatment of hazardous gases in effluent |
US09/547,423 US6391146B1 (en) | 2000-04-11 | 2000-04-11 | Erosion resistant gas energizer |
US09/547,423 | 2000-04-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001072377A2 WO2001072377A2 (en) | 2001-10-04 |
WO2001072377A3 true WO2001072377A3 (en) | 2002-01-31 |
Family
ID=27064816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/008178 WO2001072377A2 (en) | 2000-03-24 | 2001-03-13 | Treatment of hazardous gases in effluent |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2003534112A (en) |
WO (1) | WO2001072377A2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8580076B2 (en) * | 2003-05-22 | 2013-11-12 | Lam Research Corporation | Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith |
US8932430B2 (en) * | 2011-05-06 | 2015-01-13 | Axcelis Technologies, Inc. | RF coupled plasma abatement system comprising an integrated power oscillator |
GB2587393A (en) * | 2019-09-26 | 2021-03-31 | Edwards Ltd | Optimising operating conditions in an abatement apparatus |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5280012A (en) * | 1990-07-06 | 1994-01-18 | Advanced Technology Materials Inc. | Method of forming a superconducting oxide layer by MOCVD |
DE4319118A1 (en) * | 1993-06-09 | 1994-12-15 | Breitbarth Friedrich Wilhelm D | Process and apparatus for disposing of fluorocarbons and other fluorine-containing compounds |
US5663476A (en) * | 1994-04-29 | 1997-09-02 | Motorola, Inc. | Apparatus and method for decomposition of chemical compounds by increasing residence time of a chemical compound in a reaction chamber |
WO1999026726A1 (en) * | 1997-11-25 | 1999-06-03 | State Of Israel - Ministry Of Defense Rafael - Armament Development Authority | Modular dielectric barrier discharge device for pollution abatement |
-
2001
- 2001-03-13 WO PCT/US2001/008178 patent/WO2001072377A2/en active Search and Examination
- 2001-03-13 JP JP2001570334A patent/JP2003534112A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5280012A (en) * | 1990-07-06 | 1994-01-18 | Advanced Technology Materials Inc. | Method of forming a superconducting oxide layer by MOCVD |
DE4319118A1 (en) * | 1993-06-09 | 1994-12-15 | Breitbarth Friedrich Wilhelm D | Process and apparatus for disposing of fluorocarbons and other fluorine-containing compounds |
US5663476A (en) * | 1994-04-29 | 1997-09-02 | Motorola, Inc. | Apparatus and method for decomposition of chemical compounds by increasing residence time of a chemical compound in a reaction chamber |
WO1999026726A1 (en) * | 1997-11-25 | 1999-06-03 | State Of Israel - Ministry Of Defense Rafael - Armament Development Authority | Modular dielectric barrier discharge device for pollution abatement |
Also Published As
Publication number | Publication date |
---|---|
JP2003534112A (en) | 2003-11-18 |
WO2001072377A2 (en) | 2001-10-04 |
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