WO2001059891A3 - Energy stabilized gas discharge laser - Google Patents

Energy stabilized gas discharge laser Download PDF

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Publication number
WO2001059891A3
WO2001059891A3 PCT/IB2001/000789 IB0100789W WO0159891A3 WO 2001059891 A3 WO2001059891 A3 WO 2001059891A3 IB 0100789 W IB0100789 W IB 0100789W WO 0159891 A3 WO0159891 A3 WO 0159891A3
Authority
WO
WIPO (PCT)
Prior art keywords
laser
driving voltage
energy
tolerance range
input driving
Prior art date
Application number
PCT/IB2001/000789
Other languages
French (fr)
Other versions
WO2001059891A2 (en
Inventor
Vadim Berger
Igor Bragin
Original Assignee
Lambda Physik Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lambda Physik Ag filed Critical Lambda Physik Ag
Priority to JP2001559108A priority Critical patent/JP2003523091A/en
Publication of WO2001059891A2 publication Critical patent/WO2001059891A2/en
Publication of WO2001059891A3 publication Critical patent/WO2001059891A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)

Abstract

A method and apparatus for maintaining an output energy of an excimer or molecular fluorine laser within a tolerance range of a desired energy and for maintaining an imput driving voltage within a tolerance range of an optimal input driving voltage, the excimer or molecular fluorine laser having a laser tube filled with a gas mixture, multiple electrodes within the laser tube coupled with a gas discharge circuit for energizing the gas mixture and a resonator for generating a laser beam, includes operating the laser to emit the laser beam within said tolerance range of said desired energy. An energy of the laser beam is measured. An input driving voltage is adjusted to maintain the energy of the laser beam within the tolerance range of the desired energy. A value of the input driving voltage is determined. A total pressure of the gas mixture within the laser tube is adjusted to maintain the input driving voltage within the tolerance range of the optimal input driving voltage.
PCT/IB2001/000789 2000-02-11 2001-02-09 Energy stabilized gas discharge laser WO2001059891A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001559108A JP2003523091A (en) 2000-02-11 2001-02-09 Gas discharge laser with stabilized average pulse energy

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18208300P 2000-02-11 2000-02-11
US60/182,083 2000-02-11

Publications (2)

Publication Number Publication Date
WO2001059891A2 WO2001059891A2 (en) 2001-08-16
WO2001059891A3 true WO2001059891A3 (en) 2002-03-07

Family

ID=22666991

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2001/000789 WO2001059891A2 (en) 2000-02-11 2001-02-09 Energy stabilized gas discharge laser

Country Status (2)

Country Link
JP (1) JP2003523091A (en)
WO (1) WO2001059891A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6697695B1 (en) * 2000-04-25 2004-02-24 Komatsu Ltd. Laser device management system
DE102012113007B3 (en) 2012-12-21 2014-02-06 Ushio Denki Kabushiki Kaisha Method for controlling discharge plasma radiation source based on pulsed radiation stabilization, involves determining calibration function if deviation value between statistical value and reference value exceeds preset tolerance range

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4722090A (en) * 1985-03-18 1988-01-26 Mitsubishi Denki Kabushiki Kaisha Excimer laser equipment
US4977573A (en) * 1989-03-09 1990-12-11 Questek, Inc. Excimer laser output control device
JPH0487388A (en) * 1990-07-30 1992-03-19 Shimadzu Corp Excimer laser
DE19618119A1 (en) * 1995-05-12 1996-11-14 Lambda Physik Gmbh Excimer laser energy pulse control method for scientific, medical or industrial use
US6018537A (en) * 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
EP1075060A2 (en) * 1999-08-04 2001-02-07 Cymer, Inc. Automatic fluorine concentration control system for excimer laser

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4722090A (en) * 1985-03-18 1988-01-26 Mitsubishi Denki Kabushiki Kaisha Excimer laser equipment
US4977573A (en) * 1989-03-09 1990-12-11 Questek, Inc. Excimer laser output control device
JPH0487388A (en) * 1990-07-30 1992-03-19 Shimadzu Corp Excimer laser
DE19618119A1 (en) * 1995-05-12 1996-11-14 Lambda Physik Gmbh Excimer laser energy pulse control method for scientific, medical or industrial use
US6018537A (en) * 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
EP1075060A2 (en) * 1999-08-04 2001-02-07 Cymer, Inc. Automatic fluorine concentration control system for excimer laser

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 016, no. 312 (E - 1230) 9 July 1992 (1992-07-09) *

Also Published As

Publication number Publication date
WO2001059891A2 (en) 2001-08-16
JP2003523091A (en) 2003-07-29

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