WO2001036998A1 - X-ray beam position monitors - Google Patents
X-ray beam position monitors Download PDFInfo
- Publication number
- WO2001036998A1 WO2001036998A1 PCT/GB2000/003917 GB0003917W WO0136998A1 WO 2001036998 A1 WO2001036998 A1 WO 2001036998A1 GB 0003917 W GB0003917 W GB 0003917W WO 0136998 A1 WO0136998 A1 WO 0136998A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ray beam
- electrodes
- plane
- electrode
- series
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/26—Measuring radiation intensity with resistance detectors
Definitions
- This invention relates to X-ray beam position monitors and represents a development of the invention disclosed in the applicants' co-pending UK Patent Application No 9913615.2.
- the aim of the invention is to provide monitoring of at least the rotational positions of the X-ray beam, and preferably both translational and rotational positions.
- an X-ray beam position monitor comprises a first electrode assembly for detecting the rotational position of the X-ray beam about an axis orthogonal to one plane, the first electrode assembly comprising a first series of three collection electrodes and a first biasing electrode, a second electrode assembly for detecting the rotational position of the X-ray beam about another axis orthogonal to another plane transverse to said one plane, the second electrode assembly comprising a second series of three collection electrodes and a second biasing electrode, means for applying a bias voltage to the biasing electrodes and signal processing means for processing electrical signals which are generated at the collection electrodes and deriving therefrom signals which are representative of the rotational position of the X-ray beam about said axes.
- the three collection electrodes of the first series are preferably constituted by an intermediate electrode in the shape of a parallelogram adjacent to which are two end electrodes each triangular in shape, the series of the three collection electrodes preferably having in overall outline a generally rectangular shape.
- the processing means are preferably operative to sum the signals from the end electrodes and subtract therefrom the signal from the intermediate electrode, in order to derive a signal representative of the rotational position of the X-ray beam in said one plane.
- This latter signal may be normalised by dividing it by the sum of the signals from the three electrodes.
- the monitor may also detect the translational position of the X-ray beam in said one plane, in which case the signal processing means are additionally operative to obtain the difference between the signals from the two end electrodes, in order to derive a signal representative of the translational position of the X-ray beam in said one plane. This latter may be normalised by dividing it by the signal from the intermediate electrode.
- the three collection electrodes of the second series are preferably constituted by a second intermediate electrode in the shape of a parallelogram adjacent to which are two second end electrodes each triangular in shape, the series of the three collection electrodes of the second series preferably having in overall outline a generally rectangular shape.
- the processing means are preferably operative to sum the signals from the second end electrodes and subtract therefrom the signal from the second intermediate electrode, in order to derive a signal representative of the rotational position of the X-ray beam in said another plane.
- the monitor may also detect the translational position of the X-ray beam in said another plane, in which case the signal processing means are additionally operative to obtain the difference between the signals from the two second end electrodes, in order to derive a signal representative of the translational position of the X-ray beam in said another plane.
- the first electrode assembly and the second electrode assembly may be positioned at substantially the same axial position along the direction of propagation of the X-ray beam, in which case the means for applying the bias voltage include switching means for applying the bias voltage to the first biasing electrode or the second biasing electrode.
- the first electrode assembly and the second electrode assembly are not at the same axial position along the direction of propagation of the X-ray beam.
- the electrodes of the first assembly are preferably orthogonal to the electrodes of the second assembly, so that said one plane and said other plane are mutually orthogonal.
- the first and second electrode assemblies When the first and second electrode assemblies are placed at substantially the same position along the direction of propagation of the X-ray beam, the first and second electrode assemblies preferably constitute the four walls of a square-section tunnel-like structure through which the X-ray beam is propagated.
- the X-ray beam position sensor preferably acts as a null-seeking device, the beam being centred (in both translational and rotational senses) by means of adjustments in the two planes of positioning, until the electrical signals are representative of a centred position of the X-ray beam.
- This adjustment can be simultaneous when the first and second electrode assemblies are axially spaced, but is sequential in the two planes of positioning when the first and second electrode assemblies are at the same axial position. Adjustment may be achieved by applying a centring movement to the beam, to the assembly or to a combination of both beam and assembly.
- Figure 1 is a view showing the structure of collection and bias electrodes in the first embodiment.
- Figure 2 is a view showing three collection electrodes of the first embodiment.
- Figure 3 shows the electrical circuitry of the embodiment of Figure 1 .
- Figure 4 is a view showing the structure of collection and bias electrodes of the second embodiment.
- the sensor comprises a first electrode assembly comprising a first series of three collection electrodes la, lb, lc printed on a first anode board 2, and a first biasing electrode 3 printed on a first cathode board 4.
- the anode and cathode boards 2 and 4 occupy vertically spaced horizontal planes with the first series of collection electrodes la, lb, lc facing the first biasing electrode 3.
- the first biasing electrode 3 is rectangular in shape, the first series of three collection electrodes la, lb, lc, having, in overall outline, a similar rectangular shape which is divided by two angled but mutually parallel lines of separation so that the electrode lb defines an intermediate electrode in the shape of a parallelogram and the two electrodes la and lc are end electrodes each in the shape of a right-angled triangle.
- the pair of boards 2 and 8 are separated by a short distance from the pair of boards 3 and 6.
- the first anode board 2 and its three collection electrodes la, lb and lc are shown in Figure 2.
- Also shown diagrammatically in Figure 2 are the respective electrical connections to the three electrodes la, lb and lc.
- the second electrode assembly comprises a second series of three collection electrodes 5a, 5b, 5c printed on a second anode board 6, and a second biasing electrode 7 printed on a second cathode board 8.
- the second anode and cathode boards occupy horizontally spaced vertical planes, with the second series of collection electrodes 5a, 5b, 5c facing the second biasing electrode 7.
- the second biasing electrode 7 is rectangular in shape, the second series of three collection electrodes 5a, 5b, 5c having, in overall outline, a similar rectangular shape which is divided by two angled but mutually parallel lines of separation so that the electrode 5b defines an intermediate electrode in the shape of a parallelogram and the two end electrodes 5a, 5b are in the shape of right-angled triangles.
- Each electrode la, lb, lc, 5a, 5b, 5c, 3 and 7 is formed by an area of copper deposited on the appropriate board.
- the first and second electrode assemblies are positioned at the same axial position along the direction of propagation of the X-ray beam, the centred direction of which is indicated at 9 in Figure 1.
- the first and second electrode assemblies thus form a tunnel like structure of square cross-sectional shape, through which the X-ray beam is propagated.
- each board is a rectangle 8mm wide by 36mm long, with a spacing of 10mm between anode and cathode.
- the air-filled tunnel-like structure is 36mm long and has a square cross-sectional shape with an edge dimension of 10mm. This structure fits within a 25mm diameter tube, thus providing a compact arrangement.
- the two cathode or biasing electrodes 3, 7 are connected to a double pole switch 10, in one position of which (illustrated in Figure 3) the electrode 7 is grounded and the electrode 3 is connected to a -300 volt source 12, and in the other position of which the electrode 7 is connected to the -300 volt source 12 and the electrode 3 is grounded.
- Figure 3 is diagrammatic because there is no transverse plane which would show all six of these electrodes.
- the three collection electrodes la, lb, lc are respectively electrically connected to three current to voltage amplifiers 13, 14, 15 each having a respective feedback resistor 16, 17, 18 typically of 20 G ⁇ .
- the amplifiers 13, 14, 15 have respective voltage outputs Va,, Vb, and Vc, respectively proportional to the charges collected on the electrodes la, lb and lc as a result of the ionisation produced by the X-ray beam.
- the three collection electrodes 5a, 5b, 5c are respectively connected to three current to voltage amplifiers 19, 20, 21 each having a respective feedback resistor 23, 24, 25 of 20 G ⁇ .
- the three amplifiers 19, 20, 21 have respective voltage outputs Va 2 , Vb 2 and Vc 2 respectively proportional to the charges collected on the electrodes 5a, 5b and 5c as a result of the ionisation produced by the X-ray beam.
- the voltages Va, Vb, Vc are used to derive a first signal R, representative of the rotational displacement (about the central vertical axis 26) of the X-ray beam from the central axis.
- R Va, + Vc, -Vb, Va, + Vb, + Vc,
- R is indicative of the rotation (about the vertical axis 26) required to make the X-ray beam parallel to the central axis.
- the denominator in the above expression for R normalises the signal.
- the voltages Va,, Vb,, and Vc are used to derive a first signal T, representative of the translational displacement of the X-ray beam, in a horizontal plane, from the centre of the chamber.
- T, Va, - Vc, Vb, where the denominator normalises the signal. It can be shown that T, changes from + 1 through 0 to -1 as the position of the beam moves from one long edge of the electrode through the centre to the other long edge. As a result of normalisation, the values of R, and T, are independent of the X-ray beam intensity and depend solely on the beam position.
- the voltages Va 2 Vb 2 and Vc 2 are used to derive a second signal R 2 representative of the rotational displacement (about the transverse horizontal axis 27) of the X-ray beam from the central axis.
- R 2 Va, + Vc, - Vb, Va 2 + Vb 2 + Vc 2
- R 2 is indicative of the rotation (about the horizontal axis 27) required to make the beam parallel to the central axis. It can be shown that
- the voltages Va 2 Vb 2 and Vc 2 are used to derive a second signal T 2 representative of the translational displacement of the X-ray beam (in a vertical plane, from the centre of the chamber) .
- T 2 changes from + 1 through 0 to -1 as the position of the beam moves from one long edge of the electrode through the centre to the other long edge.
- R 2 and T are independent of the X-ray beam intensity and depend solely on the beam position.
- the beam is positioned so as to be maintained in its aligned central position, the alignment of the beam being carried out by sequential adjustment in the horizontal and vertical planes until R, T,, R, and T, are all 0.
- This centring process can be carried out automatically by a central processing unit.
- the embodiment of Figure 1 is a compact arrangement in which the first and second series of electrodes are located at the same axial position along the direction of propagation of the X-ray beam.
- the first series of electrodes la, lb, lc, 3 are located at a different position along the direction of propagation of the X-ray beam from the second series of electrodes 5a, 5b, 5c, 7.
- the X-ray beam passes first through the first series of electrodes and then through the second series of electrodes.
- the signal processing for the embodiment of Figure 4 is the same as for Figure 2, but it is not necessary to use a change-over switch 10 because the bias voltage 12 can be applied to both collection electrodes simultaneously and the signals R, T, R 2 and T 2 are thus obtainable simultaneously and continuously over a chosen period of time.
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Measurement Of Radiation (AREA)
- X-Ray Techniques (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU76768/00A AU767730B2 (en) | 1999-11-16 | 2000-10-12 | X-ray beam position monitors |
EP00966329A EP1230564A1 (en) | 1999-11-16 | 2000-10-12 | X-ray beam position monitor |
CA002387794A CA2387794A1 (en) | 1999-11-16 | 2000-10-12 | X-ray beam position monitors |
JP2001538831A JP2003515142A (en) | 1999-11-16 | 2000-10-12 | X-ray beam position monitor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9926933.4 | 1999-11-16 | ||
GB9926933A GB2356928B (en) | 1999-11-16 | 1999-11-16 | X-ray beam position monitors |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2001036998A1 true WO2001036998A1 (en) | 2001-05-25 |
Family
ID=10864504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/GB2000/003917 WO2001036998A1 (en) | 1999-11-16 | 2000-10-12 | X-ray beam position monitors |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1230564A1 (en) |
JP (1) | JP2003515142A (en) |
AU (1) | AU767730B2 (en) |
CA (1) | CA2387794A1 (en) |
GB (1) | GB2356928B (en) |
WO (1) | WO2001036998A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016128152A1 (en) * | 2015-02-10 | 2016-08-18 | Asml Netherlands B.V. | Radiation sensor |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5379580B2 (en) * | 2008-07-16 | 2013-12-25 | 三菱電機株式会社 | Dose distribution measuring device |
JP5930628B2 (en) * | 2011-08-22 | 2016-06-08 | 株式会社日立製作所 | Radiation irradiation apparatus and radiation measurement method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02136779A (en) * | 1988-11-16 | 1990-05-25 | Toshiba Corp | Beam monitor |
EP0736780A1 (en) * | 1995-04-07 | 1996-10-09 | Rikagaku Kenkyusho | X-ray beam position monitor and its position measurement method |
JPH11174199A (en) * | 1997-12-15 | 1999-07-02 | Kobe Steel Ltd | Beam monitor and method for measuring beam |
-
1999
- 1999-11-16 GB GB9926933A patent/GB2356928B/en not_active Expired - Fee Related
-
2000
- 2000-10-12 JP JP2001538831A patent/JP2003515142A/en active Pending
- 2000-10-12 WO PCT/GB2000/003917 patent/WO2001036998A1/en not_active Application Discontinuation
- 2000-10-12 AU AU76768/00A patent/AU767730B2/en not_active Ceased
- 2000-10-12 CA CA002387794A patent/CA2387794A1/en not_active Abandoned
- 2000-10-12 EP EP00966329A patent/EP1230564A1/en not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02136779A (en) * | 1988-11-16 | 1990-05-25 | Toshiba Corp | Beam monitor |
EP0736780A1 (en) * | 1995-04-07 | 1996-10-09 | Rikagaku Kenkyusho | X-ray beam position monitor and its position measurement method |
JPH11174199A (en) * | 1997-12-15 | 1999-07-02 | Kobe Steel Ltd | Beam monitor and method for measuring beam |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 014, no. 369 (P - 1090) 9 August 1990 (1990-08-09) * |
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 12 29 October 1999 (1999-10-29) * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016128152A1 (en) * | 2015-02-10 | 2016-08-18 | Asml Netherlands B.V. | Radiation sensor |
Also Published As
Publication number | Publication date |
---|---|
JP2003515142A (en) | 2003-04-22 |
AU7676800A (en) | 2001-05-30 |
EP1230564A1 (en) | 2002-08-14 |
CA2387794A1 (en) | 2001-05-25 |
GB9926933D0 (en) | 2000-01-12 |
GB2356928A (en) | 2001-06-06 |
AU767730B2 (en) | 2003-11-20 |
GB2356928B (en) | 2002-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5363051A (en) | Steering capaciflector sensor | |
CN1666101B (en) | Charged particle beam apparatus and method for inspecting samples | |
EP0542560B1 (en) | Scanning control system for an ion-implantation apparatus | |
CA2009562C (en) | Method and apparatus for measuring the resistivity of earth formations | |
EG19716A (en) | Method and device for logging with annular and azimuth electrodes | |
CA2309097A1 (en) | A method and a device for planar beam radiography and a radiation detector | |
JPH0628141B2 (en) | Implant dose measurement and uniformity monitoring device for ion implantation | |
US4047030A (en) | Arrangement for the mass-spectrometric detection of ions | |
AU767730B2 (en) | X-ray beam position monitors | |
EP0821393B1 (en) | Detector objective lens | |
CA2238359A1 (en) | Mounting a solid state particle detector within a magnetic deflection field | |
SE0000986D0 (en) | A method and a device for radiography and a radiation detector | |
US4246479A (en) | Electrostatic energy analysis | |
CN1985344B (en) | Apparatus for shielding a charged particle beam | |
US4479059A (en) | Imaging radiation detector with gain | |
US5134287A (en) | Double-focussing mass spectrometer | |
US6507640B1 (en) | X-ray beam position monitors | |
SE523447C2 (en) | Gas-based ionizing radiation detector with device to reduce the risk of sparks | |
JPH051584B2 (en) | ||
JPH0620633A (en) | Scanning electron microscope | |
SU1112298A1 (en) | Voltage pickup | |
Jenstrom et al. | Steering capaciflector sensor | |
JPH07161328A (en) | Focused ion beam processing device | |
Arndt et al. | Position-sensitive ionization chambers in the alignment of X-ray tubes and diffractometers | |
JPH11293492A (en) | Edge detector for preventing overcoating of strip |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AL AM AT AU AZ BA BB BG BR BY CA CH CN CR CU CZ DE DK DM EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ VN YU ZA ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2000966329 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2387794 Country of ref document: CA |
|
WWE | Wipo information: entry into national phase |
Ref document number: 76768/00 Country of ref document: AU |
|
ENP | Entry into the national phase |
Ref country code: JP Ref document number: 2001 538831 Kind code of ref document: A Format of ref document f/p: F |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10111556 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 2000966329 Country of ref document: EP |
|
REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
WWG | Wipo information: grant in national office |
Ref document number: 76768/00 Country of ref document: AU |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 2000966329 Country of ref document: EP |