WO2001036319A8 - Method for reducing variations in arrays of micro-machined cantilever structures using ion implantation - Google Patents

Method for reducing variations in arrays of micro-machined cantilever structures using ion implantation

Info

Publication number
WO2001036319A8
WO2001036319A8 PCT/US2000/031358 US0031358W WO0136319A8 WO 2001036319 A8 WO2001036319 A8 WO 2001036319A8 US 0031358 W US0031358 W US 0031358W WO 0136319 A8 WO0136319 A8 WO 0136319A8
Authority
WO
WIPO (PCT)
Prior art keywords
micro
arrays
ion implantation
reducing variations
cantilever structures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2000/031358
Other languages
French (fr)
Other versions
WO2001036319A1 (en
Inventor
Thomas Stephen Villani
Lawrence A Goodman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sarnoff Corp
Original Assignee
Sarnoff Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/712,109 external-priority patent/US6410912B1/en
Application filed by Sarnoff Corp filed Critical Sarnoff Corp
Publication of WO2001036319A1 publication Critical patent/WO2001036319A1/en
Publication of WO2001036319A8 publication Critical patent/WO2001036319A8/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00642—Manufacture or treatment of devices or systems in or on a substrate for improving the physical properties of a device
    • B81C1/0065—Mechanical properties
    • B81C1/00666—Treatments for controlling internal stress or strain in MEMS structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0161—Controlling physical properties of the material
    • B81C2201/0163—Controlling internal stress of deposited layers
    • B81C2201/0164—Controlling internal stress of deposited layers by doping the layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Micromachines (AREA)
  • Pressure Sensors (AREA)

Abstract

A method of adjusting the position of a micro-mechanical bi-material cantilever is provided. The bi-material includes a first and a second material and each material has a corresponding thermal expansion coefficient. The method includes implanting ions predominantly into one material of the bi-material to modify internal stress in one of the first and second materials relative to the other material. The deformation of the bi-material is then detected to modulate the implantation of ions thereto.
PCT/US2000/031358 1999-11-15 2000-11-15 Method for reducing variations in arrays of micro-machined cantilever structures using ion implantation Ceased WO2001036319A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US16546399P 1999-11-15 1999-11-15
US60/165,463 1999-11-15
US09/712,109 US6410912B1 (en) 1999-11-15 2000-11-14 Method for reducing variations in arrays of micro-machined cantilever structures using ion implantation
US09/712,109 2000-11-14

Publications (2)

Publication Number Publication Date
WO2001036319A1 WO2001036319A1 (en) 2001-05-25
WO2001036319A8 true WO2001036319A8 (en) 2001-09-27

Family

ID=26861414

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/031358 Ceased WO2001036319A1 (en) 1999-11-15 2000-11-15 Method for reducing variations in arrays of micro-machined cantilever structures using ion implantation

Country Status (1)

Country Link
WO (1) WO2001036319A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103449356B (en) * 2012-05-31 2016-03-30 中国科学院微电子研究所 Stress matching method for bi-material cantilever beam
CN103048051B (en) * 2012-12-17 2014-12-10 中国科学院西安光学精密机械研究所 Infrared detector non-uniformity correction device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3699334A (en) * 1969-06-16 1972-10-17 Kollsman Instr Corp Apparatus using a beam of positive ions for controlled erosion of surfaces
JPS6410140A (en) * 1987-07-02 1989-01-13 Yokogawa Electric Corp Vibration type strain sensor
JP2823276B2 (en) * 1989-03-18 1998-11-11 株式会社東芝 Method for manufacturing X-ray mask and apparatus for controlling internal stress of thin film
US5677090A (en) * 1995-02-23 1997-10-14 Mitsubishi Denki Kabushiki Kaisha Method of making X-ray mask having reduced stress
US5922212A (en) * 1995-06-08 1999-07-13 Nippondenso Co., Ltd Semiconductor sensor having suspended thin-film structure and method for fabricating thin-film structure body
US5844238A (en) * 1996-03-27 1998-12-01 David Sarnoff Research Center, Inc. Infrared imager using room temperature capacitance sensor

Also Published As

Publication number Publication date
WO2001036319A1 (en) 2001-05-25

Similar Documents

Publication Publication Date Title
AU5017996A (en) A method for the manufacturing of micromachined structures and a micromachined structure manufactured using such method
AU2001224663A1 (en) Multiple array and method of making a multiple array
AU2001292539A1 (en) Fuel cell assembly and method for making the same
AU5558799A (en) A mechanical fastener and method for making the same
AU2001278067A1 (en) A mem sensor and a method of making same
EP0747972A3 (en) Solar cell and manufacturing method thereof
AU4908497A (en) Composite shape memory micro actuator
AU7230998A (en) An optical memory device and a method of manufacturing thereof
AU7095396A (en) Asymmetrical steel sheet pile and method for manufacturing the same
EP0763858A3 (en) Photovoltaic element array and method of fabricating the same
AU2001297837A1 (en) A memory matrix and method of operating the same
AU7596198A (en) Cochlear implant with shape memory material and method for implanting the same
AU2002217868A1 (en) A joint structure and method for making a joint structure
WO2000056869A3 (en) Surfactant-lipase complex immobilized on insoluble matrix
AU2001292775A1 (en) A method for quantifying the texture homogeneity of a polycrystalline material
AU6577898A (en) Structural element and method of making
AU2273799A (en) A method for the sub-critical drying of lyogels to produce aerogels
AU4942599A (en) Device and method for expansion forming
WO2001036319A8 (en) Method for reducing variations in arrays of micro-machined cantilever structures using ion implantation
AU9200298A (en) A process to study changes in gene expression in stem cells
AU7940800A (en) Pixel structure having deformable material and method for forming a light valve
AU6229796A (en) Yeast strains having a modified alcoholic sugar fermentation balance, uses thereof, and vectors for producing said strai ns
AU2001294408A1 (en) Method for erecting a building, block and dowel therefore
AU2001230192A1 (en) Method for the enzymatic resolution of the racemates of aminomethyl-aryl-cyclohexanol derivatives
AU1417701A (en) Soluble t cell receptor protein and method of constructing the same

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): JP

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
AK Designated states

Kind code of ref document: C1

Designated state(s): JP

AL Designated countries for regional patents

Kind code of ref document: C1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR

CFP Corrected version of a pamphlet front page
CR1 Correction of entry in section i

Free format text: PAT. BUL. 21/2001 UNDER (30) REPLACE "NOT FURNISHED" BY "09/712109"

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase in:

Ref country code: JP