WO2001027661A3 - Formation d'une surface verticale lisse sur un composant optique - Google Patents

Formation d'une surface verticale lisse sur un composant optique Download PDF

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Publication number
WO2001027661A3
WO2001027661A3 PCT/US2000/041249 US0041249W WO0127661A3 WO 2001027661 A3 WO2001027661 A3 WO 2001027661A3 US 0041249 W US0041249 W US 0041249W WO 0127661 A3 WO0127661 A3 WO 0127661A3
Authority
WO
WIPO (PCT)
Prior art keywords
formation
optical component
vertical surface
smooth vertical
component
Prior art date
Application number
PCT/US2000/041249
Other languages
English (en)
Other versions
WO2001027661A9 (fr
WO2001027661A2 (fr
Inventor
Chi Wu
Tasha E Turner
Stephen E Vargo
Original Assignee
California Inst Of Techn
Chi Wu
Tasha E Turner
Stephen E Vargo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by California Inst Of Techn, Chi Wu, Tasha E Turner, Stephen E Vargo filed Critical California Inst Of Techn
Priority to AU21140/01A priority Critical patent/AU2114001A/en
Publication of WO2001027661A2 publication Critical patent/WO2001027661A2/fr
Publication of WO2001027661A3 publication Critical patent/WO2001027661A3/fr
Publication of WO2001027661A9 publication Critical patent/WO2001027661A9/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G02B1/105—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Micromachines (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Procédé de formation d'une surface sur un composant utilisé pour la mise en réseau optique. Le procédé consiste à appliquer un agent d'attaque chimique et un premier passivant sur le composant suivant un rapport tel qu'il provoque la formation d'une rainure dans le composant ; la rainure comportant des côtés sur lesquels la surface doit être formée. Le procédé consiste également à réduire le rapport de telle sorte que l'application du passivant provoque la formation d'une matière protectrice sur au moins un côté de la rainure où la surface doit être formée.
PCT/US2000/041249 1999-10-15 2000-10-16 Formation d'une surface verticale lisse sur un composant optique WO2001027661A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU21140/01A AU2114001A (en) 1999-10-15 2000-10-16 Formation of smooth vertical surface on an optical component

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15973399P 1999-10-15 1999-10-15
US60/159,733 1999-10-15

Publications (3)

Publication Number Publication Date
WO2001027661A2 WO2001027661A2 (fr) 2001-04-19
WO2001027661A3 true WO2001027661A3 (fr) 2002-02-21
WO2001027661A9 WO2001027661A9 (fr) 2002-08-08

Family

ID=22573781

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/041249 WO2001027661A2 (fr) 1999-10-15 2000-10-16 Formation d'une surface verticale lisse sur un composant optique

Country Status (2)

Country Link
AU (1) AU2114001A (fr)
WO (1) WO2001027661A2 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5182234A (en) * 1986-03-21 1993-01-26 Advanced Power Technology, Inc. Profile tailored trench etch using a SF6 -O2 etching composition wherein both isotropic and anisotropic etching is achieved by varying the amount of oxygen
US5368685A (en) * 1992-03-24 1994-11-29 Hitachi, Ltd. Dry etching apparatus and method
US5498312A (en) * 1993-05-27 1996-03-12 Robert Bosch Gmbh Method for anisotropic plasma etching of substrates
US6055344A (en) * 1998-02-18 2000-04-25 Hewlett-Packard Company Fabrication of a total internal reflection optical switch with vertical fluid fill-holes
US6071822A (en) * 1998-06-08 2000-06-06 Plasma-Therm, Inc. Etching process for producing substantially undercut free silicon on insulator structures

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5182234A (en) * 1986-03-21 1993-01-26 Advanced Power Technology, Inc. Profile tailored trench etch using a SF6 -O2 etching composition wherein both isotropic and anisotropic etching is achieved by varying the amount of oxygen
US5368685A (en) * 1992-03-24 1994-11-29 Hitachi, Ltd. Dry etching apparatus and method
US5498312A (en) * 1993-05-27 1996-03-12 Robert Bosch Gmbh Method for anisotropic plasma etching of substrates
US6055344A (en) * 1998-02-18 2000-04-25 Hewlett-Packard Company Fabrication of a total internal reflection optical switch with vertical fluid fill-holes
US6071822A (en) * 1998-06-08 2000-06-06 Plasma-Therm, Inc. Etching process for producing substantially undercut free silicon on insulator structures

Also Published As

Publication number Publication date
WO2001027661A9 (fr) 2002-08-08
WO2001027661A2 (fr) 2001-04-19
AU2114001A (en) 2001-04-23

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