WO2001011650A1 - Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof - Google Patents
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof Download PDFInfo
- Publication number
- WO2001011650A1 WO2001011650A1 PCT/US2000/040602 US0040602W WO0111650A1 WO 2001011650 A1 WO2001011650 A1 WO 2001011650A1 US 0040602 W US0040602 W US 0040602W WO 0111650 A1 WO0111650 A1 WO 0111650A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- processing
- recited
- plasma
- plasma assisted
- materials
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00965596A EP1212775A1 (en) | 1999-08-06 | 2000-08-07 | Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
KR1020027001630A KR20020029743A (en) | 1999-08-06 | 2000-08-07 | Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
JP2001516213A JP2003506888A (en) | 1999-08-06 | 2000-08-07 | Inductively coupled annular plasma source apparatus and method for processing gases and materials |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14763899P | 1999-08-06 | 1999-08-06 | |
US60/147,638 | 1999-08-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2001011650A1 true WO2001011650A1 (en) | 2001-02-15 |
Family
ID=22522322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/040602 WO2001011650A1 (en) | 1999-08-06 | 2000-08-07 | Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
Country Status (5)
Country | Link |
---|---|
US (1) | US6432260B1 (en) |
EP (1) | EP1212775A1 (en) |
JP (1) | JP2003506888A (en) |
KR (1) | KR20020029743A (en) |
WO (1) | WO2001011650A1 (en) |
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- 2000-08-07 EP EP00965596A patent/EP1212775A1/en not_active Withdrawn
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WO2008076629A3 (en) * | 2006-12-15 | 2008-08-14 | Mks Instr Inc | Inductively-coupled plasma source |
US7969096B2 (en) | 2006-12-15 | 2011-06-28 | Mks Instruments, Inc. | Inductively-coupled plasma source |
WO2008076629A2 (en) * | 2006-12-15 | 2008-06-26 | Mks Instruments, Inc. | Inductively-coupled plasma source |
US10443150B2 (en) | 2015-05-21 | 2019-10-15 | Plasmability, Llc | Toroidal plasma processing apparatus with a shaped workpiece holder |
US10704161B2 (en) | 2015-05-21 | 2020-07-07 | Plasmability, Llc | Toroidal plasma processing apparatus with a shaped workpiece holder |
Also Published As
Publication number | Publication date |
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EP1212775A1 (en) | 2002-06-12 |
KR20020029743A (en) | 2002-04-19 |
US6432260B1 (en) | 2002-08-13 |
JP2003506888A (en) | 2003-02-18 |
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