WO2001006268A8 - Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator - Google Patents

Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator

Info

Publication number
WO2001006268A8
WO2001006268A8 PCT/US2000/019535 US0019535W WO0106268A8 WO 2001006268 A8 WO2001006268 A8 WO 2001006268A8 US 0019535 W US0019535 W US 0019535W WO 0106268 A8 WO0106268 A8 WO 0106268A8
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
electron density
frequency
control system
density measurement
Prior art date
Application number
PCT/US2000/019535
Other languages
French (fr)
Other versions
WO2001006268A1 (en
Inventor
Joseph T Verdeyen
Wayne L Johnson
Murray D Sirkis
Original Assignee
Tokyo Electron Ltd
Joseph T Verdeyen
Wayne L Johnson
Murray D Sirkis
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Joseph T Verdeyen, Wayne L Johnson, Murray D Sirkis filed Critical Tokyo Electron Ltd
Priority to JP2001510852A priority Critical patent/JP4339540B2/en
Priority to EP00947493A priority patent/EP1218763A4/en
Priority to US10/030,947 priority patent/US6573731B1/en
Publication of WO2001006268A1 publication Critical patent/WO2001006268A1/en
Publication of WO2001006268A8 publication Critical patent/WO2001006268A8/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/0046—Arrangements for measuring currents or voltages or for indicating presence or sign thereof characterised by a specific application or detail not covered by any other subgroup of G01R19/00
    • G01R19/0061—Measuring currents of particle-beams, currents from electron multipliers, photocurrents, ion currents; Measuring in plasmas

Abstract

A method and system for measuring at least one of a plasma density and an electron density (e.g., in a range of 10?10 to 1012 cm-3¿). Measurement of at least one of the plasma density and the electron density enables plasma-assisted processes, such as depositions or etches, to be controlled using a feedback control. Both the measurement method and system generate a control voltage that in turn controls a plasma generator (205) to maintain at least one of the plasma density and the electron density at a pre-selected value.
PCT/US2000/019535 1999-07-20 2000-07-20 Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator WO2001006268A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2001510852A JP4339540B2 (en) 1999-07-20 2000-07-20 Electron density measurement and control system using plasma induced frequency variation of microwave oscillator
EP00947493A EP1218763A4 (en) 1999-07-20 2000-07-20 Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator
US10/030,947 US6573731B1 (en) 1999-07-20 2000-07-20 Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14487899P 1999-07-20 1999-07-20
US60/144,878 1999-07-20

Publications (2)

Publication Number Publication Date
WO2001006268A1 WO2001006268A1 (en) 2001-01-25
WO2001006268A8 true WO2001006268A8 (en) 2001-03-29

Family

ID=22510543

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/019535 WO2001006268A1 (en) 1999-07-20 2000-07-20 Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator

Country Status (6)

Country Link
EP (1) EP1218763A4 (en)
JP (1) JP4339540B2 (en)
KR (1) KR100712325B1 (en)
CN (1) CN1162712C (en)
TW (1) TW463531B (en)
WO (1) WO2001006268A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5138131B2 (en) 2001-03-28 2013-02-06 忠弘 大見 Microwave plasma process apparatus and plasma process control method
US7214289B2 (en) 2001-10-24 2007-05-08 Tokyo Electron Limited Method and apparatus for wall film monitoring
US7164095B2 (en) 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
US7806077B2 (en) 2004-07-30 2010-10-05 Amarante Technologies, Inc. Plasma nozzle array for providing uniform scalable microwave plasma generation
US7271363B2 (en) 2004-09-01 2007-09-18 Noritsu Koki Co., Ltd. Portable microwave plasma systems including a supply line for gas and microwaves
US7189939B2 (en) 2004-09-01 2007-03-13 Noritsu Koki Co., Ltd. Portable microwave plasma discharge unit
CN102573257A (en) * 2012-01-11 2012-07-11 西安电子科技大学 Electron density control system of large-area uniform plasmas
KR101287059B1 (en) * 2013-01-07 2013-07-23 주식회사 디제이피 Frequency detector
CN104181172B (en) * 2014-08-25 2016-05-25 西安近代化学研究所 A kind of SOLID PROPELLANT COMBUSTION bright eruption free electronic concentration method of testing
CN114007321A (en) * 2021-09-30 2022-02-01 中科等离子体科技(合肥)有限公司 Diagnosis method for electron density of atmospheric pressure plasma
CN114624256B (en) * 2022-03-31 2023-07-25 核工业西南物理研究院 Three-dimensional microwave reflection system and method for measuring instability modulus of magnetic fluid

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3265967A (en) * 1965-06-08 1966-08-09 Mark A Heald Microwave plasma density measurement system
US3952246A (en) * 1975-05-29 1976-04-20 The United States Of America As Represented By The United States Energy Research And Development Administration Plasma digital density determining device
US4899100A (en) 1988-08-01 1990-02-06 The United States Of America As Represented By The United States Department Of Energy Microwave measurement of the mass of frozen hydrogen pellets
US5082517A (en) * 1990-08-23 1992-01-21 Texas Instruments Incorporated Plasma density controller for semiconductor device processing equipment
US5359282A (en) * 1990-11-16 1994-10-25 Nichimen Kabushiki Kaisha Plasma diagnosing apparatus
JPH0719670B2 (en) * 1991-10-31 1995-03-06 日本高周波株式会社 Triple-probe plasma measuring device that corrects space potential error
JPH07169590A (en) * 1993-09-16 1995-07-04 Fujitsu Ltd Electron density measuring method and device thereof and electron density control device and plasma processing device
US5760573A (en) * 1993-11-18 1998-06-02 Texas Instruments Incorporated Plasma density monitor and method
US5733820A (en) * 1995-04-27 1998-03-31 Sharp Kabushiki Kaisha Dry etching method
US5691642A (en) * 1995-07-28 1997-11-25 Trielectrix Method and apparatus for characterizing a plasma using broadband microwave spectroscopic measurements

Also Published As

Publication number Publication date
TW463531B (en) 2001-11-11
CN1361867A (en) 2002-07-31
KR20020020787A (en) 2002-03-15
EP1218763A1 (en) 2002-07-03
EP1218763A4 (en) 2005-02-02
WO2001006268A1 (en) 2001-01-25
JP4339540B2 (en) 2009-10-07
CN1162712C (en) 2004-08-18
KR100712325B1 (en) 2007-05-02
JP2003505668A (en) 2003-02-12

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