WO2000073213A1 - Fluid treatment system and cleaning apparatus therefor - Google Patents
Fluid treatment system and cleaning apparatus therefor Download PDFInfo
- Publication number
- WO2000073213A1 WO2000073213A1 PCT/CA2000/000617 CA0000617W WO0073213A1 WO 2000073213 A1 WO2000073213 A1 WO 2000073213A1 CA 0000617 W CA0000617 W CA 0000617W WO 0073213 A1 WO0073213 A1 WO 0073213A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- fluid
- chamber
- cleaning
- radiation source
- fluid treatment
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 157
- 239000012530 fluid Substances 0.000 title claims abstract description 129
- 230000005855 radiation Effects 0.000 claims abstract description 53
- 230000001681 protective effect Effects 0.000 claims description 12
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 238000004891 communication Methods 0.000 claims description 3
- 230000004888 barrier function Effects 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 238000011065 in-situ storage Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000003651 drinking water Substances 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 235000012206 bottled water Nutrition 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000000116 mitigating effect Effects 0.000 description 2
- 241000195493 Cryptophyta Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010841 municipal wastewater Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
- B08B9/023—Cleaning the external surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultra-violet light
-
- B08B1/30—
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3227—Units with two or more lamps
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/324—Lamp cleaning installations, e.g. brushes
Definitions
- the present invention relates to a cleaning apparatus for use in a fluid treatment system. In another of its aspects, the present invention relates to a fluid treatment system comprising the cleaning apparatus.
- Fluid treatment systems are known generally in the art.
- Such systems include an array of UN lamp frames which include several UN lamps each of which are mounted within sleeves which extend between and are supported by a pair of legs which are attached to a cross-piece.
- the so- supported sleeves (containing the UN lamps) are immersed into a fluid to be treated which is then irradiated as required.
- the amount of radiation to which the fluid is exposed is determined by the proximity of the fluid to the lamps, the output wattage of the lamps and the fluid's flow rate past the lamps.
- one or more UV sensors may be employed to monitor the UN output of the lamps and the fluid level is typically controlled, to some extent, downstream of the treatment device by means of level gates or the like.
- the UV lamp modules are employed in an open, channel-like system (e.g., such as the one described and illustrated in Maarschalkerweerd #1 Patents), one or more of the modules may be removed while the system continues to operate, and the removed frames may be immersed in a bath of suitable cleaning solution (e.g., a mild acid) which may be air-agitated to remove fouling materials.
- suitable cleaning solution e.g., a mild acid
- suitable cleaning solution e.g., a mild acid
- This required surplus UV capacity adds to the capital expense of installing the treatment system.
- a cleaning vessel for receiving the UV lamp modules must also be provided and maintained.
- the cleaning system comprises a cleaning sleeve engaging a portion of the exterior of a radiation source assembly including a radiation source (e.g., a UV lamp).
- a radiation source e.g., a UV lamp
- the cleaning sleeve is movable between: (i) a retracted position wherein a first portion of radiation source assembly is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the first portion of the radiation source assembly is completely or partially covered by the cleaning sleeve.
- the cleaning sleeve includes a chamber in contact with the first portion of the radiation source assembly. The chamber is supplied with a cleaning solution suitable for removing undesired materials from the first portion of the radiation source assembly.
- the cleaning system described in the Maarschalkerweerd #2 Patents represents a significant advance in the art, especially when implemented in the radiation source module and fluid treatment system illustrated in these patents. More specifically, the cleaning system described in the Maarschalkerweerd #2 Patents is particularly useful in municipal wastewater treatment facilities in which the cleaning system is employed in combination with an ultraviolet radiation treatment system disposed an open channel comprising a gravity fed flow of fluid. After treatment, the fluid is then discharged into a stream, creek, river, lake or other body of water.
- Clean water treatment systems present a unique set of challenges since the fluid being treated in the system is a source of potable/drinking water. If the cleaning system described in the Maarschalkerweerd #2 Patents were implemented in a clean water treatment system, there would be a significant likelihood of leakage of the cleaning solution from the chamber into the fluid being treated. It is desirable to avoid such leakage of cleaning solution from the cleaning system.
- the present invention provides a cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve in sliding engagement with the exterior of the radiation source assembly; a first chamber disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly and for being supplied with a cleaning solution; a second chamber disposed in the at least one cleaning sleeve adjacent the first chamber; seal means to restrict movement of fluid between the first chamber and the second chamber; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly.
- the present invention provides a fluid treatment device comprising a housing for receiving a flow of fluid, the housing comprising: a fluid inlet; a fluid outlet; a fluid treatment zone disposed between the fluid inlet and the fluid outlet; a radiation source assembly disposed in the fluid treatment zone for treatment of the flow of fluid; and a cleaning apparatus comprising: at least one cleaning sleeve in sliding engagement with the exterior of the radiation source assembly; a first chamber disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly and for being supplied with a cleaning solution; a second chamber disposed in the at least one cleaning sleeve adjacent the first chamber; seal means to prevent substantially unrestricted movement of fluid between the first chamber and the second chamber; first drain means to withdraw fluid from the second chamber; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly.
- the cleaning device contains two "independent" chambers. Specifically, there is provided a cleaning chamber for containing a cleaning solution in contact with an exterior of a radiation source assembly. A second chamber is provided in the cleaning sleeve substantially adjacent the first chamber. The second chamber, in essence, functions as a fluid (typically water) buffer layer between the cleaning chamber and the fluid being treated. Thus, the fluid buffer layer acts to receive small amounts of cleaning solution which may leak from the cleaning chamber thereby obviating or mitigating passage of the cleaning fluid to the fluid being treated.
- a fluid typically water
- the cleaning chamber and the chamber defining the fluid buffer layer are relatively "independent" of one another. This may be achieved by using a seal between the two chambers. Since even the highest quality seals are likely to allow some leakage of cleaning fluid, the fluid buffer layer in the second chamber adjacent the cleaning chamber acts to obviate or mitigate alternate leakage of the cleaning fluid into the fluid being treated. This renders the present cleaning system advantageous for use in a clean water application where the fluid being treated is, for example, potable water.
- the second chamber defining the fluid buffer layer further includes a drain to remove fluid from the second chamber. This further obviates or mitigates leakage of cleaning solution from the cleaning chamber through the second chamber to the fluid being treated.
- the cleaning chamber is provided with a supply and drain to add and remove cleamng solution to and from the cleaning chamber.
- this supply and drain in the cleaning chamber is comprised in a recirculation system which allows for addition of cleaning solution, as required.
- Figure 1 illustrates a schematic, in cross-section, of a preferred embodiment of the present cleaning device
- Figure 2 and 3 illustrate side elevations, in cross-section, of a preferred embodiment of a fluid treatment device comprising a preferred embodiment of the present cleaning apparatus
- Figures 4 and 5 illustrate enlarged side elevations, cross-section of the cleaning apparatus illustrated in Figures 2 and 3, respectively;
- Figure 6-8 illustrate photographs of a particularly preferred embodiment of the present invention.
- Cleaning apparatus 10 comprises a cleaning sleeve 15.
- Cleaning sleeve 15 comprises a cleaning chamber 20 and a pair of second chambers 25,30.
- Cleaning sleeve 15 is disposed over a radiation source assembly 35 comprising a radiation source 40 enclosed within a protective sleeve 45.
- Cleaning chamber 20 is separated from second chambers 25,30 by a pair of seals 50,55.
- Second chambers 25,30 are sealed from the exterior of the cleamng sleeve 15 by a pair of annular seals 60,65.
- Cleaning sleeve 15 is reversibly movable along the exterior of protective sleeve 45 in the direction of arrow A. The actuation of cleaning sleeve 15 along the exterior of protective sleeve 45 will be described in more detail hereinbelow.
- Cleaning sleeve 15 further comprises a drain 70 from each of second chambers 25,30. Drain 70 may be utilized at atmospheric pressure. Of course, the illustrated embodiment could be modified to have a single drain from one of second chambers 25,30, and by providing communication between second chambers 25,30. Further, a cleaning solution supply inlet 75 is provided in cleaning sleeve 15 and serves to allow for supply of cleaning solution to cleaning chamber 20. Also, a cleaning supply outlet 80 is provided to allow for withdrawal of cleaning solution from cleaning chamber 20.
- a fluid treatment device 100 comprising an inlet 105, an outlet 110 and a housing 115.
- a pair of opposed flanges 120,125 are disposed at opposite ends of housing 115.
- a pair of opposed cover plates 130,135 are attached to flanges 120,125, respectively, to provide, in the case of treating liquids, a fluid-tight seal.
- a radiation source assembly 140 comprising a pair of radiation, preferably ultraviolet radiation, lamps 145 disposed within a protective sleeve 150 - e.g., a quartz sleeve.
- a cleaning apparatus 200 Disposed adjacent cover plate 135 is a cleaning apparatus 200.
- Cleaning apparatus 200 comprises a pair of rods 205,210 which are slidably moveable through cover plate 135. Attached to the ends of rods 205,210 is a cleaning sleeve 300, the details of which will be described below. Attached to the other ends of rods 205,210 is a plate 215 which is connected to a slide 219 movable along a rail 220.
- Rail 220 is a conventional electric screw drive which is connected to an electric motor (not shown) or other electric motive means. The electric motor serves to rotate the screw (not shown) which translates slide 219 along rail 220 thereby moving plate 215.
- cleaning sleeve 300 comprises a sleeve element 305 which surrounds and is movable over protective sleeve 150 of radiation source assembly 140 (see Figures 2 and 3).
- Sleeve element 305 includes a chamber 310 for receiving a cleaning fluid - in Figure 5, the cleaning fluid is shown in solid black.
- Cleaning chamber 310 is coupled to an elbow connector 315 which in turn is coupled to rod 205 and, ultimately, plate 215.
- a line 320 is connected to plate 215 and in turn to rod 205 via an elbow connector 325. The other end of line 320 is connected to a supply of cleaning fluid (not shown).
- cleaning fluid may be acetic acid or any other suitable fluid which will facilitate removal of fouling materials (e.g., minerals, algae and the like) from the surface of protective sleeve 150.
- cleaning chamber 310 is defined by a pair of seals 330,335 which, when sleeve 300 is mounted on quartz sleeve 150, form a substantially fluid-tight type seal.
- Seals 330,335 are annular seals which surround quartz sleeve 150.
- Substantially adjacent seals 330,335 are a pair of TeflonTM bearings 340,345, respectively.
- Adjacent TeflonTM bearing 340,345 are a pair of second seals 350,355, respectively.
- TeflonTM bearings 340,345 are disposed in a chamber 360 defined between seals 330,335 and 350,355, respectively. This can be seen clearly in Figure 4 which illustrates a flow of fluid in black from second chamber 360.
- Opposite elbow connection 315 attached to sleeve element 305 is another elbow element 365 which is connected to rod 210 and in turn to plate 215.
- rod 210 includes a coaxial line which serves two purposes.
- cleaning fluid shown in black
- the disposition of line 370 in this manner creates a second line 375 coaxially disposed around line 370.
- the function of line 375 is illustrated in Figure 4 and served to remove fluid from second chamber 360.
- rod 210 serves to both remove cleaning solution from chamber 310 and independently remove fluid from second chamber 360.
- lines 320 and 370 are connected to a recirculation pump which allows for cleaning solution to be recirculated through cleaning sleeve 300 as illustrated in Figure 5 (the cleaning solution is shown in black. Recirculation can be continuous or on a periodic basis. It should by apparent that the cleaning solution may be circulated in the reverse direction to that described above.
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/744,682 US6863078B1 (en) | 1999-05-28 | 2000-05-26 | Fluid treatment system and cleaning apparatus therefor |
CA002338879A CA2338879C (en) | 1999-05-28 | 2000-05-26 | Fluid treatment system and cleaning apparatus therefor |
AU49060/00A AU4906000A (en) | 1999-05-28 | 2000-05-26 | Fluid treatment system and cleaning apparatus therefor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13676699P | 1999-05-28 | 1999-05-28 | |
US60/136,766 | 1999-05-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000073213A1 true WO2000073213A1 (en) | 2000-12-07 |
Family
ID=22474266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CA2000/000617 WO2000073213A1 (en) | 1999-05-28 | 2000-05-26 | Fluid treatment system and cleaning apparatus therefor |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU4906000A (en) |
CA (1) | CA2338879C (en) |
WO (1) | WO2000073213A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102295319A (en) * | 2010-03-15 | 2011-12-28 | 株式会社东芝 | Ultraviolet water treatment apparatus |
CN102992447A (en) * | 2011-09-15 | 2013-03-27 | 株式会社东芝 | Ultraviolet irradiation device |
CN107503707A (en) * | 2017-07-20 | 2017-12-22 | 成都聚深科技有限责任公司 | Beneficial to the producing well rubber parts of discarded object output |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0743105A1 (en) * | 1995-05-18 | 1996-11-20 | Berson Milieutechniek B.V. | Device for cleaning the protective tubes of UV water sterilizers |
US5590390A (en) * | 1993-03-05 | 1996-12-31 | Trojan Technologies Inc. | Fluid treatment system and process |
US5874740A (en) * | 1996-03-14 | 1999-02-23 | Photoscience Japan Corporation | Ultraviolet ray irradiation equipment having scraper rings fitted to light transmission tubes |
-
2000
- 2000-05-26 AU AU49060/00A patent/AU4906000A/en not_active Abandoned
- 2000-05-26 WO PCT/CA2000/000617 patent/WO2000073213A1/en active Application Filing
- 2000-05-26 CA CA002338879A patent/CA2338879C/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5590390A (en) * | 1993-03-05 | 1996-12-31 | Trojan Technologies Inc. | Fluid treatment system and process |
EP0743105A1 (en) * | 1995-05-18 | 1996-11-20 | Berson Milieutechniek B.V. | Device for cleaning the protective tubes of UV water sterilizers |
US5874740A (en) * | 1996-03-14 | 1999-02-23 | Photoscience Japan Corporation | Ultraviolet ray irradiation equipment having scraper rings fitted to light transmission tubes |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102295319A (en) * | 2010-03-15 | 2011-12-28 | 株式会社东芝 | Ultraviolet water treatment apparatus |
US8742365B2 (en) | 2010-03-15 | 2014-06-03 | Kabushiki Kaisha Toshiba | Ultraviolet water treatment apparatus |
CN102295319B (en) * | 2010-03-15 | 2015-05-13 | 株式会社东芝 | Ultraviolet water treatment apparatus |
CN102992447A (en) * | 2011-09-15 | 2013-03-27 | 株式会社东芝 | Ultraviolet irradiation device |
CN102992447B (en) * | 2011-09-15 | 2015-09-23 | 株式会社东芝 | UV irradiation equipment |
CN107503707A (en) * | 2017-07-20 | 2017-12-22 | 成都聚深科技有限责任公司 | Beneficial to the producing well rubber parts of discarded object output |
Also Published As
Publication number | Publication date |
---|---|
CA2338879A1 (en) | 2000-12-07 |
CA2338879C (en) | 2005-08-09 |
AU4906000A (en) | 2000-12-18 |
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