WO2000070332A1 - Method of and apparatus for inspection of articles by comparison with a master - Google Patents
Method of and apparatus for inspection of articles by comparison with a master Download PDFInfo
- Publication number
- WO2000070332A1 WO2000070332A1 PCT/US2000/008221 US0008221W WO0070332A1 WO 2000070332 A1 WO2000070332 A1 WO 2000070332A1 US 0008221 W US0008221 W US 0008221W WO 0070332 A1 WO0070332 A1 WO 0070332A1
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- WO
- WIPO (PCT)
- Prior art keywords
- image
- article
- master
- die
- reticle
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
Definitions
- the present invention relates to inspection of articles, and in particular, to inspection of articles related to manufacture of semiconductor devices. More specifically, the invention relates to the inspection of articles used in photolithography during manufacture of semiconductor devices.
- photolithography wherein masks or "reticles" are used to transfer circuitry patterns to semiconductor wafers.
- the reticles are in the form of patterned chrome over a transparent substrate.
- a series of such reticles are employed to project the patterns onto the wafer in a preset sequence.
- Each photolithographic reticle includes an intricate set of geometric patterns corresponding to the circuit components to be integrated onto the wafer.
- the transfer of the reticle pattern onto the photoresist layer is performed conventionally by an optical exposure tool such as a scanner or a stepper, which directs light or other radiation through the reticle to expose the photoresist.
- the photoresist is thereafter developed to form a photoresist mask, and the underlying polysilicon or metal layer is selectively etched in accordance with the mask to form features such as lines or gates.
- any defect on the reticle such as extra or missing chrome, may transfer onto the fabricated wafer in a repeated manner.
- any defect on the reticle would drastically reduce the yield of the fabrication line. Therefore, it is of utmost importance to inspect the reticles and detect any defects thereupon.
- the inspection is generally performed by an optical system, using transmitted, reflected, or both types of illuminations.
- An example of such a system is the RT-8000TM series reticle inspection system available from Applied Materials of Santa Clara, CA.
- one desirable improvement would be to provide a method for mask and/or reticle inspection which is available to both entities (i.e. the mask shops and the fabs). Availability of such a method would allow for cross checking and comparison of inspection results.
- a particular general disadvantage of Die to Die inspection is that the reference used for the inspection is not necessarily perfect. That is, in the Die to Die method, one die is first compared to a neighboring die. If an inconsistency is discovered, it is flagged as a defect. However, merely identifying the inconsistency does not make it clear which die is defective. Therefore, another comparison must be made, this time to a third die. Then, the
- J HEET RULE 26 one that is different from the two others is flagged as the defective die. Even with this probabilistic approach, there still is no assurance that the correct die was flagged as defective. In particular, defects of a repeatable nature, i.e. defects that appear in all of the dies, cannot be ascertained in Die to Die inspection.
- a further disadvantage of Die to Die inspection is the amount of setup required.
- the dies need to be aligned before reliable inspection can be performed. It would be desirable to limit the amount of setup that is required.
- a still further disadvantage of Die to Die inspection is that it cannot handle the "single die” case, i.e. where there is only one die on the reticle or other article to be inspected, because there is nothing with which to compare that single die.
- the database that is used is constituted by the data used to fabricate the masks or reticles. This data theoretically is "perfect".
- the database is written as a binary image, t.e., transparent and opaque areas.
- the image obtained from the inspection system is a gray scale image. Therefore, various algorithms are used to "binarize” the inspection image before comparing it to the binary database. Other algorithm methods are used to "smear” the binary database and compare the resulting "false” gray scale image to the inspection image. Each of these algorithm methods may introduce differences between the inspected image and the database that are not indicative of a defective reticle.
- a further disadvantage of both the Die to Die and Die to Database methods is that the criteria used to declare "significant" differences between the reticle image and the reference image (i.e. the database or second die image) can be relatively far removed from the really significant question of whether the reticle will produce a good wafer (since the reference has not in any way been "proved" correct by creating a good wafer) - this again leads to an overly strict approach in identifying errors, thereby increasing the cost of the reticle manufacture.
- plates or reticles can undergo substantial wear and tear. This is true, for example, in processes employing deep ultraviolet (DUV) wavelengths.
- DUV deep ultraviolet
- the Die to Die inspection method cannot identify the resulting errors adequately. While it would be possible to use the Die to Database method to find such errors, the results are not necessarily as definite as desired.
- a method and apparatus are provided for inspection of articles through comparison with an image of a master article, which is believed to be substantially free of defects. More specifically, what is described in detail below is a method of inspection for which the term "Master to Reticle Inspection" has been coined.
- Master to Reticle Inspection or MRI
- MRI can be a superior inspection method when compared to conventional methods, such as Die to Die and Die to Database.
- the MRI method has most of the advantages of both of these classical methods, but few of their disadvantages. Moreover, there are no substantive technical problems to be encountered in implementing the inventive concept.
- MRI magnetic resonance imaging
- a gray scale image of a master reticle on some recording medium, for example a digital video disk (DVD).
- DVD digital video disk
- This recorded image then is used as the reference image, instead of a die (as in Die to Die) or database (as in Die to Database).
- a die as in Die to Die
- database as in Die to Database
- DVD digital video disk
- any suitable storage medium can be used, including magnetic media, particularly in view of the high storage capacities and fast access times which current hard disk drives provide.
- the present invention builds on the technology roadmap generated for internet and multimedia applications, which
- SUBST ⁇ UTE SHEET (RULE 26) also have required very high throughput volumes at high data rates. Moreover, prior to storage, the image data can be compressed using any known compression algorithms. The relative regularity of such plates relative to other high end applications (such as medical imaging) should increase the effectiveness of compression.
- Figure 1 shows a general flow of the steps involved in practicing the inventive method
- Figure 2 shows a block diagram of apparatus which may be used to practice the invention
- FIG. 3 shows a further embodiment of apparatus which may be used to practice the invention.
- a reticle which is known to be good i.e. is believed to be substantially free of defects, or as free of defects as is reasonably possible
- this step is preferably achieved by scanning the reticle in a high resolution inspection system, such as the RT 8200 noted above.
- the Line Width Error Detector available on the RT 8000TM series, and in particular in the RT-8200TM, is used to measure any line width error on a sub-pixel resolution (the current LWED is capable of detecting line errors at up to 1/32 of the pixel size). Only a reticle that passes the inspection with zero defects detected is identified as the master reticle. However, it should be noted that while the disclosure is provided in terms of a master reticle, in the case where only the die (and not the inter die) area needs to be inspected, it is sufficient to identify a master die, and use an image of the master die for inspection of all dies on the reticles.
- LWED Line Width Error Detector
- step 2 the master reticle (or die) is scanned to obtain a gray level master reticle (or die).
- the image of that scan is saved in some non-volatile storage device (step 3).
- the storage device could contain one or more media such as a DVD or a laser disk.
- the storage device could be a large file server containing, for example, a magnetic hard disk drive, or a group of disk drives organized in some form of array (e.g. RAID, which stands for Redundant Array of Inexpensive Disks; or JBOD, which stands for "Just a Bunch of Disks").
- RAID Redundant Array of Inexpensive Disks
- JBOD which stands for "Just a Bunch of Disks”
- DVDs on, for example, a jukebox, whereby the various DVDs may be accessible either individually or in groups (depending on the number of readers available in the jukebox).
- Other media such as magneto-optical media or laser disks could be employed as well.
- Key issues are access time and storage capacity.
- File servers also are currently available that allow terabytes of storage at read rates of tens of megabytes/second.
- DRAM dynamic random access memory
- SRAM static random access memory
- NVRAM non- volatile random access memory
- the scanned image that is recorded in step 2 above can be compressed before being stored.
- the need for and the amount of compression required depends on required image accuracy (taking into account features such as desired inspection time, and available pixel size). Inspection time can be important, because throughput has important significance in the fab environment. There can be time related consequences to working with compressed images as compared with uncompressed images. Different compression algorithms take different lengths of time to expand the master reticle image, and as a result can have an adverse impact on throughput and processing time.
- the medium is stored, or duplicated and distributed, or otherwise made available (for example, over a local area network (LAN), a wide area network (WAN), a metropolitan area network (MAN), or an intranet, or even over a internet connection) (step 4).
- LAN local area network
- WAN wide area network
- MAN metropolitan area network
- intranet intranet
- the data can be retained on the DVD (e.g. in a "jukebox"), and directly inspected from there; alternatively, it can be copied to a high performance file system from which the inspection is carried out.
- the invention is not limited to storage of images of master reticles in the manner described. It may be useful to retain images of reticles at various stages of their useful lifetimes, for example, to measure wear, or to analyze various types of systematic errors that may arise as a result of the reticle manufacturing process. Accordingly, it also is within the contemplation of the invention to store images other than the image of a master reticle, in a form in which the stored image may be used for subsequent comparison or analysis. Presently it appears that non-volatile storage of such images would be most desirable in that circumstance, but once again, if memory prices continue to drop, it may be worthwhile to have volatile storage of such images as well.
- the reticle to be inspected is identified (step
- a report on defects is produced (step 7).
- a system such as the Aris-iTM, also available from Applied Materials, may be used to scan an inspected reticle to obtain an image of the inspected reticle. Each pixel of the inspected reticle image then is compared to corresponding pixels from the stored master image. This comparison preferably is done "on the fly" as the inspected reticle is scanned. Accordingly, the pixels of the inspected and master images need to be aligned.
- the DVD or other storage medium can also include information (such as the location of alignment targets, bar codes and so on) that make alignment and other preinspection calibration easier than in the Die to Die method, which does not have such information available. That information also could be stored elsewhere in the system.
- SUBST ⁇ UTE SHEET (RULE 26)
- the comparison of the inspected image to the master image is simpler than the comparison to a database.
- both images are of the same type, i.e., gray scale, no statistical algorithm is necessary digitize the inspected image, or smear the database image. Instead, the gray levels of both images can be compared, and inconsistencies flagged as defects.
- the Aris-iTM algorithm can be used to digitize both inspected and master images, and the LWED can be used to compare the images on a sub-pixel resolution.
- the inventive method is useful for the following applications, among others:
- a reticle may be recorded as part of the incoming acceptance procedure, or the recording may be supplied by the mask shop as part of its service. As the reticle is used, it can be re-inspected relative to the master, thus permitting a direct check of any change in the reticle over time. For example, periodic re- inspection can pick up defects such as global transmission and dust particles.
- the inventive method also can be used to inspect single die reticles, and can be used to inspect the inter die area - neither of which is done by traditional Die to Die inspection.
- a history of repeated inspection may show a trend (for example changes in the transparency of the pelicle), thus helping to predict when cleaning, change of pelicle, or re-manufacture of the reticle will be necessary, or as an indication of some problem in the fab environment.
- a fab needs multiple copies of a reticle, or it needs to periodically remanufacture a reticle, then incoming inspection can be done using the inventive method. Multiple copies are needed if multiple steppers are used, or if the wafer is manufactured at different sites.
- the main advantage here is that the master can be a recording of a mask that was used to create a working tested chip. Unlike other inspection methods, here the inspection is carried out relative to an image that presumably is correct by definition (because it was used to manufacture a chip that works) rather than relative to some arbitrary criteria which may be too strict - thus defining something as a defect which may not be truly significant.
- the inventive method is not specific to what data is recorded as a representation of an image of the master reticle. Any suitable data may be recorded, including but not limited to
- SUBST ⁇ UTE SHEET (RULE 26) transmitted illumination, reflective illumination, aerial image, or a desired combination thereof, as required.
- the scanning of the reticles to obtain an image may be done in any of a number of known ways.
- the presently preferred way involves the use of a standard scanning method such as the one in the Aris-iTM system currently being offered by Applied Materials.
- the image processing is carried out in the same manner as is done in the conventional Die to Die method. As might be expected, the degree and nature of the processing required depends on the type of images (reflected, transmitted, aerial or some combination of these).
- Binarization of image data, and comparison of the binarized data may be carried out as in the RT-8200TM or Aris-iTM products.
- Figure 2 is a block diagram, showing major components which may be used to practice the invention.
- a mask, photomask, or reticle 200 is scanned using optical subsystem 220.
- the article 200 preferably is on an x-y stage (not shown).
- Optical subsystem 220 provides image data to electronics and computer subsystem 240, preferably in a stream of binary data ("binarized data").
- the electronics portion of subsystem 240 generates that binary stream, and the computer portion of subsystem 240 compares that binarized stream in a compare unit 245 with a further (second) binarized stream of data.
- subsystem 240 diverge are with respect to the source of the second binarized stream of data.
- that second binarized stream of data is placed in memory 250 based on contents of storage device 280, which contains a master image of the article being inspected.
- Memory 250 then provides the second binarized stream to compare unit 245.
- the second binarized stream of data comes from a master image, representing an article 200 that is believed to be substantially free of defects, and previously stored in storage device 280.
- the computer portion of subsystem 240 then provides an output, indicating any mismatches between the first and second binarized streams of data, to output device 290.
- optical subsystem 220 provides corresponding image data to electronic/computer subsystem 240, which causes that data to be recorded in storage device 280.
- Storage device 280 thus stores a master version of the article. However, there may be reason to store a version of the article other than a master version, for example, for analysis of degradation of a mask, photomask, or reticle over its useful lifetime.
- Storage device 280 can store various versions of an article to facilitate this analysis.
- Figure 2 shows a system which operates in reflective mode.
- the invention also is amenable readily to implementation in a system which operates in a transmissive mode.
- inventive technique is useful with a wide range of pixel sizes; however, with presently available technology, it is believed that the present technique is particularly useful for pixel sizes of 0.4 ⁇ m and larger. As scanner technology and associated hardware technology progresses, it is expected that the inventive technique will be applicable for smaller pixel sizes, and hence to smaller geometries in reticles, photomasks, etc.
- the noise introduced in this way is: a) lower than the noise obtained in any rescan of the image (as in Die to Die comparisons); and b) identifiable in some way so that it is possible to distinguish between noise and defects.
- defects which are "physical,” affect several pixels in a defined way, whereas noise is likely to be “mathematical,” and thus affect only a single pixel. Possibly a low pass filter or interpolation algorithm can clean up a lot of the noise.
- the only evident disadvantage of MRI is that it is not useful for first time (mask shop) qualifications of reticles. That is, for a "new" reticle, the MRI technique is not applicable because the technique requires a known "good" reticle before useful comparison can be performed.
- the MRI technique is extremely useful for periodic inspection and inspection (at a mask shop or a fab) of reticles that are manufactured more than once. This inability to use the inventive technique at all stages of manufacture is not unusual, and certainly is not unique to this technique.
- Each of the known methods is useful at a different stage of reticle manufacture and use lifetime.
- the MRI technique like the Die to Database technique, is useful for both single die reticles and multiple die reticles, whereas the Die to Die technique only is applicable where there are multiple dies on the reticle.
- the Die to Die technique also is limited in this regard because only the die area itself is inspected; the interdie area is not.
- the Die to Database and MRI techniques enable inspection of the interdie area as well.
- the Die to Die and MRI techniques are comparable in that both the reference and the image are the same "type," thereby yielding a more accurate comparison than in the Die to Database technique, in which representation differences between the die and the database contents (e.g. bias, corner rounding) require reduced sensitivity in order to avoid false alarms. Possibly design rules can be used to get around the differences, and reduce the false alarm problem, but this requires additional handling of the database contents, which is unnecessary in the MRI or Die to Die techniques.
- any handling overhead can easily be minimized with a "jukebox" of DVDs or by a large file server. From the user's point of view, all that is necessary is to input the identity of the plate (unless the plate is bar coded, in which case even that step becomes unnecessary). The only interaction with the system would be the occasional need to add new disks (or files) to the "jukebox” and remove obsolete disks (or files). This kind of replacement activity would be necessary only when the set of reticles used in the fabs changes.
- the Die to Die method does not pick up repeatable or "global” errors. These can be critical in reticle inspection, because any errors will be replicated throughout any run using the inspected reticles.
- the Die to Database technique can pick up "global” errors, because the database is an "absolute" reference, but the above mentioned biasing and corner rounding adjustments, mter alia, mean that the database contents differ inherently from what is on the die.
- the reference inherently is absolute, it will pick up repeatable errors; also, because the reference comes from a digital recording, the MRI technique will not result in degradation errors.
- the data handling overhead in the MRI technique is comparable to that for the Die to Database technique, which can have the database previously stored.
- the other limitations of the Die to Database technique relative for example to false alarm settings, biasing, and corner rounding, make that technique less desirable.
- the nature of the MRI technique like the Die to Database technique, using a single reference as they do, is such that sampling noise will be the same from run to run. Also setup data, relating for example to alignment, will be available, basically for the same reason. In contrast, the Die to Die technique will have a different noise reference for each run, because the reference comes from the individual reticle itself. Also, setup data will vary from run to run for the same reason.
- the invention is not limited by the particular type of inspection apparatus being used.
- interferometers could be used, especially where resolution on a wavelength scale is needed.
- the ordinarily skilled artisan will be familiar with interferometry techniques, as disclosed for example in USP 5,563,702 and 5,572,598, which are incorporated herein by reference.
- FIG. 3 A further example of the invention, as applied to the above-referenced interferometry techniques, is shown in Figure 3.
- an electronics and computer subsystem 300 similar to subsystem 240 in Figure 2, operates in conjunction with an example of an optical subsystem whose components are shown in greater detail in this Figure than in Figure 2, but with details of other elements omitted.
- USP 5,563,702 and 5,572,598 contain information regarding those further details.
- Figure 3 shows light source 310, preferably a coherent source such as a laser.
- Light source 310 outputs a beam which then enters acousto-optic scanner 320 (and optionally an acousto-optic prescanner, not shown).
- the emergent beam enters a beam splitter 330. Some of that light is reflected in beam splitter 330 to tilt mirror 332, then back through beam splitter
- Light passing through the beam splitter 330 then passes through lens 345, and through article (e.g. mask, photomask, or reticle) 350 on an x-y stage 355 which permits transmission of light.
- article e.g. mask, photomask, or reticle
- the x-y stage 355 is controlled by subsystem 300 in a known manner.
- Light passing through article 350 and stage 355 then passes through lens 365 and into transmission detector
- subsystem 300 in Figure 3 is similar to subsystem 240 in Figure 2, it will operate similarly to generate binarized streams of data which then may be stored in storage device 380.
- storage device 380 may store a master image corresponding to the article being scanned, or may store an image of the article itself.
- Transmission detector 370 and reflection detector 340 may be CCD devices, of either a lxN (line) configuration or MxN (area) configuration (M being an integer greater than 1).
- Light source 310 may be a pulsating laser, as part of the interferometry system, to facilitate inspection of phase shift masks, particularly in conjunction with area CCDs in detectors 370 and 340.
- Figure 3 shows both transmission and reflection detection, where purely a reflection detection system is used in phase mask inspection, a Twyman-Green interferometer may be suitable.
- the invention also is not limited by the degree of "perfection” currently obtainable in the identification of a master article. It is expected that techniques for obtaining and/or identifying "perfect” versions of master articles will improve. The flexible technique of the invention avails itself of such improvements, and correspondingly will yield improved results in semiconductor manufacture.
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Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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JP2000618718A JP2002544555A (en) | 1999-05-18 | 2000-05-16 | Method and apparatus for inspecting articles by comparison with a master |
KR1020017014693A KR20020011416A (en) | 1999-05-18 | 2000-05-16 | Method of and apparatus for inspection of articles by comparison with a master |
EP00930093A EP1190238A1 (en) | 1999-05-18 | 2000-05-16 | Method of and apparatus for inspection of articles by comparison with a master |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US31427399A | 1999-05-18 | 1999-05-18 | |
US09/314,273 | 1999-05-18 |
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WO2000070332A1 true WO2000070332A1 (en) | 2000-11-23 |
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PCT/US2000/008221 WO2000070332A1 (en) | 1999-05-18 | 2000-05-16 | Method of and apparatus for inspection of articles by comparison with a master |
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US (1) | US20030048939A1 (en) |
EP (1) | EP1190238A1 (en) |
JP (1) | JP2002544555A (en) |
KR (1) | KR20020011416A (en) |
WO (1) | WO2000070332A1 (en) |
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Also Published As
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US20030048939A1 (en) | 2003-03-13 |
KR20020011416A (en) | 2002-02-08 |
EP1190238A1 (en) | 2002-03-27 |
JP2002544555A (en) | 2002-12-24 |
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