WO2000057451A3 - Muffin tin style cathode element for diode sputter ion pump - Google Patents
Muffin tin style cathode element for diode sputter ion pump Download PDFInfo
- Publication number
- WO2000057451A3 WO2000057451A3 PCT/EP2000/002546 EP0002546W WO0057451A3 WO 2000057451 A3 WO2000057451 A3 WO 2000057451A3 EP 0002546 W EP0002546 W EP 0002546W WO 0057451 A3 WO0057451 A3 WO 0057451A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ion pump
- instabilities
- pump
- sputter ion
- emission
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
- H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
- H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
- H01J41/20—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes using gettering substances
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000607245A JP2002540563A (en) | 1999-03-19 | 2000-03-17 | Muffin-shaped electrode element for diode sputter ion pump. |
EP00918829A EP1095396A2 (en) | 1999-03-19 | 2000-03-17 | Muffin tin style cathode element for diode sputter ion pump |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12531899P | 1999-03-19 | 1999-03-19 | |
US60/125,318 | 1999-03-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2000057451A2 WO2000057451A2 (en) | 2000-09-28 |
WO2000057451A3 true WO2000057451A3 (en) | 2001-02-08 |
Family
ID=22419177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2000/002546 WO2000057451A2 (en) | 1999-03-19 | 2000-03-17 | Muffin tin style cathode element for diode sputter ion pump |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1095396A2 (en) |
JP (1) | JP2002540563A (en) |
WO (1) | WO2000057451A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10700207B2 (en) | 2017-11-30 | 2020-06-30 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor device integrating backside power grid and related integrated circuit and fabrication method |
US10784079B2 (en) | 2018-09-26 | 2020-09-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Ion implantation system and source bushing thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3319875A (en) * | 1965-03-22 | 1967-05-16 | Varian Associates | Ion vacuum pumps |
US3746474A (en) * | 1971-04-02 | 1973-07-17 | W Lloyd | Ionic vacuum pump |
US4631002A (en) * | 1982-09-14 | 1986-12-23 | Varian S.P.A. | Ion pump |
JPS6222364A (en) * | 1985-07-20 | 1987-01-30 | Anelva Corp | Sputter ion pump |
-
2000
- 2000-03-17 JP JP2000607245A patent/JP2002540563A/en not_active Withdrawn
- 2000-03-17 WO PCT/EP2000/002546 patent/WO2000057451A2/en not_active Application Discontinuation
- 2000-03-17 EP EP00918829A patent/EP1095396A2/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3319875A (en) * | 1965-03-22 | 1967-05-16 | Varian Associates | Ion vacuum pumps |
US3746474A (en) * | 1971-04-02 | 1973-07-17 | W Lloyd | Ionic vacuum pump |
US4631002A (en) * | 1982-09-14 | 1986-12-23 | Varian S.P.A. | Ion pump |
JPS6222364A (en) * | 1985-07-20 | 1987-01-30 | Anelva Corp | Sputter ion pump |
Non-Patent Citations (4)
Title |
---|
AUDI M ET AL: "SURFACE STRUCTURE AND COMPOSITION PROFILE OF SPUTTER-ION PUMP CATHODE AND ANODE", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART A,AMERICAN INSTITUTE OF PHYSICS. NEW YORK,US, vol. 4, no. 3, May 1986 (1986-05-01), pages 303 - 305, XP000955290, ISSN: 0734-2101 * |
G. K. WEHNER ET AL.: "Cone formation on metal targets during sputtering.", JOURNAL OF APPLIED PHYSICS., vol. 42, no. 3, 1971, AMERICAN INSTITUTE OF PHYSICS. NEW YORK., US, pages 1145 - 1149, XP000960850, ISSN: 0021-8979 * |
PATENT ABSTRACTS OF JAPAN vol. 011, no. 195 (E - 518) 23 June 1987 (1987-06-23) * |
W. HAUFFE ET AL.: "Production of microstructures by ion beam sputtering.", TOPICS IN APPLIED PHYSICS., vol. 64, 1991, SPRINGER, BERLIN., DE, pages 305 - 338, XP000965335, ISSN: 0303-4216 * |
Also Published As
Publication number | Publication date |
---|---|
EP1095396A2 (en) | 2001-05-02 |
WO2000057451A2 (en) | 2000-09-28 |
JP2002540563A (en) | 2002-11-26 |
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