WO1999010303A1 - Radiation-curable propenyl compounds, uses thereof, and compositions containing them - Google Patents

Radiation-curable propenyl compounds, uses thereof, and compositions containing them Download PDF

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WO1999010303A1
WO1999010303A1 PCT/US1998/017110 US9817110W WO9910303A1 WO 1999010303 A1 WO1999010303 A1 WO 1999010303A1 US 9817110 W US9817110 W US 9817110W WO 9910303 A1 WO9910303 A1 WO 9910303A1
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James Crivello
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Research Corporation Technologies, Inc.
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06Esters of carbamic acids
    • C07C271/08Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C07C271/28Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06Esters of carbamic acids
    • C07C271/08Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/10Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/12Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00Ethers; Compounds having groups, groups or groups
    • C07C43/02Ethers
    • C07C43/03Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/14Unsaturated ethers
    • C07C43/15Unsaturated ethers containing only non-aromatic carbon-to-carbon double bonds
    • C07C43/16Vinyl ethers
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/007Esters of unsaturated alcohols having the esterified hydroxy group bound to an acyclic carbon atom
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54Acrylic acid esters; Methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96Esters of carbonic or haloformic acids

Definitions

  • the present invention relates to novel radiation- curable propenyl compounds, to radiation - curable compositions containing such compounds, and to processes for forming radiation -cured products from such compounds and compositions.
  • Radiation curing has become an important and useful technique for applying and curing coatings, inks, and adhesives.
  • radiation curing involves presenting a radiation -curable polymer, typically in combination with a photo- initiator, and exposing the composition to radiation in the form of ultraviolet or electron-beam radiation to cause the radiation- curable compound to polymerize.
  • Radiation curing presents many advantages, such as high rates of throughput, low energy requirements, and low equipment costs.
  • Solvents typically would lead to environmental and/or safety hazards, and would require additional equipment and handling. steps to remove the solvent .
  • the present invention comprises compounds of the formula (1)
  • n is an integer from 1 to 3;
  • R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms;
  • R 1 is -H or -CH 3 ;
  • R 2 is -OH, alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring, phenoxy, acryloyloxy, methacryloyloxy, or A-CHet) ⁇ -
  • each L is independently a chemical bond or -C(0)0-, -0C(0)0-, -0-, or -NHC(0)0-, provided that each R is bonded to an oxygen atom of L, and i is an integer from 1 to 3; or X is -C(O)-, each L is a chemical bond, and i is 1.
  • the present invention is further directed to compositions comprising one or more compounds of said formula (1) , and also comprising one or more photoinitiators in an amount effective to mediate polymerization of said compound when the composition is irradiated with, for instance, ultraviolet radiation or electron beam radiation.
  • the present invention is directed to a process of forming a polymeric structure, such as a coating, film, or solid body, comprising' forming the aforementioned composition of one or more compounds of formula (1) and a photoinitiator, and then irradiating the composition with ultraviolet or electron beam radiation effective to polymerize said one or more compounds of formula (1).
  • Preferred R groups include the branched structures having the formula CH 3 C(CH 2 -) 3 , or C(CH 2 -) 4 .
  • the R 2 substituent always contains an oxygen atom which is also bonded to the R group.
  • R 2 can be hydroxyl, in which case the resulting compound is referred to herein as "underivatized” .
  • R 2 can be alkoxy containing 1 to 20 carbon atoms, phenoxy, acryloyloxy, methacryloyloxy, or any of the acyloxy, acyloxycarbonyloxy, or urethane derivatives represented by the formula A-(Het) 0 . 1 - C(0)0- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) represents the optional oxygen or NH- atoms .
  • R 2 is alkoxy it can optionally be substituted with phenyl, thereby creating for example a benzyloxy substituent.
  • R 2 is alkoxy containing two or more carbon atoms, two consecutive carbon atoms thereof can optionally be joined with an oxygen atom to form an epoxy ring.
  • R 2 is other than hydroxyl
  • Suitable X groups include, but are not limited to -Ph- groups, wherein -Ph- is phenylene (i.e. 1 , 2 -phenylene, 1 , 3 -phenylene, or 1,4- phenylene) , as well as -Ph-Ph-; -P o ⁇ -C 8 H jg -Ph o . !
  • C a H 2a is an alkylene group containing 1 to 20 carbon atoms; and groups consisting of a C f H 2£ and a C g H 2g moiety which are bonded to -C(O)-, -0- , -C ⁇ 0)0-, -Ph- or -C(0)NH- and f and g are each 1 to 12.
  • the C a H 2a , C £ H 2£ and C g H 2g groups can be straight or branched, and they can be attached to adjacent moieties at the same carbon atom (e.g. -CH 2 -, CH 3 CCH 3 ) or at different carbon atoms (e.g. -CH 2 CH 2 - , -CH 2 CH (CH 2 CH 3 ) CH 2 CH 2 CHCH 2 - ) .
  • L represents a linking group between the X moiety in each of the substituted R groups.
  • Suitable linking groups L include a single chemical bond, -C(0)0-, -OC(0)0-, -O- , and -NHC(0)0- bearing in mind that in any case each R group is bonded to an oxygen atom of the linking group L. Also, when'L is a chemical bond, X can be -C(0)-.
  • This allyl precursor if not available commercially, can be prepared by reacting a precursor of formula R(OH) n+1 with an appropriate number of moles of an allyl chloride of the formula Cl -CH j -CH ⁇ CHR 1 (or the corresponding bromide) calculated to provide the desired hydroxyl substituted compound of formula (1- A) .
  • the allyl ether precursor of formula (1-A) is converted to the desired propenyl product by isomerization of the allyl compound.
  • This isomerization is carried out in the presence of a small but effective amount of a catalyst for the isomerization, in the presence or absence of a solvent which is inert to the reactant, product and catalyst.
  • Catalysts for the isomerization include strong bases, such as potassium t-butoxide-DMSO, and sodium amide.
  • transition metal -containing catalysts such as tris (triphenylphosphine) ruthenium (II) dichloride, tris (triphenylphosphine) rhodium (I) chloride, ruthenium on alumina, and iron pentacarbonyl .
  • the hydroxyl -substituted compound of formula (1) can be reacted with p- toluene sulfonyl chloride to form an intermediate tosylate ester, which is then reacted with phenol to form the desired phenoxy compound.
  • Acyloxy derivatives such as acryloyloxy, methacryloyloxy, A-0-C(0)0- and A-C(0)0- derivatives can be formed by reacting the corresponding acyl chloride or anhydride with the compound of formula (1) wherein R 2 is -OH.
  • the urethane derivatives, of the formula A-NH-C (0)0- can be formed by reacting the corresponding isocyanate with a compound of formula wherein R 2 is -OH.
  • Another route for synthesizing compounds of formula (1) involves first reacting the allyl ether precursor having formula (1-A) to derivatize the hydroxyl group by employing any of the procedures available for derivatizing the hydroxyl -substituted propenyl compound, so as to form a suitably derivatized allyl compound, and then isomerizing the derivatized allyl compound to the desired propenyl product.
  • the isomerization conditions and catalysts suitable for the isomerization are the same as described hereinabove with respect to isomerization of compounds of formula (1-A).
  • R 2 substituent contains a linking group as defined hereinabove
  • X is as defined above and the linking groups L are as defined hereinabove.
  • the terminal group Z is any capping group which will leave the L group (or, when L is a chemical bond, leave the X group) upon reaction with the hydroxyl - substituted allyl reactant so as to permit formation of the desired linkage between the L groups and R groups.
  • the group Z can be hydrogen or lower alkyl such that the reaction between the precursor X(-L-Z) i+1 is a matter of esterification or transesterification.
  • Other routes and suitable reactants permitting the incorporation of other L linking groups disclosed herein will be apparent to those of ordinary skill in this art.
  • the intermediate is isomerized in the presence of any of the isomerization catalysts described hereinabove to form the product propenyl derivative having a plurality of propenyloxy groups attached to the X moiety through the R moiety and the L linking groups.
  • Analogous compound where the 1 , 4 -phenylene is replaced by linear, branched or cyclic alkylene, or by other position isomers of phenylene can be made by the same procedure from the appropriate diester.
  • the propenyl compounds of formula (1) are readily polymerized by exposure to ultraviolet or electron beam radiation in the presence of a cationic photoinitiator .
  • a cationic photoinitiator which may be used to achieve polymerization are diazonium salts, diaryliodonium salts, triarylsulfonium salts, diaryliodosonium salts, triarylsulfoxonium salts, dialkylphenacylsulfonium salts, and dialkyl-4- hydroxyphenylsulfonium salts.
  • these salts typically contain complex metal halide or other non-nucleophilic ions such as BF 4 " , PF 6 “ , SbF 6 “ , AsF 6 “ , C10 4 “ , CF 3 S0 3 ⁇ (C 6 F 6 ) 4 B “ and the like.
  • suitable photoinitiator salts are described hereinbelow and include those described in Crivello and Dietliker, in Chemistry & Technology of UV & EB Formulation For Coatings, Inks & Paints, Vol. 3, 1991, page 329, the disclosure of which is hereby incorporated herein by reference.
  • the amount of photoinitiator should be in the range of about 0.1 to 10% by weight based on the weight of the compound or compounds of formula (1) .
  • the compositions containing compounds of formula (1) and one or more photoinitiators for polymerization of such compounds comprises one aspect of the present invention.
  • Rapid and complete polymerization of the compounds of formula (1) can be achieved by irradiating the composition with an electron beam dose on the order of 0.1 to 10 Mrad or ultraviolet radiation flux on the order of 10-30 mW/cm 2 .
  • Higher energy levels are also useful, especially when higher throughput speeds are desired or thicker masses of polymer are presented.
  • Photopolymerizable compositions containing the compounds for formula (I) can also contain any of the other additives customary for such uses, in the amounts thereof adequate to enable the additive to perform its desired function.
  • additives include photosensitizers, fillers, flow control agents and the like. Examples of suitable materials for providing these functions abound in this field and are well known to those experienced in this field, and include the materials which are employed for those functions with other radiation- curable monomers such as acrylates and vinyl ethers.
  • other comonomers may be present such as epoxies, vinyl ethers and 1-butenyl ethers.
  • Routine infrared spectra were obtained on a Midac FT- IR.
  • Real-time IR were recorded on a Midac FT-IR (Midac Corp., Irvine, CA) equipped with a liquid nitrogen cooled MCT-detector at a scan rate of 270 scans per minute and a resolution of 4 cm "1 .
  • the data was recorded using the software program LabCalc (Galactic Software, Salem CT) and processed with Grams/386 (Galactic Software, Salem CT) .
  • the FT-IR was equipped with a UVEXS Co. Model SCU 110 UV lamp fitted with a fiber optical cable. The UV radiation flux on the sample was 17-18 mW/cm 2 .
  • Trimethylolpropane diallyl ether (20 g, 93 mmol), 14.1 g (112 mmol) of dimethyl sulfate, 4.48 g (112 mmol) of powdered sodium hydroxide and 50 mL of toluene were combined in a three neck round bottom flask equipped with a thermometer, overhead stirrer and a reflux condenser. The suspension was stirred for 10 minutes at 40°C. Tetra-n-butylammonium bromide (0.2 g) were added and the suspension was heated to 110°C for 6 hours. The solution was cooled to room temperature, extracted with a 1 M sodium hydroxide solution, washed three times with water and the solvent was evaporated. The residue was subjected to fractional distillation under reduced pressure (b.p. 55°C/0.3 mm, Yield: 19.4 g; 91%).
  • Trimethylolpropane Di (1 -propenyl) Butyl (2A) and Octyl (3A) Ethers Trimethylolpropane diallyl ether (10 g, 46.7 mmol), 93.3 mmol of n-butyl or n-octyl bromide, 15.7g of potassium hydroxide and 90 mL of DMSO were stirred for two hours at room temperature. The solution was diluted with 200 mL of water and extracted twice with 50 mL of ethyl acetate. The combined organic phases were washed with water and then dried over anhydrous sodium sulfate. After evaporation of the solvent, the residue was distilled under reduced pressure yielding 67% 2A (b.p. 110°C/0.1mm) .
  • 3A (b .p.145°C/0.05 mm) was prepared in 56% yield.
  • Both of the allyl ethers 2A and 3A were isomerized completely by heating at 170°C for 1 hour with 0.02 g (22 ⁇ mol) of tris (triphenylphosphine) ruthenium (II) dichloride as the catalyst .
  • Trimethylolpropane di (1 -propenyl ) n-butyl ether 2P (b.p. 113°C/0.2mm) was obtained in a 95% yield.
  • Trimethylolpropane di (1 -propenyl) n-octyl 1 ether 3P was obtained in 98% yield (b.p. 155°C/0.1 mm) .
  • Trimethylolpropane diallyl ether (30 g, 140 mmol) , 50 mL of pyridine and 50 mL of toluene were combined in a two neck flask. The solution was heated to 60°C and 38.13 g (200 mmol) p- toluenesulfonyl chloride dissolved in 100 mL of chloroform were added dropwise over a period of 1 hour. The solution was stirred at 60°C for an additional three hours. After cooling to room temperature, the solution was extracted with saturated sodium bicarbonate solution until no more carbon dioxide was evolved. After washing three times with water, the solvent was evaporated and the crude product used for further reactions. The yield of trimethylolpropane diallyl ether tosylate ester was 46.1 g (89%) .
  • the allyl ether was quantitatively !5 isomerized 'at 175°C for 1 hour with 0.02 g (22 ⁇ m ⁇ l) of tris (triphenylphosphine) ruthenium (II) dichloride as the catalyst.
  • the yield of 4P (b.p. 155°C/0.2 mm) was 97%.
  • Trimethylolpropane diallyl ether (20 g, 93.3 mmol) and 12.4 mL (121 mmol) of acetic anhydride were dissolved in 40 mL of toluene.
  • One drop of pyridine was added and the solution heated to reflux for 16 h. After cooling, the solution was extracted with saturated sodium bicarbonate solution until no more gas was evolved. The solution was washed with water, and the organic layer separated and dried over anhydrous sodium sulfate. The solvent was removed on a rotary evaporator and the residue distilled under reduced pressure. The fraction boiling at 76°C/0.025 mm was collected. The yield of 5A was 22.7 g (95%) .
  • 8A was isomerized to 8P in 8% yield after 2h at 180°C and purified by vacuum microdistillation (b.p. 182°C/0.1 mm) .
  • 9A was isomerized to 9P in 89% yield after 2h at 180°C. Purification was accomplished by vacuum microdistillation (b.p. 190°C/0.025 mm).
  • Thin films (-25 ⁇ m) of the liquid monomers containing 0.5 mol% of I0C10 ( (4 -n-decyloxyphenyl) phenyliodonium hexafluoroantimonate) photoinitiator were drawn onto glass or steel panels and irradiated using a GE H3T-7 200 W medium pressure mercury arc lamp mounted at a distance of 12 cm from the sample. This apparatus was equipped with a mechanical shutter which could be opened to expose the samples to UV irradiation. With monomers 1P-7P, polymerization of the monomers took place within 0.5-1 second to give crosslinked solid films of the polymer. Monomer 8P did not polymerize under these conditions while longer irradiation times (1-2 minutes) were required to polymerize monomer 9P.
  • I0C10 (4 -n-decyloxyphenyl) phenyliodonium hexafluoroantimonate
  • UV lamp fitted with a fiber optic cable and the probe of the fiber optic cable positioned so as to direct UV irradiation onto the sample window of the spectrometer. UV intensity was measured with the aid of a Control Cure Radiometer and found to be 18-19 mW/cm 2 . To determine the rate of polymerization the
  • the methyl ether substituted monomer IP has the highest rate of polymerization. This is expected since it this monomer does not contain polar groups which could interfere with the propagating carbenium ions. In addition, the methyl ether group is relatively small, so that steric factors are also small.
  • the n-butyl and n-octyl ethers (2P and 3P) undergo rather sluggish photopolymerizations with IOC10. The reason for the surprisingly low rates of polymerization is the limited solubility of the photoinitiator (IOC10) in these monomers.
  • UV 9380C is di (dodecylphenyl) phenyliodonium hexafluoroantimonate

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Abstract

Disclosed are compounds of formula (1): R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms; R1 is -H or -CH¿3; R?2 is -OH, alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring, phenoxy, acryloloxy, methacryloloxy, or A-(Het)¿0-1?C(O)O- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) is -O- or -NH-; or R?2¿ is -L-X-(L-R-(OCH=CH-CH¿2R?1)n)1-3 wherein X has any of the structures -Ph0-1-CaH2a-Ph0-1-Ph0-1-(cyclo-C5-20-alkyl)-Ph0-1-, -Ph-Ph-, or -Ph-, wherein Ph is phenylene and a is 1 to 20; -CfH2fC(O)CgH2g -CfH2fOCgH2g, -CfH2fC(O)OCgH2g-, -CfH2fPhCgH2g-, or -CfH2fC(O)NHCgH2g-, wherein f and g are each 1 to 12; and each L is independently a chemical bond or -C(O)O-, -OC(O)O-, -O-, or -NHC(O)O-, provided that each R is bonded to an oxygen atom of L; or X is -C(O)-, each L is a chemical bond, and i is 1. Also disclosed are methods and compositions useful in the radiation-induced polymerization of such compounds.

Description

RADIATION-CURABLE PROPENYL COMPOUNDS, USES THEREOF, AND COMPOSITIONS CONTAINING THEM
The present invention relates to novel radiation- curable propenyl compounds, to radiation - curable compositions containing such compounds, and to processes for forming radiation -cured products from such compounds and compositions.
Radiation curing has become an important and useful technique for applying and curing coatings, inks, and adhesives. As described herein, radiation curing involves presenting a radiation -curable polymer, typically in combination with a photo- initiator, and exposing the composition to radiation in the form of ultraviolet or electron-beam radiation to cause the radiation- curable compound to polymerize.
Radiation curing presents many advantages, such as high rates of throughput, low energy requirements, and low equipment costs. In addition, it is advantageous that users are able to avoid using a solvent when the composition to be radiation -cured is prepared. Solvents typically would lead to environmental and/or safety hazards, and would require additional equipment and handling. steps to remove the solvent .
Propenyl compounds useful in the preparation of polymeric coatings and the like via photopolymerization are disclosed in, for instance, U.S. Patent No. 5,486,545 and U.S. Patent No. 5,567,858. However, there remains a need for radiation- curable compounds, photopolymerizable or otherwise, which provide improved versatility and which can be formulated into a variety of coatings, films and the like readily and rapidly.
The present invention comprises compounds of the formula (1)
Figure imgf000004_0001
wherein n is an integer from 1 to 3;
R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms; R1 is -H or -CH3; R2 is -OH, alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring, phenoxy, acryloyloxy, methacryloyloxy, or A-CHet)^-
C(0)0- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) is -O- or -NH- ; or R2 is -L-X- (L-R- (0CH=CH-CH2R1)n)i wherein X has any of the structures - Ph0.χ-CaH2a- Ph^
-Php^- (cyclo-C5.20-alkyl) -Ph^- , -Ph-Ph-, or -Ph-, wherein Ph is phenyl ene and a is 1 to 20;
-C£H2fC(0)CgH2g -CfH0CgH2g, -C£HC (O) 0CgH2g- , -CfHPhCgH2g- , or -C£HC (0)NHCgH2g- , wherein f and g are each 1 to 12; and each L is independently a chemical bond or -C(0)0-, -0C(0)0-, -0-, or -NHC(0)0-, provided that each R is bonded to an oxygen atom of L, and i is an integer from 1 to 3; or X is -C(O)-, each L is a chemical bond, and i is 1.
Furthermore, the compounds in formula (1) , can contain up to (n-1) (OCH2CH=CHR1) groups in place of (OCH=CH-CH2R1) groups. The present invention is further directed to compositions comprising one or more compounds of said formula (1) , and also comprising one or more photoinitiators in an amount effective to mediate polymerization of said compound when the composition is irradiated with, for instance, ultraviolet radiation or electron beam radiation.
Still further, the present invention is directed to a process of forming a polymeric structure, such as a coating, film, or solid body, comprising' forming the aforementioned composition of one or more compounds of formula (1) and a photoinitiator, and then irradiating the composition with ultraviolet or electron beam radiation effective to polymerize said one or more compounds of formula (1).
Referring to formula (1) , it can be seen that R represents a linear, branched or cyclic alkyl group having at least two substituents and as many as four substituents, one of which is a R2 group and up to (n) of which have the formula -0CH=CH-CH2Rα . As will be described below, up to (n-1) substituents can have the formula -0CH2CH=CHR1 instead of -OCH=CHCHR1. Preferred R groups include the branched structures having the formula CH3C(CH2-)3, or C(CH2-)4. Referring again to formula (1) , it can be seen that the R2 substituent always contains an oxygen atom which is also bonded to the R group. Thus, R2 can be hydroxyl, in which case the resulting compound is referred to herein as "underivatized" . Alternatively, R2 can be alkoxy containing 1 to 20 carbon atoms, phenoxy, acryloyloxy, methacryloyloxy, or any of the acyloxy, acyloxycarbonyloxy, or urethane derivatives represented by the formula A-(Het)0.1- C(0)0- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) represents the optional oxygen or NH- atoms . When R2 is alkoxy it can optionally be substituted with phenyl, thereby creating for example a benzyloxy substituent. When R2 is alkoxy containing two or more carbon atoms, two consecutive carbon atoms thereof can optionally be joined with an oxygen atom to form an epoxy ring. The embodiments wherein R2 is other than hydroxyl are at times referred to herein as the derivatized embodiments of the compounds of the present invention. it can also be seen in the definition of formula (1) that R2 can be a substituent of the formula -L-X- (L-R- (OCH=CH-CH2R1) n) i . In these embodiments, a central moiety X is substituted with a total of (i+1) substituents of the formula (-L-R- (0CH=CH-CH2R1)n) . Suitable X groups include, but are not limited to -Ph- groups, wherein -Ph- is phenylene (i.e. 1 , 2 -phenylene, 1 , 3 -phenylene, or 1,4- phenylene) , as well as -Ph-Ph-; -P o^-C8Hjg-Pho.! groups in which CaH2a is an alkylene group containing 1 to 20 carbon atoms; and groups consisting of a CfH and a CgH2g moiety which are bonded to -C(O)-, -0- , -C{0)0-, -Ph- or -C(0)NH- and f and g are each 1 to 12. The CaH2a, C£H and CgH2g groups can be straight or branched, and they can be attached to adjacent moieties at the same carbon atom (e.g. -CH2-, CH3CCH3) or at different carbon atoms (e.g. -CH2CH2 - , -CH2CH (CH2CH3) CH2CH2CHCH2 - ) .
In formula (1) , L represents a linking group between the X moiety in each of the substituted R groups. Suitable linking groups L include a single chemical bond, -C(0)0-, -OC(0)0-, -O- , and -NHC(0)0- bearing in mind that in any case each R group is bonded to an oxygen atom of the linking group L. Also, when'L is a chemical bond, X can be -C(0)-.
Specific preferred examples of compounds in accordance with this description are provided hereinbelow.
The choice of routes for synthesizing the compounds of the present invention is dictated principally by the particular target compound desired. As will be seen below, in many cases there are several different routes available to synthesize a particular compound . To synthesize those embodiments of the present invention wherein R2 is -OH, the preferred route is isomerization of the allyl ether analog of the desired propenyl compound. Those allyl ether analogs thus have the formula (1-A)
Figure imgf000008_0001
wherein R, R1 and n are as defined herein. This allyl precursor, if not available commercially, can be prepared by reacting a precursor of formula R(OH)n+1 with an appropriate number of moles of an allyl chloride of the formula Cl -CHj-CH^CHR1 (or the corresponding bromide) calculated to provide the desired hydroxyl substituted compound of formula (1- A) .
The allyl ether precursor of formula (1-A) is converted to the desired propenyl product by isomerization of the allyl compound. This isomerization is carried out in the presence of a small but effective amount of a catalyst for the isomerization, in the presence or absence of a solvent which is inert to the reactant, product and catalyst. Catalysts for the isomerization include strong bases, such as potassium t-butoxide-DMSO, and sodium amide. Other suitable catalysts for this isomerization include transition metal -containing catalysts, such as tris (triphenylphosphine) ruthenium (II) dichloride, tris (triphenylphosphine) rhodium (I) chloride, ruthenium on alumina, and iron pentacarbonyl .
While complete isomerization of all allyl groups present to propenyl is preferred, it is also contemplated that some but not all allyl groups isomerize to propenyl.
Compounds of formula (I) wherein R2 is alkoxy, phenoxy, acryloyloxy, methacryloyloxy, or A- (Het) Q.AC (O) O- can be synthesized in either of two ways. One way involves the formation of the propenyl - substituted compound as described above wherein R2 is hydroxyl, followed by derivatization of the hydroxyl - substituent by reaction thereof with a suitable reagent by which the desired R2 group replaces the hydroxyl group. For instance, when the desired R2 group is alkoxy, the corresponding hydroxyl - substituted compound can be reacted with the corresponding alkyl halide, such as alkyl bromide, under alkaline conditions. When the desired R2 group is phenoxy; the hydroxyl -substituted compound of formula (1) can be reacted with p- toluene sulfonyl chloride to form an intermediate tosylate ester, which is then reacted with phenol to form the desired phenoxy compound. Acyloxy derivatives such as acryloyloxy, methacryloyloxy, A-0-C(0)0- and A-C(0)0- derivatives can be formed by reacting the corresponding acyl chloride or anhydride with the compound of formula (1) wherein R2 is -OH. The urethane derivatives, of the formula A-NH-C (0)0- can be formed by reacting the corresponding isocyanate with a compound of formula wherein R2 is -OH.
Another route for synthesizing compounds of formula (1) involves first reacting the allyl ether precursor having formula (1-A) to derivatize the hydroxyl group by employing any of the procedures available for derivatizing the hydroxyl -substituted propenyl compound, so as to form a suitably derivatized allyl compound, and then isomerizing the derivatized allyl compound to the desired propenyl product. The isomerization conditions and catalysts suitable for the isomerization are the same as described hereinabove with respect to isomerization of compounds of formula (1-A).
To produce compounds of the formula (1) wherein the R2 substituent contains a linking group as defined hereinabove, it is preferred first to react the allyl analog wherein R2 is hydroxyl, with a compound corresponding to the formula X-( -Z)i+1. For this reactant, X is as defined above and the linking groups L are as defined hereinabove. The terminal group Z is any capping group which will leave the L group (or, when L is a chemical bond, leave the X group) upon reaction with the hydroxyl - substituted allyl reactant so as to permit formation of the desired linkage between the L groups and R groups. For instance, when the L groups are to be ester linkages between the X group and the respective R moieties, the group Z can be hydrogen or lower alkyl such that the reaction between the precursor X(-L-Z)i+1 is a matter of esterification or transesterification. Other routes and suitable reactants permitting the incorporation of other L linking groups disclosed herein will be apparent to those of ordinary skill in this art. Following formation of the intermediate allyl analog in this manner, the intermediate is isomerized in the presence of any of the isomerization catalysts described hereinabove to form the product propenyl derivative having a plurality of propenyloxy groups attached to the X moiety through the R moiety and the L linking groups.
One example of the synthesis of such a multifunctional compound is the following: (termed herein Scheme A) :
Figure imgf000011_0001
TIPO
Figure imgf000011_0002
catalyst
Figure imgf000011_0003
Analogous compound where the 1 , 4 -phenylene is replaced by linear, branched or cyclic alkylene, or by other position isomers of phenylene, can be made by the same procedure from the appropriate diester.
Compounds containing -C(O)- in place of the - (0)CC6H4C(0) - moiety in Scheme A can be prepared by an analogous procedure from the diallyl precursor and diethyl carbonate in the presence of TIPO, (titanium tetra- isopropoxide) to form the allyl analog of the desired final product, followed by catalytic isomerization of the allyl groups to propenyl.
Compounds containing phenylene or straight, branched or cyclic alkylene in place of the - (0) CC6H4C (O) - moiety on Scheme A can be prepared by reacting the diallyl precursor and X-(hal)2, wherein hal is chlorine, bromine or iodine, in the presence of e.g. NaOH or KOH, to form the allyl analog of the desired final product, followed by catalytic isomerization of the allyl groups to propenyl.
Compounds containing a - (O) CNH-X-NHC (0) linkage in place of the - (0) CC6H4C (0) - moiety in Scheme A can be prepared by reacting the diallyl precursor with the polyisocyanate X(NC0)i in the presence of e.g. stannous octoate to form the analog of the desired final product, followed by catalytic isomerization of the allyl groups to propenyl.
Compounds containing a - (0) CO-X-OC (0) - linkage in place of the - (0) CC6H4C (0) -moiety in Scheme A can be prepared by reacting the diallyl precursor with X(0C(0)Cl)i in the presence of e.g. tributylamine to form the allyl analog of the desired final product, followed by catalytic isomerization of the allyl groups to propenyl .
The propenyl compounds of formula (1) are readily polymerized by exposure to ultraviolet or electron beam radiation in the presence of a cationic photoinitiator . Among those photoinitiators which may be used to achieve polymerization are diazonium salts, diaryliodonium salts, triarylsulfonium salts, diaryliodosonium salts, triarylsulfoxonium salts, dialkylphenacylsulfonium salts, and dialkyl-4- hydroxyphenylsulfonium salts. Typically, these salts contain complex metal halide or other non-nucleophilic ions such as BF4 ", PF6 " , SbF6 ", AsF6 ", C104 ", CF3S03\ (C6F6)4B" and the like. Examples of suitable photoinitiator salts are described hereinbelow and include those described in Crivello and Dietliker, in Chemistry & Technology of UV & EB Formulation For Coatings, Inks & Paints, Vol. 3, 1991, page 329, the disclosure of which is hereby incorporated herein by reference.
The amount of photoinitiator should be in the range of about 0.1 to 10% by weight based on the weight of the compound or compounds of formula (1) . As noted herein, the compositions containing compounds of formula (1) and one or more photoinitiators for polymerization of such compounds comprises one aspect of the present invention.
Rapid and complete polymerization of the compounds of formula (1) can be achieved by irradiating the composition with an electron beam dose on the order of 0.1 to 10 Mrad or ultraviolet radiation flux on the order of 10-30 mW/cm2. Higher energy levels are also useful, especially when higher throughput speeds are desired or thicker masses of polymer are presented.
Photopolymerizable compositions containing the compounds for formula (I) can also contain any of the other additives customary for such uses, in the amounts thereof adequate to enable the additive to perform its desired function. Such additives include photosensitizers, fillers, flow control agents and the like. Examples of suitable materials for providing these functions abound in this field and are well known to those experienced in this field, and include the materials which are employed for those functions with other radiation- curable monomers such as acrylates and vinyl ethers. In addition, other comonomers may be present such as epoxies, vinyl ethers and 1-butenyl ethers. Films and coatings formed by irradiation of compositions containing any of the compounds of formula (I) exhibit satisfactory and even superior mechanical strength, adhesion to substrate, high temperature stability, and high reactivity. It is not necessary to formulate the photo-polymerizable or electron beam-polymerizable composition in a solvent, thus permitting the operator to avoid the hazards and inconvenience of using solvents. The following Table 1 identifies particular R2 substituents which are referred to in the following examples and discussion:
Table 1
Figure imgf000015_0001
In the following Examples, derivatives of trimethylolpropane diallyl ether and of trimethylolpropane dipropenyl ether were prepared. The diallyl ether derivatives are identified with the number of the substituents in the R2 position followed by the letter A, and dipropenyl ether derivatives are identified with the number of the substituent in the R2 position followed by the letter P.
Examples
*H-NMR spectra were recorded either on a
Varian XL- 200 MHZ or Unity 500 MHZ spectrometer at room temperature in CDC13. Elemental analyses were performed by Atlantic Microlabs Inc, Norcross, GA.
Routine infrared spectra were obtained on a Midac FT- IR. Real-time IR were recorded on a Midac FT-IR (Midac Corp., Irvine, CA) equipped with a liquid nitrogen cooled MCT-detector at a scan rate of 270 scans per minute and a resolution of 4 cm"1. The data was recorded using the software program LabCalc (Galactic Software, Salem CT) and processed with Grams/386 (Galactic Software, Salem CT) . The FT-IR was equipped with a UVEXS Co. Model SCU 110 UV lamp fitted with a fiber optical cable. The UV radiation flux on the sample was 17-18 mW/cm2 .
Trimethylolpropane Di (1 -propenyl) methyl ether (IP)
Trimethylolpropane diallyl ether (20 g, 93 mmol), 14.1 g (112 mmol) of dimethyl sulfate, 4.48 g (112 mmol) of powdered sodium hydroxide and 50 mL of toluene were combined in a three neck round bottom flask equipped with a thermometer, overhead stirrer and a reflux condenser. The suspension was stirred for 10 minutes at 40°C. Tetra-n-butylammonium bromide (0.2 g) were added and the suspension was heated to 110°C for 6 hours. The solution was cooled to room temperature, extracted with a 1 M sodium hydroxide solution, washed three times with water and the solvent was evaporated. The residue was subjected to fractional distillation under reduced pressure (b.p. 55°C/0.3 mm, Yield: 19.4 g; 91%).
JH-NMR (CDC13) :δ(ppm) 0.84 (t,3H), 1.42 (quart., 2H), 3.28 (s,2H), 3.34 (s,7H), 3.96 (d,4H), 5.16 (d,2H), 5.25 (d,2H), 5.89 (m,2H)
Allyl ether 1A (17 g,74 mmol) and 0.02 g (22 μmol) of tris (triphenylphosphine) ruthenium (II) dichloride were heated under nitrogen for 1 hour to 160°C. The propenyl ether IP was distilled under reduced pressure (b.p. 48°C/0.25mm; Yield:16.7 g, 98%) .
*H-NMR (CDC13) :δ=0.84 (m,3H), 1.42 (m,2H), 1.56 (d, 3H,CH3 trans -propenyl ether), 1.59 (d,3H,CH3 cis- propenyl ether), 3.28 (s,2H), 3.35 (s,3H), 3.52 (s,2H, trans -propenyl ether), 3.62 (s , 2H, cis -propenyl ether), 4.33 (m, IH, cis -propenyl ether), 4.78 (m,lH, cis- propenyl ether), 5.95 (m, IH, cis-propenyl ether), 6.21 (d, IH, trans -propenyl ether)
Elemental Analysis : Calculated for C13H2403, C, 68.38 %, H, 10.59%.
Found C:, 68.36%; H,10.55%
Synthesis of Trimethylolpropane Di (1 -propenyl) Butyl (2A) and Octyl (3A) Ethers Trimethylolpropane diallyl ether (10 g, 46.7 mmol), 93.3 mmol of n-butyl or n-octyl bromide, 15.7g of potassium hydroxide and 90 mL of DMSO were stirred for two hours at room temperature. The solution was diluted with 200 mL of water and extracted twice with 50 mL of ethyl acetate. The combined organic phases were washed with water and then dried over anhydrous sodium sulfate. After evaporation of the solvent, the residue was distilled under reduced pressure yielding 67% 2A (b.p. 110°C/0.1mm) .
2H-NMR (CDClj) : δ(ppm)=0.84 (m,6H), 1.35 (quint., 2H), 1.42 (quart. ,2H), 1.57 (quint. ,2H), 3.28 (s,2H), 3.34 (s,4H), 3.40 (t,2H), 3.96 (d,4H), 5.16 (d,2H), 5.25 (d,2H) , 5.89 (m,2H)
In a similar fashion, 3A (b .p.145°C/0.05 mm) was prepared in 56% yield.
*H-NMR (CDCI3) : δ(ppm)=0.84 (m,6H), 1.25-1.36 (m,8H), 1.42 (quart., 2H) , 1.53 (quint. ,2H), 3.28 (s,2H), 3.32 (s,4H), 3.39 (t,2H), 3.96 (d,4H), 5.16 (d,2H), 5.25 (d,2H) , 5.89 (m,2H)
Both of the allyl ethers 2A and 3A were isomerized completely by heating at 170°C for 1 hour with 0.02 g (22 μmol) of tris (triphenylphosphine) ruthenium (II) dichloride as the catalyst . Trimethylolpropane di (1 -propenyl ) n-butyl ether 2P (b.p. 113°C/0.2mm) was obtained in a 95% yield.
:H-NMR (CDC13) : δ(ppm)=0.82-0.90 (m,6H), 1.38 (m,2H) 1.38-1.59 (m,12H), 3.28 (s,2H), 3.39 (t,2H), 3.55 (s , 2H, trans -propenyl ether), 3.64 (s , 2H, cis-propenyl ether), 4.33 (m, IH, cis -propenyl ether), 4.78 (m, IH trans -propenyl ether), 5.95 (m, IH, cis -propenyl ether), 6.12 (d, IH, trans -propenyl ether)
Elemental Analysis: Calculated for C16H30O3 :C, 73.57%;
H:11.73%.
Found: C, 73.63%; H, 11.70%.
Trimethylolpropane di (1 -propenyl) n-octyl1 ether 3P was obtained in 98% yield (b.p. 155°C/0.1 mm) .
:H-NMR (CDCI3) : δ(ppm)=0.80-0.91 (m,6H), 1.22-1.61 (m,22H) 3.30 (s,2H), 3.39 (m,2H), 3.55 (s, 2H, trans- propenyl ether), 3.64 (s,2H, cis-propenyl ether), 4.33 (m,lH, cis-propenyl ether), 4.78 (m,lH, trans -propenyl ether), 5.95 (m,lH, cis-propenyl ether), 6.12 (d,lH, trans -propenyl ether)
El emental Analysis : Calculated for C20H38O3 : C , 73 . 57% ;
H , 11 . 73%
Found : C , 73 . 63% ; H , 11 . 70% . Synthesis of Trimethylolpropane Di (1 -propenyl) phenyl Ether (4A)
Trimethylolpropane diallyl ether (30 g, 140 mmol) , 50 mL of pyridine and 50 mL of toluene were combined in a two neck flask. The solution was heated to 60°C and 38.13 g (200 mmol) p- toluenesulfonyl chloride dissolved in 100 mL of chloroform were added dropwise over a period of 1 hour. The solution was stirred at 60°C for an additional three hours. After cooling to room temperature, the solution was extracted with saturated sodium bicarbonate solution until no more carbon dioxide was evolved. After washing three times with water, the solvent was evaporated and the crude product used for further reactions. The yield of trimethylolpropane diallyl ether tosylate ester was 46.1 g (89%) .
*H-NMR (CDC13) :δ(ppm) 0.79 ppm (t,3H), 1.3 (quart ., 2H)
2.42 (s,3H), 3.22 (s,4H), 3.83 (d,4H), 3.96 (s,2H),
5.14 (d,2H), 5.19 (d,2H), 5.89 (m,2H), 7.32 (d,2H), 7.78 (d,2H)
El emental Analysis : Calculated f or C19H2805 : C , 61 . 93% ; H ,
7 . 66% .
Found : C , 61 . 77% ; H , 7 . 61%
Potassium tert-butoxide (3.04 g, 27.1 mmol) were dissolved in 30 mL of DMSO. Phenol (2.55 g, 27.1 mmol) was added and the solution heated under nitrogen to 70°C. There were added 5 g (13.57 mmol) of trimethylolpropane diallyl ether tosylate and the dark solution was stirred at 70°C for 6 hours. After cooling, the solution was diluted with 70 mL water and then extracted twice with 60 mL ethyl acetate. The combined organic extracts were washed three times with
- 5* 50 mL portions of water, dried over Na2S04 and the solvent removed by evaporation. The residue was distilled under reduced pressure (0.1 mm) at 150°C to give 2.01 g (51%) of colorless liquid 4A.
10 'H-NMR (CDCl3):δ= 0.90 ppm (t,3H), 1.57 (quart ., 2H) 3.42 (s,4H), 3.88 (s,2H), 3.96 (d,4H), 5.16 (d,2H), 5.25 (d,2H), 5.89 (m,2H), 6.91 (m, 3H) , 7.24 (m,2H)
The allyl ether was quantitatively !5 isomerized 'at 175°C for 1 hour with 0.02 g (22 μmόl) of tris (triphenylphosphine) ruthenium (II) dichloride as the catalyst. The yield of 4P (b.p. 155°C/0.2 mm) was 97%.
20 ^-NMR (CDC13) :δ(ppm) 0.90 (m,3H), 1.50-1.64 (m, 8H) , 3.65 (d,2H, trans -propenyl ether), 3.78 (d,2H, cis- propenyl ether), 3.88 (t,2H), 4.37 (m, IH, cis -propenyl ether), 4.78 (m, IH, trans -propenyl ether), 5.95 (m,lH, cis-propenyl ether), 6.22 (d, IH, trans -propenyl ether),
25 6.91 (m,3H) , 7.24 (m,2H)
Elemental Analysis: Calculated for C18H2603 : C, 74.45%; H, 9.02 %. Found: C, 74.55%; H, 9.02%
30
35 Synthesis of Trimethylolpropane Di (1 -propenyl) ether Acetate (5P)
Trimethylolpropane diallyl ether (20 g, 93.3 mmol) and 12.4 mL (121 mmol) of acetic anhydride were dissolved in 40 mL of toluene. One drop of pyridine was added and the solution heated to reflux for 16 h. After cooling, the solution was extracted with saturated sodium bicarbonate solution until no more gas was evolved. The solution was washed with water, and the organic layer separated and dried over anhydrous sodium sulfate. The solvent was removed on a rotary evaporator and the residue distilled under reduced pressure. The fraction boiling at 76°C/0.025 mm was collected. The yield of 5A was 22.7 g (95%) .
:H-NMR (CDClj) :δ(ppm) 0.83 (t,3H), 1.43 (quart., 2H), 2.05 (s,3H), 3.33 (s,4H,), 3.93 (d,4H), 4.03 (s,2H), 5.15 (d,2H), 5.24 (d,2H), 5.87 (m,2H)
The isomerization of 5A to 5P was conducted with tris (triphenylphosphine) ruthenium (II) dichloride as the catalyst at 190°C under N2. After 20 minutes the conversion to the propenyl ether 5P was complete as determined by ^-NMR. The product was purified by fractional vacuum distillation to yield compound 5P in 97% overall yield (b.p. 82°C/0.05 mm).
XH-NMR (CDC13) :δ(ppm) 0.87 (m,3H), 1.46 (m,2H), 1.53- 1.59 (m,6H), 2.06 (s,3H), 3.57 (d, 2H, trans -propenyl ether) , 3.63 (d, 2H, cis-propenyl ether), 4.02 (t,2H), 4.37 (m, IH, cis -propenyl ether), 4.77 (m,lH,trans- propenyl ether), 5.91 (m, IH, cis -propenyl ether), 6.21 (d, IH, trans -propenyl ether)
Elemental Analysis: Calculated for C14H2404 :C , 65.60%; H,9.44% Found: C, 65.49%; H,9.48%
Preparation of Trimethylolpropane Di (1 -propenyl) Ether Acrylate (6P)
There were combined 10 g (47 mmol) of trimethylolpropane diallyl ether, 30 g (0.234 mol) of n-butyl acrylate and 0.5 g of titanium (IV) tetra isopropoxide (TIPO) was added. The solution was stirred under nitrogen at 150°C for 10 hours. After this time, the solvent and the excess n-butyl acrylate were removed by distillation under reduced pressure. The fraction boiling at 112°C/0.05 mm was collected. The yield of 6A was 7.06 g (56%) .
*H-NMR (CDC13) :δ(ppm) 0.87 (t,3H) , 1.43 (quart., 2H) , 3.36 (s,4H) , 3.92 (d,4H) , 4.12 (s,2H) , 5.15 (d,2H) , 5.22 (d,2H) , 5.79-5.89 (m, 3H) , 6.12 (m,lH) , 6.39 (d,lH)
Elemental Analysis: Calculated for C15H2404:C, 67.14%;
H, 9.01%.
Found: C, 67.21%; H, 9.12%. Allyl ether 6A was quantatively isomerized 1 as described in the previous examples by heating for 20 minutes at 190°C under nitrogen. The conversion was complete after 25 minutes. The distilled product was extremely sensitive to air and polymerization took 5 place upon exposure to air. Attempts to stabilize the compound by adding such free radical inhibitors as hydroquinone and tert. -butyl catechol also resulted in polymerization during the isomerization reaction.
0 3H-NMR (CDC13) :δ(ppm) 0.87 (m,3H), 1.50 (m, 8H) , 3.58 (d,2H), 3.65 (d,2H), 4.15 (t,2H), 4.38 (m,lH, cis- propenyl ether), 4.77 (m, IH, trans -propenyl ether), 5.80-6.41 (m,5H)
5 Preparation of 1- Propenyl Ether Substituted Uretha,nes 8P and 9P
Combined in a 100 mL round bottom flask equipped with a magnetic stirrer, reflux condenser and nitrogen inlet were 10 g (46.7 mmol) of 0 trimethylolpropane diallyl ether and 61 mmol of either phenyl isocyanate or n-butyl isocyanate, then 0.01 g
(0.15 mmol) of di -n-butyltin dilaurate were added.
The solutions were stirred at room temperature for 30 minutes and then heated to 60°C and stirred for an
^ additional 30 minutes. After cooling, the products were purified by distillation in a Bϋchi microdistillation apparatus.
0
5 8A was obtained in 97% yield with a b.p. of 180°C/0.1 mm.
^-NMR (CDClj) :δ(ppm) 0.85 (t,3H), 0.92 (t,3H), 1.32- 1.50 (m,6H), 3.17 (m,2H), 3.30 (s,4H), 3.91 (d,4H), 4.02 (s,2H), 5.13 (d,2H), 4.61 (s,lH, NH) , 5.24 (d,2H) , 5.86 (m,2H) .
9A was not distillable, and was purified by removing the starting isocyanate by heating in the microdistillation apparatus to 180°C for 1 h under high vacuum (0.05 mm) . The yield was 94%.
*H-NMR (CDCI3) :δ(ppm) 0.87 (t,3H), 1.46 (quart., 2H),
3.37 (s,4H), 3.96 (d,4H), 4.18 (s,2H), 5.16 (d,2H), 5.25 (d,2H),, 5.88 (m,2H), 6.60 (s,lH,NH), 7.05 (t,v
IH) , 7.30-7.41 (m,4H) .
Isomerizations of 8A and 9A were conducted with the ruthenium catalyst under nitrogen.
8A was isomerized to 8P in 8% yield after 2h at 180°C and purified by vacuum microdistillation (b.p. 182°C/0.1 mm) .
^- MR (CDC13) :δ=0.80 - 0.95 ppm (m,6H), 1.30-1.60 (m,12H), 3.18 (m,2H), 3.47 (d,2H, trans -propenyl ether), 3.62 (d, 2H, cis -propenyl ether), 4.04 (d,2H),
4.38 (m, IH, cis -propenyl ether), 4.62 (s,lH, NH) , 4.78 (m, IH, trans -propenyl ether), 5.93 (m, IH, cis -propenyl ether), 6.21 (d,lH, trans -propenyl ether)
Elemental Analysis: Calculated for C17H31N04 : C, 65.14%; H,9.97%; N,4.47%. Found: C, 65.89%; H, 10.18%; N,4.05%.
9A was isomerized to 9P in 89% yield after 2h at 180°C. Purification was accomplished by vacuum microdistillation (b.p. 190°C/0.025 mm).
^-NMR (CDC13) :δ=0.80 - 1 ppm (m,6H), 1.45-1.70 (m, 8H) , 3.69-3.80 (m,4H), 4.20 (d,2H), 4.39 (m,lH, cis- propenyl ether), 4.79 (m, IH, trans -propenyl ether), 5.92 (m, IH, cis -propenyl ether), 6.22 (d,lH,trans- propenyl ether), 6.81 (s,lH,NH), 7.05 (t,lH), 7.29>- 7.40 (m,4H)
Elemental Analysis: Calculated for C19H27N04 : C, 68.44%; H, 8.16%; N, 4.20%. Found: C, 68.38%; H, 8.13%; N, 4.08%
UV Cure of Novel Monomers
Thin films (-25 μm) of the liquid monomers containing 0.5 mol% of I0C10 ( (4 -n-decyloxyphenyl) phenyliodonium hexafluoroantimonate) photoinitiator were drawn onto glass or steel panels and irradiated using a GE H3T-7 200 W medium pressure mercury arc lamp mounted at a distance of 12 cm from the sample. This apparatus was equipped with a mechanical shutter which could be opened to expose the samples to UV irradiation. With monomers 1P-7P, polymerization of the monomers took place within 0.5-1 second to give crosslinked solid films of the polymer. Monomer 8P did not polymerize under these conditions while longer irradiation times (1-2 minutes) were required to polymerize monomer 9P.
The polymerizations were also followed in detail by real-time infrared spectroscopy (RTIR) , a method described by Decker and Moussa in J. Polym. Sci. Part a: Polym. chem. , 28, 4329 (1990). For this solutions of the photoinitiator (IOClO) in a concentration of 0.5 mol% in the monomers were prepared. The solution was coated on a commercially available Saran® film (polyvinylidene chloride) . '•'The films were then covered by a second Saran film and this assembly mounted in conventional 5 x 5 cm slide frames. This sandwich was placed in a horizontally mounted Midac Corp. FT-IR spectrometer. The instrument was equipped with a UVEXS Co. Model SCU 110
UV lamp fitted with a fiber optic cable and the probe of the fiber optic cable positioned so as to direct UV irradiation onto the sample window of the spectrometer. UV intensity was measured with the aid of a Control Cure Radiometer and found to be 18-19 mW/cm2. To determine the rate of polymerization the
IR band at 1660 to 1670 cm"1 was followed. The conversion was calculated by integrating the areas of the peak at t0 and tend. The initial slopes of the curves (Rp[M]0) were determined and are considered to be a measure of the reactivity of the monomers. In these studies, the acrylate substituted monomer 6P was not included since it is too unstable to be measured under air without polymerizing by oxygen induction. The results of the measurements are displayed and summarized in Table 2.
The results show that the methyl ether substituted monomer IP has the highest rate of polymerization. This is expected since it this monomer does not contain polar groups which could interfere with the propagating carbenium ions. In addition, the methyl ether group is relatively small, so that steric factors are also small. The n-butyl and n-octyl ethers (2P and 3P) undergo rather sluggish photopolymerizations with IOC10. The reason for the surprisingly low rates of polymerization is the limited solubility of the photoinitiator (IOC10) in these monomers. In contrast, when the polymerization is carried out using the much more soluble commercially available di (docecylphenyl) iodonium hexafluoroantimonate (UV 9380C) , both monomers polymerize very rapidly and to high conversions. The n-octyl ether, 3P, polymerizes with a higher conversion of the propenyl ether groups than the n- butyl ether 2P. One reason may be when the former monomer is polymerized a polymer which possesses a lower glass transition temperature is produced. -21
Table 2
Study of the UV Induced Polymerization of 1- Propenyl
Ether Monomer Compositions
Figure imgf000030_0001
* -IOC10 is (4 -n-decyloxyphenyl) iodonium hexafluoroantimonate and UV 9380C is di (dodecylphenyl) phenyliodonium hexafluoroantimonate

Claims

What Is Claimed Is:
1. A compound of the formula (1)
(0CH=CH-CH2R1)n (1)
wherein n is an integer from 1 to 3;
R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms;
R1 is -H or -CH3;
R2 is -OH, alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring, phenoxy, acryloyloxy, methacryloyloxy, or A-(Het)0.1- C(0)0- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) is -0- or -NH-; or R2 is -L-X- (L-R- (0CH=CH-CH2R1)n) i wherein up to (n- 1) -0CH=CH-CH2R1 groups can instead be -0CH2CH=CHR1; wherein X has any of the structures - Ph0.1-CaH2a- Ph^ -Pl j- (cyclo-C5.20- alkyl) -Phg^- , -Ph-Ph-, or -Ph-, wherein Ph is phenylene and a is 1 to 20; -C£HC(0)CgH2g -C£H0CgH2g, -C£H2fC (O) 0CgH2g- , -C£HPhCgH2g- , or -C£HC (0) NHCgH2g- , wherein f and g are each 1 to 12; and each L is independently a chemical bond or -C(0)0-, -0C(0)0-, -0-, or -NHC(0)0-, provided that each R is bonded to an oxygen atom of L, and i is an integer from 1 to 3; or X is -C(O)-, each L is a chemical bond, and i is 1.
A compound according to claim 1 wherein
R1 is -H.
3. A compound according to claim 1 of the formula
Figure imgf000032_0001
4 . A compound according to claim 1 of the formula R2 - CH X22C—
Figure imgf000032_0002
C4-4H1-J"R1 )' 3
5. A compound according to claim 1 wherein R2 is -OCH3, -OC4H9, -OC8H17, -OC6H5, -0C(0)CH3, -0C(0)CH=CH2, -OC(0)OC4H9, -OC(0)NHC4H9 or -OC (0) NH-C6H5
6. A compound according to claim 1 wherein R1 is -H and R2 is -OC (0) -C6H4 -C (0) 0-R- (0CH=CHCH3) 2.
7. A composition comprising a compound according to claim 1 and an effective amount of a photoinitiator for radiation- induced polymerization thereof .
8. A composition according to claim 7 wherein R1 is -H.
9. A composition according to claim 7 wherein said compound has the formula
Figure imgf000033_0001
10. A composition according to claim 7 wherein said compound has the formula
R2 - CH2C ( CH20CH=CH - CHjR1 ) 3
11. A composition according to claim 7 wherein R2 is -OCH3, -OC4H9, -OC8H17, -OC6H5, -0C(0)CH3,
-0C(0)CH=CH2, -OC(0)OC4H9, -OC(0)NHC4H9 or -OC (0) NH-C6H5
12. A composition according to claim 7 wherein R1 is -H and R2 is -OC (O) -C6H„ -C (0) 0-R- (0CH=CHCH3)2.
13. A process for forming a polymer comprising (a) forming a mixture comprising one or more compounds according to claim 1 and at least one cationic photoinitiator for polymerization of said compound, and
(b) irradiating said mixture with ultraviolet light or electron beam radiation of an energy level, and for a time, sufficient to polymerize said one or more compounds.
14. A process according to claim 13 wherein R1 is -H.
15. A process according to claim 13 wherein said compound has the formula
Figure imgf000034_0001
16. A process according to claim 13 wherein said compound has the formula
R2 - CH2C ( CH20CH=CH - CH,!*1 ) ,
17. A process according to claim 13 wherein R2 is -0CH3, -OC4H9, -OC8H17, -OC6H5, -0C(0)CH3, -0C(0)CH=CH2, -OC(0)OC4H9, -OC(0)NHC4H9 or -OC (0) NH-C6H5
18. A process according to claim 13 wherein
R1 is -H and R2 is -OC (0) -C 6fiHH4,--CC((0O))00--RR-- ((OOCCHH==CCHHCCHH3,))2.
19. A product produced by the process of any one of claims 13 to 18.
20. A process of making a compound of the formula (1)
Figure imgf000035_0001
wherein n is an integer from 1 to 3;
R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms;
R1 is -H or -CH3;
R2 is -OH, alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring, phenoxy, acryloyloxy, methacryloyloxy, or A-(Het)0.1- C(0)0- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) is -0- or -NH- ; comprising isomerizing a compound of the formula (2)
Figure imgf000035_0002
to said compound of the formula (1) in the presence of an effective amount of a catalyst for said isomerization .
21. A process according to claim 20 wherein R1 is -H.
22. A process according to claim 20 wherein said compound has the formula
Figure imgf000036_0001
23. A process according to claim 20 wherein said compound has the formula
R2 - CH2C ( CH20CH=CH - CH-jR1 ) 3
24. A process according to claim 20 wherein R2 is -OCH3, -OC4H9, -OC8H17, -OC6H5, -OC(0)CH3, -OC(0)CH=CH2, -OC(0)OC4H9, -OC(0)NHC4H9 or -OC (O) NH-C6H5
25. A process of making a compound of the formula (1)
Figure imgf000036_0002
wherein n is an integer from 1 to 3 ;
R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms; R1 is -H or -CH3;
1 R2 is alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring,
5 phenoxy, acryloyloxy, methacryloyloxy, or A-(Het)0.1- C(0)0- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) is -0- or -NH-; comprising isomerizing an allyl compound of the formula HO-R- (OCH2CH=CHR1) n to a propenyl compound of
10 the formula HO-R- (OCH=CHCH2R1) in the presence of an effective amount of a catalyst for said isomerization, and then replacing the -OH group on said propenyl compound with R2.
--5 26. A process according to claim 25 wherein
R1 is -H.
27. A process according to claim 25 wherein said compound has the formula
20
Figure imgf000037_0001
25
28 . A process according to claim 25 wherein said compound has the formula
R2 - CH,C (CH2OCH=CH - CH-R1 ) ,
30
35
29. A process according to claim 25 wherein R2 is -OCH3, -OC4H9, -OC8H17, -OC6H5, -OC(0)CH3,
-OC(0)CH=CH2, -OC(0)OC4H9, -OC(0)NHC4H9 or -OC (O) NH-C6H5
30. A process of making a compound of the formula
X- (L-R- (OCH=CHCH2R1)n)i
wherein n is an integer from 1 to 3; R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms;
R1 is -H or -CH3; wherein X has any of the structures -Ph0.1-CaH2a-Ph0.1 -Php^- (cyclo-C5.20-alkyl) -Phg^- , -Ph-Ph-, or -Ph-, wherein Ph' is phenylene and a is 1 to 20;
-CfHC(0)CgH2g -CfHOCgH2g, -C£HC (0) OCgH2g- , -C£HPhCgH2q- , or -C£HC (0) NHCgH2g- , wherein f and g are each 1 to 12; and each L is independently a chemical bond or -C(0)0-, -0C(0)0-, -0-, or -NHC(0)0-, provided that each R is bonded to an oxygen atom of L, and i is an integer from 1 to 3; or X is -C(0) -, each L is a chemical bond, and i is 1. comprising reacting an allyl compound of the formula HO-R- (0CH2CH=CHR1) n with a compound containing a moiety of the formula X- (L-)i+1) to form an intermediate of the formula X- (L-R- (OCH-jCH^CHR1) n) i+1) and then isomerizing said intermediate to said compound of formula (1) in the presence of an effective amount of a catalyst for said isomerization.
31. A process according to claim 30 wherein R1 is -H.
32. A process according to claim 30 wherein said compound has the formula
Figure imgf000039_0001
33. A process according to claim 30 of the formula
X- (L -CH?C (CH20CH=CH -CH-^R1) 3) i+1
34. A process according to claim 30 wherein said compound has the formula (CH3CH=CHO)2-R-OC(0) -C6H4 -C (0) 0-R- (0CH=CHCH3) 21
AMENDED CLAIMS
[received by the International Bureau on 21 January 1999 (21.01.99); original claims 1-34 replaced by new claims 1-21 (7 pages)]
1. A compound of the formula (1)
(OCH^H-CH-R1)-, sr (l)
wherein n is an integer from 1 to 3;
R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms ; R1 is -H or -CH3; R2 is -OH, alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring, phenoxy, acryloyloxy, methacryloyloxy, or A-(Het)0.1- C(0)0- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) is -0- or -NH-; or R2 is -L-X- (L-R- (OCH=CH-CH2R1)n)1 wherein up to (n-1) -OCH=CH-CH2R1 groups can instead be -OCH2CH=CHR1; wherein X has any of the structures ■ Ph0.1- CAE2a- 'Pht>.l -Ph0..- (cyclo-C3.20- alkyl) -Ph0.,- , -Ph-Ph-, or -Ph-, wherein Ph is phenylene and a is 1 to 20; -C£HC(0)CςH -C£H,sOCβH3g, -CtH„C (O) 0CgH2(-- , -CfHPhCσH- , or "'CCH2(C (0)NHC,-KZg- , wherein f and g are each 1 to 12; and each L is independently a chemical bond or -C(0)0-, -0C(0)0-, -0-, or -NHC(0)0-, provided that each R is bonded to an oxygen atom of L, and i is an integer from 1 to 3 ; or X is -C(O) -, each L is a chemical bond, and i is 1. . A compound according to claim 1 wherein R1 is -H.
3. A compound according to claim 1 of the formula
Figure imgf000041_0001
4 . A compound according to claim 1 of the f orm l
R2 - CH-C ( CH20CH=CH - CH^1 ) ,
5. A compound according to claim 1 wherein R2 is -OCH3, -OCaH9. -OC8H17, -0C6Hs, -OC(0)CH3.
-OC(0)CH=CH,, -OC(0)OC,H9, -0C(0)NHCcH9 or -OC (0)NH-C6H5,
6. A compound according to claim 1 wherein R' is -H and R2 is -OC (0) -CSH,-C (0) 0-R- (0CH=CHCH3) 2.
7. A composition comprising a compound according to any one of claims 1-6 and an effective amount of a photoinitiator for radiation- induced polymerization thereof .
8. A process for forming a polymer comprising (a) forming a mixture comprising one or more compounds according to claim 1 and at least one cationic photoinitiator for polymerization of said compound, and (b) irradiating said mixture with ultraviolet light or electron beam radiation of an energy level, and for a time, sufficient to polymerize said one or more compounds .
3 . A process of making a compound of the formula (1)
Figure imgf000042_0001
wherein n is an integer from 1 to 3; R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms ; R1 is -H or -CH3; R2 is -OH, alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring, phenoxy, acryloyloxy, methacryloyloxy, or A- (Het) ,^-C (0) O- wherein
A is alkyl containing I to 20 carbon atoms, and (Het) is
-O- or -NH- ; comprising isomerizing a compound of the formula (2)
Figure imgf000043_0001
^ 2 to said compound of the formula (1) in the presence of an effective amount of a catalyst for said isomerization.
10. A process of making a compound of the formula (1)
Figure imgf000043_0002
wherein n is an integer from 1 to 3 ;
R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms;
Figure imgf000043_0003
R2 is alkoxy containing 1 to 20 carbon atoms which is optionally substituted with phenyl and two consecutive carbon atoms of which are optionally bonded to an oxygen atom to form an epoxy ring, phenoxy, acryloyloxy, methacryloyloxy, or A- (Het) 0-1-C (O) 0- wherein A is alkyl containing 1 to 20 carbon atoms, and (Het) is -0- or -NH-; comprising iεo erizing an allyl compound of the formula HO-R- (OCHjCHsCHR1)., to a propenyl compound of the formula HO-R- (OO^CHCH-R1) in the presence of an effective amount of a catalyst for said isomerization, and then replacing the -OH group on said propenyl compound with R2.
11. A process according to any one of claims 8-10 wherein R1 is -H.
12. A process according to any one of claims 8-10 wherein said compound has the formula
Figure imgf000044_0001
13. A process according to any one of claims 8-10 wherein said compound has the formula
Rz-CH2C (CH2OCH=CH-CHjR1) 3
14. A process according to any one of claims 8 to 10 wherein R2 is -OCH3, -OC4H-, -OC8H17/ -OC6H5, -
OC(0)CH,, -OC(0)CH=CH2, -OC(0)OC4H9, -OC (0) NHC„H9 or - OC(0)NH-C6H5
15. A process according to any one of claims 8-10 wherein R1 is -H and R2 is -OC (O) -C6H4 -C (0) O-R-
(OCH=CHCH3)2.
16. A product produced by the process of any one of claims S to 15.
17. A process of making a compound of the formula
Figure imgf000045_0001
wherein n is an integer from 1 to 3;
R is linear, branched or cyclic alkyl containing 1 to 6 carbon atoms ; Rλ is -H or -CH-; ' wherein X has any of the structures -Ph0.1-CaH2a-Ph0.1
-Ph0.._- (cyclo-C3.S0-alkyl) -Ph,,.!- , -Ph-Ph-, or -Ph-, wherein Ph is phenylene and a is 1 to 20;
-CH2fC(0)C,H2a -CfH2f0C,H-ff. -CfH„C (0) 0CgH2g- , -CfH„PhC,H2g- , or -CfH2fC(0)NHC,H2g- , wherein f and g are each 1 to 12; and each L is independently a chemical bond or
-C(0)0-, -0C(0)0-, -0-, or -NHC(0)0-, provided that each R is bonded to an oxygen atom of L, and i is an integer from 1 to 3; or X is -C(0)-, each L is a chemical bond, and i is 1. comprising reacting an allyl compound of the formula HO-R- (0CH2CH=CHR1)n with a compound containing a moiety of the formula X-(L-)i l) to form an intermediate of the formula X- (L-R- (0CH2CH=CHR1) a) i ) and then isomerizing said intermediate to said compound of formula (1) -in the presence of an effective amount of a catalyst for said isomerization.
18. A process according to claim 17 wherein R* is -H.
19. A process according to claim 17 wherein said compound has the formula
CH,OCH=CH-CH,R1 I X- (L-CH2C-CH2CH3)i+1
CH2OCH=CH-CH,R1
20. A process according to claim 17 of the formula X - ( L - CH2C ( CH2OCH=CH - CH^1 ) 3 ) l+1
21. A process according to claim 17 wherein said compound has the formula (CH3CH=CHO)2-R-OC(0) -C3Ht-C (0) 0-R- ( OCH=CHCH3 ) 2.
PCT/US1998/017110 1997-08-26 1998-08-19 Radiation-curable propenyl compounds, uses thereof, and compositions containing them WO1999010303A1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002018313A1 (en) * 2000-08-30 2002-03-07 Kanagawa University Oxetane-modified compounds and photocuring compounds derived therefrom, processes for preparation of both and curing compositions contaning the photocuring compounds
EP1413568A2 (en) 2002-10-25 2004-04-28 Daicel Chemical Industries, Ltd. Aromatic vinyl ether compounds
EP2289953A1 (en) * 2008-06-18 2011-03-02 Nippon Carbide Industries Co., Inc. Multifunctional vinyl ether and resin composition containing same

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
J.V. CRIVELLO & G. LÖHDEN: "The Preparation of Novel 1-Propenyl Ethers and Their Cationic Photopolymerisation", JOURNAL OF POLYMER SCIENCE: PART A; POLYMER CHEMISTRY, vol. 34, no. 10, 1996, pages 2051 - 2062, XP002086642 *
J.V. CRIVELLO: "Design of network polymers by photopolymerisation", DIE ANGEWANDTE MAKROMOLEKULARE CHEMIE, vol. 240, 1996, pages 83 - 90, XP002086643 *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002018313A1 (en) * 2000-08-30 2002-03-07 Kanagawa University Oxetane-modified compounds and photocuring compounds derived therefrom, processes for preparation of both and curing compositions contaning the photocuring compounds
EP1413568A2 (en) 2002-10-25 2004-04-28 Daicel Chemical Industries, Ltd. Aromatic vinyl ether compounds
EP1413568A3 (en) * 2002-10-25 2004-11-17 Daicel Chemical Industries, Ltd. Aromatic vinyl ether compounds
US7518021B2 (en) 2002-10-25 2009-04-14 Daicel Chemical Industries, Ltd. Aromatic vinyl ether compounds
EP2161248A1 (en) * 2002-10-25 2010-03-10 Daicel Chemical Industries, Ltd. Aromatic vinyl ether compounds
US7732645B2 (en) 2002-10-25 2010-06-08 Daicel Chemical Industries, Ltd. Aromatic vinyl ether compounds
EP2289953A1 (en) * 2008-06-18 2011-03-02 Nippon Carbide Industries Co., Inc. Multifunctional vinyl ether and resin composition containing same
EP2289953A4 (en) * 2008-06-18 2012-09-26 Nippon Carbide Kogyo Kk Multifunctional vinyl ether and resin composition containing same

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