WO1998022997A3 - Solid state laser system for ultra-violet micro-lithography - Google Patents

Solid state laser system for ultra-violet micro-lithography Download PDF

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Publication number
WO1998022997A3
WO1998022997A3 PCT/US1997/021786 US9721786W WO9822997A3 WO 1998022997 A3 WO1998022997 A3 WO 1998022997A3 US 9721786 W US9721786 W US 9721786W WO 9822997 A3 WO9822997 A3 WO 9822997A3
Authority
WO
WIPO (PCT)
Prior art keywords
lithography
laser
ultra
solid state
micro
Prior art date
Application number
PCT/US1997/021786
Other languages
French (fr)
Other versions
WO1998022997A2 (en
Inventor
Henry Shields
Original Assignee
Jmar Technology Co
Henry Shields
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/755,166 external-priority patent/US5940418A/en
Application filed by Jmar Technology Co, Henry Shields filed Critical Jmar Technology Co
Priority to AU73040/98A priority Critical patent/AU7304098A/en
Publication of WO1998022997A2 publication Critical patent/WO1998022997A2/en
Publication of WO1998022997A3 publication Critical patent/WO1998022997A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/3534—Three-wave interaction, e.g. sum-difference frequency generation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/354—Third or higher harmonic generation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/162—Solid materials characterised by an active (lasing) ion transition metal
    • H01S3/1625—Solid materials characterised by an active (lasing) ion transition metal titanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/163—Solid materials characterised by a crystal matrix
    • H01S3/1631—Solid materials characterised by a crystal matrix aluminate
    • H01S3/1636—Al2O3 (Sapphire)

Abstract

Solid state laser system for generating highly monochromatic laser radiation at wavelengths of interest for advanced micro-lithography, particularly 248 nanometer and 193 nanometer wavelengths. At least one Nd:YAG laser produces a 1,064 nm laser beam consisting of narrow-linewidth pulses of infra-red laser radiation having a pulse duration of less than 30 nanoseconds, at a pulse rate preferably in excess of 500 pulses per second with pulse energy greater than 20 millijoules. This radiation is frequency doubled and frequency tripled to produce 532 nm and 355 nm pulsed laser beams. These beams are then further optically processed to generate the ultra-violet wavelength for micro-lithography at either 248 nm or 193 nm.
PCT/US1997/021786 1996-11-22 1997-11-21 Solid state laser system for ultra-violet micro-lithography WO1998022997A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU73040/98A AU7304098A (en) 1996-11-22 1997-11-21 Solid state laser system for ultra-violet micro-lithography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/755,166 1996-11-22
US08/755,166 US5940418A (en) 1996-06-13 1996-11-22 Solid-state laser system for ultra-violet micro-lithography

Publications (2)

Publication Number Publication Date
WO1998022997A2 WO1998022997A2 (en) 1998-05-28
WO1998022997A3 true WO1998022997A3 (en) 1998-08-13

Family

ID=25038000

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1997/021786 WO1998022997A2 (en) 1996-11-22 1997-11-21 Solid state laser system for ultra-violet micro-lithography

Country Status (2)

Country Link
AU (1) AU7304098A (en)
WO (1) WO1998022997A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112421361A (en) * 2020-11-26 2021-02-26 中国林业科学研究院木材工业研究所 Ultraviolet ultrafast laser for wood processing
CN112636140B (en) * 2020-12-17 2021-11-05 武汉安扬激光技术股份有限公司 Femtosecond laser with power and pulse width simultaneously locked

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5457707A (en) * 1993-08-24 1995-10-10 Spectra-Physics Lasers, Inc. Master optical parametric oscillator/power optical parametric oscillator

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5457707A (en) * 1993-08-24 1995-10-10 Spectra-Physics Lasers, Inc. Master optical parametric oscillator/power optical parametric oscillator

Also Published As

Publication number Publication date
AU7304098A (en) 1998-06-10
WO1998022997A2 (en) 1998-05-28

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