WO1997027460A1 - Spectrometre optique miniaturise a guide d'ondes a couche mince - Google Patents

Spectrometre optique miniaturise a guide d'ondes a couche mince Download PDF

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Publication number
WO1997027460A1
WO1997027460A1 PCT/EP1997/000326 EP9700326W WO9727460A1 WO 1997027460 A1 WO1997027460 A1 WO 1997027460A1 EP 9700326 W EP9700326 W EP 9700326W WO 9727460 A1 WO9727460 A1 WO 9727460A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
light guide
light
grating
guide layer
Prior art date
Application number
PCT/EP1997/000326
Other languages
German (de)
English (en)
Inventor
Jörg Müller
Dietmar Sander
Original Assignee
Mueller Joerg
Dietmar Sander
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mueller Joerg, Dietmar Sander filed Critical Mueller Joerg
Priority to EP97901602A priority Critical patent/EP0876589A1/fr
Publication of WO1997027460A1 publication Critical patent/WO1997027460A1/fr

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0256—Compact construction
    • G01J3/0259—Monolithic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating

Definitions

  • Miniaturized optical thin film waveguide spectrometer Miniaturized optical thin film waveguide spectrometer.
  • the invention relates to a spectrometer of the type mentioned in the preamble of claim 1.
  • Such spectrometers then have the very compact structure with dimensions of a few millimeters, the structure consisting essentially of only one layer of dime layers, in particular without moving parts. Such spectrometers are very small and robust.
  • Figure 6 on page 275 shows the structure of the contaminated construction, in which the grating is formed with reflecting surfaces, that is, it reflects the diffracted light back into the light guide layer.
  • the grating is also curved and at the same time serves as a projection device for mapping the spectrum onto the line catcher.
  • a disadvantage of this construction is the step height which is very successful with a reflection grating. The formula applies to a reflection grating
  • a step height of 200 nm cannot be produced with conventional lithographic processes using UV light.
  • the resolution of the mask's corner structure becomes too poor. Since the optical properties of a step grating depend very much on the quality of the edge structure, which is predetermined by the corners of the mask, a grating with such a step height produced in the usual way would not be usable.
  • this construction is not produced in a thin layer structure, but with glass plates.
  • the step grating is produced in a holographic decay, which enables smaller structures than the lithographic mask technique.
  • Step gratings operated in transmission with transparent surfaces are outside the area of the thin film spectrometer, ie with conventional glass bodies, as are also used as prisms
  • Transmissive grids that is to say non-mirrored gratings, are also known in thin-film structures, but not as a sliver grating but as a strip load grating, the grating strips not on the end face of the light guide layer, but on the Side surface of a cover layer covering the light guide layer are applied. Such constructions are out
  • the object of the present invention is to provide a spectrometer of the type mentioned at the beginning which can be used for the analysis of visible light and which can be produced inexpensively in conventional masking technology.
  • n w 1.
  • the Nemier of the break is 0.5.
  • the step height is therefore 5 times higher and can be easily produced with standard lithographic methods using masking technology with usable edge structuring. The manufacturing costs are thereby reduced by several orders of magnitude.
  • Conventional systems for thin-film production such as are available in the semiconductor industry, can be used.
  • Fig. 4 a stai viigiösonnet Scluiitt in dei layer height according to line
  • the step grating formed with transparent surfaces a, b diffracts the light radiated by the light source 8, which is shown in FIG. 1 consisting of two lines. By diffraction at the step grating, the light is broken down into two lines and emitted into the air beyond the step grating.
  • a cylindrical lens I 1 as a projection device images the spectrum with two lines on a line sensor 12.
  • the layer structure is applied to substrate 1 a little longer, that is to say projecting beyond end surface 7. Then a wolf ram or molybdenum layer is wildly applied to the layer structure, which is coated with photoresist, exposed with the pattern of the stair tunnels of the lattice and then washed off beyond the stair-shaped end surface 7.
  • the metal mask is now removed there and then in a plasma etching process preferably with pure CHF 3 plasma with beam direction perpendicular to the layer plane dei entire layer structure beyond the step-shaped edge of the metal mask, so that the step-shaped end face 7 shown in FIG. 2 is formed.
  • the metal film vvu d is then cleaned using known methods 3 shows a spectrometer in another embodiment.
  • the layer structure 3 is in turn provided on the substrate 1 between the end face 10 on the irradiation side and the step-shaped end face 7 carrying the grating, which end face is constructed exactly as shown in FIG. 2. Subsequent to the layer structure 3, a further, second layer structure 3 'is provided, in which the light guide layer 4', which consists of a different material, adjoins the light guide layer 4 of the first layer structure 3 in abutting manner and at the same height.
  • the projection device for imaging the spectrum on the line sensor 12 is designed as a cylindrical layer lens between the light guide layers 4 'and 4 ". This results in a completely integrated spectrometer in a solid structure.
  • the difference in the refractive index at the grating can be very much smaller.
  • it can e.g. be 0.2 or less.
  • the usable step height a (FIG. 2) becomes larger, so that the formation of the slits in the end face 7 can be produced more easily with conventional tecluiology.
  • the materials used in the embodiment of FIGS. 3 and 4 for the materials of the light guide layers 4, 4 'and 4 " can be, for example, Si 3 N 4 for the light guide layer 4 with a refractive index of 2, Si0 2 with a refractive index of 1.46 for the light guide layer 4 'and again Si 3 N 4 for the light guide layer 4 ".
  • the refractive index of approximately 0.5.
  • the layer structure of the construction of FIGS. 3 and 4 can be produced in such a way that the layer structure of FIG. 2 is first produced.
  • the layer structure 3 ' is then applied, for example continuously also over the layer structure 3 (where it is subsequently removed).
  • the end face 13 is produced using masking technique and then the Layer structure 3 "produced in the same way.
  • the lower one can also be produced
  • Cover layer 5 can be formed continuously, just like the upper cover layer 6, only the light guide layers 4, 4 'and 4 "being made to abut one another in mask technology.

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

L'invention concerne un spectromètre comportant: une couche guide de lumière mince (4) dans une structure stratifiée (3) réalisée en couche mince entre deux couches de revêtement (5, 6) d'un indice de réfraction plus faible; une face terminale de la couche guide de lumière, laquelle présente un réseau (a, b,) et est irradiée, par l'intermédiaire de la couche guide de lumière, avec de la lumière à analyser; et un système de projection permettant d'afficher le spectre sur un capteur à balayage linéaire, le réseau étant configuré comme un réseau à échelons de Michelson avec des arêtes étagées perpendiculaires au plan de couche, par ablation, selon une technique de masquage, de régions de la structure stratifiée saillantes dans le sens des couches. Le spectromètre est caractérisé en ce que le réseau est conformé avec des surfaces transparentes (a, b).
PCT/EP1997/000326 1996-01-25 1997-01-24 Spectrometre optique miniaturise a guide d'ondes a couche mince WO1997027460A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP97901602A EP0876589A1 (fr) 1996-01-25 1997-01-24 Spectrometre optique miniaturise a guide d'ondes a couche mince

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19602584.2 1996-01-25
DE19602584A DE19602584A1 (de) 1996-01-25 1996-01-25 Miniaturisiertes optisches Dünnschichtspektrometer und dessen Verfahren zur Herstellung

Publications (1)

Publication Number Publication Date
WO1997027460A1 true WO1997027460A1 (fr) 1997-07-31

Family

ID=7783622

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP1997/000326 WO1997027460A1 (fr) 1996-01-25 1997-01-24 Spectrometre optique miniaturise a guide d'ondes a couche mince

Country Status (3)

Country Link
EP (1) EP0876589A1 (fr)
DE (1) DE19602584A1 (fr)
WO (1) WO1997027460A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19811989A1 (de) * 1998-03-19 1999-09-30 Joerg Mueller Dünnschichtspektrometer mit Transmissionsgitter
WO2011137584A1 (fr) * 2010-05-05 2011-11-10 台湾超微光学股份有限公司 Structure optique d'un micro spectromètre
TWI506253B (zh) * 2010-04-21 2015-11-01 Oto Photonics Inc 微型光譜儀以及其組裝方法
US10393586B2 (en) 2016-07-12 2019-08-27 Oto Photonics Inc. Spectrometer and manufacturing method thereof

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2766920B1 (fr) * 1997-07-31 1999-08-27 Commissariat Energie Atomique Micromonochromateur et procede de realisation de celui-ci
US20020027655A1 (en) * 2000-09-04 2002-03-07 Shigeo Kittaka Optical device and spectroscopic and polarization separating apparatus using the same
DE10357062B4 (de) * 2003-12-04 2005-12-15 Albert-Ludwigs-Universität Freiburg, vertreten durch den Rektor System zur Messung der Verkippung von strukturierten Oberflächen

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0250824A1 (fr) * 1986-05-29 1988-01-07 Polaroid Corporation Multi-démultiplexeur optique intégré
US4773063A (en) * 1984-11-13 1988-09-20 University Of Delaware Optical wavelength division multiplexing/demultiplexing system
EP0672924A1 (fr) * 1994-03-16 1995-09-20 Fujitsu Limited Dispositif de commutation optique
US5581639A (en) * 1995-05-04 1996-12-03 National Research Council Of Canada Raman-nath diffraction grating

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5416861A (en) * 1994-04-29 1995-05-16 University Of Cincinnati Optical synchronous clock distribution network and high-speed signal distribution network

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4773063A (en) * 1984-11-13 1988-09-20 University Of Delaware Optical wavelength division multiplexing/demultiplexing system
EP0250824A1 (fr) * 1986-05-29 1988-01-07 Polaroid Corporation Multi-démultiplexeur optique intégré
EP0672924A1 (fr) * 1994-03-16 1995-09-20 Fujitsu Limited Dispositif de commutation optique
US5581639A (en) * 1995-05-04 1996-12-03 National Research Council Of Canada Raman-nath diffraction grating

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19811989A1 (de) * 1998-03-19 1999-09-30 Joerg Mueller Dünnschichtspektrometer mit Transmissionsgitter
DE19811989B4 (de) * 1998-03-19 2004-10-28 Müller, Jörg, Prof. Dr.-Ing. Dünnschichtspektrometer mit Transmissionsgitter
TWI506253B (zh) * 2010-04-21 2015-11-01 Oto Photonics Inc 微型光譜儀以及其組裝方法
WO2011137584A1 (fr) * 2010-05-05 2011-11-10 台湾超微光学股份有限公司 Structure optique d'un micro spectromètre
CN102869963A (zh) * 2010-05-05 2013-01-09 台湾超微光学股份有限公司 微型光谱仪的光学机构
US20130294727A1 (en) * 2010-05-05 2013-11-07 Oto Photonics Inc. Optical Mechanism Of Miniaturized Optical Spectrometers
US9122014B2 (en) * 2010-05-05 2015-09-01 Oto Photonics, Inc. Optical mechanism of miniaturized optical spectrometers
US10393586B2 (en) 2016-07-12 2019-08-27 Oto Photonics Inc. Spectrometer and manufacturing method thereof

Also Published As

Publication number Publication date
DE19602584A1 (de) 1997-07-31
EP0876589A1 (fr) 1998-11-11

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