WO1996041137A1 - Acquisition de surface automatique pour un microscope a foyer commun - Google Patents

Acquisition de surface automatique pour un microscope a foyer commun Download PDF

Info

Publication number
WO1996041137A1
WO1996041137A1 PCT/US1996/008610 US9608610W WO9641137A1 WO 1996041137 A1 WO1996041137 A1 WO 1996041137A1 US 9608610 W US9608610 W US 9608610W WO 9641137 A1 WO9641137 A1 WO 9641137A1
Authority
WO
WIPO (PCT)
Prior art keywords
point
values
maximum
objective lens
intensity
Prior art date
Application number
PCT/US1996/008610
Other languages
English (en)
Inventor
Ken K. Lee
Original Assignee
Ultrapointe Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultrapointe Corporation filed Critical Ultrapointe Corporation
Publication of WO1996041137A1 publication Critical patent/WO1996041137A1/fr

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302Contactless testing
    • G01R31/308Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G01R31/311Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/002Scanning microscopes
    • G02B21/0024Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052Optical details of the image generation
    • G02B21/006Optical details of the image generation focusing arrangements; selection of the plane to be imaged
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/24Base structure
    • G02B21/241Devices for focusing
    • G02B21/244Devices for focusing using image analysis techniques

Definitions

  • Such a microscope includes a laser light source that emits a laser beam focussed on a pinhole aperture in a focal plane of an objective lens.
  • a beam scanner receives the beam after it exits the pinhole aperture and, using moving reflective elements, scans the beam through the objective lens and across a surface to be imaged.
  • the objective lens has a second focal plane, on the side of the objective lens opposite the pinhole aperture, in which an image of the pinhole aperture is formed.
  • a photodetector in the return path of laser light reflected from the surface generates an output signal proportional to the intensity of laser light reflected from the object and back through the lens, the beam scanner, and the pinhole aperture.
  • the reflected intensity, and therefore the output signal from the photodetector is highest when the surface lies in the second focal plane of the lens. This is because the objective lens focusses the reflected image of the pinhole aperture back through the pinhole aperture to the photodetector.
  • the image of the pinhole aperture is out of focus (i.e., the diameter of the image on the surface is much larger than the aperture) so that most of the reflected image does not return through the pinhole aperture.
  • the target surface is scanned in a number of X-Y planes located along a Z axis generally normal to the target surface.
  • the photodetector provides indications of the intensities of the reflected laser light from a number of points on the surface. That is, the
  • the objective lens is positioned at each location on the Z axis and the laser beam is scanned across the surface to generate a number of signals, each of the signals representing an intensity of light reflected through the objective lens from a given point on the surface.
  • the group of signals provided by an X-Y scan from a single location of the objective lens on the Z axis is called a "slice" of intensity data. Slices taken from the various locations on the Z axis overlap to form a three-dimensional set of reflected intensity data.
  • the overlapping slices of data create a column of data values for each point on the surface, each data value representing a reflected intensity of light from that point from a particular Z location. For each such column, data values are compared to determine the location on the Z axis that resulted in a maximum reflected intensity. Because the intensity of the reflected light from a particular point is greatest when that point on the surface is coincident with the focal plane of the objective lens, the location of the objective lens on the Z axis that corresponds to the maximum reflected intensity gives an indication of the Z coordinate of that point on the surface. In this way, the X, Y, and Z Cartesian coordinates are
  • An image of the surface may then be generated from this
  • Confocal microscopes require the user to input sample-specific data before an image of the target sample can be obtained.
  • the user might have to specify the optimal photodetector gain for measuring laser-light reflected from the target
  • time constraints limit the number of slices to fifty. If the sample is very flat, resolution should be maximized by taking the fifty slices over a relatively short Z range, whereas if the surface of the sample is relatively rough (i.e., the surface features are "tall"), the distance between adjacent slices should be optimized so that the total Z range captures the low and high regions of the surface. And, whatever the surface texture, the scan range should be optimized so that the scan precisely covers the Z range of the surface features so that almost all of the fifty slices provide surface data.
  • the present invention fills the need for a confocal microscope that automatically sets the optimal vertical scan range (i.e., Z-scan range) and photodetector gain for a given target sample.
  • a user is able to automatically set the Z-scan start point, Z-scan range, and optimal photodetector gain.
  • a manual method of setting the scan parameters is still supported, and may be needed in special circumstances, as where the surface features are very tall, or for multi-layered samples.
  • a button called the "SetZ” button, is provided to allow the user to enter the automatic mode.
  • the program performs a number of scans along the Z axis over a scan range that is long relative to typical surface features. From this, the system obtains a coarse measurement of highest and lowest points on the surface (i.e., the greatest and the least Z values on the scanned surface). The system then uses this information to set the Z positions at which the Z stage will start and stop during a subsequent series of scans.
  • the Z-scan starting point for the microscope on the Z axis is set to the Z position corresponding to the highest point on the surface plus a safety margin. Similarly, the end Z position is set to the lowest point measured minus a safety margin.
  • the laser imaging system also uses the maximum reflected
  • the system evenly divides the distance between the start and stop positions by one less than the number of available Z-steps and moves the fine Z stage to the start Z position.
  • the system may then image the target surface by (1) taking a selected number of slices of intensity data along the Z axis (e.g., fifty slices) from the Z- scan start position to the Z-scan stop position and (2) using the data obtained to determine the location of a number of points on the surface of the target surface.
  • a selected number of slices of intensity data along the Z axis e.g., fifty slices
  • Figure 1 is a simplified block diagram of a
  • Figures 2a-2c show a target of a confocal
  • Figure 3 is an idealized graph of an electronic focus signal of a confocal scanning laser microscope as the target is moved along the Z-axis;
  • Figure 4 is a block diagram of a Z-axis controller used to control a fine Z-stage and to provide feedback to a coarse Z-stage;
  • FIGS 5a-5e are schematic diagrams of the Z-axis controller of Figure 4.
  • FIGS. 6A and 6B describe the process of
  • Figure 1 is a simplified block diagram of a confocal microscope system 100 according to an
  • a laser 102 generates a laser beam 123 that is transmitted through a beam splitter 104, reflected from an X-mirror 106 and a Y-mirror 108, and transmitted through an objective lens 110 to the surface of a target 112.
  • laser 102 is a conventional argon-ion laser, however, other types of lasers may be utilized in alternate embodiments.
  • Target 112 is an object, such as a semiconductor wafer, that is to be viewed using microscope system
  • X-mirror 106 and Y-mirror 108 are each rotatable about an axis such that laser beam 123 can be moved along an X-axis and a Y-axis, respectively, of target 112.
  • Laser 102, beam splitter 104, X-mirror 106, Y- mirror 108 and objective lens 110 are each conventional structures that are well known by those skilled in the art.
  • Laser beam 123 reflects off the surface of target 112 in a manner that is dependent upon the distance of objective lens 110 from target 112.
  • Figures 2a-2c show target 112 below the focus position 203, at the focus position 203 and above the focus position 203,
  • laser beam 123 is reflected from target 112 back through objective lens 110 to Y-mirror 108, X-mirror 106, and beam splitter 104.
  • a mirror control 124 is coupled between a host work station 116 and X and Y mirror 106 and 108.
  • Mirror control 124 is used by the work station to rotate X-mirror 106 and Y-mirror 108 such that laser beam 123 can scan more than a single point on target 112.
  • Photodetector 114 is a device such as a photo-multiplier tube (PMT) or photo-diode that generates an analog electronic focus signal on lead 115 proportional to the intensity of reflected laser beam 123 measured by photodetector 114.
  • the photodetector gain must be appropriately calibrated for the laser power, laser wavelength and type of target 112 being viewed. This calibration is discussed below in
  • the PMT used is a Hamamatsu PMT, part number R268.
  • the electric focus signal on lead 115 is provided to host work station 116 and to Z-axis controller 118.
  • Z-axis controller 118 is directly coupled to fine Z- stage 120 and is indirectly coupled to coarse Z-stage 122 through host work station 116 and coarse Z-axis controller 117.
  • Coarse Z-stage 122 uses a motor, such as a stepper motor, to move target 112 through a relatively large range of motion along the Z-axis.
  • the coarse Z- stage controller 117 is a conventional stepper motor controller available as part number 310MX3 from New England affiliated Technology, and coarse Z-stage 122 is driven by a conventional stepper motor such as the Vexta C5858-9012 available from Oriental Motor.
  • fine Z-stage 120 uses a piezoelectrically driven element to move target 112 through a smaller range of motion along the Z-axis than coarse Z-stage 122.
  • FIG. 1 is an idealized graph of the electric focus signal on lead 115 as target 112 is moved along the Z-axis relative to objective lens 110.
  • electric focus signal on lead 115 is theoretically a sine-squared function ((sin(x)/x) 2 ) having a full-width, half-max measurement 305 that varies based on the numerical aperture of the objective lens 110 and the wavelength of laser beam 123.
  • the full-width, half-raax measurement 305 is the width of the electric focus signal on lead 115 (along the Z-axis) at the point on the Z axis at which the electric focus signal on lead 115 is at half of its maximum amplitude.
  • an objective lens 110 having a power of 100x and a numerical aperture of 0.95 and a laser beam 123 with a wavelength of 488 nanometers (nm) will produce an electronic focus signal on lead 115 with a full-width, half-max measurement of approximately 0.5 microns.
  • the electric focus signal on lead 115 exhibits a distinct focus position 203 in main lobe 307 as shown by peak 301.
  • the electric focus signal also exhibits two side lobes 306a-306b.
  • the depth of focus 302 is defined by the Z-axis range at which the magnitude of the electric focus signal on lead 115 is greater than a background value 303.
  • the small non-zero background value 303 of the electronic focus signal on lead 115 results from leakage currents and the small amount of background light that reaches photodetector 114.
  • the depth of focus 302 becomes smaller as the numerical aperture of objective lens 110 increases or as the wavelength of the laser beam 123 decreases.
  • the objective lens 110 has a power of 100x and numerical aperture of 0.95, and laser beam 123 has a wavelength of 488 nm, unless otherwise noted.
  • Figure 4 is a block diagram of Z-axis controller 118, which controls the fine Z-stage 120 and also provides feedback used to control coarse Z-stage 122.
  • the electric focus signal on lead 115 is transmitted to a first input terminal of comparator 401 and to an input of an analog to digital converter (ADC) 407.
  • ADC 407 is coupled to a microprocessor 403, which monitors and controls various components of the microscope, as described below.
  • the output terminal of comparator 401 is coupled to the set terminal of latching flip-flop 402.
  • the Q output terminal of flip-flop 402 is coupled to an input of status register 405.
  • An output signal from control register 406 is coupled to the reset terminal of flip- flop 402.
  • the microprocessor 403 is coupled to status register 405, control register 406, digital to analog converter (DAC) 404, ADC 407 and host work station 116.
  • the output terminal of DAC 404 is coupled to a second input terminal of comparator 401.
  • Microprocessor 403 is also coupled to position control register 408.
  • the output signal from position control register 408 is transmitted through DAC 409, integrator 420, summing node 410 and amplifier 411 to provide a control voltage to a piezoelectric element 1130 of the fine Z-stage 120.
  • the summing node 410 also receives a feedback signal from a proximity sensor 1135 of the fine Z-stage 120.
  • Figures 5a-5e are schematic diagrams of the Z-axis controller 118 of Figure 4. Similar elements in
  • FIGS 4 and 5a-5e are labelled with the same number.
  • central processing unit (CPU) 5000 of microprocessor 403 transmits and receives information through bus transceiver 5034 to 8-bit data bus 5006.
  • CPU 5000 is a TP-RS485 twisted-pair control module, model number 55050-00, available from Echelon.
  • Bus transceiver 5034 provides additional drive
  • Bus transceiver 5034 is a well-known device, available as part number 74ALS245, from Texas
  • the CPU 5000 sends address information corresponding to that device to address register 5036 through bus transceiver 5034 and over data bus 5006.
  • address register 5036 is available from TI as part number 74ALS573.
  • register 5036 is provided to address decoders 5038 and 5040, which decode the output signal and generate control signals to the device being accessed. For example, if the CPU 5000 sent address information directed to enabling the input of video data, address decoder 5040 would output a logic zero on SEL_VIDEO*, thereby closing video input switch 5022 of Figure 5c. Address decoders 5038 and 5040 are available from TI as part numbers 74ALS138 and 74LS139, respectively.
  • Microprocessor 403 communicates with position control register 408, status register 405, control register 406, DAC 404 and ADC 407 using 8-bit data bus 5006.
  • registers 5001 and 5003 within position control register 408 receive
  • Registers 5001-5004 are known in the art. Registers 5001 and 5003, available from TI as part number 74ALS574, serve as buffer registers that, when clocked, make the eight-bit data word on data bus 5006 available as input to registers 5002 and 5004.
  • Registers 5002 and 5004 serve as storage registers that, when clocked by the signal LD_DAC*, store the eight-bit data words output by registers 5001 and 5003 and apply these data words to the input of 12-bit DAC unit 5008 of DAC 409.
  • DAC unit 5008 is a conventional DAC, known in the art, and available from Analog Devices as part number AD7541.
  • the remaining ancillary elements of DAC 409 including operational amplifier 5009 and the
  • Operational amplifier 5009 is available from Analog Devices as part number OP-177E.
  • DAC 409 provides an analog output signal on lead 5010.
  • lead 5010 is connected to one input of operational amplifier 5012 of summing node 410.
  • Operational amplifier 5012 is available as part number AD712 from Analog Devices.
  • the other input to operational amplifier 5012 is derived from the position feedback signal provided by a position sensor (not shown) in fine Z-stage 120 with an output coupled to a connector 1135.
  • Operational amplifier 5018 is
  • Operational amplifier 5018 an its associated resistors and capacitors are configured as a conventional buffer.
  • the output signal from operational amplifier 5018 is provided to the inverting input of operational amplifier 5012.
  • the output signal from summing node 410 is coupled to the input of a conventional
  • integrator 420 which includes an operational amplifier 5016, such as part number AD712 available from AD, and associated elements.
  • the output signal from integrator 420 is provided to notch filter 5013, which includes two resistors and two capacitors.
  • the output signal from notch filter 5013 is provided to operational amplifier 5014, which is available from Analog Devices as part number ad712.
  • the output signal from operational amplifier 5014 is provided to the input of amplifier 411.
  • Amplifier 411 is a conventional amplifier that includes an operational amplifier available from Apex as part number PA85. The combination of diodes, resistors, and capacitors associated with amplifier 411 are all known in the art.
  • the output signal from amplifier 411 is provided through a connector 1130 to a piezoelectric element (not shown) within the fine Z- stage 120.
  • the electric focus signal on lead 115 is provided to ADC 407.
  • the electronic focus signal on lead 115 is routed through multiplexer 5022 to operational amplifier 5020.
  • Multiplexer 5022 is a conventional part available from Siliconix as part number DG 211.
  • Operational amplifier 5020 available from Analog Devices as part number AD843, buffers the electric focus signal on lead 115.
  • the output signal from operational amplifier 5020 is provided to an input of ADC unit 5021.
  • ADC unit 5021 is a conventional part available as part number AD7575 from Analog Devices. The other devices coupled to ADC unit 5021, as
  • ADC unit 5021 In response to the electric focus signal on lead 115, ADC unit 5021 outputs an 8-bit digital signal
  • ADC unit 5021 The 8-bit digital output signal of ADC unit 5021 is provided to microprocessor 403 on data bus 5006.
  • FIG. 5c also illustrates flip-flop 402.
  • Flip- flop 402 is programmed as one of the devices present within programmable logic device (PLD) 5023.
  • PLD 5023 is available from Lattice Semiconductor as part number GAL20RA10.
  • the inputs to PLD 5023 include a set input from comparator 401 and a reset input from control register 406.
  • PLD 5023 processes these inputs and generates an output representing the Q output signal from flip-flop 402. This Q output is provided to status register 405.
  • PLD 5023 also has inputs and outputs unrelated to automatic focus operations.
  • Figure 5d illustrates status register 405, which is a conventional register available as part number 74ALS541 from TI.
  • status register 405 receives the Q output signal from flip- flop 402. (Status register 405 also receives other information unrelated to automatic focus operations.)
  • the 8-bit output signal from status register 405 is provided to data bus 5006 such that microprocessor 403 can detect when flip-flop 402 sets.
  • Control register 406 receives an 8-bit input from microprocessor 403 on data bus 5006.
  • Control register 406 is available from TI as part number 74ALS273. An output signal from control
  • register 406 is coupled to PLD 5023, such that a signal from control register 406 can reset flip-flop 402.
  • DAC 404 also serves as
  • DAC unit 5011 converts the incoming 8-bit signal to an analog output signal. This analog output signal is provided to an input of operational amplifier 5017 (available from Analog Devices as part number AD712). The output signal from operational amplifier 5017 is provided to an input of comparator 401. The electric focus signal is provided to the other input of
  • Comparator 401 includes comparator unit 5019, available from National Semiconductor as part number LM311. The output signal from comparator 401 is provided to flip-flop 402.
  • Figure 5e illustrates the power supply connections 5041, 5042 and analog/digital grounding structure 5043 for Z-stage controller 118.
  • FIGS. 6A and 6B describe the process of
  • a user instigates this process by selecting a "SetZ" button.
  • the SetZ button may be an icon on a computer screen associated with host work station 116, or the SetZ function may be assigned to a function key.
  • the gain of photodetector 114, and hence the measured intensity of laser beam 123 reflected from target 112, is grossly adjusted.
  • the gain of photodetector 114, and hence the measured intensity of laser beam 123 reflected from target 112 is grossly adjusted.
  • photodetector 114 is a photo-multiplier tube (PMT) that includes a gain terminal 114A. The gain of the PMT is adjusted by changing the voltage on gain terminal 114A.
  • a digital-to-analog converter (not shown) is coupled between work station 116 and gain terminal 114A so that the gain of photodetector 114A may be set by supplying an appropriate digital input to the digital-to-analog converter.
  • step 1 the input voltage on gain terminal 114A is compared to a pre-determined upper limit. If the gain voltage is greater than this upper limit, the gain voltage is set to the upper limit. If, on the other hand, the gain voltage is less than a predetermined lower limit, the gain voltage is set to the lower limit.
  • the upper limit is selected to ensure that a reflected surface image does not saturate the
  • system 100 moves to step 2 of Figure 6A, in which system 100 determines the Z range over which to scan target 112.
  • the range of motion of fine Z-stage 120 is, in one embodiment, 50 microns. That is, host work station 116, through Z-axis controller 118, can direct fine Z-stage 120 to move vertically to cover a total distance of up to 50 microns.
  • wafer features are typically much smaller than 50 microns, so a 50 micron SetZ scan would be unnecessarily large.
  • a typical scan window is, for
  • the scan window is normally centered on focus position 203, so the start point of the scan (“Z start ”) is determined by adding half of the predetermined Z scan range to focus position 203, and the stop point of the scan (“Z stop ”) is determined by subtracting half of the predetermined Z scan range from focus position 203.
  • Z max When focus position 203 plus half the scan range is above the maximum Z height attainable with fine Z- stage 120 ("Z max "), Z start is set to Z max and Z stop is set to Z max minus the scan range. Similarly, when focus position 203 minus half the scan range is below the minimum Z height attainable with fine Z-stage 120
  • Z min Z stop is set to Z min and Z start is set to Z min plus the scan range.
  • an automatic focus operation may be performed prior to step 2 to determine the approximate focus position 203 of the sample surface within the coarse scan range of the microscope.
  • the autofocus operation is generally not required in the SetZ sequence shown, as an autofocus is normally performed prior to the SetZ operation.
  • an autofocus is performed on one portion of a relatively flat target, such as a semiconductor wafer, it is generally unnecessary to perform subsequent autofocus operations for other points on that target. In such cases, the automatic focus operation is not performed more than once because it wastes valuable time.
  • host work station 116 directs Z-axis controller 118 to move fine Z-stage 120 to the Z start position.
  • System 100 then begins a series of scans of the surface of target 112, moving step-by-step toward Z stop , to acquire a slice of data values for each Z position.
  • each intensity value of each slice of intensity data is compared to a maximum intensity value corresponding to the same X-Y
  • intensity value of the array of maximum intensity values is updated with a new maximum intensity value for that X-Y coordinate and the array of Z values is updated with the Z location of the new maximum
  • the array of Z values provides an indication of the surface contour.
  • the maximum reflected intensity and Z location associated with the maximum reflected intensity for a particular point on the surface may be determined by comparing each data value associated with that point after slices of data are obtained and stored for all Z locations. This second method is slower and requires more memory than the first, as it is necessary to store all of the data values for each slice.
  • fine Z-stage 120 issues an interrupt signal to work station 116, indicating that the data acquisition is complete.
  • the number of steps in a SetZ scan is user- configurable. Generally, a greater number of steps provides for better image resolution along the Z axis. Unfortunately, each scan step takes time. For this reason, the number of steps (i.e., the number of
  • step 6 of surface data is limited. Moreover, the minimum step size is limited by the resolution of the microscope. For example, in the embodiment described in connection with Figure 3, the half-max measurement 305 of 0.5 microns limits the resolution of the microscope in the Z direction such that providing a step size of less than 0.5 microns will not further increase resolution. For the foregoing reasons, one embodiment uses 50 steps over a scan range of 25 microns, yielding a step size of 0.5 microns.
  • host work station 116 smooths the intensity data stored in the array of maximum intensity values by, for example, averaging the intensity values for a number of neighboring X-Y locations.
  • the work station 116 divides the X-Y locations into groups of nine (i.e., a three-by-three grid of X-Y locations) and assigns each group an average intensity value I ave equal to the average of the maximum intensity values corresponding to the X-Y locations in that group. This smoothing minimizes the effects of noise on the intensity data.
  • step 7 of Figure 6B host work station 116 compares each I ave value to the others to obtain the maximum I ave . Then, in step 8, each I ave value is
  • the minimum-intensity threshold value is established using the minimum and maximum I ave values. For example, in an embodiment that uses an intensity scale of from 0 to 255 to determine the PMT voltage on gain terminal 114A, the minimum- intensity threshold is established using the equation:
  • MinumumThreshold Minl ave + 8 + (Maxl ave - Minl ave )/16 where Minl ave is the minimum average intensity value and Maxl ave is the maximum average intensity value.
  • step 9 host work station 116 smooths the data stored in the array of Z values by, for example,
  • work station 116 divides the X-Y locations into groups of nine (i.e., a three- by-three grid of X-Y locations, wherein each X-Y
  • work station 116 optimizes the gain of photodetector 114 by adjusting the voltage on gain terminal 114A.
  • the maximum I ave value (“I ave_max ”) is compared to a predetermined ideal maximum intensity value. If the maximum I ave is less than the ideal value, then the gain of photodetector 114 is increased. If, on the other hand, the maximum I ave is greater than the ideal value, then the gain of photodetector 114 is decreased.
  • the gain may be set to provide a desired maximum output level on lead 115 using the equation: where "Ideal I" is the desired maximum measured
  • step 11 the maximum measured Z value (“Z M ”) and the minimum measured Z value (“Z m ”) are used to calculate a safety margin S M for a subsequent scan. This safety margin is added to Z M and subtracted from Z m to determine the start and end points, respectively, of the next scan.
  • Z start Z M + S M
  • Z stop Z stop
  • the microscope may be configured to perform a number of different actions after establishing the appropriate Z-scan and photodetector gain settings.
  • the host work station 116 may prompt the user for further instructions, or may scan the surface from Z start to Z end , dividing the distance between Z start and Z end into the preconfigured number of steps (e.g., 50 steps), thereby generating a three-dimensional set of data values.
  • System 100 can then extract a surface image of target 112 from this three-dimensional set of data values.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • General Engineering & Computer Science (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

Une image de surface cible (112), représentée par plusieurs points sur la surface (112), eux-mêmes représentés par des coordonnées cartésiennes X, Y et Z, est obtenue à l'aide un microscope à foyer commun (100). Ce microscope sélectionne une position de départ pour une lentille d'objectif (110) du microscope (100) le long d'un vecteur Z perpendiculaire à la surface (112). Une plage de déplacement présélectionnée de la lentille d'objectif (110) est divisée en plusieurs positions Z. La lentille d'objectif (110) est ensuite positionnée et la surface (112) est balayée à chaque position Z. Chaque position Z balayée fournit des signaux représentant l'intensité réfléchie de la lumière laser. Pour chaque point de la surface (112), le microscope (100) trouve la coordonnée Z correspondante en déterminant la plus forte intensité de retour de la lumière laser réfléchie. A partir de là, chaque coordonnée Z particulière peut être obtenue car l'intensité réfléchie maximale pour un point donné donne l'emplacement Z de ce point de la surface (112). A partir de là, les emplacements Z sont comparés pour permettre la détermination des points bas/hauts de la surface (112). Un deuxième balayage est réalisé à l'aide de ces points bas/hauts de la surface (112) pour déterminer les paramètres de balayage optiques.
PCT/US1996/008610 1995-06-07 1996-06-06 Acquisition de surface automatique pour un microscope a foyer commun WO1996041137A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/483,234 US5594235A (en) 1993-06-17 1995-06-07 Automated surface acquisition for a confocal microscope
US483,234 1995-06-07

Publications (1)

Publication Number Publication Date
WO1996041137A1 true WO1996041137A1 (fr) 1996-12-19

Family

ID=23919249

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/008610 WO1996041137A1 (fr) 1995-06-07 1996-06-06 Acquisition de surface automatique pour un microscope a foyer commun

Country Status (2)

Country Link
US (1) US5594235A (fr)
WO (1) WO1996041137A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002075423A1 (fr) * 2001-03-17 2002-09-26 Carl Zeiss Microelectronic Systems Gmbh Procede d'evaluation d'images en couches
GB2466830A (en) * 2009-01-09 2010-07-14 Ffei Ltd Controlling focus in a microscope
CN109406453A (zh) * 2018-09-11 2019-03-01 江苏大学 一种改进的z扫描测量方法

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6098031A (en) * 1998-03-05 2000-08-01 Gsi Lumonics, Inc. Versatile method and system for high speed, 3D imaging of microscopic targets
US6366357B1 (en) 1998-03-05 2002-04-02 General Scanning, Inc. Method and system for high speed measuring of microscopic targets
US6248988B1 (en) 1998-05-05 2001-06-19 Kla-Tencor Corporation Conventional and confocal multi-spot scanning optical microscope
WO2000057231A1 (fr) 1999-03-19 2000-09-28 Olympus Optical Co., Ltd. Microscope confocal a balayage
US6486457B1 (en) * 1999-10-07 2002-11-26 Agilent Technologies, Inc. Apparatus and method for autofocus
US7003143B1 (en) * 1999-11-02 2006-02-21 Hewitt Charles W Tomographic microscope for high resolution imaging and method of analyzing specimens
DE10005852C2 (de) * 2000-02-10 2002-01-17 Nano Focus Mestechnik Gmbh Verfahren zur Herstellung von Höhenbildern technischer Oberflächen in mikroskopischer Auflösung
US6662063B2 (en) 2000-05-16 2003-12-09 Gsi Lumonics Corporation Method and subsystem for determining a sequence in which microstructures are to be processed at a laser-processing site
US6483071B1 (en) * 2000-05-16 2002-11-19 General Scanning Inc. Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site
US6495791B2 (en) 2000-05-16 2002-12-17 General Scanning, Inc. Method and subsystem for generating a trajectory to be followed by a motor-driven stage when processing microstructures at a laser-processing site
US20040224421A1 (en) * 2000-06-15 2004-11-11 Deweerd Herman Bi-directional scanning method
EP1199542A3 (fr) * 2000-10-13 2003-01-15 Leica Microsystems Imaging Solutions Ltd. Procédé et appareil pour la mesure optique d'un profil de surface d'un objet
US6777645B2 (en) 2001-03-29 2004-08-17 Gsi Lumonics Corporation High-speed, precision, laser-based method and system for processing material of one or more targets within a field
US7139415B2 (en) * 2001-12-05 2006-11-21 The Regents Of The University Of California Robotic microscopy systems
GB0200844D0 (en) * 2002-01-15 2002-03-06 Solexa Ltd Linear response auto focussing device and method
US6862491B2 (en) * 2002-05-22 2005-03-01 Applied Materials Israel, Ltd. System and method for process variation monitor
US20050122577A1 (en) * 2002-06-18 2005-06-09 Olympus Corporation Confocal microscope and measuring method by this confocal microscope
JP4601965B2 (ja) * 2004-01-09 2010-12-22 浜松ホトニクス株式会社 レーザ加工方法及びレーザ加工装置
JP4509578B2 (ja) 2004-01-09 2010-07-21 浜松ホトニクス株式会社 レーザ加工方法及びレーザ加工装置
JP4598407B2 (ja) * 2004-01-09 2010-12-15 浜松ホトニクス株式会社 レーザ加工方法及びレーザ加工装置
JP3923945B2 (ja) * 2004-01-13 2007-06-06 三鷹光器株式会社 非接触表面形状測定方法
US20060050376A1 (en) * 2004-09-02 2006-03-09 Houston Edward S Robotic microscopy apparatus for high throughput observation of multicellular organisms
US20060191884A1 (en) * 2005-01-21 2006-08-31 Johnson Shepard D High-speed, precise, laser-based material processing method and system
US7638731B2 (en) * 2005-10-18 2009-12-29 Electro Scientific Industries, Inc. Real time target topography tracking during laser processing
DE102008034137A1 (de) 2007-09-28 2009-04-02 Carl Zeiss Microlmaging Gmbh Mikroskop und Verfahren zum Betreiben eines Mikroskops
DE102011075809A1 (de) * 2011-05-13 2012-11-15 Carl Zeiss Microimaging Gmbh Verfahren und Vorrichtung zum Festlegen eines z-Bereiches in einer Probe, in dem ein z-Stapel der Probe mittels eines Mikroskops aufzunehmen ist
EP3604555A1 (fr) 2011-10-14 2020-02-05 President and Fellows of Harvard College Séquençage par ensemble de structure
EP4108782B1 (fr) 2011-12-22 2023-06-07 President and Fellows of Harvard College Compositions et procédés de détection d'analyte
US11021737B2 (en) 2011-12-22 2021-06-01 President And Fellows Of Harvard College Compositions and methods for analyte detection
US9914967B2 (en) 2012-06-05 2018-03-13 President And Fellows Of Harvard College Spatial sequencing of nucleic acids using DNA origami probes
US9488819B2 (en) 2012-08-31 2016-11-08 Nanotronics Imaging, Inc. Automatic microscopic focus system and method for analysis of transparent or low contrast specimens
WO2014093838A2 (fr) 2012-12-14 2014-06-19 The J. David Gladstone Institutes Systèmes de microscopie robotique automatisée
EP2971184B1 (fr) 2013-03-12 2019-04-17 President and Fellows of Harvard College Procédé de génération d'une matrice tridimensionnelle contenant des acides nucléiques
EP3003392B1 (fr) 2013-06-04 2019-10-23 President and Fellows of Harvard College Régulation de la transcription à guidage arn
US10274715B2 (en) * 2014-08-06 2019-04-30 Cellomics, Inc. Image-based laser autofocus system
JP7187151B2 (ja) 2015-04-10 2022-12-12 プレジデント アンド フェローズ オブ ハーバード カレッジ 生存細胞の画像解析のための方法及び装置
US10690897B2 (en) * 2015-04-20 2020-06-23 Canon Kabushiki Kaisha Laser scanning microscope apparatus
AU2016349288A1 (en) 2015-11-03 2018-05-31 President And Fellows Of Harvard College Method and apparatus for volumetric imaging of a three-dimensional nucleic acid containing matrix
TWI583918B (zh) 2015-11-04 2017-05-21 澧達科技股份有限公司 三維特徵資訊感測系統及感測方法
CN116200465A (zh) 2016-04-25 2023-06-02 哈佛学院董事及会员团体 用于原位分子检测的杂交链反应方法
WO2018045186A1 (fr) 2016-08-31 2018-03-08 President And Fellows Of Harvard College Procédés de combinaison de la détection de biomolécules dans un dosage unique à l'aide d'un séquençage fluorescent in situ
CN118389650A (zh) 2016-08-31 2024-07-26 哈佛学院董事及会员团体 生成用于通过荧光原位测序检测的核酸序列文库的方法
DE102017223787B3 (de) 2017-12-22 2019-05-09 Leica Microsystems Cms Gmbh Verfahren und Vorrichtung zur Bestimmung der Brechzahl eines Probenmediums, nichtflüchtiges computerlesbares Speichermedium und Mikroskop
SG11202101934SA (en) 2018-07-30 2021-03-30 Readcoor Llc Methods and systems for sample processing or analysis
WO2020076976A1 (fr) 2018-10-10 2020-04-16 Readcoor, Inc. Indexation moléculaire spatiale tridimensionnelle

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4863252A (en) * 1988-02-11 1989-09-05 Tracor Northern, Inc. Objective lens positioning system for confocal tandem scanning reflected light microscope
US5084612A (en) * 1989-10-20 1992-01-28 Fuji Photo Film Co., Ltd. Imaging method for scanning microscopes, and confocal scanning microscope
US5479252A (en) * 1993-06-17 1995-12-26 Ultrapointe Corporation Laser imaging system for inspection and analysis of sub-micron particles

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5483055A (en) * 1994-01-18 1996-01-09 Thompson; Timothy V. Method and apparatus for performing an automatic focus operation for a microscope

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4863252A (en) * 1988-02-11 1989-09-05 Tracor Northern, Inc. Objective lens positioning system for confocal tandem scanning reflected light microscope
US5084612A (en) * 1989-10-20 1992-01-28 Fuji Photo Film Co., Ltd. Imaging method for scanning microscopes, and confocal scanning microscope
US5479252A (en) * 1993-06-17 1995-12-26 Ultrapointe Corporation Laser imaging system for inspection and analysis of sub-micron particles

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002075423A1 (fr) * 2001-03-17 2002-09-26 Carl Zeiss Microelectronic Systems Gmbh Procede d'evaluation d'images en couches
GB2466830A (en) * 2009-01-09 2010-07-14 Ffei Ltd Controlling focus in a microscope
US8472692B2 (en) 2009-01-09 2013-06-25 Ffei Limited Method and apparatus for controlling a microscope
GB2466830B (en) * 2009-01-09 2013-11-13 Ffei Ltd Method and apparatus for controlling a microscope
CN109406453A (zh) * 2018-09-11 2019-03-01 江苏大学 一种改进的z扫描测量方法
CN109406453B (zh) * 2018-09-11 2021-04-20 江苏大学 一种自动确定最优入射光强的z扫描测量方法

Also Published As

Publication number Publication date
US5594235A (en) 1997-01-14

Similar Documents

Publication Publication Date Title
US5594235A (en) Automated surface acquisition for a confocal microscope
US5963314A (en) Laser imaging system for inspection and analysis of sub-micron particles
US8975582B2 (en) Method and apparatus for reviewing defects
US6504948B1 (en) Apparatus and method for automatically detecting defects on silicon dies on silicon wafers
US7642514B2 (en) Charged particle beam apparatus
US5783814A (en) Method and apparatus for automatically focusing a microscope
US7706597B2 (en) Defect inspection apparatus and defect inspection method
US5932871A (en) Microscope having a confocal point and a non-confocal point, and a confocal point detect method applied thereto
US5761336A (en) Aperture optimization method providing improved defect detection and characterization
Carlsson et al. A confocal laser microscope scanner for digital recording of optical serial sections
CN116754565B (zh) 一种光学元件全口径表面微缺陷光致荧光检测用自动对焦检测方法
KR20080011304A (ko) 시료검사장치
WO2005096062A1 (fr) Procede de compensation de l'aberration spherique et systeme correspondant
US6185036B1 (en) Confocal system
JP3579166B2 (ja) 走査型レーザ顕微鏡
US6621628B1 (en) Laser microscope and confocal laser scanning microscope
JP4229573B2 (ja) 共焦点走査型顕微鏡、共焦点走査型顕微鏡における画像表示方法および画像表示処理をするための処理プログラムを記録した記録媒体
CN207020390U (zh) 一种扫描粒子束显微镜系统
JPH11183803A (ja) 共焦点顕微鏡装置
JP2004069795A (ja) 共焦点顕微鏡システム及びパラメータ設定用コンピュータプログラム
JP2000305021A (ja) 共焦点顕微鏡
JP3518923B2 (ja) 共焦点走査型光学顕微鏡の自動画像形成装置
JP2000182555A (ja) 自動焦点合わせ装置
JP2001330779A (ja) 走査式顕微鏡の焦点補正方法及び走査式顕微鏡
JP2001091845A (ja) 走査型顕微鏡装置

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): JP KR

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
122 Ep: pct application non-entry in european phase