WO1996012389A1 - Appareil destine a deposer une couche de matiere sur un substrat - Google Patents

Appareil destine a deposer une couche de matiere sur un substrat Download PDF

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Publication number
WO1996012389A1
WO1996012389A1 PCT/US1995/013585 US9513585W WO9612389A1 WO 1996012389 A1 WO1996012389 A1 WO 1996012389A1 US 9513585 W US9513585 W US 9513585W WO 9612389 A1 WO9612389 A1 WO 9612389A1
Authority
WO
WIPO (PCT)
Prior art keywords
laser beam
target
target material
plume
travel
Prior art date
Application number
PCT/US1995/013585
Other languages
English (en)
Other versions
WO1996012389A9 (fr
Inventor
Laxminarayana Ganapathi
Steven E. Giles
Rama Rao
Original Assignee
Edsi, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edsi, Inc. filed Critical Edsi, Inc.
Priority to AU41948/96A priority Critical patent/AU4194896A/en
Publication of WO1996012389A1 publication Critical patent/WO1996012389A1/fr
Publication of WO1996012389A9 publication Critical patent/WO1996012389A9/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Abstract

Appareil et procédé destiné au dépôt, sur de la céramique, du verre et du plastique, de couche lisses, amorphes ou microcristallines, présentant la dureté du diamant et assurant une protection contre les agressions chimiques et l'abrasion. Dans une chambre à vide (1), un laser pulsé (2) dirige un faisceau (3) à travers le dispositif optique (4), la fenêtre (5), et la lentille (8), avec ses miroirs (7a, b), du dispositif de balayage (10) positionnant le faisceau focalisé (11) sur la cible carbone (12) pour produire un panache (18) de substance vaporisée. Les couches sont produites par augmentation du panache au moyen d'un circuit à condensateurs (13, 14, 15, 16). Une électrode annulaire (9) et la cible permettent de coupler au panache l'énergie stockée dans un condensateur, lequel couplage est synchrone avec le processus de dépôt par laser pulsé. L'augmentation du panache accroît d'une part l'énergie et l'ionisation de l'espèce de dépôt, et favorise d'autre part l'élargissement de la zone de panache jusqu'à ce qu'elle coïncide avec la zone du substrat (19) où doit être déposé le film. Un moteur linéaire (17) permet de positionner exactement la cible, ce qui, associé au dispositif de balayage, évite d'endommager la cible.
PCT/US1995/013585 1994-10-18 1995-10-18 Appareil destine a deposer une couche de matiere sur un substrat WO1996012389A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU41948/96A AU4194896A (en) 1994-10-18 1995-10-18 Apparatus for depositing a layer of material on a substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32489494A 1994-10-18 1994-10-18
US324,894 1994-10-18

Publications (2)

Publication Number Publication Date
WO1996012389A1 true WO1996012389A1 (fr) 1996-04-25
WO1996012389A9 WO1996012389A9 (fr) 1996-10-10

Family

ID=23265565

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1995/013585 WO1996012389A1 (fr) 1994-10-18 1995-10-18 Appareil destine a deposer une couche de matiere sur un substrat

Country Status (2)

Country Link
AU (1) AU4194896A (fr)
WO (1) WO1996012389A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7273655B2 (en) 1999-04-09 2007-09-25 Shojiro Miyake Slidably movable member and method of producing same
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
US8096205B2 (en) 2003-07-31 2012-01-17 Nissan Motor Co., Ltd. Gear
US8152377B2 (en) 2002-11-06 2012-04-10 Nissan Motor Co., Ltd. Low-friction sliding mechanism
WO2023072543A1 (fr) * 2021-10-28 2023-05-04 Joachim Richter Systeme und Maschinen GmbH & Co. KG Dispositif et procédé permettant de produire une couche de graphène

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4370176A (en) * 1980-02-01 1983-01-25 Commissariat A L'energie Atomique Process for fast droping of semiconductors
US4664940A (en) * 1983-03-07 1987-05-12 Marcel Bensoussan Process for the formation of a flux of atoms and its use in an atomic beam epitaxy process
US4701592A (en) * 1980-11-17 1987-10-20 Rockwell International Corporation Laser assisted deposition and annealing
US4762975A (en) * 1984-02-06 1988-08-09 Phrasor Scientific, Incorporated Method and apparatus for making submicrom powders
USH872H (en) * 1987-09-15 1991-01-01 The United States Of America As Represented By The Department Of Energy Method of applying coatings to substrates
US4987007A (en) * 1988-04-18 1991-01-22 Board Of Regents, The University Of Texas System Method and apparatus for producing a layer of material from a laser ion source
US5084300A (en) * 1989-05-02 1992-01-28 Forschungszentrum Julich Gmbh Apparatus for the ablation of material from a target and coating method and apparatus
US5098737A (en) * 1988-04-18 1992-03-24 Board Of Regents The University Of Texas System Amorphic diamond material produced by laser plasma deposition
US5203929A (en) * 1990-07-24 1993-04-20 Toyota Jidosha Kabushiki Kaisha Method of producing amorphous magnetic film
US5300485A (en) * 1990-03-02 1994-04-05 Samitomo Electric Industries, Ltd. Method of preparing oxide superconducting films by laser ablation
US5330968A (en) * 1991-06-12 1994-07-19 Sumitomo Electric Industries, Ltd. Laser ablation process for preparing oxide superconducting thin films

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4370176A (en) * 1980-02-01 1983-01-25 Commissariat A L'energie Atomique Process for fast droping of semiconductors
US4701592A (en) * 1980-11-17 1987-10-20 Rockwell International Corporation Laser assisted deposition and annealing
US4664940A (en) * 1983-03-07 1987-05-12 Marcel Bensoussan Process for the formation of a flux of atoms and its use in an atomic beam epitaxy process
US4762975A (en) * 1984-02-06 1988-08-09 Phrasor Scientific, Incorporated Method and apparatus for making submicrom powders
USH872H (en) * 1987-09-15 1991-01-01 The United States Of America As Represented By The Department Of Energy Method of applying coatings to substrates
US4987007A (en) * 1988-04-18 1991-01-22 Board Of Regents, The University Of Texas System Method and apparatus for producing a layer of material from a laser ion source
US5098737A (en) * 1988-04-18 1992-03-24 Board Of Regents The University Of Texas System Amorphic diamond material produced by laser plasma deposition
US5084300A (en) * 1989-05-02 1992-01-28 Forschungszentrum Julich Gmbh Apparatus for the ablation of material from a target and coating method and apparatus
US5300485A (en) * 1990-03-02 1994-04-05 Samitomo Electric Industries, Ltd. Method of preparing oxide superconducting films by laser ablation
US5203929A (en) * 1990-07-24 1993-04-20 Toyota Jidosha Kabushiki Kaisha Method of producing amorphous magnetic film
US5330968A (en) * 1991-06-12 1994-07-19 Sumitomo Electric Industries, Ltd. Laser ablation process for preparing oxide superconducting thin films

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7273655B2 (en) 1999-04-09 2007-09-25 Shojiro Miyake Slidably movable member and method of producing same
US8152377B2 (en) 2002-11-06 2012-04-10 Nissan Motor Co., Ltd. Low-friction sliding mechanism
US8096205B2 (en) 2003-07-31 2012-01-17 Nissan Motor Co., Ltd. Gear
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
WO2023072543A1 (fr) * 2021-10-28 2023-05-04 Joachim Richter Systeme und Maschinen GmbH & Co. KG Dispositif et procédé permettant de produire une couche de graphène

Also Published As

Publication number Publication date
AU4194896A (en) 1996-05-06

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