WO1992015920A3 - Peel-apart photosensitive element - Google Patents

Peel-apart photosensitive element Download PDF

Info

Publication number
WO1992015920A3
WO1992015920A3 PCT/US1992/001409 US9201409W WO9215920A3 WO 1992015920 A3 WO1992015920 A3 WO 1992015920A3 US 9201409 W US9201409 W US 9201409W WO 9215920 A3 WO9215920 A3 WO 9215920A3
Authority
WO
WIPO (PCT)
Prior art keywords
photosensitive element
peel
layer
apart photosensitive
apart
Prior art date
Application number
PCT/US1992/001409
Other languages
French (fr)
Other versions
WO1992015920A2 (en
Inventor
Charles D Lang
Scott Dixon Mccalmont
John Choi
Anchi Hou
Alan Shobert
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of WO1992015920A2 publication Critical patent/WO1992015920A2/en
Publication of WO1992015920A3 publication Critical patent/WO1992015920A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Element Separation (AREA)
  • Dicing (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A multilayer, photosensitive element comprising a coversheet, a photohardenable layer, a contiguous layer, an isolation layer, an adhesive layer, and a support, is described. The element is used for image reproduction.
PCT/US1992/001409 1991-03-04 1992-03-04 Peel-apart photosensitive element WO1992015920A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66399991A 1991-03-04 1991-03-04
US663,999 1991-03-04

Publications (2)

Publication Number Publication Date
WO1992015920A2 WO1992015920A2 (en) 1992-09-17
WO1992015920A3 true WO1992015920A3 (en) 1992-10-29

Family

ID=24664096

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1992/001409 WO1992015920A2 (en) 1991-03-04 1992-03-04 Peel-apart photosensitive element

Country Status (3)

Country Link
EP (1) EP0574546A1 (en)
AU (1) AU1787292A (en)
WO (1) WO1992015920A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9225687D0 (en) * 1992-12-09 1993-02-03 Minnesota Mining & Mfg Peel-apart proofing system
WO1996010216A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative or positive working surprint colour proofing system
WO1996010214A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative working overlay colour proofing system
WO1996010215A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative working surprint colour proofing system
US5939232A (en) * 1996-07-03 1999-08-17 E. I. Du Pont De Nemours And Company Photosensitive elements and their process of use
EP0890878A3 (en) * 1997-07-08 1999-01-20 Agfa-Gevaert N.V. Development material and process for the production of a negative colour proof, and process for the production of both a positive and negative colour proof on a single image-receiving material.
US6001532A (en) * 1997-09-25 1999-12-14 E.I. Dupont De Nemours And Company Peel-apart photosensitive elements and their process of use
US5965321A (en) * 1997-09-25 1999-10-12 E. U. Du Pont De Nemours And Company Peel-apart photosensitive elements and their process of use
US6100006A (en) * 1999-08-19 2000-08-08 E. I. Du Pont De Nemours And Company Peel-apart photosensitive elements and their process of use

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
No relevant documents disclosed *

Also Published As

Publication number Publication date
WO1992015920A2 (en) 1992-09-17
EP0574546A1 (en) 1993-12-22
AU1787292A (en) 1992-10-06

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