WO1992000280A1 - Quinoline derivative and production thereof - Google Patents

Quinoline derivative and production thereof Download PDF

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Publication number
WO1992000280A1
WO1992000280A1 PCT/JP1991/000824 JP9100824W WO9200280A1 WO 1992000280 A1 WO1992000280 A1 WO 1992000280A1 JP 9100824 W JP9100824 W JP 9100824W WO 9200280 A1 WO9200280 A1 WO 9200280A1
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Prior art keywords
formula
compound
protecting group
present
ice
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PCT/JP1991/000824
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French (fr)
Japanese (ja)
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Masahiko Kitano
Ken-Ichi Nakamura
Tatsuhiko Kashima
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Nippon Shinyaku Co., Ltd.
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Publication of WO1992000280A1 publication Critical patent/WO1992000280A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D513/00Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
    • C07D513/02Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
    • C07D513/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D215/00Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/48Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
    • C07D215/54Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 3
    • C07D215/56Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 3 with oxygen atoms in position 4
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Definitions

  • the present invention relates to an important intermediate of a quinoline carboxylic acid derivative which has an antibacterial action and is useful as a therapeutic agent for various infectious diseases.
  • the compound according to the present invention can be represented by the following general formula [I].
  • R 1 represents hydrogen or a low alkyl
  • R 3 represents a nitrogen atom protecting group
  • R 3 represents a sulfur atom protecting group.
  • the compound [II] and its derivative synthesized from the compound [I] according to the present invention as described below have excellent antibacterial activity, and can be used for infections caused by gram-negative bacteria, intractable chlorophyll infections, Useful for the treatment of Gram-positive bacterial infections.
  • R 1 represents chromium or lower alkyl
  • R 2 represents a protecting group for a nitrogen atom
  • R 3 represents a protecting group for a sulfur atom
  • R represents hydrogen, alkyl, or fuunyl.
  • the derivative [VI] was generated in an amount of 5 to 20%, and the yield was poor. Furthermore, when [VI] is mixed into the reaction product, there is a technical problem that it is difficult to remove and purify the product.
  • an object of the present invention was to develop a production method which is significantly superior to the existing production method.
  • the gist of the present invention lies in the chemical structure itself represented by the general formula [I].
  • the compound [I] of the present invention is a novel compound.
  • the method of the present invention is a novel production method not described in the literature, and its feature lies in using the compound [ ⁇ ] as a raw material.
  • the lower alkyl represented by R ′ is preferably a straight-chain or a lower alkyl having 1 to 4 carbon atoms, for example, methyl, ethyl, ⁇ -propyl, i Soprovir, ⁇ -butyl, isobutyl, sec-butyl, tert-butyl and the like can be mentioned.
  • examples of the nitrogen-protecting group represented by R 2 include alkoxycarbonyl (eg, methoxycarbonyl, ethoxycarbonyl, tert-butoxycarbonyl, isobutyloxycarbonyl, etc.), and acyl (eg, , Holmil, acetyl, chloroethyl cetyl, benzoyl, P-anisyl, etc.), vinylidylylcarbonyl, penzyloxycarbonyl, ryjenyl (eg, allyl, etc.), rylarky (eg, Penzyl, diphenylmethyl), 2,4'-dinitrofuryl and the like can be used.
  • alkoxycarbonyl eg, methoxycarbonyl, ethoxycarbonyl, tert-butoxycarbonyl, isobutyloxycarbonyl, etc.
  • acyl eg, Holmil, acetyl, chloroethyl cetyl,
  • examples of the sulfur-protecting group represented by R 3 include alkoxymethyl, substituted benzyl, and 2,4-dinitrophenyl. , Disulfide as a dimer of [ ⁇ ], alkylthiomethyl, substituted carbamoyl, difluoromethyl, triphenylmethyl, picolyl, acetamidomethyl,, ⁇ , ⁇ -trifluoro- a-ylaminoethyl, ⁇ , ⁇ -diethoxykarponylethyl, acyl (eg, acetyl, penzyl), benzoylcarbonylcarbonyl, tetrahydrobiranyl, benzylthiomethyl, isobutoxymethyl, etc. Can be mentioned.
  • protecting groups include, for example, methoxymethyl and methoxypentyl.
  • the compound [I] of the present invention has a protective group which is deprotected, if necessary, and has an excellent antibacterial effect by the methods described in, for example, JP-A-63-107990 and JP-A-11-29468Q. It can lead to a nor- nic carboxylic acid derivative.
  • the method of the present invention according to the method for producing the compound [I] of the present invention can be carried out as follows.
  • This ring closure reaction can be performed by a method known per se.
  • a method using heating a method using an acidic substance, or the like can be used.
  • the heating is carried out by heating to 100 to 300, preferably 110 to 150 "C in a solvent without or in a solvent.
  • the solvent include diph Xnyl ether, liquid paraffin, diethylene glycol.
  • the starting compound [ ⁇ ] will be described later as a reference example, and ⁇ can be produced by a known method (eg, JP-A-57-136588).
  • the target compound [I] thus produced is isolated and purified by a method known per se, for example, concentration, liquid conversion, phase transfer, solvent extraction, crystallization, recrystallization, fractionation, chromatography, etc.
  • a method known per se for example, concentration, liquid conversion, phase transfer, solvent extraction, crystallization, recrystallization, fractionation, chromatography, etc.
  • the extract is washed with 2% hydrochloric acid, washed forever, and dried over magnesium sulfate.
  • the solvent was distilled off under reduced pressure to obtain a light brown residue. Purification by silica gel column chromatography gave 2.64 g of the target compound as colorless crystals.
  • the present invention by using [II] as a raw material, by-products are not generated, the reaction proceeds almost quantitatively, and the target compound can be obtained in an extremely high yield and purity.
  • the raw material for obtaining [I] can be produced at very low cost and at low cost compared to the conventional method. Therefore, the present invention provides an industrially advantageous medium body and is a very useful production method.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

An intermediate of formula (I) for the synthesis of a compound of formula (III) which has an excellent antibacterial action; and a process for producing the intermediate of formula (I) by the ring closure of a compound of formula (II), wherein R1 represents hydrogen or lower alkyl, R2 represents a protective group of a nitrogen atom, and R3 represents a protective group of a sulfur atom.

Description

明 細 睿  Rui Akira
キノ リ ン誘導体及び製法 技 術 分 野  Quinoline derivatives and manufacturing technology
本発明は、 抗菌作用を有し、 各種感染症の治療剤として有 用なキノ リ ンカルボン酸誘導体の重要な中間体に関する。 本 発明に係る化合物は、 下記の一般式 〔 I〕 によって表すこと ができる。  The present invention relates to an important intermediate of a quinoline carboxylic acid derivative which has an antibacterial action and is useful as a therapeutic agent for various infectious diseases. The compound according to the present invention can be represented by the following general formula [I].
Figure imgf000003_0001
式中、 R 1 は、 水素又は低扱アルキルを表し、 R 3 は、 窒 素原子の保護基を表し、 R 3 は、 硫黄原子の保護基を表す。 本発明に係る化合物 〔 I 〕 より以下のようにして合成され る化合物 〔II〕 及びその誘導体は、 優れた抗菌作用を有し、 グラム陰性菌による感染症、 難治性の緑膜菌感染症やグラム 陽性菌感染症の治療に有用である。
Figure imgf000003_0001
In the formula, R 1 represents hydrogen or a low alkyl, R 3 represents a nitrogen atom protecting group, and R 3 represents a sulfur atom protecting group. The compound [II] and its derivative synthesized from the compound [I] according to the present invention as described below have excellent antibacterial activity, and can be used for infections caused by gram-negative bacteria, intractable chlorophyll infections, Useful for the treatment of Gram-positive bacterial infections.
Figure imgf000003_0002
Figure imgf000003_0002
C I 〕 ジハロゲン化
Figure imgf000004_0001
式中、 R 1 は、 氷素又は低极アルキルを表し、 R 2 は、 窒 素原子の保護基を表し、 R 3 は、 硫黄原子の保護基を表し、 Rは、 水素、 アルキル、 フユニルを表す。
CI) Dihalogenation
Figure imgf000004_0001
In the formula, R 1 represents chromium or lower alkyl, R 2 represents a protecting group for a nitrogen atom, R 3 represents a protecting group for a sulfur atom, and R represents hydrogen, alkyl, or fuunyl. Represent.
背 景 技 術  Background technology
本発明者らは、 優れた抗菌作用を有するキノ リ ンカルボン 酸を見いだし、 既に特許出願した (特開昭 57— 136588号、 特 開昭 58— 103393号、 特開昭 63— 107990号、 特開平 3-12061 号 等) 。  The present inventors have found a quinoline carboxylic acid having an excellent antibacterial action, and have already filed patent applications (Japanese Patent Application Laid-Open Nos. 57-136588, 58-103393, 63-107990, and 63-107990). 3-12061).
これらの出願明钿窨中には、 キノ リ ンカルボン酸綉導体の 種々の製法が記載されている。 これらの記載によれば、 その 置換基の組合せによっては本発明に係る化合物及び製法を表 示することとなるとも考えられる。 しかし、 これらの明細誊 のいずこにも 6位にフッ素を有し 7位にビペラジノ基を有す る本発明化合物 〔 I〕 の開示はない。 また、 次に示す化合物 〔Π〕 を用いた本発明の製法も具体的な開示がない。  In these patent applications, various methods for producing quinoline carboxylic acid conductors are described. According to these descriptions, it is considered that the compound and the production method according to the present invention will be shown depending on the combination of the substituents. However, none of these specifications disclose the compound [I] of the present invention having a fluorine at the 6-position and a biperazino group at the 7-position. Also, there is no specific disclosure of the production method of the present invention using the following compound [Π].
(以下次頁) (E〕
Figure imgf000005_0001
式中、 Rl 、 R2 、 R3 は、 前記と同じである。 発 明 の 開 示
(The following page) (E)
Figure imgf000005_0001
In the formula, R 1 , R 2 and R 3 are the same as described above. Disclosure of the invention
化合物 〔m〕 の合成中間体としての化合物 〔 i〕 を製造す るにあたっては、 これまで化合物 〔π〕 においてビペラジノ 基がフッ素に置き換わった下記の化合物 〔IV〕 が、 中間体と して用いられてきた。  In the production of compound (i) as an intermediate for the synthesis of compound (m), the following compound (IV) in which the biperazino group in compound (π) has been replaced by fluorine has been used as an intermediate so far. Have been.
しかしながら、 この方法においては、 副生成物として逆閉 However, in this method, the reverse
¾体 〔VI〕 が 5〜20%生じ、 収率が悪いという欠点を有して いた。 更に、 反応生成物に 〔VI〕 が混入した場合にこれの除 去精製が困難である技術的課題を有していた。 The derivative [VI] was generated in an amount of 5 to 20%, and the yield was poor. Furthermore, when [VI] is mixed into the reaction product, there is a technical problem that it is difficult to remove and purify the product.
Figure imgf000005_0002
Figure imgf000005_0002
〔V〕 〔VI〕 本発明者らはこれらの点を克服すぺく研究を続行する過程 で、 著しく上記を凌駕する製法を見い出し、 本発明を完成す るに到った。 (V) (VI) In the course of continuing research to overcome these points, the present inventors have found a manufacturing method that remarkably surpasses the above, and have completed the present invention.
従って、 本発明の目的は、 前記既存の製法より著しく優れ た製法を開発しょうとする点にあった。  Therefore, an object of the present invention was to develop a production method which is significantly superior to the existing production method.
本発明の要旨は、 一般式 〔 I〕 で表される化学構造そのも のにある。  The gist of the present invention lies in the chemical structure itself represented by the general formula [I].
本発明化合物 〔 I〕 は、 新規化合物である。 また本発明方 法は、 文献未記載の新規製法であり、 その特徴は、 化合物 〔 π〕 を原料に用いることにある。  The compound [I] of the present invention is a novel compound. The method of the present invention is a novel production method not described in the literature, and its feature lies in using the compound [π] as a raw material.
—般式 〔 I〕 において R ' で示される低极アルキルとして は、 直鎖状又は分技妆の炭素数 1〜4の低級アルキルが好ま しく、 例えば、 メチル、 ェチル、 π-プロ ビル、 イ ソプロビル、 η -ブチル、 イ ソブチル、 sec-ブチル、 tert-ブチル等を挙げ ることができる。  — In the general formula [I], the lower alkyl represented by R ′ is preferably a straight-chain or a lower alkyl having 1 to 4 carbon atoms, for example, methyl, ethyl, π-propyl, i Soprovir, η-butyl, isobutyl, sec-butyl, tert-butyl and the like can be mentioned.
—般式 〔 I〕 において R 2 で示される窒素の保護基として は、 アルコヰシカルボニル (例、 メ トキシカルボニル、 ェ ト キシカルボニル、 tert-ブトキシカルボニル、 イ ソブチルォ キシカルボニル等) 、 ァシル (例、 ホルミ ル、 ァセチル、 ク ロロ了セチル、 ベンゾィル、 P-ァニソィル、 等) 、 ビぺ リ ジ ニリレカルボニル、 ペンジルォキシカルポニル、 了 jレケニル ( 例、 ァ リル等) 、 了ラルキル (例、 ペンジル、 ジフヱニルメ チル等) 、 2, 4' - ジニ トロフユ二ル等を用いることができる。 —In the general formula [I], examples of the nitrogen-protecting group represented by R 2 include alkoxycarbonyl (eg, methoxycarbonyl, ethoxycarbonyl, tert-butoxycarbonyl, isobutyloxycarbonyl, etc.), and acyl (eg, , Holmil, acetyl, chloroethyl cetyl, benzoyl, P-anisyl, etc.), vinylidylylcarbonyl, penzyloxycarbonyl, ryjenyl (eg, allyl, etc.), rylarky (eg, Penzyl, diphenylmethyl), 2,4'-dinitrofuryl and the like can be used.
一般式 〔 I〕 において R 3 で示される硫黄の保護基として は、 了ルコキシメチル、 置換ぺンジル、 2, 4-ジニ ト ロフエ二 ル、 〔 Π〕 の二量体と してのジスルフィ ド、 アルキルチオメ チル、 置换カルバモイル、 ジフヱ ルメチル、 ト リ フヱニル メチル、 ピコ リル、 ァセ ト ア ミ ドメチル、 , β, β - ト リ フルォロ- a - 了シルアミノ エチル、 β , β - ジエ トキシカ ルポニルェチル、 ァシル (例、 ァセチル、 ペンゾィル) 、 ぺ ンゾィルォヰシカルボニルェチル、 テ ト ラ ヒ ドロ ビラニル、 ぺンジルチオメチル、 ィ ソブチ キシメチル等を挙げること ができる。 In the general formula (I), examples of the sulfur-protecting group represented by R 3 include alkoxymethyl, substituted benzyl, and 2,4-dinitrophenyl. , Disulfide as a dimer of [Π], alkylthiomethyl, substituted carbamoyl, difluoromethyl, triphenylmethyl, picolyl, acetamidomethyl,, β, β-trifluoro- a-ylaminoethyl, β, β-diethoxykarponylethyl, acyl (eg, acetyl, penzyl), benzoylcarbonylcarbonyl, tetrahydrobiranyl, benzylthiomethyl, isobutoxymethyl, etc. Can be mentioned.
かかる保護基の代表例としては、 例えば、 メ トキシメチル、 メ トキシペンジルが好ましい。  Representative examples of such protecting groups include, for example, methoxymethyl and methoxypentyl.
本発明化合物 〔 I〕 は、 必要に応じて、 保護基を脱雜し、 例えば、 特開昭 63— 107990号公報、 特開平 1一 29468Q号公報 に記載の方法により優れた抗菌作用を有するヰノ リ ンカルボ ン酸誘導体に導く ことができる。  The compound [I] of the present invention has a protective group which is deprotected, if necessary, and has an excellent antibacterial effect by the methods described in, for example, JP-A-63-107990 and JP-A-11-29468Q. It can lead to a nor- nic carboxylic acid derivative.
本発明化合物 〔 I〕 の製法に係る本発明の方法は、 下記の ようにして実行することができる。  The method of the present invention according to the method for producing the compound [I] of the present invention can be carried out as follows.
本閉環反応は自体公知の方法により行うこどができる。 例 えば、 加熱による方法、 酸性物煑を用いる方法等を用いるこ とができる。 例えば、 加熱による場合、 無溶媒又は溶媒中で、 100 〜300 で、 好ましく は 110 〜: 150 "Cに加熱することによ り行う。 溶媒としては、 ジフ Xニルエーテル、 流動パラフィ ン、 ジエチレングリ コールジメチルエーテル、 テ ト ラ リ ン、 ジク口ルペンゼン等の比較的髙沸点の溶媒を用いることがで 酸性物質を用いる場合、 〔 Π〕 1モルに対して 1 モル〜大 過剰量、 好ましく は 20〜30モルの酸性物質を用い、 通常 0〜 lOO t好ましく は 0〜60tで行う。 酸性物質としては、 ォキ シ塩化リ ン、 五塩化リ ン、 三塩化リ ン、 チォユルク Ό リ ド、 発煙硫酸、 濃硫酸、 ポ リ U ン酸、 ポ リ リ ン酸エステル等を用 いることができる。 This ring closure reaction can be performed by a method known per se. For example, a method using heating, a method using an acidic substance, or the like can be used. For example, in the case of heating, the heating is carried out by heating to 100 to 300, preferably 110 to 150 "C in a solvent without or in a solvent. Examples of the solvent include diph Xnyl ether, liquid paraffin, diethylene glycol. When using a relatively low boiling point solvent such as dimethyl ether, tetralin, and dike pentene, when using an acidic substance, [〔] 1 mole to 1 mole per mole The reaction is usually carried out at 0 to 100 t, preferably at 0 to 60 t, using an excess, preferably 20 to 30 mol of acidic substance. As the acidic substance, oxylin chloride, pentachloride, lin trichloride, thioyukuride, fuming sulfuric acid, concentrated sulfuric acid, polyunic acid, polyphosphate ester, etc. should be used. Can be.
原料化合物 〔 Π〕 は、 参考例として後記するが、 公知 (例、 特開昭 57— 136588号公報) の方法によって製造することがで きる β The starting compound [Π] will be described later as a reference example, and β can be produced by a known method (eg, JP-A-57-136588).
かく して生成される目的化合物 〔 I〕 は、 自体公知の手段、 例えば、 濃縮、 液性変換、 転溶、 溶媒抽出、 結晶化、 再結晶、 分溜、 クロマ トグラフィ ー等により単雜精製することができ る ο  The target compound [I] thus produced is isolated and purified by a method known per se, for example, concentration, liquid conversion, phase transfer, solvent extraction, crystallization, recrystallization, fractionation, chromatography, etc. Can ο
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
以下に本発明に係る参考例及び実施例を掲げて本発明を更 に詳しく銳明する。  Hereinafter, the present invention will be described in more detail with reference to Reference Examples and Examples according to the present invention.
参考例 1 Reference example 1
(1) Ν- (2- フルオロフェ -ル) ビぺラジン  (1) Ν- (2-fluorophenyl) biradine
2-フルォ口ァニリ ン 11. lg 、 ビス(2- プロモェチル) 了ミ ン臭化氷素酸塩 34. 3g、 及び氷 lloilの溶液を 80 tで 10分藺攪 拌する。 同温で永酸化力 リ ゥム 13g を水 50mlに溶かした氷溶 液を 1時間で滴下する。 更に 30分間攙拌する。 室温まで冷却 した後、 水を加えて溶かし、 氷氷冷却下、 10%氷酸化ナ リ ゥムを加えて PH 10 とする。 齚酸ェチルで抽出する。 抽出液 を水洗、 硫酸マグネシウムで乾煥し、 溶媒を減圧留去する。 淡褐色油钛物として目的化合物 18. 0g を得た。 (2) 1-エ トキシカルボ二ル- 4- (2-フルオロフェニル) ピペラ ジン 2-Fluoroaniline 11. lg, bis (2-bromoethyl) bromominobromate 34.3 g, and ice lloil solution are stirred at 80 t for 10 min. At the same temperature, an ice solution prepared by dissolving 13 g of peroxidative room in 50 ml of water is added dropwise over 1 hour. Stir for an additional 30 minutes. After cooling to room temperature, add water to dissolve, and add 10% sodium hydroxide to pH 10 under ice-ice cooling.齚 Extract with acid ethyl. The extract is washed with water, dried over magnesium sulfate, and the solvent is distilled off under reduced pressure. This gave 18.0 g of the target compound as a light brown oily substance. (2) 1-ethoxycarbonyl-4- (2-fluorophenyl) piperazine
N- (2- フルオロフェニル) ビぺラ ジン 24. 5g、 ト リ ェチル 了 ミ ン 14. 4g をクロ σホルム 123ro l に溶かした溶液に、 氷冷、 攙拌下、 クロロカルボン酸のェチルエステル 16. 2g を 20分で 滴下する。 更に同温で 30分、 室温で 2時間攙拌する。 反応液 を 0. 5N塩酸 120m l中に注ぎ、 クロ口ホルムで抽出する。 抽出 液を水洗、 硫酸マグネシウムで乾煥し、 溶媒を減圧留去する。 淡褐色油状物として目的化合物を 31. Og 得た。  To a solution of 24.5 g of N- (2-fluorophenyl) biazine and 14.4 g of triethylamine dissolved in 123 rolls of chloroform was added, while cooling with ice and stirring, ethyl ester of chlorocarboxylic acid. 2 g is dripped in 20 minutes. The mixture is further stirred at the same temperature for 30 minutes and at room temperature for 2 hours. The reaction solution is poured into 120 ml of 0.5N hydrochloric acid, and extracted with chloroform. The extract is washed with water, dried over magnesium sulfate, and the solvent is distilled off under reduced pressure. 31. Og of the target compound was obtained as a light brown oil.
(3) ェ トキシカルポニル -4- (2-フルォ口- 5- ニ ト ロフエ二 ル) ビぺラジン  (3) Ethoxycarponyl-4- (2-fluoro-5-nitrophenyl) biperazine
1-ェ トキシカルポニル -4- (2-フルォロフヱニル) ビぺラジ ン 30. 1g を濃硫酸 120m lに溶かした溶液に氷冷、 攙拌下、 濃 硫酸 10m lと 61%硝酸 10. 2m lの混合液を 30分で滴下する。 更に 同温で 4. 5 時間攪拌する。 反応液を氷に注ぎ、 酢酸ェチルで 抽出する。 抽出液を 10%炭酸水素ナ ト リ ゥムで洗浄し、 水洗 した後、 硫酸マグネシウムで乾燥する。 溶媒を減圧留去し、 目的化合物を淡褐色結晶として 32. 9g 得た。  1-Ethoxycarbonyl-4- (2-fluorophenyl) biradine 30.1 g of a solution of 1 g of concentrated sulfuric acid dissolved in 120 ml of concentrated sulfuric acid was stirred under ice-cooling, and then stirred with 10 ml of concentrated sulfuric acid and 10.2 ml of 61% nitric acid. The mixture is added dropwise in 30 minutes. Stir at the same temperature for 4.5 hours. Pour the reaction mixture onto ice and extract with ethyl acetate. The extract is washed with 10% sodium hydrogen carbonate, washed with water, and dried over magnesium sulfate. The solvent was distilled off under reduced pressure to obtain 32.9 g of the desired compound as pale brown crystals.
(4) 3- (4- エ トキシカルボニル) ピペラジニル -4-フルォ口 了二 リ ン  (4) 3- (4-ethoxycarbonyl) piperazinyl-4-fluorine
1-ェ トキシカルポニル -4- (2-フルォ口- 5— 二口フエニル) ビぺラジン 1. 5g、 メタノ ール 5FD 1及び 35 %塩酸 6 m lの懸濁液 に、 室温攙拌下、 鉄粉 1. Ogを 15分で添加する。 更に室温で 2 時間攙拌する。 反応液を氷に注ぎ、 10 %炭酸水素ナ ト リ ウム で PH 7〜8 とした後、 酢酸ェチルで抽出する。 抽出液を 10 % 炭酸水素ナ ト リ ゥムで洗浄した後、 水洗し、 硫酸マグネシゥ ムで乾燥する。 溶媒を滅圧留去し、 目的化合物を淡褐色結晶 として 1. 32g 得た。 To a suspension of 1-ethoxycarbonyl-4- (2-fluoro-5-diphenyl) perazine 1.5 g, methanol 5FD 1 and 6 ml of 35% hydrochloric acid was added iron at room temperature under stirring. Flour 1. Add Og in 15 minutes. Stir at room temperature for another 2 hours. Pour the reaction mixture onto ice, adjust the pH to 7-8 with 10% sodium bicarbonate, and extract with ethyl acetate. 10% extract After washing with sodium bicarbonate, wash with water and dry with magnesium sulfate. The solvent was distilled off under reduced pressure to obtain 1.32 g of the target compound as pale brown crystals.
(5) 3- (4- エ トキシカルボ二ルビペラジニル)-4-フルオロフ ェニルイ ソチオシ了ネー ト  (5) 3- (4-ethoxycarbonylbiperazinyl) -4-fluorophenylisothiocinate
3- (4- エ トキシカルボニル) ビペラジニル -4-フルォロア 二リ ン 2. 68g をトルェン 13mlに溶かした溶液に、 室温攙拌下、 二硫化炭素 0. 84g 、 ト リ ェチルァミ ン 1. lgを順に加え、 室温 で 12時藺攙拌する。 反応液を氷水で冷やし、 攙拌しながら、 ト リ エチル了 ミ ン 1. lg、 クロロカルボン酸ェチルエステル 1. 2gを頫に加え、 氷氷浴上で 3時間攙拌する。 反応液を水で希 釈し、 ク π ホルムで抽出する。 抽出液を 2 %塩酸で洗浄し た後、 永洗し、 硫酸マグネシウムで乾煜する。 溶媒を滅圧留 去し、 淡褐色残渣を得た。 シリカゲルカラムクロマ トグラフ ィ 一で精製し、 目的化合物を無色結晶として 2. 64g 得た。  3- (4-Ethoxycarbonyl) biperazinyl-4-fluoralineline In a solution of 2.68 g in 13 ml of toluene, stir at room temperature, 0.84 g of carbon disulfide and 1. lg of triethylamine in order. In addition, stir at room temperature for 12:00. The reaction mixture is cooled with ice water, and while stirring, 1.lg of triethylamine and 1.2 g of chlorocarboxylic acid ethyl ester are added to the mixture, and the mixture is stirred on an ice-ice bath for 3 hours. Dilute the reaction solution with water and extract with π-form. The extract is washed with 2% hydrochloric acid, washed forever, and dried over magnesium sulfate. The solvent was distilled off under reduced pressure to obtain a light brown residue. Purification by silica gel column chromatography gave 2.64 g of the target compound as colorless crystals.
(6) [3- (4-ェ トキシカルポニルビぺラジニル)-4-フルォ口フ ェニル] 了 ミ ノ メ トキシメチルチオメチレンマロ ン酸ジェチ jレエスチ jレ  (6) [3- (4-ethoxycarbonylperazinyl) -4-fluoro mouth phenyl] methyl methoxymethylthiomethylenemalonic acid
粉末水酸化力 リ ゥム 0. 83g を 1, 4-ジォキサン 39m lに懸濁し た液に、 室温攢拌下、 マ 1 Pン酸ジェチルエステル 2. Ogを滴下 した後、 1時間攙拌する。 次いで 3- - ェ トキシカルボニル ピペラジニル)-4 -フルォ口フエ二ルイ ソチオシ了ネー ト 1. 94 g を加え、 室温で 1時間攙拌する。 反応液を氷氷で冷却し、 攪拌しながら、 ク ロロメチルメチルヱ一テル 0. 72g を滴下す る。 同温で 15分間、 更に室温で 2時間攙拌する。 反応液を水 で希釈し、 エーテルで抽出する。 抽出液を 1 %塩酸で洗浄し た後、 10 %炭酸水素ナ ト リ ゥムで洗浄、 永洗し、 硫酸マグネ シゥムで乾燥する。 溶媒を減圧留去し、 目的化合物を淡黄色 結晶として 2. 93g 得た。 1 Powder hydroxide force Li © beam 0. 83 g, 4-Jiokisan 39m liquid suspended in l, at room temperature攢拌, was added dropwise Ma 1 P phosphate Jefferies chill ester 2. Og, 1 hour攙拌I do. Then, add 1.94 g of 3- (ethoxycarbonylpiperazinyl) -4-fluorene fluorinated sothiocinate and stir at room temperature for 1 hour. The reaction mixture is cooled with ice and ice, and 0.72 g of chloromethyl methyl ether is added dropwise with stirring. Stir for 15 minutes at the same temperature and for 2 hours at room temperature. Water And extract with ether. Wash the extract with 1% hydrochloric acid, then wash with 10% sodium bicarbonate, wash forever, and dry with magnesium sulfate. The solvent was distilled off under reduced pressure to obtain 2.93 g of the desired compound as pale yellow crystals.
融点 104. 0〜; 105. 0 t o  Melting point 104.0-; 105.0 to
同様にして、 マロ ン酸ジェチルエステルの代わりにマロ ン 酸ジメチルエステルを用いて、 融点 122 123 tの [3- (4-ェ トキシカルボニルビぺラジニル)-4 -フルォ口フエニル〕 アミ ノメ トキシメチルチオメチレンマロ ン酸ジメチルエステルを Similarly, using dimethyl malonate in place of dimethyl malonate, [3- (4-ethoxycarbonylbiradizinyl) -4-fluorofluorophenyl] aminomethoxy having a melting point of 122 123 t was used. Methyl thiomethylene malonic acid dimethyl ester
1½ 0 1½ 0
実施例 1  Example 1
2- メ トキシメチルチオ一 4—ヒ ド oヰシー 6 -フルォ D—7- (4 - エ トキシカルボ二ルビペラジニル) -3-キノ リ ンカルボン酸 ェチ jレエステ jレ  2-Methoxymethylthio-1-4-hydroxy 6-Fluoro D-7- (4-ethoxycarbonylbiperazinyl) -3-quinolinecarboxylic acid
[3- (4-ェ トキシカルボニルビぺラジニル)-4-フルオロフェ ニル] 丁ミ ノメ トヰシメチルチオメチレンマロ ン酸ジェチル エステル 2. 50g とジフヱニルエーテル 7. 5rolの混合物を 170 :で 1時間攙拌する。 反応液を室温まで冷却し、 n-へキサン 10m lを加えて 1時間氷水で冷却する。 析出結晶を攄取し、 n - へキサンで洗浄し、 減圧乾燥し、 目的化合物を淡黄色結晶と して 1. 99g 得た。  [3- (4-ethoxycarbonylbiradinyl) -4-fluorophenyl] dimethylaminomethylthiomethylenemalonic acid dimethyl ester 2.50 g and diphenyl ether 7.5 rol mixture at 170: 1 Stir for hours. The reaction solution is cooled to room temperature, 10 ml of n-hexane is added, and the mixture is cooled with ice water for 1 hour. The precipitated crystals were collected, washed with n-hexane, and dried under reduced pressure to obtain 1.99 g of the desired compound as pale yellow crystals.
融点 156. 0 157. 5 で。 Mp 156.0 at 157.5.
同様にして次の化合物を得た。  The following compound was obtained in the same manner.
実施例 2 Example 2
2- メ トキシメチルチオ一 4-ヒ ドロキシ一 6-フルオロー 7 -(·4 二 ェ トキシカルポ二ルビペラジニル) _3-キノ リ ンカルボン酸 メチルエステル 2-methoxymethylthio-1-hydroxy-6-fluoro 7-(· 4 2-ethoxycarbonyldibiperazinyl) _3-quinolinecarboxylic acid methyl ester
融点 161〜: 162.5 で Melting point 161 ~: at 162.5
元素分析植 (C30H: PN3(36Sとして) Elemental analysis planted (C 30 H: as PN 3 (3 6 S)
理論僮 « C:52.97 H:5.33 N:9.27  Theory «C: 52.97 H: 5.33 N: 9.27
実測僮(50 C:53.04 H:5.56 N:9.31  Actual measurement (50 C: 53.04 H: 5.56 N: 9.31
発 明 の 効 果  The invention's effect
本発明は、 〔 II〕 を原料として用いることにより、 副生成 物が生じず、 殆ど定量的に反応が進み、 極めて高収率、 髙純 度に目的化合物を得ることができる。 また、 〔Π〕 を得るた めの原料も従来法に比べ、 非常に安く、 安価に 〔 I〕 を製造 することができる。 従って、 本発明は、 工業的に有利な中簡 体を提供するとともに、 非常に有用な製法である。  In the present invention, by using [II] as a raw material, by-products are not generated, the reaction proceeds almost quantitatively, and the target compound can be obtained in an extremely high yield and purity. In addition, the raw material for obtaining [I] can be produced at very low cost and at low cost compared to the conventional method. Therefore, the present invention provides an industrially advantageous medium body and is a very useful production method.

Claims

請 求 の 範 囲 The scope of the claims
次の一般式 〔 I〕  The following general formula (I)
RR
Figure imgf000013_0001
で示されるキノ リ ンカルボン酸誘導体。
Figure imgf000013_0001
A quinoline carboxylic acid derivative represented by the formula:
ここに、 式中、 R1 は、 永素又は低扱アルヰルを表し、 R2 は、 窒素原子の保護基を表し、 R3 は、 硫黄原子の保護基を 表す。 Here, in the formula, R 1 represents an aryl or low-alkyl, R 2 represents a protecting group for a nitrogen atom, and R 3 represents a protecting group for a sulfur atom.
2. 次の一般式 〔Π〕  2. The following general formula [Π]
〔E〕
Figure imgf000013_0002
で表されるマロン酸ジアルキルエステルを閉 it反応に付す とを特徴とする次の一般式 〔 I〕
[E]
Figure imgf000013_0002
Subjecting the dialkyl malonate represented by the formula to the closed it reaction:
R2R 2
Figure imgf000013_0003
で示されるキノ リ ンカルボン酸誘導体の製造方法。
Figure imgf000013_0003
A method for producing a quinoline carboxylic acid derivative represented by the formula:
式中、 は、 水素又は低級了ルキルを表し、 R2 は、 窒 素原子の保護基を表し、 R3 は、 硫黄原子の保護基を表す。 In the formula, represents hydrogen or lower alkyl, R 2 represents a protecting group for a nitrogen atom, and R 3 represents a protecting group for a sulfur atom.
PCT/JP1991/000824 1990-06-22 1991-06-20 Quinoline derivative and production thereof WO1992000280A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57136588A (en) * 1981-02-18 1982-08-23 Nippon Shinyaku Co Ltd Carboxylic acid derivative
JPS58103393A (en) * 1981-12-12 1983-06-20 Nippon Shinyaku Co Ltd Quinolinecarboxylic acid derivative
JPS61143363A (en) * 1984-12-17 1986-07-01 Kyorin Pharmaceut Co Ltd Production of quinolonecarboxylic acid derivative
JPS63107990A (en) * 1986-05-14 1988-05-12 Nippon Shinyaku Co Ltd Quinolinecarboxylic acid derivative

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57136588A (en) * 1981-02-18 1982-08-23 Nippon Shinyaku Co Ltd Carboxylic acid derivative
JPS58103393A (en) * 1981-12-12 1983-06-20 Nippon Shinyaku Co Ltd Quinolinecarboxylic acid derivative
JPS61143363A (en) * 1984-12-17 1986-07-01 Kyorin Pharmaceut Co Ltd Production of quinolonecarboxylic acid derivative
JPS63107990A (en) * 1986-05-14 1988-05-12 Nippon Shinyaku Co Ltd Quinolinecarboxylic acid derivative

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