WO1989011776A1 - Arrangement for irradiating objects - Google Patents

Arrangement for irradiating objects Download PDF

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Publication number
WO1989011776A1
WO1989011776A1 PCT/DE1989/000075 DE8900075W WO8911776A1 WO 1989011776 A1 WO1989011776 A1 WO 1989011776A1 DE 8900075 W DE8900075 W DE 8900075W WO 8911776 A1 WO8911776 A1 WO 8911776A1
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WO
WIPO (PCT)
Prior art keywords
mirror
magnet system
cylinder
deflection magnet
arrangement
Prior art date
Application number
PCT/DE1989/000075
Other languages
German (de)
French (fr)
Inventor
Karl-Heinz Müller
Original Assignee
Siemens Aktiengesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of WO1989011776A1 publication Critical patent/WO1989011776A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00

Definitions

  • a plurality of beam tubes are provided in the area of a deflection magnet system, via which synchrotron radiation is guided outwards, so that, for example, several semiconductor wafers can be exposed simultaneously in so-called steppers.
  • the invention is based on an arrangement for illuminating objects in the area of a deflection magnet system of an electron storage ring or a ring accelerator, from which the synchrotron radiation is supplied to one of several exposure stations assigned to the deflection magnet system via a cylinder mirror as a collimator through a beam tube.
  • Objects are understood to mean both semiconductor wafers for electrical circuits and materials for the production of micromechanical components. With such an arrangement, the radiation intensity on the object or the semiconductor wafer is relatively low because the individual beam tubes are arranged relatively far from the deflection magnet system with their input end due to their geometric dimensions, so that only a comparatively small part of the emitted synchrotron radiation is absorbed by them can be.
  • the cylinder mirrors are arranged in a single mirror chamber, which is attached to the outside of the deflection magnet system;
  • the beam tubes are attached to the side of the mirror chamber facing away from the deflection magnet system.
  • An essential advantage of the arrangement according to the invention is that the cylinder mirrors can be arranged relatively close to the deflecting magnet system due to the use of a single mirror chamber arranged upstream of the beam pipes, because the dimensions of each cylinder mirror are smaller than those of the beam pipes. A comparatively high proportion of the synchrotron radiation emitted is therefore detected by the cylinder mirrors, which results in a relatively high radiation intensity on the downstream of the beam tubes
  • the cylinder mirrors arranged upstream of the individual beam tubes are each arranged tangentially at approximately the same distance from the assigned, radiating electron beam path pieces.
  • holding and adjusting devices for the cylinder mirrors are fastened in the wall of the mirror chamber, as a result of which the latter can be precisely aligned.
  • Figure 1 is a plan view of a schematically shown
  • FIG. 2 a section through a deflection magnet system of the ring accelerator according to FIG. 1 with a mirror chamber and in FIG. 3 a section through the embodiment according to FIG. 2 along line III-III.
  • the ring accelerator 1 shown in FIG. 1 has a pre-accelerator 2 and a ring with a plurality of deflection magnet systems 3, 4, 5 and 6 and also contains feedback magnet systems 7, 8, 9 and 10, between which an accelerator 11 is arranged .
  • the entire ring accelerator 1 is closed off from the outside by a wall 12.
  • Each of the deflection magnet systems 3 to 6 of the ring accelerator 1 is assigned steppers 13a, 13b, 13c and 13d and 14a, 14b, 14c and 14d outside the wall 12; the steppers associated with the deflection magnet systems 5 and 6 are not shown in the figure.
  • each deflection magnet system 3 to 6 consists of a deflection magnet 19 which has a channel 20 (see FIG. 3) for guiding the electron beam 21.
  • Deflection magnet 19 is surrounded by an inner container 22 which is filled with helium.
  • an outer container 23 which is evacuated.
  • the outer container 23 is provided with an inlet opening 24 sealed to the outside for the electron beam.
  • the outer container 23 of the deflection magnet 19 is provided with a flange 25 to which an evacuated mirror chamber 26 is attached in a vacuum-tight manner.
  • the mirror chamber 26 contains four collimating cylinder mirrors 27, 28, 29 and 30, which in the direction of the exiting 1 Tenden Synchrot 'ronstrahlung 31 offset next to one another are arranged ange ⁇ .
  • the colliating cylinder mirrors 27 to 30 are each preceded by an additional cylinder mirror 31, 32, 33 and 34 in the beam direction and thus towards the deflecting magnet 19,
  • An exit opening 35 for the electron beam which is sealed off from the outside is provided on the mirror chamber 26.
  • beam tubes 36, 37, 38 and 39 are provided on the mirror chamber 26, which, for example,
  • the deflecting magnet 19 consists of an upper solenoid 40 and a lower solenoid 41, between which the channel 20 for guiding the electrical
  • FIG. 3 also shows that the inner container 22 of the deflection magnet system is provided with a filler neck 43, through which the inner container 22 can be filled with helium from the outside.
  • the electrical connection is provided with a filler neck 43, through which the inner container 22 can be filled with helium from the outside.
  • Container 23 of the deflection magnet system is provided with a nozzle 44 to which a vacuum pump, not shown in FIG. 3, is connected.
  • a dash-dotted line indicates an optionally provided middle container 45 as a temperature shield, which can be filled with liquid nitrogen through an additional filler neck 46 for reasons of thermal insulation of the inner container 22.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Particle Accelerators (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

In an arrangement for irradiating objects in the region of a bending magnet system of an electron storage ring or of an annular accelerator, the steppers associated with this magnetic system are each connected, through beam tube, to a cylindrical mirror for the purpose of capturing the synchrotron beam. As a result, only a portion of the synchrotron beam generated by the magnet system can be utilized. In order to optimize the portion of the synchrotron beam utilized to irradiate objects, the cylindrical mirrors (27 to 34) are arranged in a single mirror chamber (26) fastened to the outside of the bending magnet system (19). The beam tubes (36 to 39) are arranged on the opposite side of the mirror chamber (26) to the bending magnet deflection system (3). The arrangement is suitable for irradiating objects with a synchrotron beam.

Description

Anordnung zur Belichtung von Objekten Arrangement for the exposure of objects
Bei dem Berliner Elektronenspeicherring (BESSY) sind im Bereich eines Ablenkmagnetsystems mehrere Strahlrohre vorgesehen, über die Synchrotronstrahlung nach außen geführt wird, so daß bei¬ spielsweise gleichzeitig mehrere Halbleiterscheiben in soge¬ nannten Steppern belichtet werden können.In the Berlin electron storage ring (BESSY), a plurality of beam tubes are provided in the area of a deflection magnet system, via which synchrotron radiation is guided outwards, so that, for example, several semiconductor wafers can be exposed simultaneously in so-called steppers.
Ferner ist es aus der Zeitschrift 3. Vac. Sei. Technol . B 1 ' (4), Oktober - Dezember 1983, Seiten 1262 - 1266 bekannt, in der Röntgenstrahllithographie im Strahlengang zwischen der Strahlungsquelle und der der jeweils zu belichtenden Halbleiter¬ scheibe vorgeordneten Maske einen Spiegel anzuordnen, der als Kollimator die abgegebene Synchrotronstrahlung in horizontaler Richtung kollimiert, wodurch eine relativ hohe Strahlungsinten¬ sität auf der Halbleiterscheibe erreicht wird.Furthermore, it is from the magazine 3. Vac. Be. Technol. B 1 ' (4), October - December 1983, pages 1262 - 1266, in the X-ray lithography to arrange a mirror in the beam path between the radiation source and the mask arranged upstream of the respective semiconductor wafer to be exposed, which serves as a collimator for the emitted synchrotron radiation in the horizontal direction collimated, whereby a relatively high radiation intensity is achieved on the semiconductor wafer.
Die Erfindung geht von einer Anordnung zur Belichtung von Objekten im Bereich eines Ablenkmagnetsystems eines Elektronen- speicherringes oder eines Ringbeschleunigers aus, aus dem über jeweils einen Zylinderspiegel als Kollimator durch jeweils ein Strahlrohr die Synchrotronstrahlung jeweils einer von mehreren dem Ablenkmagnetsystem zugeordneten Belichtungsstationen zu¬ geführt wird. Dabei werden unter Objekten sowohl Halbleiter- Scheiben für elektrische Schaltungen als auch Materialien zur Herstellung von mikromechanischen Bauteilen verstanden. Bei einer solchen Anordnung ist die Strahlungsintensität auf dem Objekt bzw. der Halbleiterscheibe relativ gering, weil die einzelnen Strahlrohre aufgrund ihrer geometrischen Abmessungen relativ weit vom Ablenkmagnetsystem mit ihrem Eingangsende an¬ geordnet sind, so daß von ihnen nur ein vergleichsweise kleiner Teil der abgegebenen Synchrotronstrahlung aufgenommen werden kann. Gemäß der Erfindung sind bei einer Anordnung der oben angegebenen Art die Zylinderspiegel in einer einzigen Spiegelkammer angeordnet, d e außen am Ablenkmagnetsystem befestigt ist; an der von dem Ablenkmagnetsystem abgewandten Seite der Spiegelkammer sind die Strahlrohre angebracht.The invention is based on an arrangement for illuminating objects in the area of a deflection magnet system of an electron storage ring or a ring accelerator, from which the synchrotron radiation is supplied to one of several exposure stations assigned to the deflection magnet system via a cylinder mirror as a collimator through a beam tube. Objects are understood to mean both semiconductor wafers for electrical circuits and materials for the production of micromechanical components. With such an arrangement, the radiation intensity on the object or the semiconductor wafer is relatively low because the individual beam tubes are arranged relatively far from the deflection magnet system with their input end due to their geometric dimensions, so that only a comparatively small part of the emitted synchrotron radiation is absorbed by them can be. According to the invention, in an arrangement of the type specified above, the cylinder mirrors are arranged in a single mirror chamber, which is attached to the outside of the deflection magnet system; The beam tubes are attached to the side of the mirror chamber facing away from the deflection magnet system.
Ein wesentlicher Vorteil der erfindungsgemäßen Anordnung be¬ steht darin, daß infolge der Verwendung einer einzigen, den Strahlrohren vorgeordneten Spiegelkammer die Zylinderspiegel relativ dicht in der Nähe des Ablenkmagnetsystems angeordnet werden können, weil die Abmessungen jedes Zylinderspiegels kleiner sind als die der Strahlrohre. Von den Zylinderspiegeln wird daher ein vergleichsweise hoher Anteil der abgegebenen Synchrotronstrahlung erfaßt, woraus eine relativ hohe Bestrah- lungsintensität auf den den Strahlrohren nachgeordnetenAn essential advantage of the arrangement according to the invention is that the cylinder mirrors can be arranged relatively close to the deflecting magnet system due to the use of a single mirror chamber arranged upstream of the beam pipes, because the dimensions of each cylinder mirror are smaller than those of the beam pipes. A comparatively high proportion of the synchrotron radiation emitted is therefore detected by the cylinder mirrors, which results in a relatively high radiation intensity on the downstream of the beam tubes
Objekten resultiert. Anders ausgedrückt: Es wird bei der er¬ findungsgemäßen Anordnung ein relativ großer, synchrαtron- strahlungserzeugender Elektronenbahnanteil genutzt.Objects results. In other words: in the arrangement according to the invention, a relatively large proportion of electron pathways generating synchronous radiation is used.
Die den einzelnen Strahlrohren vorgeordneten Zylinderspiegel sind jeweils tangential in etwa gleichem Abstand von den zu¬ geordneten, strahlenden Elektronenstrahlbahnstücken angeordnet.The cylinder mirrors arranged upstream of the individual beam tubes are each arranged tangentially at approximately the same distance from the assigned, radiating electron beam path pieces.
Im Hinblick auf die Erzielung einer hohen Strahlungsintensität auf der Halbleiterscheibe einerseits und im Hinblick auf das Erreichen eines aus Gründen hoher Auflösungsgenauigkeit mög¬ lichst strichförmigen Synchrotronstrahls auf der Halbleiter¬ scheibe andererseits ist es vorteilhaft, wenn in der Spiegel¬ kammer jedem kolli ierenden Zylinderspiegel jeweils ein zu- sätzlicher Zylinderspiegel mit in bezug zur Strahlenrichtung quer liegender Zylinderachse zugeordnet ist.With a view to achieving a high radiation intensity on the semiconductor wafer on the one hand and with regard to achieving a line-like synchrotron beam on the semiconductor wafer for reasons of high resolution accuracy on the other hand, it is advantageous if in the mirror chamber one collimating cylinder mirror in each case additional cylinder mirror is assigned with a cylinder axis lying transversely with respect to the beam direction.
Bei der erfindungsgemäßen Anordnung sind in der Wandung der Spiegel kammer Halte- und Justiereinrichtungen für die Zylinderspiegel befestigt, wodurch letztere genau ausrichtbar sind. Zur Erläuterung der Erfindung ist inIn the arrangement according to the invention, holding and adjusting devices for the cylinder mirrors are fastened in the wall of the mirror chamber, as a result of which the latter can be precisely aligned. To explain the invention is in
Figur 1 eine Aufsicht auf einen schematisch dargestelltenFigure 1 is a plan view of a schematically shown
Ringbeschleuniger mit mehreren Anordnungen gemäß der vorliegenden Erfindung, in Figur 2 einen Schnitt durch ein Ablenkmagnetsystem des Ringbe¬ schleunigers nach Figur 1 mit einer Spiegelkammer und in Figur 3 ein Schnitt durch das Ausführungsbeispiel nach Figur 2 entlang etwa der Linie III-III wiedergegeben.Ring accelerator with several arrangements according to the present invention, in FIG. 2 a section through a deflection magnet system of the ring accelerator according to FIG. 1 with a mirror chamber and in FIG. 3 a section through the embodiment according to FIG. 2 along line III-III.
Der in Figur 1 dargestellte Ringbeschleuniger 1 weist in be¬ kannter Weise einen Vorbeschleuniger 2 sowie einen Ring mit mehreren Ablenkmagnetsystemen 3, 4, 5 und 6 auf und enthält darüber hinaus Rückführmagnetsysteme 7, 8, 9 und 10, zwischen denen ein Beschleuniger 11 angeordnet ist. Der gesamte Ringbe- schleuniger 1 ist durch eine Wand 12 nach außen abgeschlossen.The ring accelerator 1 shown in FIG. 1 has a pre-accelerator 2 and a ring with a plurality of deflection magnet systems 3, 4, 5 and 6 and also contains feedback magnet systems 7, 8, 9 and 10, between which an accelerator 11 is arranged . The entire ring accelerator 1 is closed off from the outside by a wall 12.
Jedem der Ablenkmagnetsysteme 3 bis 6 des Ringbeschleunigers 1 sind außerhalb der Wand 12 Stepper 13a, 13b, 13c und 13d sowie 14a, 14b, 14c und 14d zugeordnet; die den Ablenkmagnetsystemen 5 und 6 zugehörigen Stepper sind in der Figur nicht gezeigt.Each of the deflection magnet systems 3 to 6 of the ring accelerator 1 is assigned steppers 13a, 13b, 13c and 13d and 14a, 14b, 14c and 14d outside the wall 12; the steppers associated with the deflection magnet systems 5 and 6 are not shown in the figure.
Wie die Figuren 2 und 3 erkennen lassen, besteht jedes Ablenk¬ magnetsystem 3 bis 6 aus einem Ablenkmagneten 19, der einen Kanal 20 (vgl. Fig. 3) zur Führung des Elektronenstrahls 21 aufweist. Der vorzugsweise zylindrische, supraleitendeAs can be seen in FIGS. 2 and 3, each deflection magnet system 3 to 6 consists of a deflection magnet 19 which has a channel 20 (see FIG. 3) for guiding the electron beam 21. The preferably cylindrical, superconducting
Ablenkmagnet 19 ist von einem inneren Behälter 22 umgeben, der mit Helium gefüllt ist. Um diesen inneren Behälter 22 herum befindet sich ein äußerer Behälter 23, der evakuiert ist. Der äußere Behälter 23 ist mit einer nach außen abgedichteten Ein- trittsöffnung 24 für den Elektronenstrahl versehen.Deflection magnet 19 is surrounded by an inner container 22 which is filled with helium. Around this inner container 22 there is an outer container 23 which is evacuated. The outer container 23 is provided with an inlet opening 24 sealed to the outside for the electron beam.
Der Eintrittsöffnung 24 nahezu diametral gegenüber ist der äußere Behälter 23 des Ablenkmagneten 19 mit einem Flansch 25 versehen, an dem vakuumdicht eine evakuierte Spiegelkammer 26 befestigt ist. Die Spiegelkammer 26 enthält vier kollimierende Zylinderspiegel 27, 28, 29 und 30, die in Richtung der austre- 1 tenden Synchrot'ronstrahlung 31 versetzt nebeneinander ange¬ ordnet sind. Den kolli ierenden Zylinderspiegeln 27 bis 30 ist jeweils ein zusätzlicher Zylinderspiegel 31, 32, 33 und 34 in Strahlrichtung und damit zum Ablenkmagneten 19 hin vorgeordnet,Almost diametrically opposite the inlet opening 24, the outer container 23 of the deflection magnet 19 is provided with a flange 25 to which an evacuated mirror chamber 26 is attached in a vacuum-tight manner. The mirror chamber 26 contains four collimating cylinder mirrors 27, 28, 29 and 30, which in the direction of the exiting 1 Tenden Synchrot 'ronstrahlung 31 offset next to one another are arranged ange¬. The colliating cylinder mirrors 27 to 30 are each preceded by an additional cylinder mirror 31, 32, 33 and 34 in the beam direction and thus towards the deflecting magnet 19,
5 die ebenfalls seitlich versetzt nebeneinander angeordnet sind. Auf diese Weise wird von den Zylinderspiegeln 31 bis 34 ein großer Anteil der aus dem Ablenkmagneten 19 austretenden Synchrotronstrahlung SR erfaßt.5 which are also arranged laterally offset next to one another. In this way, a large proportion of the synchrotron radiation SR emerging from the deflection magnet 19 is detected by the cylinder mirrors 31 to 34.
10 An der Spiegelkammer 26 ist eine nach außen hin abgedich¬ tete Austrittsöffnung 35 für den Elektronenstrahl vorgesehen. Außerdem befinden sich in Richtung der Synchrotronstrahlung an der Spiegelkammer 26 Strahlrohre 36, 37, 38 und 39, die durch die in Figur 1 gezeigte Wand 12 des Ringbeschleunigers beispiels-An exit opening 35 for the electron beam which is sealed off from the outside is provided on the mirror chamber 26. In addition, in the direction of the synchrotron radiation, there are beam tubes 36, 37, 38 and 39 on the mirror chamber 26, which, for example,
15 weise zu den Steppern 13a bis 13d führen.15 lead to steppers 13a to 13d.
Aus Figur 3 ist ergänzend erkennbar, daß der Ablenkmagnet 19 aus einer oberen Zylinderspule 40 und einer unteren Zylinderspule 41 besteht, zwischen denen der Kanal 20 zur Führung des Elektro-From FIG. 3 it can additionally be seen that the deflecting magnet 19 consists of an upper solenoid 40 and a lower solenoid 41, between which the channel 20 for guiding the electrical
20. nenstrahls 21 freigelassen ist. Ferner zeigt die Figur 3, daß der innere Behälter 22 des Ablenkmagnetsystems mit einem Füllstutzen 43 versehen ist, durch den von außen her eine Befüllung des inneren Behälters 22 mit Helium möglich ist. Außerdem erfolgt über diesen Füllstützen die elektrische Ver-20. nenstrahls 21 is released. FIG. 3 also shows that the inner container 22 of the deflection magnet system is provided with a filler neck 43, through which the inner container 22 can be filled with helium from the outside. In addition, the electrical connection
25 sorgung der supraleitenden Spulen 41 und 42. Der äußere25 supply of the superconducting coils 41 and 42. The outer
Behälter 23 des Ablenkmagnetsystems ist mit einem Stutzen 44 versehen, an den eine in der Figur 3 nicht dargestellte Vakuumpumpe angeschlossen ist.Container 23 of the deflection magnet system is provided with a nozzle 44 to which a vacuum pump, not shown in FIG. 3, is connected.
30 In der Figur 3 nur strichpunktiert angedeutet ist ein ggf. vorgesehener mittlerer Behälter 45 als Temperaturschild, der aus Gründen der Wärmeisolation des inneren Behälters 22 durch einen zusätzlichen Füllstutzen 46 mit flüssigem Stickstoff gefüllt werden kann.30 In FIG. 3, only a dash-dotted line indicates an optionally provided middle container 45 as a temperature shield, which can be filled with liquid nitrogen through an additional filler neck 46 for reasons of thermal insulation of the inner container 22.
3535
Aus Figur 3 ist ferner deutlich erkennbar, daß in der seitlich an dem äußeren Behälter 23 des Ablenkmagnetsystems angeflansch¬ ten Spiegelkammer 26 der zusätzliche Spiegel 33 über ein Halte- und Justiersystem 47 von außen einstellbar ist. Entsprechend ist der nachgeordnete kollimierende Zylinderspiegel 29 durch eine weitere Haltevorrichtung 48 einstellbar; die Halte- und Justiereinrichtungen 47 und 48 sind durch nur schematisch dargestellte Manipulatoren 49 und 50 betätigbar, so daß die Zylinderspiegel 29 und 33 so eingestellt werden können, daß über das Strahlrohr 38 ein fokussierter Synchrotronstrahl im Stepper entsteht, der hier nicht dargestellt ist. Am Eingang des Strahlrohres ist ein abdichtendes Fenster 51 vorge¬ sehen, wodurch das Strahlrohr 38 vakuummäßig von der Spiegel¬ kammer 26 getrennt wird, während die Synchrotronstrahlung das Fenster passieren kann. Die übrigen Spiegel in der Spiegel- kammer 26 sind in Figur 3 der besseren Übersichtlichkeit halber nicht dargestellt. From Figure 3 it is also clearly visible that in the side on the outer container 23 of the deflecting magnet system flanged mirror chamber 26 the additional mirror 33 can be adjusted from the outside via a holding and adjusting system 47. The downstream collimating cylinder mirror 29 can accordingly be adjusted by a further holding device 48; the holding and adjusting devices 47 and 48 can be actuated by manipulators 49 and 50, which are only shown schematically, so that the cylinder mirrors 29 and 33 can be adjusted so that a focused synchrotron beam is formed in the stepper via the beam tube 38, which is not shown here. At the entrance of the jet pipe, a sealing window 51 is provided, whereby the jet pipe 38 is vacuum-separated from the mirror chamber 26, while the synchrotron radiation can pass through the window. The remaining mirrors in the mirror chamber 26 are not shown in FIG. 3 for the sake of clarity.

Claims

Patentansprüche Claims
1. Anordnung zur Belichtung von Objekten im Bereich eines Ablenkmagnetsystems (z.B. 3) eines Elektronenspeicherringes oder Ringbeschleunigers (1), aus dem über jeweils einen Zylinder¬ spiegel (27,28,29,30) als Kollimator durch jeweils ein Strahl¬ rohr (36,37,38,39) Synchrotronstrahlung (31) jeweils einer von mehreren dem Ablenkmagnetsystem (z.B. 3) zugeordneten Be¬ lichtungsstationen (z.B. 13a,13b,13c,13d) zugeführt wird, d a d u r c h g e k e n n z e i c h n e t , daß die Zylinderspiegel (27,28,29,30) in einer einzigen Spiegel¬ kammer (26) angeordnet sind, die außen am Ablenkmagnetsystem (3) befestigt ist, und daß an der von dem Ablenkmagnetsystem (3) abgewandten Seite der Spiegelkammer (26) die Strahlrohre (36,37,38,39) angebracht sind.1. Arrangement for the exposure of objects in the area of a deflection magnet system (for example 3) of an electron storage ring or ring accelerator (1), from which each has a cylinder mirror (27, 28, 29, 30) as a collimator through a beam tube (36 , 37, 38, 39) synchrotron radiation (31) is supplied in each case to one of several illumination stations (for example 13a, 13b, 13c, 13d) assigned to the deflection magnet system (for example 3), characterized in that the cylinder mirrors (27, 28, 29, 30) are arranged in a single mirror chamber (26) which is fastened to the outside of the deflection magnet system (3) and that on the side of the mirror chamber (26) facing away from the deflection magnet system (3) the jet pipes (36, 37, 38, 39) are attached.
2. Anordnung nach Anspruch 1, d a d u r c h g e k e n n z e i c h n e t , daß in der Spiegelkammer (26) jedem kollimierenden Zylinder¬ spiegel (27,28,29,30) jeweils ein zusätzlicher Zylinderspiegel (31,32,33,34) mit in bezug zur Strahlrichtung quer liegender Achse zugeordnet ist.2. Arrangement according to claim 1, characterized in that in the mirror chamber (26) each collimating cylinder mirror (27,28,29,30) each have an additional cylinder mirror (31,32,33,34) with transverse to the beam direction Axis is assigned.
3. Anordnung nach Anspruch 1 oder 2, d a d u r c h g e k e n n z e i c h n e t , daß in der Wandung der Spiegelkammer (26) Halte- und Justierein¬ richtungen (47,48) für die Zylinderspiegel (31,27) befestigt sind. 3. Arrangement according to claim 1 or 2, so that the holding and adjusting devices (47, 48) for the cylinder mirrors (31, 27) are fastened in the wall of the mirror chamber (26).
PCT/DE1989/000075 1988-05-18 1989-02-03 Arrangement for irradiating objects WO1989011776A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP3817378.6 1988-05-18
DE19883817378 DE3817378A1 (en) 1988-05-18 1988-05-18 ARRANGEMENT FOR EXPOSURE OF OBJECTS

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0197211A1 (en) * 1985-04-04 1986-10-15 Hitachi, Ltd. X-ray exposure system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0197211A1 (en) * 1985-04-04 1986-10-15 Hitachi, Ltd. X-ray exposure system

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
Journal of Vacuum Science & Technology B, Band 1, Nr. 4, Oktober-Dezember 1983, American Vacuum Society, R.P. Healbich et al.: "Design and performance of an x-ray lithography beam line at a storage ring", Seiten 1262-1266 *
Nuclear Instruments & Methods, Band 172, Nr. 1,2, Mai 1980, North-Holland Publishing Co. (Amsterdam, NL), G.P. Williams et al.: "Current schemes for national synchrotron light source UV beamlines", Seiten 379-385 *
Soviet Physics Technical Physics, Band 24, Nr. 9, September 1979, American Institute of Physics, (N ew York, US), V.I. Kvochka et al.: "Optical system for extraction of synchrotron radiation", Seiten 1101-1102 *

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JPH03504156A (en) 1991-09-12

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