WO1983003599A1 - Doped optical fiber - Google Patents
Doped optical fiber Download PDFInfo
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- WO1983003599A1 WO1983003599A1 PCT/US1983/000334 US8300334W WO8303599A1 WO 1983003599 A1 WO1983003599 A1 WO 1983003599A1 US 8300334 W US8300334 W US 8300334W WO 8303599 A1 WO8303599 A1 WO 8303599A1
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- fiber
- tube
- alumina
- core
- aluminum
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C13/00—Fibre or filament compositions
- C03C13/04—Fibre optics, e.g. core and clad fibre compositions
- C03C13/045—Silica-containing oxide glass compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/90—Feeding the burner or the burner-heated deposition site with vapour generated from solid glass precursors, i.e. by sublimation
Definitions
- This invention involves optical fibers based upon the silica glass system in which either the core, the cladding, or both, have an index of refraction different from that of pure silica as a result of the addition of an appropriate dopant. Disclosures of Interest
- Optical fibers are now routinely fabricated on a commercial basis with losses less than 1 dB/km in at least part of the optical region of the spectrum, generally extending from 0.7 to 1.7 micrometers.
- the fibers comprise a core and a cladding, with the cladding having an index of refraction lower, at least in part, than that of an index of refraction associated with the core.
- Both multi-mode fibers and single-mode fibers are routinely fabricated using various design parameters, such as appropriate gradations in index of refraction to obtain desirable characteristics, such as high bandwidth.
- Dopants whi ch are used include germania, an index raising dopant, which is the principal and most widely used dopant, as well as other minor dopants, such as phosphorus, and other index raising dopant, and fluorine and boron, index lowering dopants.
- boron and phosphorus are used to improve processing characteristics, such as those associated with sintering. Recently, boron has been less widely used because of its infrared absorption band which appears in the spectral range of interest. Where long wavelength transmission is of interest, boron is usually replaced with fluorine, which, like boron, lowers
- fluorine which, like boron, lowers
- 3,220,893 discloses a liquid quenching medium comprising an aqueous solution of a liquid oxyalkylene polymer having both oxyethylene and higher oxyalkylene groups and a molecular weight of 12,000 to 14,000.
- a liquid oxyalkylene polymer having both oxyethylene and higher oxyalkylene groups and a molecular weight of 12,000 to 14,000.
- Such compounds are also referred to herein as polyether polyols and poly (oxyethyene-oxyalkylene)glycols.
- the oxyalkylene polymers have the characteristic of decreasing in solubility as the temperature of the quenching bath is increased, as when red hot metal is introduced therein.
- the oxyalkylene polymers are said to form a covering over the metal surface to the exclusion of the water component of the bath.
- the polymer layer is said to be an excellent heat conducting medium which operates at a high rate, and thus use thereof requires relatively short quench cycle time, which results in minimum internal stress and distortion of
- organic compounds which cause the formation of a vapor blanket about the metal during the quenching operation have been used.
- organic compound is a water-soluble polyacrylate, such as a sodium polyacrylate, the use of which compound in a quenching bath comprises the subject matter of U.S. Patent No. 4,087,290.
- An object of this invention is the provision of a novel quenching medium the composition of which can be varied to provide a broad range of quenching rates between the quenching rates of water and oil.
- Letters, Vol. 10, No. 20, p. 410, 1974 Such work, however, has generally involved low concentrations of alumina dopant. The use of higher concentrations of alumina generally results in devitrification (J. F. MacDowell and G. H. Beall, Journal of the American Ceramics Society, Vol. 52, p. 17, January 1969), and hence is discouraged. Summary of the Invention
- This invention is an optical fiber doped, at least in part, with at least one nonglass forming refractory oxide which is substantially stable relative to its halide vapor species at typical deposition temperatures used in fiber fabrication. Furthermore, the refractory oxide is substantially stable relative to its suboxides at subsequent processing temperatures, such as for example at collapse temperatures used in MCVD.
- Exemplary nonglass forming refractory oxides appropriate for the practice of this invention include alumina and zirconia. In the practice of this invention alumina has been incorporated in silica fibers at dopant levels even greater than 5, 7, or 10 mole percent without deleterious devitrification.
- Such high concentrations of nonglass forming dopants may be obtained by either incorporating a third glass forming dopant, such as P 2 O 5 , to retard devitrification, or by using a fabrication process which quenches the doped silica to form the glass state.
- a fabrication process which quenches the doped silica to form the glass state.
- Processes for fiber fabrication which may quench the doped silica in the glass state include the MCVD process where deposited particulate material is sintered to a clear glass by means of a passing hot zone. This is to be compared with various forms of the flame hydrolysis process which are applied to fiber fabrication to yield a porous particulate body which is then sintered to a clear glass over relatively long periods of time.
- sintering occurs over temperature-time periods long compared to the temperature-time period over which devitrification occurs, thereby allowing the doped silica to devitrify.
- the temperature-time devitrification periods relevant for materials discussed here may be deleteriously shortened by the fact that alumina, for example, i s no t a gl ass fo rmer , and hence tends to devi t r i fy relatively rapidly. Consequently, short temperature-time periods for sintering may become important.
- a doped halide precursor vapor may be conveniently formed by passing high purity halide vapor, such as chlorine, over high purity aluminum or zirconia wire advantageously heated in an appropriate vessel.
- the halide precursor vapor may be diluted, for example, by helium, to provide a mixture dew point high enough so that the mixture may be delivered without condensation.
- the mixture was delivered, along with other precursor vapors such as silicon tetrachlor ide and oxygen, to an MCVD fabrication apparatus where appropriate deposition, and subsequent fiber fabrication, occurred.
- FIG. 1 is a schematic representation of the inventive fiber.
- FIG. 2 is a schematic representation of a reactor oven which may be used to form doped precursor vapor in the practice of this invention.
- FIG. 3 is a schematic representation of an exemplary injector which may be used to deliver the reactant precursor vapor to a deposition apparatus without condensation.
- FIG. 4 is a graphical representation of the loss values obtained in a fiber fabricated according to the teachings of this invention. Detailed Description
- the invention is a communications grade optical fiber (loss less than 2.5 dB/km over at least a portion of the optical region of the spectrum) comprising silica (generally greater than 80 weight percent) doped with a nonglass forming refractory oxide such as Ail 2 O 3 on ZrO 2 .
- a nonglass forming refractory oxide such as Ail 2 O 3 on ZrO 2 .
- the specific design of the fiber is determined by the requirement of the practitioner, but will usually include a cladding region of lower index of refraction and a central core region of higher index of refraction.
- the size of the various regions, as well as their relative index of refraction values and distributions or gradations, are determined by the particular application.
- dopant oxides are used to alter the index of refraction of the silica-based fiber with a view toward obtaining requisite index of refraction values and/o r gradations.
- Oxides used in this invention are substantially stable relative to their halide vapor species at temperatures necessary to form and deposit the oxides during fiber fabrication. Simultaneously, these oxides are substantially stable relative to their suboxides at subsequent processing temperatures, such as for example, collapse temperatures in MCVD.
- the Corning process involves the formation of silica and/or doped silica particles using a hydrolysis burner (see, U.S. Patents 2,272,342 and 2,326,059), and the subsequent deposition of these particles on an appropriate mandrel to obtain a porous tubular body which is subsequently sintered to a clear glass tube from which the fiber is drawn.
- the MCVD process involves flowing appropriate glass precursor reactants through a glass tube which is traversed by an appropriate hot zone.
- the hot zone serves the dual purpose of a) stimulating reaction of the glass precursor vapors to form glass particulate material which generally deposits downstream of the hot zone, and b) simultaneously sintering previously deposited particulate material to a unitary glass layer.
- the tube is collapsed to a rod from which the fiber is drawn.
- a distinction of significance between the Corning hydrolysis process and the Bell MCVD process is the time-temperature period necessary for sintering.
- Table I shows, however, that zirconia tetrachloride and aluminum trichloride, behaving much like phosphorus oxychloride, are essentially entirely reacted during MCVD chemistry (less than 5 parts in 10 5 unreacted).
- the results of Table I led one to believe, as in fact applicants have now shown, that alumin and zirconia may be easily incorporated into silica glass.
- the stability of the oxide to its suboxide species during subsequent processing at elevated temperatures is a measure of the tendency of the oxide to vaporize as a suboxide, for example, during the collapse step in MCVD.
- Table II the equilibrium partial pressures of particular suboxides are compared for a number of oxides used in fiber fabrication.
- the partial pressure of germanium oxide is high.
- the equilibrium between GeO 2 and GeO at high temperatures such as those encountered in the MCVD collapse step, favor the vaporization of GeO 2 as GeO, a reaction referred to as "burnoff," and resulting in an index dip in the resultant fiber. This index dip is believed to be a cause of bandwidth loss.
- Table II shows that both aluminum oxide and zirconium oxide have very little tendency to vaporize as suboxides,
- FIG. 1 a fiber fabricated according to the teachings of this invention is shown.
- 11 is the fiber core comprising silica doped with appropriate nonglass forming refractory oxides, including alumina and/or zirconia
- 12 is the fiber cladding which may be pure silica or s i l ic a doped with dopants disclosed here, or common to those skilled in the art.
- dopant precursor vapor yields superior fiber transmission characteristics.
- alumina trichloride is available as a powder over which oxygen may be flowed to yield alumina trichloride vapor in oxygen
- the aluminum trichloride powder is relatively impure.
- silicon and germania trichloride have been used in conjunction with oxygen carrier gas to yield appropriate vapor
- the high vapor pressure of these constituents results in the separation of contaminants which are left behind, due to their low vapor pressure.
- aluminum trichloride tends to dimerize with contaminants further exacerbating the contaminant problem.
- the present process involves, in a sense, a two-step chemistry.
- FIG. 2 is a reactor oven which may be used to form an aluminum or zirconium halide precursor reactant for delivery, for example to an MCVD apparatus.
- 21 is a Pyrex vessel. Chlorine, as well as any diluents which may be used, such as helium, enter the reactor oven through 22, pass through a tube, 23, through fritted glass, 24, and over aluminum or zirconium wire, 25.
- the vessel may be heated with tape, 26, or in a furnace, and insulated with vermiculite insulation, 27.
- the resultant aluminum chloride, and any diluent which may be used, exit through 28 and are then transmitted to a reactant injector which is heated to prevent condensation.
- the reactant injector is shown in FIG.
- FIG. 4 is a loss diagram for exemplary fibers fabricated according to the teachings of this invention.
- Example Optical fiber preforms were made using a standard
- AlCl 2 generator (FIG. 2) and a hot reactant injector (FIG. 3).
- Pure AlC l 3 was generated by passing high purity chlorine (Airco research grade) over Marz grade aluminum wire (5-9's containing transition metals at less than 1 ppm) heated to 300 degrees Celsius in a Pyrex vessel (21 in FIG. 2).
- the chlorine flow was controlled from 5 to 100 cc/min. to regulate the amount of AnCl 3 generated and was diluted by 300 cc/min. of helium to provide a mixture dew point high enough to be delivered by the injection tube heated to 200 degrees Celsius.
- the hot injection system (FIG.
- Deposition was carried out in waveguide grade 19 mm I.D. x 25 mm O.D. silica tubes using a single water-cooled torch for deposition and collapse. Deposit conditions are outlined in Table III.
- reaction of the aluminum wire was initiated by passing chlorine and helium over it until a visible amount of AlCl 3 could be condensed inside the substrate tube.
- the condensed AlCl 3 was then sublimed while helium continued to purge the generator.
- this practice prepared the surface of the aluminum wire in the generator to allow controlled delivery of A lC I 3 when required.
- Deposition of a B 2 O 3 -SiO 2 barrier and a Al 2 O 3 -P 2 O 5 -SiO 2 core proceeded much the same as usual. During collapse, however, the low viscosity of the core composition required that considerable back pressure be applied to ensure a circular core.
- the P 2 O 5 -Al 2 O 3 -SiO 2 system contains the phase (AlPO 4 ) which is an isomorph of silica.
- AlPO 4 is an isomorph of silica.
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Abstract
Optical fibers at least the core (11) of which contains at least 80 weight percent silica doped with nonglass forming refractory oxides, such as alumina and zirconia. Devitrification is retarded by adding an additional glass forming component, such as P2O5, and by rapidly quenching the heated glass. Aluminium and zirconium-containing precursor vapors are formed by passing halide gas over heated aluminium of zirconium wire.
Description
DOPED OPTICAL FIBER
Background of the Invention Field of the Invention
This invention involves optical fibers based upon the silica glass system in which either the core, the cladding, or both, have an index of refraction different from that of pure silica as a result of the addition of an appropriate dopant. Disclosures of Interest
Over the past decade the suggestion of Kao and Hockham (Proceedings of IEE, Vol. 113, No. 7, July 1966, p. 1151) that silica would constitute an appropriate transmission medium for low loss optical fibers has been widely realized. Optical fibers are now routinely fabricated on a commercial basis with losses less than 1 dB/km in at least part of the optical region of the spectrum, generally extending from 0.7 to 1.7 micrometers. The fibers comprise a core and a cladding, with the cladding having an index of refraction lower, at least in part, than that of an index of refraction associated with the core. Both multi-mode fibers and single-mode fibers are routinely fabricated using various design parameters, such as appropriate gradations in index of refraction to obtain desirable characteristics, such as high bandwidth.
Dopants whi ch are used include germania, an index raising dopant, which is the principal and most widely used dopant, as well as other minor dopants, such as phosphorus, and other index raising dopant, and fluorine and boron, index lowering dopants. In addition, boron and phosphorus are used to improve processing characteristics, such as those associated with sintering. Recently, boron has been less widely used because of its infrared absorption band which appears in the spectral range of interest. Where long wavelength transmission is of interest, boron is usually replaced with fluorine, which, like boron, lowers
For example, U.S. Patent No. 3,220,893 discloses a liquid quenching medium comprising an aqueous solution of a liquid oxyalkylene polymer having both oxyethylene and higher oxyalkylene groups and a molecular weight of 12,000 to 14,000. Such compounds are also referred to herein as polyether polyols and poly (oxyethyene-oxyalkylene)glycols. According to the patent, the oxyalkylene polymers have the characteristic of decreasing in solubility as the temperature of the quenching bath is increased, as when red hot metal is introduced therein. The oxyalkylene polymers are said to form a covering over the metal surface to the exclusion of the water component of the bath. The polymer layer is said to be an excellent heat conducting medium which operates at a high rate, and thus use thereof requires relatively short quench cycle time, which results in minimum internal stress and distortion of the metal, while at the same time imparting uniform hardenability of the metal.
However, it is frequently desirable to increase the quench cycle time, and for such purposes organic compounds which cause the formation of a vapor blanket about the metal during the quenching operation have been used. An example of such an organic compound is a water-soluble polyacrylate, such as a sodium polyacrylate, the use of which compound in a quenching bath comprises the subject matter of U.S. Patent No. 4,087,290.
An object of this invention is the provision of a novel quenching medium the composition of which can be varied to provide a broad range of quenching rates between the quenching rates of water and oil.
Letters, Vol. 10, No. 20, p. 410, 1974). Such work, however, has generally involved low concentrations of alumina dopant. The use of higher concentrations of alumina generally results in devitrification (J. F. MacDowell and G. H. Beall, Journal of the American Ceramics Society, Vol. 52, p. 17, January 1969), and hence is discouraged. Summary of the Invention
This invention is an optical fiber doped, at least in part, with at least one nonglass forming refractory oxide which is substantially stable relative to its halide vapor species at typical deposition temperatures used in fiber fabrication. Furthermore, the refractory oxide is substantially stable relative to its suboxides at subsequent processing temperatures, such as for example at collapse temperatures used in MCVD. Exemplary nonglass forming refractory oxides appropriate for the practice of this invention include alumina and zirconia. In the practice of this invention alumina has been incorporated in silica fibers at dopant levels even greater than 5, 7, or 10 mole percent without deleterious devitrification. Such high concentrations of nonglass forming dopants may be obtained by either incorporating a third glass forming dopant, such as P2O5, to retard devitrification, or by using a fabrication process which quenches the doped silica to form the glass state. Processes for fiber fabrication which may quench the doped silica in the glass state include the MCVD process where deposited particulate material is sintered to a clear glass by means of a passing hot zone. This is to be compared with various forms of the flame hydrolysis process which are applied to fiber fabrication to yield a porous particulate body which is then sintered to a clear glass over relatively long periods of time. In the various fiber fabrication processes which utilize hydrolysis, sintering occurs over temperature-time periods long compared to the temperature-time period over which devitrification occurs, thereby allowing the doped
silica to devitrify. The temperature-time devitrification periods relevant for materials discussed here may be deleteriously shortened by the fact that alumina, for example, i s no t a gl ass fo rmer , and hence tends to devi t r i fy relatively rapidly. Consequently, short temperature-time periods for sintering may become important.
In at least the case of alumina or zirconia, a doped halide precursor vapor may be conveniently formed by passing high purity halide vapor, such as chlorine, over high purity aluminum or zirconia wire advantageously heated in an appropriate vessel. The halide precursor vapor may be diluted, for example, by helium, to provide a mixture dew point high enough so that the mixture may be delivered without condensation. In an exemplary embodiment the mixture was delivered, along with other precursor vapors such as silicon tetrachlor ide and oxygen, to an MCVD fabrication apparatus where appropriate deposition, and subsequent fiber fabrication, occurred. Brief Description of the Drawing
FIG. 1 is a schematic representation of the inventive fiber.
FIG. 2 is a schematic representation of a reactor oven which may be used to form doped precursor vapor in the practice of this invention.
FIG. 3 is a schematic representation of an exemplary injector which may be used to deliver the reactant precursor vapor to a deposition apparatus without condensation. FIG. 4 is a graphical representation of the loss values obtained in a fiber fabricated according to the teachings of this invention. Detailed Description
The invention is a communications grade optical fiber (loss less than 2.5 dB/km over at least a portion of the optical region of the spectrum) comprising silica (generally greater than 80 weight percent) doped with a
nonglass forming refractory oxide such as Ail2O3 on ZrO2. The specific design of the fiber is determined by the requirement of the practitioner, but will usually include a cladding region of lower index of refraction and a central core region of higher index of refraction. The size of the various regions, as well as their relative index of refraction values and distributions or gradations, are determined by the particular application. As in the prior art, dopant oxides are used to alter the index of refraction of the silica-based fiber with a view toward obtaining requisite index of refraction values and/o r gradations. Oxides used in this invention are substantially stable relative to their halide vapor species at temperatures necessary to form and deposit the oxides during fiber fabrication. Simultaneously, these oxides are substantially stable relative to their suboxides at subsequent processing temperatures, such as for example, collapse temperatures in MCVD.
The significance of this invention and the importance of the dopant's stability relative to its halide vapor species, as well as to its suboxides, may be understood by considering the various fabrication processes as well as the chemistry used to transform these vapor reactants to doped silica glass.
There are two major fiber fabrication processes currently in commercial practice. They are the MCVD process (U.S. Patent 4,217,027) developed by the Bell System and the Corning hydrolysis process (U.S. Patent Re 28,029). The Corning process involves the formation of silica and/or doped silica particles using a hydrolysis burner (see, U.S. Patents 2,272,342 and 2,326,059), and the subsequent deposition of these particles on an appropriate mandrel to obtain a porous tubular body which is subsequently sintered to a clear glass tube from which the fiber is drawn.
The MCVD process involves flowing appropriate glass precursor reactants through a glass tube which is
traversed by an appropriate hot zone. In commercial embodiments, the hot zone serves the dual purpose of a) stimulating reaction of the glass precursor vapors to form glass particulate material which generally deposits downstream of the hot zone, and b) simultaneously sintering previously deposited particulate material to a unitary glass layer. In commercial practice, subsequent to deposition, the tube is collapsed to a rod from which the fiber is drawn. For the purposes of this invention, a distinction of significance between the Corning hydrolysis process and the Bell MCVD process is the time-temperature period necessary for sintering. Since the Corning process deals with a macroscopic porous particulate body which must be sintered, the temperature-time period for sintering is relatively long. In the MCVD process, however, sintering generally occurs layer by layer and is effected by means of the passing hot zone which traverses at rates generally greater than 1 or 2 cm per minute. This results in a relatively short temperature-time period for sintering.
The significance of this distinction arises because of the tendency of the nonglass forming refractory oxides to crystallize if given sufficient time, at sufficiently elevated temperatures, to equilibrate. In the MCVD process where the temperature-time period for sintering is short, the nonglass forming refractory oxide is essentially quenched in the glass state. In the Corning hydrolysis process, however, where the temperature-time period for sintering is relatively long, equilibration may result in devitrification of the nonglass former to a crystal. This proclivity of the oxide to devitrify is exacerbated by the fact that it is a nonglass former and tends to devitrify if given the thermodynamic opportunity. Inclusion of at least one additional glass former retards the tendency to devitrify.
Consideration of the chemistry which occurs during glass formation gives the practitioner an
appreciation for the significance of the dopant's stability relative to its halide vapor species, as well as relative to its suboxides. In generic form, the relevant reaction is
where "A" is silicon or an appropriate dopant, such as phosphorus, germanium, aluminum, zirconium, etc., "H" is a appropriate halide, such as, for example, chlorine and "c" is a constant. Table I presents order of magnitude estimates of the ratios of equilibrium partial pressures of the halides to the initial partial pressures of the reactants. This represents the fraction of halide which remains unreacted at equilibrium. In Table I, equilibria are compared at typical deposition temperatures for the MCVD process, e.g., 1800 degrees Kelvin. The Table shows that only one in 106 parts of silicon tetrachloride remains unreacted in the MCVD process, consistent with measured observations that silicon tetrachloride is completely reacted in MCVD. Germania tetrachloride, on the other hand, remains 70 percent unreacted. This, too, is consistent with observations which indicate that germanium oxide is difficult to incorporate into the silica glass during fiber fabrication. Furthermore, germania incorporation becomes very sensitive to temperature resulting in a layer structure deleterious to the resultant bandwidth of the optical fiber. Table I shows, however, that zirconia tetrachloride and aluminum trichloride, behaving much like phosphorus oxychloride, are essentially entirely reacted during MCVD chemistry (less than 5 parts in 105 unreacted). The results of Table I led one to believe, as in fact applicants have now shown, that alumin and zirconia may be easily incorporated into silica glass.
T
The stability of the oxide to its suboxide species during subsequent processing at elevated temperatures is a measure of the tendency of the oxide to vaporize as a suboxide, for example, during the collapse step in MCVD. In Table II, the equilibrium partial pressures of particular suboxides are compared for a number of oxides used in fiber fabrication. As can be seen from the Table, the partial pressure of germanium oxide is high. Hence, the equilibrium between GeO2 and GeO at high temperatures, such as those encountered in the MCVD collapse step, favor the vaporization of GeO2 as GeO, a reaction referred to as "burnoff," and resulting in an index dip in the resultant fiber. This index dip is believed to be a cause of bandwidth loss. Table II, however, shows that both aluminum oxide and zirconium oxide have very little tendency to vaporize as suboxides,
[suboxide partial pressure less than 5.07x10-4 Pa.
(5x10-9 atm.)] and hence will show little, if any, "burnoff" tendencies.
T
The FIGURES will be helpful in discussing the particular embodiment described in the Example. In FIG. 1 a fiber fabricated according to the teachings of this invention is shown. In this Example, 11 is the fiber core comprising silica doped with appropriate nonglass forming refractory oxides, including alumina and/or zirconia, and 12 is the fiber cladding which may be pure silica or s i l ic a doped with dopants disclosed here, or common to those skilled in the art. Proper formation of dopant precursor vapor yields superior fiber transmission characteristics. For example, while alumina trichloride is available as a powder over which oxygen may be flowed to yield alumina trichloride vapor in oxygen, the aluminum trichloride powder is relatively impure. While silicon and germania trichloride have been used in conjunction with oxygen carrier gas to yield appropriate vapor, the high vapor pressure of these constituents results in the separation of contaminants which are left behind, due to their low vapor pressure. However, the low vapor pressure of aluminum trichloride does not allow for this inherent purification phenomenon. Tr imethylal umina , whi ch has a h ighe r vapo r pressure has been considered but results in deleterious contamination because of hydroxyl formation, not to mention its tendency to explode upon contact with oxygen. Additionally, aluminum trichloride tends to dimerize with contaminants further exacerbating the contaminant problem.
To alleviate contamination, and unlike previous fiber fabrication chemistry, which involved the direct formation of a reactant vapor, such as SiCl4, the present process involves, in a sense, a two-step chemistry. First, formation of appropriate reactant by passing chlorine over aluminum, and then reaction with oxygen to form an appropriate silica-based glass (see, for example, K. Nassau et al, Journal of the American Ceramics Society, Vol. 58, p. 461, (1975), H. S. Parker and C. A. Harding, Journal of the American Ceramics Society, Vol. 53, p. 583, November
1970, and P. Wong and M. Robinson, Journal of the American Ceramics Society, Vol. 53, p. 617, November 1970).
FIG. 2 is a reactor oven which may be used to form an aluminum or zirconium halide precursor reactant for delivery, for example to an MCVD apparatus. In FIG. 2, 21 is a Pyrex vessel. Chlorine, as well as any diluents which may be used, such as helium, enter the reactor oven through 22, pass through a tube, 23, through fritted glass, 24, and over aluminum or zirconium wire, 25. The vessel may be heated with tape, 26, or in a furnace, and insulated with vermiculite insulation, 27. The resultant aluminum chloride, and any diluent which may be used, exit through 28 and are then transmitted to a reactant injector which is heated to prevent condensation. The reactant injector is shown in FIG. 3 where the aluminum halide and associated diluents enter through 31. Other reactants such as silicon tetrachloride, POCl3 and oxygen enter through 32. The two different groups of reactants are shown separated to prevent premature reaction. Heating tape, 33, surrounds the injector through which the aluminum halide is passed to prevent condensation. 34 is a rotating seal comprising a stationary part, 35, and a rotating part, 36. Purge gas is passed through the stationary part at 37 to prevent contamination of the reactant gas with ambient air. 38 is the downstream lathe head stock and chucks used in the MCVD process, and 39 is an appropriate ribbon burner. 40 is an exemplary 16 millimeter O.D. tube used to feed reactant gas to the reaction tube, and 41 is the MCVD substrate tube, in the particular embodiment discussed below, a silica tube of 19 mm I.D. x 25 mm O.D. dimension.
FIG. 4 is a loss diagram for exemplary fibers fabricated according to the teachings of this invention. Example Optical fiber preforms were made using a standard
MCVD lathe and delivery system with the addition of an AlCl2 generator (FIG. 2) and a hot reactant injector
(FIG. 3). Pure AlC l3 was generated by passing high purity chlorine (Airco research grade) over Marz grade aluminum wire (5-9's containing transition metals at less than 1 ppm) heated to 300 degrees Celsius in a Pyrex vessel (21 in FIG. 2). The chlorine flow was controlled from 5 to 100 cc/min. to regulate the amount of AnCl3 generated and was diluted by 300 cc/min. of helium to provide a mixture dew point high enough to be delivered by the injection tube heated to 200 degrees Celsius. The hot injection system (FIG. 3), designed around a rotating Teflon seal provided the heated line necessary to deliver the AlCl3-He mixture to a region near the upstream turnaround point of the deposition torch. It is advantageous to deliver the AlCl3 separately from the POCl3, SiCl4 and O2 to avoid clogging of the lines where the chlorides mix and to prevent a particulate deposit upstream. When formed, this has a tendency to detach during deposition causing an inhomogeneous deposit downstream.
Deposition was carried out in waveguide grade 19 mm I.D. x 25 mm O.D. silica tubes using a single water-cooled torch for deposition and collapse. Deposit conditions are outlined in Table III.
- 13
Temperature 150°C; Chlorine 10-50 cc/min; 5 cc/min. increment/pass; Helium 300 cc/min.
Before each deposition run, reaction of the aluminum wire (heated to 300 degrees Celsius) was initiated by passing chlorine and helium over it until a visible amount of AlCl3 could be condensed inside the substrate tube. The condensed AlCl3 was then sublimed while helium continued to purge the generator. We believe this practice
prepared the surface of the aluminum wire in the generator to allow controlled delivery of A lC I3 when required. Deposition of a B2O3-SiO2 barrier and a Al2O3-P2O5-SiO2 core proceeded much the same as usual. During collapse, however, the low viscosity of the core composition required that considerable back pressure be applied to ensure a circular core.
The attenuation of two Al2O3-P2O5-SiO2 core fibers are presented in FIG. 4. These fibers had numerical apertures of 0.16 and 0.27 and minimum losses of 2 dB/km and 8 dB/km at 1.15 μm respectively. We attribute these losses, lower than previously reported work, to the purity of the A lC l3 generated by the reaction/injection method and the reduced tendency of the ternary Al2O3-P2O5-SiO2 glass system to devitrify. The higher the doping level the greater the tendency to devitrify, and consequently greater quenching and/or addition of more third component, such as P2O5 is necessary. Applicants find that the inclusion of phosphorus suppresses the tendency of the alumina deposited silica glass to devitrify. Although the inclusion of phosphorus tends to lower the viscosity of the resultant melt and hence would tend to indicate more likely devitrification, applicants find less likelihood of devitrification. The P2O5-Al2O3-SiO2 system contains the phase (AlPO4) which is an isomorph of silica. The incorporation of Al in the AlPO4 groups effectively diminishes the tendency to form mullite crystals which are thought to be responsible for devitrification.
Reduction of OH- concentrations to levels even below those typically observed in GeO2-SiO2 fibers i s possible using this invention. As revealed by Table I the oxide of aluminum is more stable at deposition temperatures than GeO2. Thus the reaction will even occur at increased Cl2 levels leading to the possibility of adding more Cl2 during deposition, or operation at reduced O2 levels to yield very low OH fibers. This can potentially lead to yet lower levels of hydroxyl concentrations which are
controlled by the reaction:
As revealed by Tables I and II the thermodynamic characteristics of zirconium oxide are even more favorable than those of aluminum oxide. We have made fibers using
ZrCl4 as the reactant, and the tendency to devitrify is greater than with alumina.
Claims
1. An optical fiber transmission line comprising a core and a cladding, at least the core of the fiber comprises silica and a dopant,
CHARACTERIZED IN THAT silica is present in said at least the core in an amount of more than 80 weight percent and the dopant is a nonglass forming refractory oxide selected from alumina and zirconia.
2. The fiber according to claim 1, CHARACTERIZED IN THAT alumina is present in an amount of more than 5 mole percent.
3. The fiber according to claim 1, CHARACTERIZED IN THAT alumina is present in an amount of more than
7 mole percent.
4. The fiber according to claim 1, CHARACTERIZED IN THAT alumina is present in an amount of more than 10 mole percent.
5. The fiber according to claim 1 CHARACTERIZED IN THAT said at least the core of the fiber includes at least one additional glass forming dopant.
6. The fiber according to claim 5,
CHARACTERIZED IN THAT said at least one additional dopant is P2 O5.
7. A process for fabrication of an optical fiber transmission line according to any one of preceding claims 1-6, which comprises the steps of introducing a moving stream of a vapor mixture including at least one compound glass-forming precursor together with an oxidizing medium into a tube while heating the tube so as to react the said mixture and produce a glassy deposit on the inner surface of the tube, heating of tube and contents by a moving hot zone produced by a correspondingly moving heat source external to the tube, the temperature within the hot zone, composition of the vapor mixture, and rate of introduction of the vapor mixture being maintained at values such that at least a part of the reaction takes place within the gaseous mixture at a position spaced from the inner walls of the said tube thereby producing a suspension of oxidic reaction product particulate material, which deposits on the inner surface of the tube consolidating said particulate material to produce said glassy deposit on the inner surface of the tube
CHARACTERIZED IN THAT the vapor mixture comprises aluminum or zirconium.
8. A method according to claim 7,
CHARACTERIZED BY forming an aluminum or zirconium containing vapor by passing a halide over aluminum or zirconium wire, and reacting the aluminum or zirconium containing vapor to form an optical fiber.
9. The method according to claim 7 or 8,
CHARACTERIZED IN THAT the fiber comprises greater than 80 weight percent silica 10. The method according to claim 9,
CHARACTERIZED IN THAT at least the core of the fiber comprises more than 5 mole percent of alumina.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE8383901459T DE3374555D1 (en) | 1982-04-09 | 1983-03-14 | Doped optical fiber |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36709182A | 1982-04-09 | 1982-04-09 | |
US367,091820409 | 1982-04-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1983003599A1 true WO1983003599A1 (en) | 1983-10-27 |
Family
ID=23445902
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1983/000334 WO1983003599A1 (en) | 1982-04-09 | 1983-03-14 | Doped optical fiber |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0105325B1 (en) |
JP (1) | JPH0247421B2 (en) |
CA (1) | CA1239042A (en) |
DE (1) | DE3374555D1 (en) |
GB (1) | GB2118320B (en) |
WO (1) | WO1983003599A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100788120B1 (en) * | 2000-09-26 | 2007-12-21 | 란세스 도이치란트 게엠베하 | Contact and adsorber granulates |
US8381549B2 (en) | 2006-06-26 | 2013-02-26 | Sumitomo Electric Industries, Ltd. | Optical fiber preform fabricating method |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3427323A1 (en) * | 1984-07-25 | 1986-03-27 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | METHOD FOR PRODUCING A AEROSOL FLOW |
IT1180127B (en) * | 1984-11-13 | 1987-09-23 | Cselt Centro Studi Lab Telecom | PROCEDURE FOR THE PRODUCTION OF FIBER OPTICS IN SILICA DROGATED WITH ALUMINUM |
IT1184068B (en) * | 1985-04-10 | 1987-10-22 | Cselt Centro Studi Lab Telecom | PROCEDURE FOR THE PRODUCTION OF OPTICAL FIBERS IN SILICA DROGATED WITH ALUMINUM USING METALLORGANIC REAGENTS |
US4830463A (en) * | 1988-02-08 | 1989-05-16 | American Telephone And Telegraph Company, At&T Bell Laboratories | Article comprising silica-based glass containing aluminum and phorphorus |
IT1219404B (en) * | 1988-06-27 | 1990-05-11 | Sip | PROCEDURE AND EQUIPMENT FOR THE MANUFACTURE OF FIBER OPTICS IN SILICA |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1049586A (en) * | 1963-04-11 | 1966-11-30 | Horizons Inc | Improvements in or relating to glass fibres for optical devices |
USRE28029E (en) * | 1972-01-03 | 1974-06-04 | Method of forming optical waveguide fibers | |
US3841882A (en) * | 1971-02-08 | 1974-10-15 | Owens Corning Fiberglass Corp | Cladding glass compositions for light transmitting glass fibers |
US3853384A (en) * | 1973-04-16 | 1974-12-10 | Bell Telephone Labor Inc | Optical transmission line |
JPS533352A (en) * | 1976-06-30 | 1978-01-13 | Toshiba Corp | Glass fibre for optical communication |
US4217027A (en) * | 1974-02-22 | 1980-08-12 | Bell Telephone Laboratories, Incorporated | Optical fiber fabrication and resulting product |
US4264131A (en) * | 1978-05-16 | 1981-04-28 | Tokyo Shibaura Denki Kabushiki Kaisha | Optical fiber of high durability prepared from multicomponent glass |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4089586A (en) * | 1976-06-23 | 1978-05-16 | Bell Telephone Laboratories, Incorporated | Single mode optical transmission line |
JPS53135655A (en) * | 1977-04-29 | 1978-11-27 | Int Standard Electric Corp | Highly pure optical fiber with numerous open face |
JPS54143242A (en) * | 1978-04-28 | 1979-11-08 | Kokusai Denshin Denwa Co Ltd | Optical fiber |
US4262131A (en) * | 1979-04-02 | 1981-04-14 | The Upjohn Company | 19-Hydroxy-inter-phenylene-PG1 componds |
-
1983
- 1983-03-14 WO PCT/US1983/000334 patent/WO1983003599A1/en active IP Right Grant
- 1983-03-14 JP JP50158083A patent/JPH0247421B2/en not_active Expired - Lifetime
- 1983-03-14 EP EP83901459A patent/EP0105325B1/en not_active Expired
- 1983-03-14 DE DE8383901459T patent/DE3374555D1/en not_active Expired
- 1983-04-07 GB GB8309434A patent/GB2118320B/en not_active Expired
- 1983-04-08 CA CA000425533A patent/CA1239042A/en not_active Expired
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1049586A (en) * | 1963-04-11 | 1966-11-30 | Horizons Inc | Improvements in or relating to glass fibres for optical devices |
US3841882A (en) * | 1971-02-08 | 1974-10-15 | Owens Corning Fiberglass Corp | Cladding glass compositions for light transmitting glass fibers |
USRE28029E (en) * | 1972-01-03 | 1974-06-04 | Method of forming optical waveguide fibers | |
US3853384A (en) * | 1973-04-16 | 1974-12-10 | Bell Telephone Labor Inc | Optical transmission line |
US4217027A (en) * | 1974-02-22 | 1980-08-12 | Bell Telephone Laboratories, Incorporated | Optical fiber fabrication and resulting product |
US4217027B1 (en) * | 1974-02-22 | 1986-07-15 | ||
JPS533352A (en) * | 1976-06-30 | 1978-01-13 | Toshiba Corp | Glass fibre for optical communication |
US4264131A (en) * | 1978-05-16 | 1981-04-28 | Tokyo Shibaura Denki Kabushiki Kaisha | Optical fiber of high durability prepared from multicomponent glass |
Non-Patent Citations (6)
Title |
---|
Electronics Letters, issued 03 October 1974, Vol. 10, No. 20, S. KOBAYASHI et al , Low-Loss Optical Glass Fibre with A12O3-SIO2 Core, pp. 410-411. * |
Journal of the American Ceramic Society, issued January 1969, Vol. 52, No.1, J.F. MacDOWELL et al, Immiscibility and Crystallization in AL2O3-SIO2 Glasses, pp. 17-25. * |
Journal of the American Ceramic Society, issued November 1970, Vol. 53, No. 11, H.S. PARKER et al, Vapor Growth of A12O3 Bicrystals, p.583. * |
Journal of the American Ceramic Society, issued November 1970, Vol. 53, No. 11, P. WONG et al, Chemical Vapor Deposition of Polycrystalline A12O3, pp. 617-621. * |
Journal of the American Ceramic Society, issued September-October 1975, Vol. 58, No. 9-10, K. NASSAU et al, Preparation and Properties of Fused Silica Containing Alumina, p. 461. * |
Proceedings of the IEE, issued July 1966, Vol. 113, No. 7, K.C. KAO et al, Dielectric Fibre Surface Waveguides for Optical Frequencies, pp. 1151-1158. * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100788120B1 (en) * | 2000-09-26 | 2007-12-21 | 란세스 도이치란트 게엠베하 | Contact and adsorber granulates |
US8381549B2 (en) | 2006-06-26 | 2013-02-26 | Sumitomo Electric Industries, Ltd. | Optical fiber preform fabricating method |
Also Published As
Publication number | Publication date |
---|---|
GB2118320A (en) | 1983-10-26 |
JPH0247421B2 (en) | 1990-10-19 |
JPS59500513A (en) | 1984-03-29 |
CA1239042A (en) | 1988-07-12 |
DE3374555D1 (en) | 1987-12-23 |
EP0105325B1 (en) | 1987-11-19 |
EP0105325A1 (en) | 1984-04-18 |
EP0105325A4 (en) | 1984-08-10 |
GB2118320B (en) | 1986-12-03 |
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