UST946003I4 - - Google Patents

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Publication number
UST946003I4
UST946003I4 US55661075A UST946003I4 US T946003 I4 UST946003 I4 US T946003I4 US 55661075 A US55661075 A US 55661075A US T946003 I4 UST946003 I4 US T946003I4
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US
United States
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to US55661075 priority Critical patent/UST946003I4/en
Application granted granted Critical
Publication of UST946003I4 publication Critical patent/UST946003I4/en
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
US55661075 1975-03-10 1975-03-10 Pending UST946003I4 (en))

Priority Applications (1)

Application Number Priority Date Filing Date Title
US55661075 UST946003I4 (en)) 1975-03-10 1975-03-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US55661075 UST946003I4 (en)) 1975-03-10 1975-03-10

Publications (1)

Publication Number Publication Date
UST946003I4 true UST946003I4 (en)) 1976-05-04

Family

ID=24222076

Family Applications (1)

Application Number Title Priority Date Filing Date
US55661075 Pending UST946003I4 (en)) 1975-03-10 1975-03-10

Country Status (1)

Country Link
US (1) UST946003I4 (en))

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519846A (en) 1984-03-08 1985-05-28 Seiichiro Aigo Process for washing and drying a semiconductor element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519846A (en) 1984-03-08 1985-05-28 Seiichiro Aigo Process for washing and drying a semiconductor element

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