UST900030I4 - Defensive publication - Google Patents

Defensive publication Download PDF

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Publication number
UST900030I4
UST900030I4 US900030DH UST900030I4 US T900030 I4 UST900030 I4 US T900030I4 US 900030D H US900030D H US 900030DH US T900030 I4 UST900030 I4 US T900030I4
Authority
US
United States
Prior art keywords
naphthalene
light
sulfonyl
oxo
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of UST900030I4 publication Critical patent/UST900030I4/en
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Definitions

  • naphthalene sensitizers include such materials as Z-diazo- 1,2-dehydro-1-oxo-5 [(2',2,2-tribromoethoxy) sulfonyl] naphthalene and 2-dia'zo-1,2-dehydro-1-oxo-5 [(2,2',2- trichloroethoxy) sulfonyl] naphthalene.
  • the light-sensitive compositions can be coated on support materials to prepare composite photographic elements which can be processed by contact with aqueous alkaline solutions.
  • the processed elements have utility as photolithographic printing masters and pho-toresists for etching operations.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
US900030D 1970-10-15 1971-07-06 Defensive publication Pending UST900030I4 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4910670 1970-10-15

Publications (1)

Publication Number Publication Date
UST900030I4 true UST900030I4 (en) 1972-07-25

Family

ID=10451166

Family Applications (1)

Application Number Title Priority Date Filing Date
US900030D Pending UST900030I4 (en) 1970-10-15 1971-07-06 Defensive publication

Country Status (3)

Country Link
US (1) UST900030I4 (OSRAM)
FR (1) FR2111292A5 (OSRAM)
GB (1) GB1331286A (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69105848T3 (de) * 1990-07-27 1998-02-19 Fuji Photo Film Co Ltd 2-Diazo-1,2-chinonverbindungen und Reproduktionsmaterialien, die diese Verbindungen enthalten.
WO2012148629A1 (en) 2011-03-31 2012-11-01 Ocv Intellectual Capital, Llc Microencapsulated curing agent
WO2013086109A1 (en) 2011-12-08 2013-06-13 Ocv Intellectual Capital, Llc Fiber reinforced resin molding compound and manufacturing method for fiber reinforced resin molded article therefrom

Also Published As

Publication number Publication date
GB1331286A (en) 1973-09-26
FR2111292A5 (OSRAM) 1972-06-02

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