UST105402I4 - Method for polishing amorphous aluminum oxide - Google Patents

Method for polishing amorphous aluminum oxide Download PDF

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Publication number
UST105402I4
UST105402I4 US06/603,263 US60326384A UST105402I4 US T105402 I4 UST105402 I4 US T105402I4 US 60326384 A US60326384 A US 60326384A US T105402 I4 UST105402 I4 US T105402I4
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United States
Prior art keywords
aluminum oxide
water
perfection
accomplished
amorphous aluminum
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Pending
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US06/603,263
Inventor
Jagtar S. Basi
Eric Mendel
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Priority to US06/603,263 priority Critical patent/UST105402I4/en
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Publication of UST105402I4 publication Critical patent/UST105402I4/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

A method for the chemical-mechanical polishing of amorphous aluminum oxide surfaces to a high degree of perfection is described. The aluminum oxide surfaces are continuously wetted with a water-citric acid slurry containing a soft abrasive material. The continuously wiping of the aluminum oxide surface is accomplished with a firm surface using pressure while maintaining a relative movement between the aluminum oxide surface and the firm surface to remove the water reacted aluminum oxide product from the high points of the aluminum oxide surface. This method is continued until a high degree of perfection of the surface is accomplished. The slurry is typically composed of colloidal silicon dioxide dispersed in water containing citric acid.
US06/603,263 1983-03-10 1984-04-23 Method for polishing amorphous aluminum oxide Pending UST105402I4 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US06/603,263 UST105402I4 (en) 1983-03-10 1984-04-23 Method for polishing amorphous aluminum oxide

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US47412083A 1983-03-10 1983-03-10
US06/603,263 UST105402I4 (en) 1983-03-10 1984-04-23 Method for polishing amorphous aluminum oxide

Related Parent Applications (1)

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US47412083A Continuation 1983-03-10 1983-03-10

Publications (1)

Publication Number Publication Date
UST105402I4 true UST105402I4 (en) 1985-05-07

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ID=27044359

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US06/603,263 Pending UST105402I4 (en) 1983-03-10 1984-04-23 Method for polishing amorphous aluminum oxide

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US (1) UST105402I4 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994028194A1 (en) * 1993-05-26 1994-12-08 Rodel, Inc. Improved compositions and methods for polishing
US5700383A (en) * 1995-12-21 1997-12-23 Intel Corporation Slurries and methods for chemical mechanical polish of aluminum and titanium aluminide
WO1998004646A1 (en) * 1996-07-25 1998-02-05 Ekc Technology, Inc. Chemical mechanical polishing composition and process
US5858813A (en) * 1996-05-10 1999-01-12 Cabot Corporation Chemical mechanical polishing slurry for metal layers and films
US20040134873A1 (en) * 1996-07-25 2004-07-15 Li Yao Abrasive-free chemical mechanical polishing composition and polishing process containing same
US20040140288A1 (en) * 1996-07-25 2004-07-22 Bakul Patel Wet etch of titanium-tungsten film
US20060118760A1 (en) * 2004-12-03 2006-06-08 Yang Andy C Slurry composition and methods for chemical mechanical polishing

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5391258A (en) * 1993-05-26 1995-02-21 Rodel, Inc. Compositions and methods for polishing
US5476606A (en) * 1993-05-26 1995-12-19 Rodel, Inc. Compositions and methods for polishing
WO1994028194A1 (en) * 1993-05-26 1994-12-08 Rodel, Inc. Improved compositions and methods for polishing
US5700383A (en) * 1995-12-21 1997-12-23 Intel Corporation Slurries and methods for chemical mechanical polish of aluminum and titanium aluminide
US5858813A (en) * 1996-05-10 1999-01-12 Cabot Corporation Chemical mechanical polishing slurry for metal layers and films
US6117783A (en) * 1996-07-25 2000-09-12 Ekc Technology, Inc. Chemical mechanical polishing composition and process
WO1998004646A1 (en) * 1996-07-25 1998-02-05 Ekc Technology, Inc. Chemical mechanical polishing composition and process
US6313039B1 (en) 1996-07-25 2001-11-06 Ekc Technology, Inc. Chemical mechanical polishing composition and process
US6635186B1 (en) 1996-07-25 2003-10-21 Ekc Technology, Inc. Chemical mechanical polishing composition and process
US20040134873A1 (en) * 1996-07-25 2004-07-15 Li Yao Abrasive-free chemical mechanical polishing composition and polishing process containing same
US20040140288A1 (en) * 1996-07-25 2004-07-22 Bakul Patel Wet etch of titanium-tungsten film
US20050266689A1 (en) * 1996-07-25 2005-12-01 Small Robert J Chemical mechanical polishing composition and process
US7314823B2 (en) 1996-07-25 2008-01-01 Dupont Airproducts Nanomaterials Llc Chemical mechanical polishing composition and process
US20060118760A1 (en) * 2004-12-03 2006-06-08 Yang Andy C Slurry composition and methods for chemical mechanical polishing

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