USH560H - Method of manufacturing dislocation and etch channel free quartz resonator blanks - Google Patents

Method of manufacturing dislocation and etch channel free quartz resonator blanks Download PDF

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Publication number
USH560H
USH560H US07/091,686 US9168687A USH560H US H560 H USH560 H US H560H US 9168687 A US9168687 A US 9168687A US H560 H USH560 H US H560H
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United States
Prior art keywords
dislocation
free
quartz
cultured
quartz stone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
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US07/091,686
Inventor
John Gualtieri
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United States Department of the Army
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United States Department of the Army
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Filing date
Publication date
Application filed by United States Department of the Army filed Critical United States Department of the Army
Priority to US07/091,686 priority Critical patent/USH560H/en
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Publication of USH560H publication Critical patent/USH560H/en
Assigned to UNITED STATES OF AMERICA, THE, AS REPRESENTED BY THE SECRETARY OF THE ARMY reassignment UNITED STATES OF AMERICA, THE, AS REPRESENTED BY THE SECRETARY OF THE ARMY ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: GUALTIERI, JOHN G.
Abandoned legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/18Quartz
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure

Definitions

  • This invention relates in general to a method of manufacturing dislocation and etch-channel-free quartz resonator blanks and in particular to a method of manufacturing dislocation and etch channel free quartz resonator blanks from a cultured quartz stone.
  • the quartz blanks will come from the Z-growth region of a cultured quartz stone. This is because of fewer impurities in the Z-region.
  • Z-seed plates are generally used for the next generation growth of quartz and are usually cut from the Z-region even though the Z-plate could have been cut from any region of a cultured quartz stone.
  • the Z-region is also structurally sounder than any of the other regions of the cultured quartz stone.
  • the general object of this invention is to provide a method of making a high stability quartz crystal resonator blank.
  • a more particular object of the invention is to provide such a method of making a dislocation and etch-channel-free blank from a cultured quartz stone.
  • Another object of the invention is to provide such a method wherein dislocations and resultant etch channels, caused by dislocations in the seed plate can be eliminated.
  • the dislocation and etch-channel free areas of the cultured quartz stone are visualized by a suitable means as for example, X-ray topography, the seed plates cut from the dislocation-free areas, quartz grown from the dislocation-free seed plates, and the dislocation-free quartz resonator blanks then cut from the quartz.
  • the drawing is a schematic of a Y-cut section of cultured quartz as visualized by X-ray topography or by the etching of Y-cut test sections.
  • 1 shows growth sector and seed boundaries
  • 2 shows mineralizer-etched cavities
  • 3 shows dislocations
  • 4 shows possible Z-plate seed locations.
  • the seed area is enlarged to show detail. Since dislocation directions are roughly parallel to the growth direction in each growth sector, areas close to the sector boundaries are free of dislocations. Prospective Z-seed plate areas are shown for each sector.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

Dislocation and etch channel-free quartz resonator blanks are made from a cultured quartz stone by visualizing the dislocation-free areas of the cultured quartz stone by X-ray topography, cutting seed plates for the next generation of crystal growth from the dislocation-free areas of the cultured quartz stone, growing dislocation free quartz from said seed plates using conventional growth techniques, and cutting dislocation-free quartz resonator blanks from said dislocation-free quartz.

Description

The invention described herein may be manufactured, used, and licensed by or for the Government for governmental purposes without the payment to me of any royalty thereon.
This invention relates in general to a method of manufacturing dislocation and etch-channel-free quartz resonator blanks and in particular to a method of manufacturing dislocation and etch channel free quartz resonator blanks from a cultured quartz stone.
BACKGROUND OF THE INVENTION
It is generally accepted that for resonator applications, the quartz blanks will come from the Z-growth region of a cultured quartz stone. This is because of fewer impurities in the Z-region. Z-seed plates are generally used for the next generation growth of quartz and are usually cut from the Z-region even though the Z-plate could have been cut from any region of a cultured quartz stone. The Z-region is also structurally sounder than any of the other regions of the cultured quartz stone.
However, the dislocations in the Z-region run roughly parallel (within 15°) to Z. Therefore, these dislocations run roughly perpendicular to the Z-plate.
SUMMARY OF THE INVENTION
The general object of this invention is to provide a method of making a high stability quartz crystal resonator blank. A more particular object of the invention is to provide such a method of making a dislocation and etch-channel-free blank from a cultured quartz stone. Another object of the invention is to provide such a method wherein dislocations and resultant etch channels, caused by dislocations in the seed plate can be eliminated.
It has now been found that the aforementioned objects can be attained by taking the seed plates from the dislocation-free areas of a cultured quartz stone.
More particularly, according to the invention, the dislocation and etch-channel free areas of the cultured quartz stone are visualized by a suitable means as for example, X-ray topography, the seed plates cut from the dislocation-free areas, quartz grown from the dislocation-free seed plates, and the dislocation-free quartz resonator blanks then cut from the quartz.
DESCRIPTION OF THE DRAWING
The drawing is a schematic of a Y-cut section of cultured quartz as visualized by X-ray topography or by the etching of Y-cut test sections.
Referring to the drawing, 1 shows growth sector and seed boundaries, 2 shows mineralizer-etched cavities, 3 shows dislocations, and 4 shows possible Z-plate seed locations. The seed area is enlarged to show detail. Since dislocation directions are roughly parallel to the growth direction in each growth sector, areas close to the sector boundaries are free of dislocations. Prospective Z-seed plate areas are shown for each sector.
As seen in the drawing, there are areas in either the X-or Z-growth sectors which should be free of dislocations. Seed plates cut from these areas should not produce mineralizer-etched cavities or dislocations/etch channels in the Z-growth regions during growth.
I wish it to be understood that I do not desire to be limited to the exact details as described for obvious modifications will occur to a person skilled in the art.

Claims (7)

What is claimed is:
1. Method of manufacturing dislocation and etch channel-free quartz resonator blanks from a non dislocation-free quartz stone, comprising locating dislocation and etch channel-free areas in the x and z regions of the non dislocation-free quartz stone that are outside of ±15° from the normals to the original seed boundary using y-test plates, cutting seed plates for the next generation of crystal growth from the dislocation-free areas of the non disclosure-free quartz stone, and growing dislocation free quartz from said seed plates using conventional cultured quartz growth techniques.
2. Method according to claim 1 wherein said quartz stone is a cultured quartz stone.
3. Method according to claim 2 wherein the seed plate is a Z-seed plate.
4. Method according to claim 3 wherein the Z-seed plate is cut out of the Z-growth region of the cultured quartz stone.
5. Method according to claim 3 wherein the Z-seed plate is cut out of the X-growth region of the cultured quartz stone.
6. Method according to claim 2 wherein the dislocation-free areas of the cultured quartz are visualized by X-ray topography.
7. Method according to claim 2 wherein the dislocation-free areas of the cultured quartz stone are located by the etching of Y-cut test sections.
US07/091,686 1987-08-31 1987-08-31 Method of manufacturing dislocation and etch channel free quartz resonator blanks Abandoned USH560H (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US07/091,686 USH560H (en) 1987-08-31 1987-08-31 Method of manufacturing dislocation and etch channel free quartz resonator blanks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/091,686 USH560H (en) 1987-08-31 1987-08-31 Method of manufacturing dislocation and etch channel free quartz resonator blanks

Publications (1)

Publication Number Publication Date
USH560H true USH560H (en) 1988-12-06

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US07/091,686 Abandoned USH560H (en) 1987-08-31 1987-08-31 Method of manufacturing dislocation and etch channel free quartz resonator blanks

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997022738A1 (en) * 1995-12-20 1997-06-26 Motorola Inc. St-cut and at-cut oriented seed bodies for quartz crystal synthesis and method for making the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3291575A (en) 1965-01-27 1966-12-13 Sawyer Res Products Inc Method for growth of pegmatitic quartz crystals in a controlled axial direction
US3576608A (en) 1967-10-16 1971-04-27 Aiken Ind Inc Hydrothermal synthesis of quartz utilizing x-cut seed plate elongated on the crystallographic z axis
US3917506A (en) 1971-08-30 1975-11-04 Motorola Inc Method of growing quartz crystals and seed plate therefor
US3976535A (en) 1975-05-27 1976-08-24 Bell Telephone Laboratories, Incorporated Screening seeds for quartz growth
US4255228A (en) 1979-01-05 1981-03-10 The United States Of America As Represented By The Secretary Of The Army Method of growing quartz
US4576808A (en) 1983-12-28 1986-03-18 The United States Of America As Represented By The Secretary Of The Air Force Quartz growth on X-seeds

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3291575A (en) 1965-01-27 1966-12-13 Sawyer Res Products Inc Method for growth of pegmatitic quartz crystals in a controlled axial direction
US3576608A (en) 1967-10-16 1971-04-27 Aiken Ind Inc Hydrothermal synthesis of quartz utilizing x-cut seed plate elongated on the crystallographic z axis
US3917506A (en) 1971-08-30 1975-11-04 Motorola Inc Method of growing quartz crystals and seed plate therefor
US3976535A (en) 1975-05-27 1976-08-24 Bell Telephone Laboratories, Incorporated Screening seeds for quartz growth
US4255228A (en) 1979-01-05 1981-03-10 The United States Of America As Represented By The Secretary Of The Army Method of growing quartz
US4576808A (en) 1983-12-28 1986-03-18 The United States Of America As Represented By The Secretary Of The Air Force Quartz growth on X-seeds

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Barns et al., "Production and Perfection of `Z-Face` Quartz", J. Crys. Grh, 34 (1976), 189-197.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997022738A1 (en) * 1995-12-20 1997-06-26 Motorola Inc. St-cut and at-cut oriented seed bodies for quartz crystal synthesis and method for making the same
US5714005A (en) * 1995-12-20 1998-02-03 Motorola Inc. ST-cut and AT-cut oriented seed bodies for quartz crystal synthesis and method for making the same

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Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:GUALTIERI, JOHN G.;REEL/FRAME:005031/0578

Effective date: 19870826