USD173996S - Exposure meter - Google Patents

Exposure meter Download PDF

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Publication number
USD173996S
USD173996S US D173996 S USD173996 S US D173996S
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US
United States
Prior art keywords
exposure meter
milwaukee
united states
elevational view
view
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Inventor
Joseph Palma
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G
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United States Patent 0 Des. 173,996 C Patented Feb. 8, 1955 EXPOSURE METER Joseph Palma, Jr., Berwyu, 11]., and Courtney A. Leubner, Milwaukee, Wis., assignors to G. M. Laboratories Inc., Chicago, Ill., a corporation of Illinois Application July 9, 1953, Serial No. 25,854
Term of patent 7 years (Cl. D61-1) To all whom it may concern:
Be it known that we, Joseph Palma, In, and Courtney A. Leubner, citizens of the United States, and residents respectively of Berwyn, Cook County, State of Illinois, and Milwaukee, Milwaukee County, State of Wisconsin, have invented a new, original, and ornamental Design for Exposure Meter, of which the following is a specification, reference Bing had to the accompanying drawing, forming a part thereof.
Fig. 1 is a front elevational view of an exposure meter, showing our design;
Fig. 2 is a rear elevational view thereof;
Fig. 3 is a side elevational view thereof;
Fig. 4 is a top plan view thereof; and
Fig. 5 is a bottom plan view thereof.
The dominant feature of our design resides in the portions shown in full lines.
We claim: The ornamental design for an exposure meter as shown and described.
References Cited in the file of this patent UNITED STATES PATENTS Bakke June 2, 1953 Kerr et al. June 2, 1953 OTHER REFERENCES

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