USB778836I5 - - Google Patents

Info

Publication number
USB778836I5
USB778836I5 US778836DD USB778836I5 US B778836 I5 USB778836 I5 US B778836I5 US 778836D D US778836D D US 778836DD US B778836 I5 USB778836 I5 US B778836I5
Authority
US
United States
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of USB778836I5 publication Critical patent/USB778836I5/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/944—Shadow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/945—Special, e.g. metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
US778836D 1958-12-08 Pending USB778836I5 (en)van)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US778836A US2969296A (en) 1958-12-08 1958-12-08 Thermal expansion fixture for spacing vaporized contacts on semiconductor devices

Publications (1)

Publication Number Publication Date
USB778836I5 true USB778836I5 (en)van)

Family

ID=25114542

Family Applications (2)

Application Number Title Priority Date Filing Date
US778836D Pending USB778836I5 (en)van) 1958-12-08
US778836A Expired - Lifetime US2969296A (en) 1958-12-08 1958-12-08 Thermal expansion fixture for spacing vaporized contacts on semiconductor devices

Family Applications After (1)

Application Number Title Priority Date Filing Date
US778836A Expired - Lifetime US2969296A (en) 1958-12-08 1958-12-08 Thermal expansion fixture for spacing vaporized contacts on semiconductor devices

Country Status (1)

Country Link
US (2) US2969296A (en)van)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3167451A (en) * 1959-08-26 1965-01-26 Sprague Electric Co Method of resistor production
FR1148316A (fr) * 1959-10-20 1957-12-06 Thomson Houston Comp Francaise Procédé et appareil pour la réalisation de circuits imprimés
US3066053A (en) * 1960-02-01 1962-11-27 Sylvania Electric Prod Method for producing semiconductor devices
US3092522A (en) * 1960-04-27 1963-06-04 Motorola Inc Method and apparatus for use in the manufacture of transistors
US3158504A (en) * 1960-10-07 1964-11-24 Texas Instruments Inc Method of alloying an ohmic contact to a semiconductor
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components
US3093507A (en) * 1961-10-06 1963-06-11 Bell Telephone Labor Inc Process for coating with silicon dioxide
US3207126A (en) * 1961-11-14 1965-09-21 Byron Ernest Mask changer means for vacuum deposition device
US3230109A (en) * 1961-12-18 1966-01-18 Bell Telephone Labor Inc Vapor deposition method and apparatus
US3161542A (en) * 1961-12-29 1964-12-15 Ibm Peltier heating and cooling of substrates and masks
US3276423A (en) * 1963-10-04 1966-10-04 David P Triller Pattern mask for use in making thin film circuitry
NL132313C (en)van) * 1964-12-17 1900-01-01
US3401055A (en) * 1964-12-31 1968-09-10 Ibm Vapor depositing solder
US3356069A (en) * 1966-05-16 1967-12-05 Conforming Matrix Corp Spray painting apparatus including a workholder, mask and aligning means therefor
US3453501A (en) * 1966-08-10 1969-07-01 Philco Ford Corp Metallization of silicon semiconductor devices for making ohmic connections thereto
US3502051A (en) * 1966-09-01 1970-03-24 George D Adams Vacuum deposition apparatus
US4372248A (en) * 1981-09-21 1983-02-08 Applied Magnetics-Magnetic Head Division Corporation Apparatus for accurately registering a member and a substrate in an interdependent relationship
US4676193A (en) * 1984-02-27 1987-06-30 Applied Magnetics Corporation Stabilized mask assembly for direct deposition of a thin film pattern onto a substrate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE430527A (en)van) * 1937-10-07
US2286819A (en) * 1940-09-28 1942-06-16 Eastman Kodak Co Nonreflecting coating for glass
US2453582A (en) * 1944-06-09 1948-11-09 Libbey Owens Ford Glass Co Apparatus for making pattern mirrors and other coatings
US2482329A (en) * 1946-05-27 1949-09-20 Rca Corp Apparatus for selective vapor coating
US2634322A (en) * 1949-07-16 1953-04-07 Rca Corp Contact for semiconductor devices
US2804405A (en) * 1954-12-24 1957-08-27 Bell Telephone Labor Inc Manufacture of silicon devices
US2766144A (en) * 1955-10-31 1956-10-09 Lidow Eric Photocell

Also Published As

Publication number Publication date
US2969296A (en) 1961-01-24

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