USB486304I5 - - Google Patents

Info

Publication number
USB486304I5
USB486304I5 US486304DD USB486304I5 US B486304 I5 USB486304 I5 US B486304I5 US 486304D D US486304D D US 486304DD US B486304 I5 USB486304 I5 US B486304I5
Authority
US
United States
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of USB486304I5 publication Critical patent/USB486304I5/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Chemical Vapour Deposition (AREA)
US486304D 1966-12-15 Pending USB486304I5 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60209966A 1966-12-15 1966-12-15

Publications (1)

Publication Number Publication Date
USB486304I5 true USB486304I5 (ko)

Family

ID=24409961

Family Applications (2)

Application Number Title Priority Date Filing Date
US486304D Pending USB486304I5 (ko) 1966-12-15
US602099A Expired - Lifetime US3453412A (en) 1966-12-15 1966-12-15 Apparatus for producing proportioned admixtures of gaseous components

Family Applications After (1)

Application Number Title Priority Date Filing Date
US602099A Expired - Lifetime US3453412A (en) 1966-12-15 1966-12-15 Apparatus for producing proportioned admixtures of gaseous components

Country Status (1)

Country Link
US (2) US3453412A (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0058571A1 (en) * 1981-02-18 1982-08-25 National Research Development Corporation Method and apparatus for delivering a controlled flow rate of reactant to a vapour deposition process
US5078092A (en) * 1989-12-22 1992-01-07 Corning Incorporated Flash vaporizer system for use in manufacturing optical waveguide fiber
US5470441A (en) * 1994-03-07 1995-11-28 Phillips Petroleum Company Packed column vaporizer and vaporizing process

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1456986A (en) * 1923-05-29 Gas generator for internal combustion engines
US2127880A (en) * 1934-03-28 1938-08-23 Ferrolene Oxygen Co Of Ohio Apparatus for the production of combustible gas
US2186152A (en) * 1938-06-17 1940-01-09 Joseph Fuhringer Vaporizing device
US2334926A (en) * 1940-03-21 1943-11-23 Bailey Meter Co Measuring apparatus
US2446309A (en) * 1946-05-28 1948-08-03 John A Starr Gas generator
US2789062A (en) * 1952-04-03 1957-04-16 Gen Electric Transparent fluoride luminescent screen and method for preparing same
US2805921A (en) * 1955-08-01 1957-09-10 Du Pont Production of tio2
US2982528A (en) * 1958-06-13 1961-05-02 Maurice R Shirley Vapor fuel system
US3055750A (en) * 1959-10-20 1962-09-25 Carolis Julius J De Cold weather starting apparatus for diesel engines
US3107719A (en) * 1960-04-18 1963-10-22 Daniel F Buckley Apparatus to convert oil to gas
US3188230A (en) * 1961-03-16 1965-06-08 Alloyd Corp Vapor deposition process and device

Also Published As

Publication number Publication date
US3453412A (en) 1969-07-01

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