USB462893I5 - - Google Patents

Info

Publication number
USB462893I5
USB462893I5 US46289374A USB462893I5 US B462893 I5 USB462893 I5 US B462893I5 US 46289374 A US46289374 A US 46289374A US B462893 I5 USB462893 I5 US B462893I5
Authority
US
United States
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to US05/462,893 priority Critical patent/US3984253A/en
Publication of USB462893I5 publication Critical patent/USB462893I5/en
Application granted granted Critical
Publication of US3984253A publication Critical patent/US3984253A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
US05/462,893 1974-04-22 1974-04-22 Imaging processes and elements therefor Expired - Lifetime US3984253A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US05/462,893 US3984253A (en) 1974-04-22 1974-04-22 Imaging processes and elements therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/462,893 US3984253A (en) 1974-04-22 1974-04-22 Imaging processes and elements therefor

Publications (2)

Publication Number Publication Date
USB462893I5 true USB462893I5 (en) 1976-02-24
US3984253A US3984253A (en) 1976-10-05

Family

ID=23838155

Family Applications (1)

Application Number Title Priority Date Filing Date
US05/462,893 Expired - Lifetime US3984253A (en) 1974-04-22 1974-04-22 Imaging processes and elements therefor

Country Status (1)

Country Link
US (1) US3984253A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4138508A (en) 1976-06-17 1979-02-06 The Mead Corporation Process for producing pressure-sensitive transfer sheets using novel radiation curable coatings
US4296947A (en) 1976-06-17 1981-10-27 The Mead Corporation Pressure-sensitive transfer sheets using novel radiation curable coatings
EP0295344A1 (en) * 1985-11-20 1988-12-21 The Mead Corporation Imaging material and an image-forming process

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
DE2718254C3 (en) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Radiation-sensitive copying paste
US4288531A (en) * 1978-12-20 1981-09-08 Eastman Kodak Company Imaging elements
US4356252A (en) * 1979-12-26 1982-10-26 E. I. Du Pont De Nemours And Company Photosensitive negative-working tonable element
US4294909A (en) * 1979-12-26 1981-10-13 E. I. Du Pont De Nemours And Company Photosensitive negative-working toning process
US4365019A (en) * 1981-08-06 1982-12-21 Eastman Kodak Company Positive-working resist quinone diazide containing composition and imaging method having improved development rates
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4788125A (en) * 1985-11-20 1988-11-29 The Mead Corporation Imaging materials employing microparticles including a silver initiator
US4675270A (en) * 1986-02-10 1987-06-23 Loctite (Ireland) Limited Imaging method for vapor deposited photoresists of anionically polymerizable monomer
DE3621376A1 (en) * 1986-06-26 1988-01-07 Hoechst Ag RADIATION-SENSITIVE RECORDING MATERIAL
US4983363A (en) * 1987-03-24 1991-01-08 Advanced Technology Materials, Inc. Apparatus for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
US4781900A (en) * 1987-03-24 1988-11-01 Advanced Technology Materials, Inc. Process and composition for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
US4761395A (en) * 1987-03-24 1988-08-02 Advanced Technology Materials, Inc. Process and composition for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
US4876172A (en) * 1987-05-20 1989-10-24 The Mead Corporation Imaging method employing photoadhesive microparticles
DE3737734A1 (en) * 1987-11-06 1989-05-18 Hoechst Ag RADIATION-SENSITIVE MIXTURE
DE69123932T2 (en) * 1990-10-18 1997-05-22 Canon Kk Manufacturing process of an ink jet print head
US8450043B2 (en) 2010-09-30 2013-05-28 International Business Machines Corporation Patterning nano-scale patterns on a film comprising unzipping copolymers
US8323870B2 (en) * 2010-11-01 2012-12-04 Taiwan Semiconductor Manufacturing Company, Ltd. Method and photoresist with zipper mechanism
GB2501681A (en) * 2012-04-30 2013-11-06 Ibm Nanoimprint lithographic methods

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892712A (en) * 1954-04-23 1959-06-30 Du Pont Process for preparing relief images
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4138508A (en) 1976-06-17 1979-02-06 The Mead Corporation Process for producing pressure-sensitive transfer sheets using novel radiation curable coatings
US4296947A (en) 1976-06-17 1981-10-27 The Mead Corporation Pressure-sensitive transfer sheets using novel radiation curable coatings
EP0295344A1 (en) * 1985-11-20 1988-12-21 The Mead Corporation Imaging material and an image-forming process

Also Published As

Publication number Publication date
US3984253A (en) 1976-10-05

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