USB433892I5 - - Google Patents
Info
- Publication number
- USB433892I5 USB433892I5 US43389274A USB433892I5 US B433892 I5 USB433892 I5 US B433892I5 US 43389274 A US43389274 A US 43389274A US B433892 I5 USB433892 I5 US B433892I5
- Authority
- US
- United States
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/433,892 US4016061A (en) | 1971-03-11 | 1974-01-16 | Method of making resistive films |
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JA46-13829 | 1971-03-11 | ||
| JP46013829A JPS5110677B1 (en) | 1971-03-11 | 1971-03-11 | |
| JA46-15274 | 1971-03-17 | ||
| JP46015274A JPS5110679B1 (en) | 1971-03-17 | 1971-03-17 | |
| JP46015273A JPS5110678B1 (en) | 1971-03-17 | 1971-03-17 | |
| JA46-15273 | 1971-03-17 | ||
| US00227070A US3803057A (en) | 1971-03-11 | 1972-02-17 | Resistive materials and method of making such materials |
| US05/433,892 US4016061A (en) | 1971-03-11 | 1974-01-16 | Method of making resistive films |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US00227070A Division US3803057A (en) | 1971-03-11 | 1972-02-17 | Resistive materials and method of making such materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| USB433892I5 true USB433892I5 (en) | 1976-04-06 |
| US4016061A US4016061A (en) | 1977-04-05 |
Family
ID=27519564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US05/433,892 Expired - Lifetime US4016061A (en) | 1971-03-11 | 1974-01-16 | Method of making resistive films |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US4016061A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114086122A (en) * | 2021-11-26 | 2022-02-25 | 江苏科技大学 | Ceramic-based gradient plating layer based on high film-substrate binding force on copper substrate and preparation method thereof |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3545636A1 (en) * | 1985-12-21 | 1987-06-25 | Leybold Heraeus Gmbh & Co Kg | HARD MATERIAL COATING ON BASE |
| US5605609A (en) * | 1988-03-03 | 1997-02-25 | Asahi Glass Company Ltd. | Method for forming low refractive index film comprising silicon dioxide |
| US5060671A (en) * | 1989-12-01 | 1991-10-29 | Philip Morris Incorporated | Flavor generating article |
| US5224498A (en) * | 1989-12-01 | 1993-07-06 | Philip Morris Incorporated | Electrically-powered heating element |
| US5269327A (en) * | 1989-12-01 | 1993-12-14 | Philip Morris Incorporated | Electrical smoking article |
| US5093894A (en) * | 1989-12-01 | 1992-03-03 | Philip Morris Incorporated | Electrically-powered linear heating element |
| US5179966A (en) * | 1990-11-19 | 1993-01-19 | Philip Morris Incorporated | Flavor generating article |
| US5095921A (en) * | 1990-11-19 | 1992-03-17 | Philip Morris Incorporated | Flavor generating article |
| US5388594A (en) * | 1991-03-11 | 1995-02-14 | Philip Morris Incorporated | Electrical smoking system for delivering flavors and method for making same |
| US5573692A (en) * | 1991-03-11 | 1996-11-12 | Philip Morris Incorporated | Platinum heater for electrical smoking article having ohmic contact |
| US5505214A (en) * | 1991-03-11 | 1996-04-09 | Philip Morris Incorporated | Electrical smoking article and method for making same |
| US5665262A (en) * | 1991-03-11 | 1997-09-09 | Philip Morris Incorporated | Tubular heater for use in an electrical smoking article |
| US5249586A (en) * | 1991-03-11 | 1993-10-05 | Philip Morris Incorporated | Electrical smoking |
| US5322075A (en) * | 1992-09-10 | 1994-06-21 | Philip Morris Incorporated | Heater for an electric flavor-generating article |
| US5666976A (en) * | 1992-09-11 | 1997-09-16 | Philip Morris Incorporated | Cigarette and method of manufacturing cigarette for electrical smoking system |
| US5692525A (en) * | 1992-09-11 | 1997-12-02 | Philip Morris Incorporated | Cigarette for electrical smoking system |
| TW245766B (en) * | 1992-09-11 | 1995-04-21 | Philip Morris Prod | |
| US5367285A (en) * | 1993-02-26 | 1994-11-22 | Lake Shore Cryotronics, Inc. | Metal oxy-nitride resistance films and methods of making the same |
| US5649554A (en) * | 1995-10-16 | 1997-07-22 | Philip Morris Incorporated | Electrical lighter with a rotatable tobacco supply |
| AU742275B2 (en) * | 1996-12-27 | 2001-12-20 | Canon Kabushiki Kaisha | Charge-reducing film, image forming apparatus and method of manufacturing the same |
| CN1127750C (en) * | 1996-12-27 | 2003-11-12 | 佳能株式会社 | Charge-reducing film, image forming apparatus and method of manufacturing the same |
| EP2100525A1 (en) | 2008-03-14 | 2009-09-16 | Philip Morris Products S.A. | Electrically heated aerosol generating system and method |
| EP2110034A1 (en) | 2008-04-17 | 2009-10-21 | Philip Morris Products S.A. | An electrically heated smoking system |
| EP2113178A1 (en) | 2008-04-30 | 2009-11-04 | Philip Morris Products S.A. | An electrically heated smoking system having a liquid storage portion |
| EP2253233A1 (en) | 2009-05-21 | 2010-11-24 | Philip Morris Products S.A. | An electrically heated smoking system |
| EP2319334A1 (en) * | 2009-10-27 | 2011-05-11 | Philip Morris Products S.A. | A smoking system having a liquid storage portion |
| EP2327318A1 (en) | 2009-11-27 | 2011-06-01 | Philip Morris Products S.A. | An electrically heated smoking system with internal or external heater |
| US9854839B2 (en) | 2012-01-31 | 2018-01-02 | Altria Client Services Llc | Electronic vaping device and method |
| JP6420155B2 (en) | 2012-02-22 | 2018-11-07 | アルトリア クライアント サービシーズ エルエルシー | Electronic smoking article and improved heater element |
| USD849993S1 (en) | 2013-01-14 | 2019-05-28 | Altria Client Services | Electronic smoking article |
| USD691766S1 (en) | 2013-01-14 | 2013-10-15 | Altria Client Services Inc. | Mouthpiece of a smoking article |
| USD841231S1 (en) | 2013-01-14 | 2019-02-19 | Altria Client Services, Llc | Electronic vaping device mouthpiece |
| USD691765S1 (en) | 2013-01-14 | 2013-10-15 | Altria Client Services Inc. | Electronic smoking article |
| USD695449S1 (en) | 2013-01-14 | 2013-12-10 | Altria Client Services Inc. | Electronic smoking article |
| BR302014001648S1 (en) | 2013-10-14 | 2015-06-09 | Altria Client Services Inc | Smoke Applied Configuration |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3395089A (en) * | 1964-12-14 | 1968-07-30 | Bell Telephone Labor Inc | Method of depositing films of controlled specific resistivity and temperature coefficient of resistance using cathode sputtering |
| US3664931A (en) * | 1970-07-27 | 1972-05-23 | Dieter Gerstenberg | Method for fabrication of thin film capacitor |
| US3736242A (en) * | 1968-01-31 | 1973-05-29 | Bell Telephone Labor Inc | Sputtering technique |
-
1974
- 1974-01-16 US US05/433,892 patent/US4016061A/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3395089A (en) * | 1964-12-14 | 1968-07-30 | Bell Telephone Labor Inc | Method of depositing films of controlled specific resistivity and temperature coefficient of resistance using cathode sputtering |
| US3736242A (en) * | 1968-01-31 | 1973-05-29 | Bell Telephone Labor Inc | Sputtering technique |
| US3664931A (en) * | 1970-07-27 | 1972-05-23 | Dieter Gerstenberg | Method for fabrication of thin film capacitor |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114086122A (en) * | 2021-11-26 | 2022-02-25 | 江苏科技大学 | Ceramic-based gradient plating layer based on high film-substrate binding force on copper substrate and preparation method thereof |
| CN114086122B (en) * | 2021-11-26 | 2023-06-20 | 江苏科技大学 | Ceramic-based gradient coating based on high film-based bonding force on copper substrate and preparation method |
Also Published As
| Publication number | Publication date |
|---|---|
| US4016061A (en) | 1977-04-05 |