USB392242I5 - - Google Patents
Info
- Publication number
- USB392242I5 USB392242I5 US39224273A USB392242I5 US B392242 I5 USB392242 I5 US B392242I5 US 39224273 A US39224273 A US 39224273A US B392242 I5 USB392242 I5 US B392242I5
- Authority
- US
- United States
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6283—Polymers of nitrogen containing compounds having carbon-to-carbon double bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
- C08G18/46—Polycondensates having carboxylic or carbonic ester groups in the main chain having heteroatoms other than oxygen
- C08G18/4615—Polycondensates having carboxylic or carbonic ester groups in the main chain having heteroatoms other than oxygen containing nitrogen
- C08G18/463—Polycondensates having carboxylic or carbonic ester groups in the main chain having heteroatoms other than oxygen containing nitrogen containing nitro groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
- C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
- C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/91—Polymers modified by chemical after-treatment
- C08G63/914—Polymers modified by chemical after-treatment derived from polycarboxylic acids and polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Polyurethanes Or Polyureas (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2242394A DE2242394A1 (en) | 1972-08-29 | 1972-08-29 | MIXTURES OF SUBSTANCE HARDLED UNDER THE EFFECT OF LIGHT |
Publications (2)
Publication Number | Publication Date |
---|---|
USB392242I5 true USB392242I5 (en) | 1975-01-28 |
US3926636A US3926636A (en) | 1975-12-16 |
Family
ID=5854848
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US392242A Expired - Lifetime US3926636A (en) | 1972-08-29 | 1973-08-28 | Photocurable compositions |
Country Status (5)
Country | Link |
---|---|
US (1) | US3926636A (en) |
JP (1) | JPS4953933A (en) |
DE (1) | DE2242394A1 (en) |
FR (1) | FR2197914B3 (en) |
GB (1) | GB1442827A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2389158A1 (en) * | 1977-04-27 | 1978-11-24 | Du Pont | COMPOSITION FOR BONDING A PHOTOGRAPHIC EMULSION TO A POLYESTER DANDRUFF SUPPORT |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4035189A (en) * | 1972-02-25 | 1977-07-12 | Hitachi Chemical Company, Ltd. | Image forming curable resin compositions |
US4321317A (en) * | 1980-04-28 | 1982-03-23 | General Motors Corporation | High resolution lithography system for microelectronic fabrication |
US4467022A (en) * | 1980-08-11 | 1984-08-21 | Minnesota Mining And Manufacturing Company | Imaging process and article employing photolabile, blocked surfactant |
US4599273A (en) * | 1980-08-11 | 1986-07-08 | Minnesota Mining And Manufacturing Co. | Photolabile blocked surfactants and compositions containing the same |
US4478967A (en) * | 1980-08-11 | 1984-10-23 | Minnesota Mining And Manufacturing Company | Photolabile blocked surfactants and compositions containing the same |
US4369244A (en) * | 1980-08-11 | 1983-01-18 | Minnesota Mining And Manufacturing Company | Imaging process and article employing photolabile, blocked surfactant |
US4551416A (en) * | 1981-05-22 | 1985-11-05 | At&T Bell Laboratories | Process for preparing semiconductors using photosensitive bodies |
US4410611A (en) * | 1981-08-31 | 1983-10-18 | General Motors Corporation | Hard and adherent layers from organic resin coatings |
DE3231147A1 (en) * | 1982-08-21 | 1984-02-23 | Basf Ag, 6700 Ludwigshafen | POSITIVELY WORKING METHOD FOR PRODUCING RELIEF IMAGES OR RESIST PATTERNS |
DE3231145A1 (en) * | 1982-08-21 | 1984-02-23 | Basf Ag, 6700 Ludwigshafen | NEGATIVE WORKING METHOD FOR THE PRODUCTION OF RELIEF IMAGES OR RESIST PATTERNS |
DE3231144A1 (en) * | 1982-08-21 | 1984-02-23 | Basf Ag, 6700 Ludwigshafen | METHOD FOR PRODUCING PRINTING FORMS WITH PLASTIC PRINT LAYERS |
DE3331691A1 (en) * | 1983-09-02 | 1985-03-21 | Basf Ag, 6700 Ludwigshafen | LIGHT-SENSITIVE, CURABLE MIXTURE SUITABLE FOR POSITIVE RECORDING MATERIAL |
US4540636A (en) * | 1983-12-27 | 1985-09-10 | General Motors Corporation | Metal bearing element with a score-resistant coating |
US4740600A (en) * | 1984-05-10 | 1988-04-26 | Minnesota Mining And Manufacturing Company | Photolabile blocked surfactants and compositions containing the same |
DE3701569A1 (en) * | 1987-01-21 | 1988-08-04 | Basf Ag | COPOLYMERISATE WITH O-NITROCARBINOLESTER GROUPINGS, THE USE THEREOF AND METHOD FOR THE PRODUCTION OF SEMICONDUCTOR COMPONENTS |
DE3702035A1 (en) * | 1987-01-24 | 1988-08-04 | Basf Ag | COPOLYMERISATE WITH O-NITROCARBINOLESTER GROUPS AND METHOD FOR THE PRODUCTION OF TWO-LAYER RESISTORS AND SEMICONDUCTOR COMPONENTS |
US5143854A (en) | 1989-06-07 | 1992-09-01 | Affymax Technologies N.V. | Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof |
US6551784B2 (en) | 1989-06-07 | 2003-04-22 | Affymetrix Inc | Method of comparing nucleic acid sequences |
US5800992A (en) | 1989-06-07 | 1998-09-01 | Fodor; Stephen P.A. | Method of detecting nucleic acids |
US5547839A (en) | 1989-06-07 | 1996-08-20 | Affymax Technologies N.V. | Sequencing of surface immobilized polymers utilizing microflourescence detection |
US6309822B1 (en) | 1989-06-07 | 2001-10-30 | Affymetrix, Inc. | Method for comparing copy number of nucleic acid sequences |
US6346413B1 (en) | 1989-06-07 | 2002-02-12 | Affymetrix, Inc. | Polymer arrays |
US6406844B1 (en) | 1989-06-07 | 2002-06-18 | Affymetrix, Inc. | Very large scale immobilized polymer synthesis |
US5424186A (en) | 1989-06-07 | 1995-06-13 | Affymax Technologies N.V. | Very large scale immobilized polymer synthesis |
US6416952B1 (en) | 1989-06-07 | 2002-07-09 | Affymetrix, Inc. | Photolithographic and other means for manufacturing arrays |
US5744101A (en) | 1989-06-07 | 1998-04-28 | Affymax Technologies N.V. | Photolabile nucleoside protecting groups |
US6506558B1 (en) | 1990-03-07 | 2003-01-14 | Affymetrix Inc. | Very large scale immobilized polymer synthesis |
DE69132905T2 (en) | 1990-12-06 | 2002-08-01 | Affymetrix Inc N D Ges D Staat | Detection of nucleic acid sequences |
US6468740B1 (en) | 1992-11-05 | 2002-10-22 | Affymetrix, Inc. | Cyclic and substituted immobilized molecular synthesis |
DE19535161A1 (en) * | 1995-09-22 | 1997-03-27 | Basf Ag | Radiation-curable compositions containing surface-active, blocked amino compounds |
DE10129787A1 (en) * | 2001-06-20 | 2003-01-09 | Coronis Gmbh | Optical component, in particular eye implant |
DE10326893A1 (en) * | 2003-06-14 | 2004-12-30 | Degussa Ag | Resins based on ketones and aldehydes with improved solubility properties and low color numbers |
EP2380925A1 (en) | 2010-04-22 | 2011-10-26 | 3M Innovative Properties Company | Radiation curable composition, process of production and use thereof |
ES2353293B1 (en) * | 2010-11-09 | 2012-01-19 | Primus Rain, S. L. | COMPOSITION FOR THE SECTOR OF GRAPHIC ARTS, PROCEDURE AND USE OF THE SAME. |
EP3233018A1 (en) | 2014-12-16 | 2017-10-25 | 3M Innovative Properties Company | Cationically curing dental composition containing polymeric particles and use thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3615629A (en) * | 1967-03-10 | 1971-10-26 | Basf Ag | Photosensitive compositions for production of relief-bearing plates sheets or films |
-
1972
- 1972-08-29 DE DE2242394A patent/DE2242394A1/en active Pending
-
1973
- 1973-08-28 GB GB4046673A patent/GB1442827A/en not_active Expired
- 1973-08-28 US US392242A patent/US3926636A/en not_active Expired - Lifetime
- 1973-08-29 FR FR7331215A patent/FR2197914B3/fr not_active Expired
- 1973-08-29 JP JP48096281A patent/JPS4953933A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3615629A (en) * | 1967-03-10 | 1971-10-26 | Basf Ag | Photosensitive compositions for production of relief-bearing plates sheets or films |
Non-Patent Citations (1)
Title |
---|
Patchornik, J.A. et al., J. Amer. Chem. Soc., 92, 6333, 1970 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2389158A1 (en) * | 1977-04-27 | 1978-11-24 | Du Pont | COMPOSITION FOR BONDING A PHOTOGRAPHIC EMULSION TO A POLYESTER DANDRUFF SUPPORT |
Also Published As
Publication number | Publication date |
---|---|
GB1442827A (en) | 1976-07-14 |
FR2197914A1 (en) | 1974-03-29 |
DE2242394A1 (en) | 1974-03-14 |
US3926636A (en) | 1975-12-16 |
FR2197914B3 (en) | 1976-07-30 |
JPS4953933A (en) | 1974-05-25 |