US9390882B2 - Apparatus having a magnetic lens configured to diverge an electron beam - Google Patents
Apparatus having a magnetic lens configured to diverge an electron beam Download PDFInfo
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- US9390882B2 US9390882B2 US14/171,357 US201414171357A US9390882B2 US 9390882 B2 US9390882 B2 US 9390882B2 US 201414171357 A US201414171357 A US 201414171357A US 9390882 B2 US9390882 B2 US 9390882B2
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- magnetic lens
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- 238000010894 electron beam technology Methods 0.000 title claims abstract description 56
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 38
- 238000004804 winding Methods 0.000 claims abstract 9
- 230000004075 alteration Effects 0.000 claims description 21
- 230000005294 ferromagnetic effect Effects 0.000 claims description 12
- 239000007787 solid Substances 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 abstract description 8
- 239000000523 sample Substances 0.000 description 27
- 238000009792 diffusion process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 238000005430 electron energy loss spectroscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/58—Arrangements for focusing or reflecting ray or beam
- H01J29/64—Magnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/049—Focusing means
- H01J2237/0492—Lens systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/103—Lenses characterised by lens type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/14—Lenses magnetic
- H01J2237/1405—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
Definitions
- Various embodiments are directed to performing imaging of a specimen using an electron microscope.
- Electron microscopes are used in a variety of applications that require high resolution imaging and analysis.
- electron microscopes are used in applications such as metallurgy, crystallography, biological sciences, and the semiconductor industry. Any technology which increases the resolution offered by electron microscopes would be desirable.
- FIG. 1 shows a scanning transmission electron microscope (STEM) system in accordance with at least some embodiments
- FIG. 2A shows an electron probe
- FIG. 2B shows an annular aperture in accordance with at least some embodiments
- FIG. 2C shows an electron probe in accordance with at least some embodiments
- FIG. 3A shows a an overhead elevation view of a diverging lens in accordance with at least some embodiments
- FIG. 3B shows a cross-section elevation view of a diverging lens in accordance with at least some embodiments
- FIG. 4 shows a partial STEM system in accordance with at least some embodiments.
- FIG. 5 shows a method in accordance with at least some embodiments.
- the terms “including” and “comprising” are used in an open-ended fashion, and thus should be interpreted to mean “including, but not limited to . . . .”
- the term “couple” or “couples” is intended to mean either an indirect or direct connection. Thus, if a first device couples to a second device, that connection may be through a direct connection or through an indirect connection via other intermediate devices and connections.
- the term “system” means “one or more components” combined together. Thus, a system can comprise an “entire system,” “subsystems” within the system, an electron microscope, a magnetic lens, or any other device comprising one or more components.
- Electrode probe refers to a volume enclosed by a substantially equal-intensity contour surface around a focus of an electron beam.
- One example of the intensity of the contour surface is an electron intensity substantially equal to half the electron intensity at the focus center.
- “Vertical direction” refers to the direction parallel to the optical axis of an electron beam. “Horizontal direction” refers to the direction perpendicular to the optical axis of an electron beam.
- FIG. 1 shows a system 100 in accordance with at least some embodiments.
- system 100 is an electron microscope (e.g., scanning transmission electron microscope (STEM)).
- An electron beam generated by the electron source 102 is focused onto specimen 108 using a series of converging magnetic lenses 104 A- 104 B and 105 .
- the electron source 102 accelerates the electron beam to a predetermined acceleration voltage from an electron gun (e.g. cold field emission gun or a Schottky thermally assisted field emission gun).
- the electron beam is focused (equivalently referred to as converged or demagnified) by passing the electron beam through a magnetic field of converging lens 104 A and 104 B.
- the electron beam is further focused by the objective lens 105 to form an electron probe.
- the electron probe is horizontally positioned on the specimen 108 by the beam deflection coils 106 and/or by physical positioning of the specimen 108 .
- the electron beam transmitted through and scattered by the specimen 108 is passed through projection lenses 110 and 112 , and then detected by the detector 114 .
- the detector 114 comprises a bright field (BF) detector and an annular dark field (ADF) detector.
- the BF detector detects the direct transmitted electron beam through the specimen 108
- the ADF detector detects the electron beam scattered by the specimen 108 .
- the image is acquired by scanning the specimen 108 with an electron probe using the beam deflection coils 106 and changing the strength of the condenser lens 105 .
- a computer system (not shown in FIG. 1 so as to not to unduly complicate the figure) synchronized with the scanning of the specimen 108 forms a scanning transmitted image.
- the resolution (i.e. spatial) of the system 100 is limited by the electron probe size, and the electron probe size is affected by aberration of the lenses 104 A, 104 B and 105 . Due to aberration, the electron probe may be diffused along the longitudinal axis and the latitudinal axis of the electron beam.
- FIG. 2A illustrates an electron probe 203 diffused at least along the longitudinal axis of the electron beam 202 .
- the diffusion of the electron probe 203 is caused at least in part by chromatic and/or spherical aberration of the lenses 104 A, 104 B and 105 .
- the aberration of the magnetic lenses is reduced, at least in part, by annular aperture 118 , resulting in an electron probe smaller than previously achievable.
- FIG. 2B illustrates an overhead elevation view of annular aperture 118 in accordance with at least some embodiments.
- annular aperture 118 comprises an outer portion 204 and an inner portion 205 .
- Outer portion 204 is shown in FIG. 2B as a ring; however, other shapes may be equivalently used.
- inner portion 205 is shown to be circularly symmetric, but other shapes may be equivalently used.
- the outer portion 204 and the inner portion 205 are separated by uniform width 207 to create an opening 208 which, in this particular example, is also circularly symmetric.
- the outer portion 204 and the inner portion 205 are bridged (e.g., at locations 206 ) to prevent movement between the inner and outer portions.
- the annular aperture 118 is made of a heavy metal (e.g. Molybdenum, Platinum, or Tungsten) capable of blocking the electron beam, and the annular aperture 118 is grounded to prevent charge accumulation.
- a heavy metal e.g. Molybdenum, Platinum, or T
- annular aperture 118 is situated co-axially with the electron beam.
- the annular aperture 118 may be moved (i.e. by mechanical control) in the horizontal direction to align the center of the inner portion 205 of the annular aperture 118 with the optical axis of the electron beam.
- Annular aperture 118 enables only the portion of the electron beam incident on the opening 208 to pass, and the remaining portion of the electron beam is blocked by the outer portion 204 and inner portion 205 .
- the result is an electron beam confined to a hollow-core or hollow-cone geometry. When focused to create an electron probe, the hollow-cone electron beam creates an electron probe with less diffusion along the longitudinal axis.
- FIG. 2C illustrates a cross-sectional elevation view of a hollow-cone electron beam 210 focused to create electron probe 250 .
- the electron probe 250 is significantly smaller than the electron probe 203 formed by a solid-cone electron beam.
- the smaller size of the electron probe 250 is due in part to the aberration reduction provided by the annular aperture 118 , and also due in part to use of a hollow-cone electron beam enabling the electron beam to converge at larger angles (measured from the axis of the electron beam).
- annular aperture 118 may significantly reduce the electron probe 250 size by reducing aberration and resultant diffusion, some aberration (and thus diffusion) may still be present.
- the aberration that remains may be equivalently thought of as the portion of the aberration from lenses 104 A, 104 B and 105 that remains after the aberration reduction by the annular aperture 118 .
- the amount of remaining aberration is proportional to the angular range of the electron beam that passes through opening 208 of the annular aperture. Stated otherwise, the amount of remaining aberration is related to width 207 of the opening 208 .
- a diverging lens 120 ( FIG. 1 ) is used to correct at least some of the remaining aberration (and resulting diffusion).
- the diverging lens 120 is a magnetic lens situated co-axially with the hollow-cone electron beam at a location after the annular aperture 118 and before the specimen 108 .
- the diverging lens 120 diverges a hollow-cone electron beam, and in the embodiments of FIG. 1 the diverging lens 120 diverges the hollow-cone electron beam prior to the beam passing through the deflection coils 106 .
- FIG. 3A shows an overhead view of the diverging lens 120 .
- FIG. 3A shows that the diverging lens 120 is, in some embodiments, rotationally symmetric (i.e.
- FIG. 3B shows a cross-sectional elevation view of the diverging lens 120 taken along line 3 B- 3 B of FIG. 3A .
- the diverging lens 120 comprises a body member 301 , made of soft iron (or any other ferromagnetic substance).
- the body member 301 may be electrically grounded.
- the diverging lens 120 further comprises a solid core 302 within the body member 301 (e.g., at the center of the body member 301 ) and with air gaps 304 defining edges.
- an electrical coil 303 wound around the core 302 is excited by way of an electrical current.
- the electric current generates a magnetic field across the air gaps 304 . Because of fringing of the magnetic field outside the of the air gaps 304 , a hollow-cone electron beam 300 passing through the magnetic field 306 diverges to the outside of the lens 120 , as illustrated in FIG. 3B .
- the diverging lens 120 like magnetic lenses 104 A- 104 B and 105 , has inherent spherical and chromatic aberrations. As illustrated in FIG. 3B , the portion of the electron beam closest to the gaps 304 diverges more than portions of the electron beam that pass further away from the gaps 304 .
- the spherical aberration of the diverging lens 120 is substantially opposite that of the converging magnetic lenses 104 A- 104 B and 105 , and by adjusting the strength of the magnetic field of the diverging lens 120 (i.e. by the current applied to the electrical coil 303 ), the spherical aberration(s) caused by lenses 104 A, 104 B and 105 may be substantially cancelled by the diverging lens 120 .
- chromatic aberration in the diverging lens 120 cancels with the chromatic aberration of the magnetic lenses 104 A- 104 B and 105 .
- the resolution of the system 100 is controlled, at least in part, by the electron probe size, and the electron probe size is limited by the aberrations of the magnetic lens.
- the electron probe formed by system 100 has small horizontal and vertical dimensions, as the aberrations are limited and/or corrected by the annular aperture 118 and the diverging lens 120 .
- the system 100 is capable of performing high resolution three-dimensional imaging by scanning the specimen 108 with the electron probe in both horizontal and vertical directions.
- the scanning of the specimen 108 with the electron probe is controlled by the objective lens 105 and the beam deflector coils 106 .
- changing the strength of the deflector coils 106 enables scanning of the specimen 108 in the horizontal direction
- changing the strength of the objective lens 105 enables scanning of the specimen 108 in the vertical direction (i.e. through its thickness).
- the detector 114 detects the electron beams transmitted through and/or scattered by scanning the specimen 108 with the electron probe.
- FIG. 4 shows such other embodiments for detecting the direct transmitted electron beam and the scattered electron beams by the detector 114 .
- FIG. 4 shows an annular aperture 401 situated substantially at the back focal plane 402 between the post-field objective lens 110 and projection lens 112 .
- the annular aperture 401 blocks the scattered electron to provide a filtered image at the bright field detector 404 .
- the annular aperture 401 blocks the direct transmitted electron beams to provide a cleaner image at the annular dark field detector 406 .
- FIG. 5 shows a method in accordance with at least some embodiments.
- the method starts (block 500 ) and moves to generating an electron beam (block 504 ).
- a hollow-cone electron beam is created (block 508 ) by passing the electron beam through a annular aperture.
- the hollow-cone electron beam is focused to form a probe (block 512 ).
- a specimen is scanned using the probe (block 516 ).
- three-dimensional imaging is performed based on the scanning (block 520 ), and the method ends (block 524 ).
- the three-dimensional imaging may be performed using a scanning transmission electron microscope, or the three-dimensional imaging maybe performed with any other types of electron microscope (e.g. scanning electron microscope (SEM)).
- SEM scanning electron microscope
- the various embodiments are discussed with both the annular aperture and diverging lens; however, in other embodiments the annular aperture may be used without the diverging lens.
- EELS electron energy loss spectroscopy
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- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
Claims (22)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US14/171,357 US9390882B2 (en) | 2007-10-29 | 2014-02-03 | Apparatus having a magnetic lens configured to diverge an electron beam |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US11/926,791 US8642959B2 (en) | 2007-10-29 | 2007-10-29 | Method and system of performing three-dimensional imaging using an electron microscope |
US14/171,357 US9390882B2 (en) | 2007-10-29 | 2014-02-03 | Apparatus having a magnetic lens configured to diverge an electron beam |
Related Parent Applications (1)
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US11/926,791 Division US8642959B2 (en) | 2007-10-29 | 2007-10-29 | Method and system of performing three-dimensional imaging using an electron microscope |
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US20140145089A1 US20140145089A1 (en) | 2014-05-29 |
US9390882B2 true US9390882B2 (en) | 2016-07-12 |
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US11/926,791 Active 2029-12-15 US8642959B2 (en) | 2007-10-29 | 2007-10-29 | Method and system of performing three-dimensional imaging using an electron microscope |
US14/171,357 Active 2027-12-16 US9390882B2 (en) | 2007-10-29 | 2014-02-03 | Apparatus having a magnetic lens configured to diverge an electron beam |
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US11/926,791 Active 2029-12-15 US8642959B2 (en) | 2007-10-29 | 2007-10-29 | Method and system of performing three-dimensional imaging using an electron microscope |
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Families Citing this family (13)
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DE102009016861A1 (en) * | 2009-04-08 | 2010-10-21 | Carl Zeiss Nts Gmbh | particle beam |
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JP5208910B2 (en) * | 2009-12-07 | 2013-06-12 | 株式会社日立ハイテクノロジーズ | Transmission electron microscope and sample observation method |
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CN102033308B (en) * | 2010-10-22 | 2012-08-29 | 浙江大学 | Ultra-high resolution optical microscope imaging method and device |
JP5934513B2 (en) * | 2012-02-09 | 2016-06-15 | 日本電子株式会社 | Transmission electron microscope |
JP6252099B2 (en) * | 2013-10-24 | 2017-12-27 | 富士通株式会社 | Scanning transmission electron microscope system, image processing apparatus, image processing method, and image processing program |
US9552961B2 (en) | 2015-04-10 | 2017-01-24 | International Business Machines Corporation | Scanning transmission electron microscope having multiple beams and post-detection image correction |
WO2017192100A1 (en) * | 2016-05-06 | 2017-11-09 | National University Of Singapore | A corrector structure and a method for correcting aberration of an annular focused charged-particle beam |
JP7304461B2 (en) | 2018-04-13 | 2023-07-06 | 株式会社ホロン | Electronic detector |
JP7193694B2 (en) * | 2018-07-26 | 2022-12-21 | 国立研究開発法人理化学研究所 | Electron microscope and sample observation method using the same |
US11404241B2 (en) * | 2020-03-30 | 2022-08-02 | Fei Company | Simultaneous TEM and STEM microscope |
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