US8467425B1 - Method for generating high-energy and high repetition rate laser pulses from CW amplifiers - Google Patents
Method for generating high-energy and high repetition rate laser pulses from CW amplifiers Download PDFInfo
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- US8467425B1 US8467425B1 US13/373,716 US201113373716A US8467425B1 US 8467425 B1 US8467425 B1 US 8467425B1 US 201113373716 A US201113373716 A US 201113373716A US 8467425 B1 US8467425 B1 US 8467425B1
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- laser beam
- pulsed laser
- pulse energy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2316—Cascaded amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
- H01S3/10046—Pulse repetition rate control
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
- H01S3/1673—YVO4 [YVO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/2333—Double-pass amplifiers
Definitions
- the invention relates generally to a method and apparatus for obtaining high pulse energy and high repetition rate from a pulsed laser.
- MOPA master-oscillator-power amplifier mode
- the repetition rate is set by the oscillator.
- the output pulse energy is limited with a CW amplifier as the maximum stored energy in the CW amplifier is limited for efficient extraction and the amplified energy in each pulse is dependent on the pulse repetition rate with higher repetition rates typically yielding lower pulse energies.
- the invention provides a method for generating high-energy, high repetition rate laser pulses using a continuous wave amplifier.
- the method comprises providing a commercial oscillator producing a pulsed laser beam, the beam has a beam path and an initial beam pulse energy.
- the method further comprises providing a first continuous wave amplifier and an electro-optical modulator in the beam path, wherein the electro-optical modulator is between the oscillator and the first continuous wave amplifier and providing a phase-locking system that synchronizes the initial pulsed laser beam with the electro-optical modulator.
- the pulsed laser beam is passed along the beam path through the electro-optical modulator and first amplifier and the beam is amplified to produce a pulsed output laser beam with amplified output beam pulse energy.
- at least one second continuous wave amplifier is provided after the first amplifier to provide at least one second stage of amplification of the pulsed laser beam.
- the output beam pulse energy is at least 100 fold greater than the initial beam pulse energy. In another exemplary embodiment the output beam pulse energy is at least 1000 fold greater than the initial beam pulse energy.
- the pulsed output laser beam has a repetition rate of at least one mega-hertz and alternatively at least 2 mega-hertz.
- the invention also provides a laser system configuration for generating high-energy, high repetition rate laser pulses using a continuous wave amplifier.
- the laser system comprises an oscillator having a pulsed laser beam wherein the pulsed laser beam has a beam path and an initial beam pulse energy; a first continuous wave amplifier and an electro-optical modulator wherein the first continuous wave amplifier and electro-optical modulator are in the beam path and the electro-optical modulator is between the oscillator and the first continuous wave amplifier; and a phase-locking system wherein the phase-locking system synchronizes the pulsed laser beam with the electro-optical modulator.
- the pulsed laser beam passes along the beam path through the electro-optical modulator and first continuous wave amplifier.
- the system also comprises at least one second continuous wave amplifier.
- FIG. 1 is a schematic representation of one embodiment of the pulsed laser system of the invention.
- FIG. 2 is a graph of amplified pulse energy versus repetition rate for an exemplary embodiment of the invention.
- the apparatus and method described herein utilizes one or more continuous wave (CW) amplifiers with an oscillator to obtain a pulsed laser beam with both a high output beam pulse energy (micro-joule or greater) and high repetition rate (a rate at least in the mega-hertz range) simultaneously.
- the system comprises an oscillator, electro-optical modulator, and at least one continuous wave amplifier with the electro-optical modulator positioned in the beam between the oscillator and the first continuous wave amplifier.
- an oscillator is any laser in which the output beam takes the form of pulses of light at a predetermined repetition rate.
- Seed lasers are oscillators, for example.
- a mode locked oscillator is a laser that creates very short pulses at a pre-determined repetition rate.
- a continuous wave amplifier i.e. CW amplifier
- CW amplifier is designed for use with a continuous wave laser, i.e. a laser that produces a continuously output beam.
- Amplifiers that are used with CW lasers have been deemed in the prior art to be unsuitable for amplification of pulsed lasers due to low amplification gain.
- an electro-optical modulator is an optical device that serves as a pulse repetition selection device; i.e. it is a switch that operates to change the pulse repetition rate.
- a Pockels cell is exemplary of an EOM.
- a polarizer is a device that passes light of a specific polarization and rejects light of other polarizations.
- FIG. 1 is a schematic representation of an exemplary embodiment of laser system 1 of the invention.
- the laser system comprises an oscillator 2 .
- Any high repetition rate, mode-locked laser may be used as the oscillator in the practice of the invention.
- the invention is particularly well suited for use with a conventional or commercial oscillator and provides for obtaining a high output pulse energy from a conventional oscillator.
- a diode pumped Nd:YVO 4 laser was used as the oscillator.
- Other lasers, which may likewise be suitable oscillators include, but are not limited to, diode lasers or fiber lasers.
- the oscillator 2 produces a laser beam 3 which has an initial beam pulse energy and follows a beam path 33 .
- the initial laser beam 3 is directed through the system 1 along the beam path 33 by a plurality of mirrors 4 .
- the oscillator 2 will produce a pulsed beam with a pulse energy of a few nano-joules.
- the initial beam pulse energy is less than 10 nano-joules, or alternatively less than 7 nano-joules, or alternatively less than 5 nano-joules or alternatively less than 3 nano-joules.
- the laser beam 3 having the initial beam pulse energy passes through an optical isolator 5 and into an electro-optical modulator (EOM) 6 .
- EOM 6 is placed in the beam path 33 between the oscillator 2 and first amplifier 7 .
- the EOM 6 serves as a pulse frequency down converter to reduce the laser pulse repetition rate to a lower repetition rate.
- a phase-locking system may be used to synchronize the laser beam 3 and EOM 6 driver and keep the laser beam 3 and EOM 6 in phase.
- a Pockels cell may be used as an electro-optical modulator 6 , for example
- the initial laser beam 3 passes from the EOM 6 through a series of optics to a first amplifier 7 .
- the first amplifier 7 may also be referred to as a “preamplifier” in embodiments using a plurality of amplifiers.
- the beam 3 passes through optics elements including two wave plates 13 , 15 , polarizer 12 and a second optical isolator 14 and is reoriented in direction by two mirrors 4 as it passes from the EOM 6 to the first amplifier 7 .
- This optical arrangement between the EOM 6 and first amplifier 7 is exemplary of a suitable optical arrangement, however, as one skilled in the art appreciates, other optical arrangements and/or optical components may be likewise suitable for use in the practice of the invention.
- the beam 3 upon passing through the first amplifier 7 , the beam 3 strikes a high reflector 8 and is redirected through the first amplifier 7 for further amplification.
- the high reflector 8 is highly efficient in reflecting the beam 3 .
- the beam 3 is directed through a series of optics to a second amplifier 9 .
- the second amplifier 9 may also be referred to as a “power amp” in embodiments using a plurality of amplifiers.
- the beam 3 is directed from the first amplifier 7 to the second amplifier by a plurality of mirrors 4 and passes through waveplate 15 , optical isolator 14 , polarizer 12 and lenses 20 .
- the use of the polarizer 12 facilitates utilization of the first amplifier 7 for two stages of amplification.
- This optical arrangement between the first amplifier 7 and second amplifier 9 is exemplary of a suitable optical arrangement; however, as one skilled in the art appreciates, other optical arrangements and/or optical components may be likewise suitable for use in the practice of the invention.
- the pulsed output laser beam 11 Upon exiting the second amplifier 9 , the pulsed output laser beam 11 has a output pulse energy at least an order of magnitude greater than the initial beam pulse energy of laser beam 3 and in some embodiments two, three or more orders of magnitude greater.
- the pulse energy of the output laser beam is typically at least 1 micro-joule.
- an output laser beam having micro-joule energy, pico-second pulses at mega-hertz repetition rates was achieved from an initial pulsed laser beam with an energy of about 5 nano-joules.
- a power meter 10 can measure the power of the output beam 11 .
- the exemplary embodiment of FIG. 1 uses two amplifiers with three stages of amplification. Preferably at least two stages of amplification are used and more preferably it is desirable to use 3 or more stages of amplification.
- the number of amplifiers used depends upon the intended use for the system with more amplifiers being used for higher output beam pulse energies; i.e. 3, 4, or more amplifiers may be used to achieve higher amplification.
- the plurality of stages of amplification may be accomplished using a plurality of amplifiers, by redirecting the laser beam through one or more of the amplifiers a second time and/or a combination thereof.
- all of the amplifiers are CW amplifiers for mega hertz repetition rates.
- CW amplifiers including commercially available CW amplifiers may be use in the practice of the invention.
- the laser media inside the amplifier was Nd:YVO 4 side-pumped by laser diodes.
- Other exemplary CW amplifiers included, but are not limited to, Yb-glass and YLF at wavelengths matched to that of the oscillators, for example.
- the all of the amplifiers are positioned in the optical path such that the laser beam passes through the EOM prior to passing through any of the amplifiers; i.e. the laser beam passes through the EOM before reaching the first amplifier and any other amplifiers are positioned such that the beam passes through the first amplifier before passing through to other amplifiers.
- the inventor believes without wishing to be held to the theory that the use of an electro-optic modulator in the beam path between the oscillator and the first CW amplifier is the key component for achieving both high pulse rate and high repetition rate. Further by using a configuration in which the EOM is positioned between the laser oscillator and first amplifier, optical damage to the EOM can be minimized as the laser beam has low power as it passes through the EOM. The low laser power beam also comes with the great advantage that smaller EOM aperture or lower driving voltage is required.
- a second harmonic generator (not shown) may be included in the laser system 1 shown in FIG. 1 after the second amplifier 9 and is highly desirable for some applications, such as for example, applications related to photo-cathode based equipment that need shorter wavelength laser beams.
- a method for obtaining both high pulse energy and high repetition rate simultaneously using conventional continuous wave amplifiers is provided.
- the method may be used with conventional and/or commercial oscillators.
- the method comprises providing a pulsed laser beam having a beam path.
- a first CW amplifier and an electro-optical modulator are placed in the beam path with the electro-optical modulator being between the laser and the first CW amplifier.
- a phase-locking system synchronizes the pulsed laser beam with the electro-optical modulator.
- the method includes the use of a plurality of stages of additional amplification after the beam passes through the first CW amplifier. This may be accomplished by passing the beam through at least one second CW amplifier after passing the beam through the first CW amplifier and/or by using a high reflectance reflector and passing the beam through at least one CW amplifier a second time for a second stage of amplification. Alternatively, a combination of CW and other types of amplifiers may be used. However, at least one CW amplifier should be used and preferably all amplifiers are CW amplifiers.
- a commercial diode pumped Nd:YVO 4 mode-locked laser was used as the oscillator with a first and a second CW amplifier.
- the laser media inside the amplifiers was Nd:YVO 4 side-pumped by laser diodes.
- the beam was passed through the first amplifier twice before passing to the second amplifier for two stages of amplification.
- an initial beam energy of about 5 nano-joules was amplified to an output beam energy of micro-joules at a repetition rate of mega-hertz.
- the method provides at least a hundred fold or two orders of magnitude increase in pulse energy between the initial beam pulse energy and the output beam pulse energy at multi-mega-hertz repetition rates. In another embodiment at least a thousand fold or three orders of magnitude or more increase in energy between the initial beam pulse energy and the output beam pulse energy at mega-hertz repetition rates may be obtained.
- Pulsed laser (PW) amplifiers known in the art prior to the present invention do not provide for such amplification and energies simultaneously at variable repetition rates over mega-hertz.
- additional amplifiers may be added to the laser system.
- the addition of additional amplifiers will also require the addition of corresponding optical elements such as, for example, mirrors to direct the beam and/or lenses.
- the method of the invention provides a practical approach for overcoming the known difficulty in obtaining laser systems having both output pulses with MHz or higher repetition rates and high pulse energy simultaneously.
- Such systems are desirable for many applications in scientific research.
- high energy (micro-J) and high repetition rate (mega-hertz) pico-second lasers have unique capability that opens the way to new solutions in industrial applications such as precision micromachining, materials processing, flat panel display, advanced packaging, interconnects, semiconductor and solar manufacturing.
- the oscillator was a mode-locked Nd:YVO 4 seed laser.
- the seed laser had 20 pico-second pulse width, 500 mW output power, 1064 nm wavelength and 74.85 MHz repetition rate.
- Two identical continuous wave amplifiers with the beam being reflected to make two passes through the first amplifier were used.
- the seed laser generated an initial laser beam having about 5 nano-joule pulse energy and a repetition rate of 74.85 MHz.
- FIG. 2 provides data showing the amplification of the laser system of Example 1.
- the initial beam pulse energy of about 5 nano-joules of the seed laser was increased to 240 nJ at 74.85 MHz and it continues to increase as the repetition rate decreases.
- FIG. 2 also shows that while retaining a repetition rate in the MHz range of 2.34 MHz an output beam pulse energy of 3 micro-joules was obtained. This is an amplification of about 1000 fold and is sufficient energy for producing nano-coulomb high energy electron bunches even with a 1% quantum efficiency photo-cathode for accelerators.
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US13/373,716 US8467425B1 (en) | 2011-02-22 | 2011-11-28 | Method for generating high-energy and high repetition rate laser pulses from CW amplifiers |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20180159298A1 (en) * | 2016-12-06 | 2018-06-07 | Newport Corporation | Laser System Having A Multi-Stage Amplifier and Methods of Use |
WO2018105733A1 (en) * | 2016-12-09 | 2018-06-14 | 古河電気工業株式会社 | Pulsed laser device, processing device, and pulsed laser device control method |
CN117673880A (en) * | 2024-01-31 | 2024-03-08 | 北京卓镭激光技术有限公司 | Nanosecond pulse laser with double-path energy amplification |
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US20090201954A1 (en) * | 2007-08-01 | 2009-08-13 | Deep Photonics Corporation | Method and apparatus for pulsed harmonic ultraviolet lasers |
US20110267671A1 (en) * | 2008-03-31 | 2011-11-03 | Electro Scientific Industries, Inc. | Combining multiple laser beams to form high repetition rate, high average power polarized laser beam |
US8199398B2 (en) * | 2008-02-07 | 2012-06-12 | Imra America, Inc. | High power parallel fiber arrays |
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2011
- 2011-11-28 US US13/373,716 patent/US8467425B1/en active Active - Reinstated
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US20090201954A1 (en) * | 2007-08-01 | 2009-08-13 | Deep Photonics Corporation | Method and apparatus for pulsed harmonic ultraviolet lasers |
US8199398B2 (en) * | 2008-02-07 | 2012-06-12 | Imra America, Inc. | High power parallel fiber arrays |
US20110267671A1 (en) * | 2008-03-31 | 2011-11-03 | Electro Scientific Industries, Inc. | Combining multiple laser beams to form high repetition rate, high average power polarized laser beam |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20180159298A1 (en) * | 2016-12-06 | 2018-06-07 | Newport Corporation | Laser System Having A Multi-Stage Amplifier and Methods of Use |
KR20190085090A (en) * | 2016-12-06 | 2019-07-17 | 뉴포트 코포레이션 | Laser system with multi-pass amplifier and method of using same |
US10784646B2 (en) * | 2016-12-06 | 2020-09-22 | Newport Corporation | Laser system having a multi-stage amplifier and methods of use |
US20200373727A1 (en) * | 2016-12-06 | 2020-11-26 | Newport Corporation | Laser System Having A Multi-Stage Amplifier and Methods of Use |
US11705688B2 (en) * | 2016-12-06 | 2023-07-18 | Newport Corporation | Laser system having a multi-stage amplifier and methods of use |
WO2018105733A1 (en) * | 2016-12-09 | 2018-06-14 | 古河電気工業株式会社 | Pulsed laser device, processing device, and pulsed laser device control method |
JPWO2018105733A1 (en) * | 2016-12-09 | 2019-10-24 | 古河電気工業株式会社 | Pulse laser apparatus, processing apparatus, and control method of pulse laser apparatus |
US11050211B2 (en) | 2016-12-09 | 2021-06-29 | Furukawa Electric Co., Ltd. | Pulsed laser device, processing device, and method of controlling pulsed laser device |
CN117673880A (en) * | 2024-01-31 | 2024-03-08 | 北京卓镭激光技术有限公司 | Nanosecond pulse laser with double-path energy amplification |
CN117673880B (en) * | 2024-01-31 | 2024-04-30 | 北京卓镭激光技术有限公司 | Nanosecond pulse laser with double-path energy amplification |
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